JP2006082926A - Substrate treatment device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To surely prevent deformation and damage to a device body caused by thermal stress. <P>SOLUTION: In the substrate treatment device, one series of various kinds of treatments including calcination treatment are applied to a substrate B conveyed along a conveying passage 43. The device includes the conveying passage 43 for conveying the substrate B comprising an indoor conveying roller 40 at the inside and is provided with the device body 20 in which a plurality of treatment chambers 30 for performing one series of substrate treatment are formed. The device body 20 is provided with a rectangular parallelopiped frame 11 and a skin 21 for covering the rectangular parallelopiped frame 11. The rectangular parallelopiped frame 11 has one end (an end in an upstream side in the present embodiment) made to a fixed end fixed to a stopper 17 and the other end (an end in a downstream side) made to a free end. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a substrate processing apparatus configured to perform a series of various processes including a baking process on various substrates including a glass substrate on which a liquid crystal, various electronic components, and the like are mounted.

  2. Description of the Related Art Conventionally, there is known a substrate processing apparatus configured to perform a series of various processes including a baking process on a substrate being transported along a transport path. As a series of processes, a pre-heat treatment performed on the fed substrate, a baking process performed on the substrate on which the pre-heat treatment has been completed, and a substrate on which the baking process has been completed are performed. A cooling process is common.

  Each process is performed in each processing unit in which the inside of the apparatus main body that is long in the substrate transport direction is separated from the others by a partition wall. As each process part, a preheating part, a baking part, and a cooling part can be mentioned. The partition wall is provided with a passage opening through which the substrate passes, and a shutter for opening and closing the passage opening. Since each processing unit is in a sealed state by closing the shutter, the processing unit can be processed on the substrate in a state of being cut off from other processing units.

  By the way, in the substrate processing apparatus as described above, the preheating part and the baking part are heated to a higher temperature than other processing parts by heating by a predetermined heating means when the substrate is subjected to the preheat treatment and baking process. While this portion expands in the substrate transport direction due to thermal expansion of this portion, it shrinks to its original size by cooling due to interruption of substrate processing.

  In other words, the main body of the device repeatedly expands and contracts every time it is operated and interrupted, but conventionally, no measures have been taken against such expansion and contraction of the main body of the device, so thermal stress is generated at various locations on the main body of the device. However, in a severe case, there is a problem that a part of the apparatus main body is deformed or damaged.

  The present invention has been made in view of such a situation, and even if the start and stop of the operation are repeated, the substrate processing that can reliably prevent deformation and breakage due to the thermal stress of the apparatus main body. The object is to provide a device.

  According to the first aspect of the present invention, there is provided an integrated long casing placed on the floor surface, a transport path for transporting a substrate disposed along the longitudinal direction in the casing, and the transport In a substrate heat treatment apparatus comprising a plurality of heat treatment units including at least a firing treatment unit arranged along a path, the substrate heat treatment device is provided at one location of the housing, and moves the housing in the longitudinal direction with respect to the floor surface. A regulation part for regulation, and a bottom part of the casing excluding the regulation part, and a low friction member that has low friction with the floor surface at a predetermined position in the longitudinal direction are provided. is there.

  According to such a configuration, the casing regulates the movement in the longitudinal direction with respect to the floor surface even if thermal expansion or thermal contraction occurs due to the baking process being performed on the substrate or the baking process being interrupted. Therefore, by making the end portion in the longitudinal direction a free end, the free end side moves forward and backward in the substrate transport direction to cope with expansion and contraction due to heat. In this case, since the friction reducing member is interposed between the casing and the floor, the casing can be easily expanded and contracted. Therefore, when both ends of the casing are fixed as in the past, thermal stress is generated in the casing because there is no escape place even if the casing tries to expand or contract due to heating by heating treatment or interruption of heating. However, inconvenience occurs when the case causes deformation or breakage of the housing. In the present invention, such inconvenience is prevented.

  According to a second aspect of the present invention, in the first aspect of the present invention, the restricting portion is provided at one end in the longitudinal direction of the casing.

