JP2006108054A5 - - Google Patents
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- Publication number
- JP2006108054A5 JP2006108054A5 JP2004296890A JP2004296890A JP2006108054A5 JP 2006108054 A5 JP2006108054 A5 JP 2006108054A5 JP 2004296890 A JP2004296890 A JP 2004296890A JP 2004296890 A JP2004296890 A JP 2004296890A JP 2006108054 A5 JP2006108054 A5 JP 2006108054A5
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- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004296890A JP4868330B2 (ja) | 2004-10-08 | 2004-10-08 | 多価イオン発生源およびこの発生源を用いた荷電粒子ビーム装置 |
| PCT/JP2005/007284 WO2006040850A1 (ja) | 2004-10-08 | 2005-04-08 | 多価イオン発生源およびこの発生源を用いた荷電粒子ビーム装置 |
| US11/576,945 US7544952B2 (en) | 2004-10-08 | 2005-04-08 | Multivalent ion generating source and charged particle beam apparatus using such ion generating source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004296890A JP4868330B2 (ja) | 2004-10-08 | 2004-10-08 | 多価イオン発生源およびこの発生源を用いた荷電粒子ビーム装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006108054A JP2006108054A (ja) | 2006-04-20 |
| JP2006108054A5 true JP2006108054A5 (enExample) | 2007-07-05 |
| JP4868330B2 JP4868330B2 (ja) | 2012-02-01 |
Family
ID=36148151
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004296890A Expired - Fee Related JP4868330B2 (ja) | 2004-10-08 | 2004-10-08 | 多価イオン発生源およびこの発生源を用いた荷電粒子ビーム装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7544952B2 (enExample) |
| JP (1) | JP4868330B2 (enExample) |
| WO (1) | WO2006040850A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9443698B2 (en) * | 2008-10-06 | 2016-09-13 | Axcelis Technologies, Inc. | Hybrid scanning for ion implantation |
| EP3905300A3 (en) | 2009-05-15 | 2022-02-23 | Alpha Source, Inc. | Ecr particle beam source apparatus |
| CN102012476B (zh) * | 2010-07-27 | 2012-10-10 | 中国科学院等离子体物理研究所 | 低温超导绝缘帕邢放电试验装置 |
| JP2013239303A (ja) * | 2012-05-14 | 2013-11-28 | National Institutes Of Natural Sciences | 電子ビーム多価イオン源における多価イオン生成方法 |
| US9984847B2 (en) | 2013-03-15 | 2018-05-29 | Mars Tohken Solution Co., Ltd. | Open-type X-ray tube comprising field emission type electron gun and X-ray inspection apparatus using the same |
| JP6218403B2 (ja) * | 2013-03-15 | 2017-10-25 | 株式会社マーストーケンソリューション | 電界放射型電子銃を備えたｘ線管及びそれを用いたｘ線検査装置 |
| US10297413B2 (en) | 2015-03-10 | 2019-05-21 | North-Western International Cleaner Production Centre | Method and device for the production of highly charged ions |
| CN110868790A (zh) * | 2019-11-26 | 2020-03-06 | 成都理工大学工程技术学院 | 一种负氢离子引出装置 |
| CN111712033B (zh) * | 2020-06-23 | 2022-09-27 | 中国科学院近代物理研究所 | 一种级联漂移管电势阱装置及其使用方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59121735A (ja) * | 1982-12-28 | 1984-07-13 | Toshiba Corp | イオン発生装置 |
| FR2595868B1 (fr) * | 1986-03-13 | 1988-05-13 | Commissariat Energie Atomique | Source d'ions a resonance cyclotronique electronique a injection coaxiale d'ondes electromagnetiques |
| JP2733243B2 (ja) | 1988-03-31 | 1998-03-30 | 科学技術振興事業団 | イオンソースチャンバー |
| FR2676593B1 (fr) * | 1991-05-14 | 1997-01-03 | Commissariat Energie Atomique | Source d'ions a resonance cyclotronique electronique. |
| JPH05275408A (ja) * | 1992-03-24 | 1993-10-22 | Nippon Steel Corp | 平面状基板の洗浄装置 |
| JPH05275048A (ja) * | 1992-03-26 | 1993-10-22 | Fine Ceramics Center | 酸素イオン注入装置 |
| JPH07262946A (ja) | 1994-03-22 | 1995-10-13 | Mitsubishi Electric Corp | イオン源 |
| JP3368695B2 (ja) * | 1994-10-05 | 2003-01-20 | 日新電機株式会社 | イオン源 |
| JPH11233335A (ja) * | 1997-12-08 | 1999-08-27 | Mitsubishi Heavy Ind Ltd | 超伝導コイル装置 |
| JP4252237B2 (ja) * | 2000-12-06 | 2009-04-08 | 株式会社アルバック | イオン注入装置およびイオン注入方法 |
| JP2004087542A (ja) * | 2002-08-23 | 2004-03-18 | Sumitomo Heavy Ind Ltd | カスプ磁場発生用超伝導磁石装置 |
| JP2004111330A (ja) | 2002-09-20 | 2004-04-08 | Aisin Seiki Co Ltd | 溶融バルク高温超伝導体を備えた装置 |
| US6783059B2 (en) | 2002-12-23 | 2004-08-31 | General Electric Company | Conduction cooled passively-shielded MRI magnet |
-
2004
- 2004-10-08 JP JP2004296890A patent/JP4868330B2/ja not_active Expired - Fee Related
-
2005
- 2005-04-08 WO PCT/JP2005/007284 patent/WO2006040850A1/ja not_active Ceased
- 2005-04-08 US US11/576,945 patent/US7544952B2/en not_active Expired - Fee Related