  According to such a configuration, only the other end side of the housing expands and contracts due to the restricting portion provided at one end.

  The invention according to claim 3 is the invention according to claim 1 or 2, wherein the low friction member is a plurality of rollers attached to the bottom of the casing along the longitudinal direction. It is.

  According to such a configuration, the expansion and contraction of the housing is easily performed by the rolling of the rollers interposed between the housing and the floor.

  According to a fourth aspect of the present invention, in the first aspect of the invention, the frictional force reducing member is a powdery body interposed between the casing and the floor. .

  According to such a configuration, the expansion and contraction of the casing is easily performed by the flow of the powder that is interposed between the casing and the floor.

  According to a fifth aspect of the present invention, in the invention according to any one of the first to fourth aspects, the plurality of processing sections include an upstream atmosphere replacement section in which an internal atmosphere is a non-oxidizing atmosphere, and the upstream atmosphere. A preheating unit that preheats the substrate sent from the replacement unit, a baking unit that performs a baking process on the substrate sent from the preheating unit, and a cooling process for the substrate sent from the baking unit The cooling unit to be applied and the internal atmosphere is a non-oxidizing atmosphere, and the substrate is a downstream atmosphere replacement unit into which the substrate is fed from the cooling unit.

  According to such a configuration, since the substrate carried into the housing along the conveyance path first passes through the upstream atmosphere replacement portion that has been set to the non-oxidizing atmosphere, the preheating portion when the substrate is carried into the next preheating portion. A predetermined pre-heat treatment is performed in a state in which the outside air is prevented from being brought in. Next, the substrate that has undergone the pre-heat treatment is subjected to a full-scale baking process in the baking unit, and subsequently subjected to a predetermined cooling process in the cooling unit, and then discharged out of the system through the downstream atmosphere replacement unit. The In the downstream atmosphere replacement part, since the internal atmosphere is a non-oxidizing atmosphere, the inconvenience that the oxidizing atmosphere enters the cooling part is avoided.

  According to the first aspect of the present invention, the casing moves in the longitudinal direction even if thermal expansion or thermal contraction occurs due to the baking process on the substrate or the baking process being interrupted. Since the restricting portion to be restricted is provided and the end portion is a free end, the free end side moves forward and backward in the substrate transport direction with reference to the restricting portion, so that expansion and contraction due to heat can be dealt with. Therefore, when both ends are fixed ends, thermal stress is generated in the casing because there is no escape space even if the casing tries to expand and contract due to heating by heating processing or interruption of heating, which causes deformation of the casing. However, in the present invention, such an inconvenience can be surely prevented, and the maintenance cost can be reduced.

  According to the second aspect of the present invention, since the restricting portion is provided at one end in the longitudinal direction of the casing, the casing expands and contracts only at the other end, so that the positioning of the one end is determined. Can be stabilized.

  According to the third aspect of the present invention, the casing in which heat has entered and exited can be easily expanded and contracted by the rolling of a roller interposed between the casing and the floor.

  According to the fourth aspect of the present invention, the casing in which heat enters and exits can be easily expanded and contracted by the flow of the powder interposed between the casing and the floor.

  According to the fifth aspect of the present invention, the general baking process for the substrate can be appropriately executed.

  FIG. 1 and FIG. 2 are perspective views showing an embodiment of a rectangular parallelepiped frame 11 of a substrate baking apparatus (substrate processing apparatus) 10 according to the present invention, and FIG. 1 shows that the rectangular parallelepiped frame 11 is installed on a floor. The state immediately before, FIG. 2 has each shown the state in which the rectangular parallelepiped frame was installed on the floor. 1 and 2, the XX direction is referred to as the width direction, and the YY direction is referred to as the front-rear direction. In particular, the -X direction is leftward, the + X direction is rightward, the -Y direction is forward, and the + Y direction is forward. It is called the back.

  As shown in FIGS. 1 and 2, the rectangular parallelepiped frame 11 serves as a skeleton for configuring the substrate baking apparatus 10 as a structure, and a floor frame 12 having a long rectangular shape in the front-rear direction. And a ceiling frame 13 having the same shape as that of the floor frame 12 disposed above the floor frame 12 and interposed between the four corners of the floor frame 12 and the ceiling frame 13. It has a basic configuration with four main struts 14 provided.

  The floor frame 12 includes a long joist member 121 that is long in the front-rear direction, and a short joist member 122 that extends between the ends of the pair of long joist members 121 and extends in the width direction. The abutting portions between the long joists 121 and the short joists 122 are fixed by welding or bolting, whereby the floor frame 12 is integrally formed.

  The ceiling frame 13 includes a long beam member 131 having the same dimensions as the long joist member 121 and extending in the front-rear direction, and a short beam extending in the width direction between the ends of the pair of long beam members 131. It consists of material 132. The contact portion between the long beam member 131 and the short beam member 132 is also fixed by welding or bolting, whereby the ceiling frame 13 has an integral structure.

  The floor frame 12 and the ceiling frame 13 are integrally connected to each other at the four corners by the four main struts 14 by welding or the like, so that the rectangular parallelepiped frame 11 itself has an integral structure. .

  A plurality of (four in the present embodiment) auxiliary struts 141 are interposed between the long joist member 121 and the long beam member 131 at an equal pitch in the front-rear direction, and a pair of long members. Between the joists 121 and between the pair of long beams 131, a plurality (four in the present embodiment) of installed joists 123 and installed beams 133 are installed at equal pitches in the front-rear direction. The auxiliary strut 141, the installed joist 123, and the installed beam 133 play a role as a structural material and include a plurality of substrate processing units (upstream atmosphere replacement unit 31, preheating unit 32, firing unit (firing process) described later). Part) 33, the cooling part 34, and the downstream atmosphere replacement part 35).

  Further, between each pair of main columns 14 opposed in the front-rear direction, a roller support plate 16 is installed at a substantially central position in the vertical direction. These roller support plates 16 are for supporting a plurality of indoor transport rollers 40 described later. These long joists 121, short joists 122, elongate beams 131, elongate beams 132, and further, in addition to the installed joists 123, erect beams 133, bracing members 15, and roller support plates 16, are appropriately reinforced. Although the material for this is attached, illustration is abbreviate | omitted.

  In order to further strengthen the integral structure of the rectangular parallelepiped frame 11, the brace 15 is diagonally interposed between the long beam member 131 and the main support column 14 and the auxiliary support column 141 by welding or the like. Thus, the rectangular parallelepiped frame 11 has a so-called ramen structure in which the joints of the respective members are rigidly connected as a whole.

  The rectangular parallelepiped frame 11 configured in this manner is installed via a plurality of rollers (friction force reducing members) 90 in an installation area F1 on the floor F for installing the substrate baking apparatus 10, and an upstream end is installed. It is fixed to a stopper 17 that is erected and fixed on the floor F immediately upstream of the region F1.

  The stopper 17 is provided on the front side of the rectangular concrete foundation 171 in plan view, and is provided obliquely to support the gate holder 172 in a state where the base end portion is embedded in the concrete foundation 171 and the gate holder 172. The base end portion is configured to include a pair of bracing columns 175 in the width direction embedded in the concrete foundation 171. The gate support body 172 includes a pair of columnar bodies 173 in the width direction and a beam body 174 that is integrally constructed between the tops of the pair of columnar bodies 173.

  The standing dimension (length dimension above the concrete foundation 171) of the column body 173 is set to the same length as the outer dimension between the floor frame body 12 and the ceiling frame body 13, and the beam body. The length dimension of 174 is set to be the same as the outer dimension between the pair of main struts 14 opposed in the width direction, whereby the rear end portion of the rectangular parallelepiped frame 11 is placed on the front edge portion of the concrete foundation 171. Thus, the pair of main columns 14 and the short beam members 132 are opposed to the pair of column bodies 173 and the beam bodies 174, respectively.

  A plurality of the rollers 90 are laid at an equal pitch on the installation region F1 with the axes oriented in the direction orthogonal to the substrate transport direction, and the diameter dimension protrudes upward from the floor F of the concrete foundation 171. In the state where the rectangular parallelepiped frame 11 is placed on the plurality of rollers 90, the pair of main struts 14 and the short beam members 132 at the rear end are paired with the pair of gate holders 172. It can come into close contact with the column body 173 and the beam body 174.

  In the present invention, as shown in FIG. 2, in a state where the rectangular parallelepiped frame 11 is installed on the plurality of rollers 90, the rear end main strut 14 and the column body 173, and the rear end short length The beam member 132 and the beam body 174 are connected to each other by a predetermined number of bolts, whereby the rear end portion of the rectangular parallelepiped frame 11 is a fixed end, while the front end portion of the rectangular parallelepiped frame 11 is a free end. Has been.

  Therefore, when the rectangular parallelepiped frame 11 expands and contracts due to thermal stress, the plurality of rollers 90 sandwiched between the floor F and the long joists 121 roll on the floor F according to the expansion and contraction. Unnecessary force does not act on the rectangular parallelepiped frame 11 by releasing the thermal stress.

  In the present embodiment, as shown in FIG. 2, the rectangular parallelepiped frame 11 is installed on the roller 90, and the surface of the rectangular parallelepiped frame 11 is predetermined with the rear end fixed to the gate holder 172. The substrate baking apparatus 10 is completed by being covered with a covering material and mounting various devices therein. Hereinafter, the substrate baking apparatus 10 will be described with reference to FIGS. 3 and 4.

  FIG. 3 is a partially cutaway perspective view showing an embodiment of the substrate baking apparatus 10, and FIG. 4 is a cross-sectional view taken along the line AA. In addition, the direction display by X and Y in FIG. 3 and FIG. 4 is the same as that of FIG. As shown in these drawings, the substrate baking apparatus 10 is for processing a substrate B in an apparatus main body (housing) 20 formed by stretching an outer skin 21 on the outer surface of the rectangular frame 11. A plurality of processing chambers 30 are formed to form the processing chamber 30.

  The skin 21 is attached to a bottom plate 211 attached to the bottom of the rectangular parallelepiped frame 11, a pair of side plates 212 attached to each side surface in the left-right width direction of the rectangular parallelepiped frame 11, and attached to the rear surface of the rectangular parallelepiped frame 11. The rear plate 213, the front plate 214 stretched on the front surface of the rectangular parallelepiped frame 11, and the top plate 215 stretched on the upper surface of the rectangular parallelepiped frame 11.

  The rear plate 213 has an opening 22 for carrying the substrate B conveyed from the upstream side into the processing chamber 30, and the front plate 214 is baked in the substrate storage device 30. An unloading port 23 is opened for unloading the processed substrate B out of the system. At the carry-in port 22 and the carry-out port 23, a rotary shutter 24 is provided so as to be freely opened and closed. These shutters 24 are opened and closed by driving an opening / closing mechanism (not shown).

  The processing chamber 30 is formed on the upstream atmosphere replacement section 31 formed on the most upstream side, the preheating section 32 formed on the downstream side of the upstream atmosphere replacement section 31, and the downstream side of the preheating section 32. The firing section 33, the cooling section 34 formed on the downstream side of the firing section 33, and the downstream atmosphere replacement section 35 formed on the downstream side of the cooling section 34 are divided. Each part 31, 32, 33, 34, 35 is formed in front of and behind a pair of auxiliary struts 141, the installed joist 123 and the installed beam 133 corresponding to each other in the rectangular parallelepiped frame 11. In addition, a partition plate 25 is provided in a portion surrounded by each set of auxiliary columns 141, the installed joist 123, and the installed beam member 133. By this partition plate 25, the parts 31, 32, 33, 34, and 35 are mutually connected. It is partitioned. Each partition plate 25 has a passage opening 26 for allowing the substrate B to pass therethrough.

  The partition plate 25 provided between the upstream atmosphere replacement section 31 and the preheating section 32 and between the cooling section 34 and the downstream atmosphere replacement section 35 has a vertically moving gate that opens and closes the passage opening 26. A valve 27 is provided, and a shutter 24 that opens and closes the passage opening 26 is provided in the partition plate 25 before and after the firing unit 33. The gate valve 27 can obtain a higher degree of sealing than the shutter 24, and the gate valve 27 is employed in the passage port 26 on the upstream side of the preheating unit 32 and the passage port 26 on the downstream side of the cooling unit 34. By doing so, the preheating part 32, the baking part 33, and the cooling part 34, which should be the heart of the baking process, can be reliably sealed.

  Further, in the processing chamber 30, a plurality of indoor transfer rollers 40 provided between the pair of roller support plates 16 in the width direction of the rectangular parallelepiped frame 11 are provided, and the substrate B carried into the processing chamber 30 is It is conveyed in the processing chamber 30 by the driving rotation of the indoor conveyance roller 40 by driving of a conveyance motor (not shown).

  The indoor conveyance rollers 40 are set at the same height position as a plurality of upstream conveyance rollers 41 arranged in parallel on the upstream side of the substrate baking apparatus 10 and downstream conveyance rollers 42 arranged in parallel on the downstream side, Accordingly, the substrate B can be continuously transported from the upstream transport roller 41 to the downstream transport roller 42 via the indoor transport roller 40. A transport path 43 for transporting the substrate B through the substrate baking apparatus 10 is formed by the upstream transport roller 41, the indoor transport roller 40, and the downstream transport roller 42.

  The upstream atmosphere replacement unit 31 is for replacing the internal atmosphere with a non-oxidizing atmosphere in a state where the substrate B is loaded and the upstream shutter 24 and the downstream gate valve 27 are closed. Then, when the substrate B is transferred from the upstream atmosphere replacement unit 31 to the preheating unit 32, the gate valve 27 is opened, and even if the upstream atmosphere replacement unit 31 and the preheating unit 32 are in communication with each other, the preheating unit 32 is opened. To prevent oxidizing atmosphere.

  The preheating part 32 is for performing a preheat treatment on the substrate B fed from the upstream atmosphere replacement part 31 in a non-oxidizing atmosphere. In the present embodiment, an ultraviolet lamp 321 for preheating is provided in the preheating unit 32, and the substrate B introduced into the preheating unit 32 is preheated by being irradiated with ultraviolet rays from the ultraviolet lamp 321. A predetermined curing process using ultraviolet rays is performed. In the present embodiment, the substrate B is preheated to 150 ° C. to 200 ° C. during the stay of about 5 minutes to 10 minutes in the preheating unit 32.

  The baking part 33 performs a full-scale baking process in a non-oxidizing atmosphere on the preheated substrate B, and an energization heating element 331 serving as a heat source for baking the substrate B is provided therein. ing. The substrate B introduced into the baking unit 33 is heated to about 250 ° C. to 350 ° C. by obtaining heat from the energized heating element 331 during the stay of about 30 minutes to 50 minutes with the front and rear shutters 24 closed. As a result, a baking treatment is performed.

  The cooling unit 34 performs a cooling process on the substrate B after the baking process, and the substrate B is in a period of 10 minutes to 20 minutes between the room temperature non-oxidizing gas supplied to the cooling unit 34. It is cooled by the heat exchange over it.

  The downstream atmosphere replacement unit 35 is a portion through which the cooled substrate B sent from the cooling unit 34 passes before being discharged to the outside, and the upstream side gate valve 27 is closed and the downstream side shutter is closed. After the substrate B is carried out to the outside through the carry-out port 23 with the opening 24 open, the inside atmosphere is replaced from the oxidizing atmosphere to the non-oxidizing atmosphere with the shutter 24 closed.

  This is because when the downstream shutter 24 is opened to carry the substrate B out of the downstream atmosphere replacement section 35, air enters the downstream atmosphere replacement section 35 via the outlet 23. As a result, the inside of the downstream atmosphere replacement section 35 becomes an oxidizing atmosphere, and when the gate valve 27 is opened to transport the next substrate B from the cooling section 34 to the downstream atmosphere replacement section 35, the cooling section 34 is returned to. Since an oxidizing atmosphere invades, the atmosphere in the downstream atmosphere replacing portion 35 is replaced in advance so as to avoid this, thereby forming a non-oxidizing atmosphere.

  As shown in FIG. 4, a gas supply unit 50 that supplies a non-oxidizing gas (nitrogen gas) to the processing chamber 30 is provided in the vicinity of the substrate baking apparatus 10, and nitrogen gas from the gas supply unit 50 is provided. Is supplied to each part 31, 32, 33, 34, 35 of the processing chamber 30.

  The gas supply unit 50 includes a gas source 51 such as a nitrogen cylinder, a gas supply pipe 52 interposed between the gas source 51 and the units 31, 32, 33, 34, and 35 of the processing chamber 30, And a control valve 53 provided in a part corresponding to each part 31, 32, 33, 34, 35 of the gas supply pipe 52. Each part 31, 32, 33, 34, The supply amount of nitrogen gas to 35 is controlled.

  An exhaust pipe 54 is connected to each part 31, 32, 33, 34, 35 of the processing chamber 30, and the gas in each part 31, 32, 33, 34, 35 expelled by the supplied nitrogen gas is exhausted. The gas is exhausted to the outside through the pipe 54.

  According to the substrate baking apparatus 10 configured as described above, the substrate B supplied into the processing chamber 30 is first replaced in the non-oxidizing atmosphere by replacing the internal gas with nitrogen gas in the upstream atmosphere replacement unit 31. Then, the preheating unit 32 is preheated by being irradiated with the ultraviolet lamp 321 and is cured by ultraviolet rays. Subsequently, the baking unit 33 performs the baking process with the energization heating element 331, and then the cooling unit. A cooling process is performed at 34 and the liquid is discharged to the outside through the downstream atmosphere replacement unit 35.

  The rectangular parallelepiped frame 11 which is the skeleton of the substrate baking apparatus 10 is supported by a plurality of rollers 90 laid on the floor F, and the upstream end is fixed to the stopper 17 and fixed to the floor F. On the other hand, since the downstream end is a free end that is not fixed to and supported by the floor F, the substrate baking apparatus 10 is heated by the ultraviolet lamp 321 or the energization heating element 331, thereby Even if the rectangular parallelepiped frame 11 extends in the substrate transport direction, this extension is absorbed by the rolling of the rollers 90. Therefore, internal stress due to heat is accumulated in the rectangular parallelepiped frame 11, thereby reliably preventing inconveniences such as deformation and breakage of the rectangular parallelepiped frame 11.

  As described above in detail, the substrate baking apparatus 10 according to the present invention performs a series of various processes including a baking process on the substrate B transferred along the transfer path 43, and includes an indoor transfer roller inside. The apparatus main body 20 includes a transport path 43 for transporting the substrate B composed of 40 and has a plurality of processing chambers 30 for performing a series of substrate processing. The apparatus main body 20 includes a rectangular parallelepiped frame 11 and the rectangular parallelepiped The rectangular parallelepiped frame 11 has one end portion (upstream end portion in the present embodiment) fixed to the stopper 17 while the other end portion (downstream side). Since the device main body 20 is subjected to a baking process on the substrate B or an interruption of the baking process, the apparatus main body 20 can The end is fixed Write, by the other end is a free end, the free end corresponds to the expansion and contraction due to heat by forward and reverse movement toward the substrate conveying direction fixed end as a reference. Therefore, when both ends are fixed ends, a thermal stress is generated in the apparatus main body 20 due to the fact that the apparatus main body 20 does not escape even if the apparatus main body 20 tries to expand and contract due to heating by heating processing or interruption of heating. Although inconvenience occurs when it causes deformation or breakage, in the present invention, since the free end side moves freely, such inconvenience can be reliably prevented.

  And, as in this embodiment, in the apparatus main body 20, the high temperature part and the low temperature part are mixed, and the free end side can move freely even when the degree of expansion and contraction is not uniform throughout the apparatus. There is no inconvenience. Further, when the entire apparatus main body 20 is a free end (that is, when both the front end and the rear end are free ends), when the expansion and contraction of the apparatus main body 20 is repeated, the apparatus main body 20 becomes the original. Although it may be moved from the installation position, in the present invention, since the restricting portion (the stopper 17 in the present embodiment) that restricts the movement of the apparatus main body 20 is provided, the apparatus main body 20 is in the original installation position. There is no inconvenience of moving from.

  In the above embodiment, since the roller 90 as a frictional force reducing member for reducing the frictional force between the bottom portion of the apparatus main body 20 and the floor F is interposed, the apparatus main body 20 is provided. Is easily performed by the rolling of the roller 90 interposed between the apparatus main body 20 and the floor F, and accumulation of internal stress in the rectangular parallelepiped frame 11 can be reliably prevented.

  And in said embodiment, the substrate baking apparatus 10 is employ | adopted as a substrate processing apparatus, and the some process chamber 30 has the upstream atmosphere replacement part 31 by which internal atmosphere is made into a non-oxidizing atmosphere, and this upstream atmosphere. A preheating unit 32 that preheats the substrate B fed from the replacement unit 31, a firing unit 33 that performs a firing process on the substrate B fed from the preheating unit 32, and the firing unit 33. The apparatus main body is provided along the transport path 43 because it includes a cooling unit 34 that performs a cooling process on the substrate B, and a downstream atmosphere replacement unit 35 that has a non-oxidizing atmosphere and the substrate B is fed from the cooling unit 34. First, since the substrate B carried into the substrate 20 passes through the upstream atmosphere replacement section 31 that is set to the non-oxidizing atmosphere, when the substrate B is carried into the next preheating section 32, the outside air is brought into the preheating section 32. Predetermined preheat treatment is performed in a state but which are prevented. Next, the substrate B that has undergone the pre-heat treatment is subjected to a full-scale baking process on the substrate B in the baking unit 33, and subsequently subjected to a predetermined cooling process in the cooling unit 34, and then via the downstream atmosphere replacement unit 35. It is discharged out of the system. In the downstream atmosphere replacement section 35, the internal atmosphere is a non-oxidizing atmosphere, so that the inconvenience that the oxidizing atmosphere enters the cooling section 34 is avoided.

  In the substrate baking apparatus 10, the extension of the rectangular frame 11 due to the temperature rise of the preheating unit 32 and the baking unit 33 is such that the upstream end of the rectangular frame 11 is a fixed end, while the downstream end is a free end. Therefore, the occurrence of inconveniences that cause a problem in the base baking process due to the thermal expansion of the rectangular parallelepiped frame 11 is surely eliminated.

  The present invention is not limited to the above embodiment, and includes the following contents.

  (1) In the above embodiment, the substrate baking apparatus 10 that performs the baking process on the substrate B is adopted as the substrate processing apparatus. However, the present invention is limited to the substrate baking apparatus 10 being the substrate processing apparatus. It may be a normal substrate processing apparatus that does not involve firing. That is, even in a substrate processing apparatus that does not involve a baking process, a frame that has a rectangular parallelepiped shape that is disposed along the transport path is a long frame for processing the substrate B while transporting it in a flat flow. Since the frame expands and contracts due to a partial change in temperature, the frame arrangement structure using the roller 90 according to the present invention is effective in order to cope with such a change.

  (2) In the embodiment described above, the upstream end of the rectangular parallelepiped frame 11 is fixed to the stopper 17 to be a fixed end, while the downstream end is a free end. Instead, the downstream end may be a fixed end and the upstream end may be a free end. Moreover, while fixing the center part of the rectangular parallelepiped frame 11 of the board | substrate conveyance direction to the floor F, it is good also considering both the upstream end and the downstream end of the rectangular parallelepiped frame 11 as a free end. By doing so, the amount of deformation at the end of the rectangular parallelepiped frame 11 can be reduced by half. In this case, the center part of the rectangular parallelepiped frame 11 can be interpreted as the end part on the side where the fixed end according to the present invention is formed.

  (3) In the above embodiment, the roller 90 as a frictional force reducing member is interposed between the rectangular parallelepiped frame 11 and the floor F. In the present invention, the frictional force reducing member is the roller 90. However, the present invention is not limited thereto, and a caster provided with wheels rotatably around an axis may be attached to the bottom of the rectangular parallelepiped frame 11, or a powdery substance such as sand may be attached to the rectangular parallelepiped frame 11 and the floor F. You may interpose between. In particular, when a powdery body is interposed, the inconvenience that the expansion and contraction of the apparatus main body 20 is easily absorbed by the flow of the powdery body and the internal stress is accumulated in the rectangular parallelepiped frame 11 is effectively eliminated. Is done.

  (4) In the above embodiment, the roller 90 is directly placed on the floor F. However, instead of doing this, a rail is laid in the installation area F1, and the roller 90 is placed on this rail. Good.

It is a perspective view which shows one Embodiment of the rectangular parallelepiped frame of the substrate baking apparatus (substrate processing apparatus) which concerns on this invention, and has shown the state just before a rectangular parallelepiped frame is installed on a floor. It is a perspective view which shows one Embodiment of the rectangular parallelepiped frame of the substrate baking apparatus (substrate processing apparatus) which concerns on this invention, and has shown the state in which the rectangular parallelepiped frame was installed on the floor. It is a partially cutaway perspective view showing an embodiment of a substrate baking apparatus. It is AA sectional view taken on the line of the board | substrate baking apparatus shown in FIG.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Substrate baking apparatus 11 Cuboid frame 12 Floor frame 121 Long joisting material 122 Short joisting material 123 Erection joisting material 13 Ceiling frame 131 Long beam material 132 Short beam material 133 Construction beam material 14 Main support 141 Supplementary support 15 Bracing Materials 16 Roller support plate 17 Stopper 171 Concrete foundation 172 Gate body 173 Column body 174 Beam body 175 Bracing column 20 Device main body (housing) 21 Skin 211 Bottom plate 212 Side plate 213 Rear plate 214 Front plate 215 Top plate 22 Inlet 23 Inlet 23 24 Shutter 25 Partition plate 26 Passage port 27 Gate valve 30 Processing chamber 31 Upstream atmosphere replacement section 32 Preheating section 321 UV lamp 33 Baking section (baking section)
331 Energizing heating element 34 Cooling unit 35 Downstream atmosphere replacement unit 40 Indoor transfer roller 41 Upstream transfer roller 42 Downstream transfer roller 43 Transfer path 50 Gas supply unit 51 Gas source 52 Gas supply pipe 53 Control valve 54 Exhaust pipe 90 Roller ( Friction force reducing member) B Substrate F Floor

Claims (5)

  An integrated long casing placed on the floor, a transport path for transporting a substrate disposed along the longitudinal direction in the casing, and at least arranged along the transport path In a substrate heat treatment apparatus comprising a plurality of heat treatment units including a firing treatment unit, a restriction unit provided at one position of the housing and restricting movement of the housing in the longitudinal direction with respect to the floor surface, and the restriction A substrate processing apparatus comprising a low friction member that is low in friction with the floor surface at a predetermined position in the longitudinal direction, which is a bottom portion of the casing excluding a portion.   The substrate processing apparatus according to claim 1, wherein the restricting portion is provided at one end in the longitudinal direction of the housing. The substrate processing apparatus according to claim 1, wherein the low friction member is a plurality of rollers attached to a bottom portion of the housing along a longitudinal direction.
Substrate processing equipment.   The substrate processing apparatus according to claim 1, wherein the frictional force reducing member is a powdery body interposed between the apparatus main body and the floor.   The plurality of processing units include an upstream atmosphere replacement unit in which the internal atmosphere is a non-oxidizing atmosphere, a preheating unit that preheats the substrate fed from the upstream atmosphere replacement unit, and the preheating unit. A baking unit that performs a baking process on the substrate, a cooling unit that performs a cooling process on the substrate fed from the baking unit, and an internal atmosphere is a non-oxidizing atmosphere, and the substrate is fed from the cooling unit. The substrate processing apparatus according to claim 1, wherein the substrate processing apparatus is a downstream atmosphere replacement unit.

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