JP2006075661A - Method and apparatus for manufacturing pattern forming substrate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and apparatus for manufacturing a pattern forming substrate on which a water repellent partition is formed, the method and apparatus which enable wettability of a functional liquid to be improved by irradiating the pattern forming area on which the functional liquid is discharged with ultraviolet light. <P>SOLUTION: A filter element forming area 7 divided by the partition 6 formed on a mother substrate 12 and having water repellent effect is irradiated with an ultraviolet light 86 from a surface side opposed from a surface of the mother substrate 12 on which the partition 6 is formed, after the filter element material 13 is discharged on the filter element forming area 7 and before the element material 13 is solidified. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a method for manufacturing a patterned substrate and an apparatus for manufacturing the same.

  Conventionally, in the case of manufacturing a color filter having a pixel pattern by discharging a functional liquid from a droplet discharge head to a substrate, the functional liquid is discharged to a filter element forming region constituting a color filter formed on the substrate. Sometimes, when there is a trace amount of organic residue in the formation area or the viscosity of the functional liquid is high, the functional liquid does not wet and spread throughout the filter element formation area, and color loss occurs at the corners in the area. It becomes a quality defect product.

  In order to solve such a problem, there is a method of improving the wettability of the functional liquid by removing the trace organic substances by irradiating the entire substrate with ultraviolet rays and cleaning the surface of the filter element forming region. Known (Patent Document 1).

JP 2003-136003 A

  However, in the above method, since the entire substrate is irradiated with ultraviolet rays, not only the filter element forming region but also the liquid-repellent partition wall partitioning the filter element forming region is irradiated with ultraviolet rays. As a result, the liquid repellency of the partition walls is impaired, and the functional liquid moves up the partition walls and wets and spreads to other adjacent filter element formation regions, resulting in quality defects such as color mixing and color unevenness. There was a problem.

  An object of the present invention is to solve the above-described problem, and can improve the wettability of a functional liquid ejected to a pattern area partitioned by a liquid-repellent partition wall. An object of the present invention is to provide a method for manufacturing a patterned substrate and a manufacturing apparatus therefor.

  In order to solve the above problems, a method for producing a pattern-formed substrate according to the present invention is a method for producing a pattern-formed substrate in which a functional liquid is ejected onto a substrate to form a pattern, and the partition wall is formed by lyophobic treatment on the substrate. A partition forming step for forming the functional region, a functional liquid discharging step for discharging the functional liquid to the pattern region partitioned by the partition forming step, and an ultraviolet irradiation step for irradiating the pattern region where the functional liquid is discharged by the functional liquid discharging step with ultraviolet rays. And a drying step of drying the functional liquid discharged to the pattern region.

  According to this, since the ultraviolet irradiation is performed from the end of the functional liquid discharge process to the start of the drying process, it prevents the reduction of the cleaning effect of the pattern region and effectively improves the wettability of the functional liquid. be able to.

  The pattern forming substrate manufacturing method of the present invention may irradiate the pattern region where the functional liquid excluding at least the partition walls has been discharged.

  According to this, since the pattern area where the functional liquid is discharged is irradiated with ultraviolet rays, the surface of the pattern area is cleaned, and the wettability of the functional liquid can be improved.

  You may irradiate the ultraviolet-ray of the manufacturing method of the pattern formation board | substrate of this invention from the surface opposite to the board | substrate surface in which the partition was formed.

  According to this, since the partition wall has a masking effect and only the fine pattern region is irradiated, the wettability of the functional liquid in the fine pattern region can be improved.

  The ultraviolet rays of the pattern forming substrate manufacturing method of the present invention may be applied to a local portion of the pattern region including at least a region where the functional liquid is not wet and spread.

  According to this, since the local region is irradiated with ultraviolet rays, it is possible to correct the region of the pattern region in which insufficient dampening of the functional liquid has occurred.

  You may irradiate the corner part in a pattern area | region with the ultraviolet-ray of the manufacturing method of the pattern formation board | substrate of this invention.

  According to this, since the functional liquid is likely to be insufficiently wet and spread at the corners of the pattern, the wettability of the functional liquid at the corners can be improved by irradiating the corners with ultraviolet rays.

  The ultraviolet rays of the pattern forming substrate manufacturing method of the present invention may be applied to a portion where the functional liquid is not spread in the pattern region.

  According to this, since the portion where the functional liquid is not wet spread is irradiated with ultraviolet rays, this portion can be made lyophilic and the functional liquid can be wet spread.

  The pattern area of the present invention may be a filter element forming area constituting a color filter.

  According to this, since the filter element forming region is cleaned by ultraviolet irradiation after the functional liquid is discharged, the wettability of the functional liquid can be improved.

  The pattern forming substrate manufacturing apparatus of the present invention is a pattern forming substrate manufacturing apparatus that discharges a functional liquid onto a substrate to form a pattern, and is a droplet discharge that discharges the functional liquid as droplets onto the substrate. The present invention includes a moving part that relatively moves a droplet discharge head that constitutes the droplet discharge unit and the substrate, and an ultraviolet irradiation unit that irradiates the substrate on which the functional liquid is discharged with ultraviolet rays.

  According to this, the droplet discharge head discharges the functional liquid from the droplet discharge portion while moving relative to the substrate. Thereafter, the substrate is irradiated with ultraviolet rays by the ultraviolet irradiation unit. Therefore, a series of manufacturing processes can be simplified and man-hours can be reduced.

    DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, embodiments of the invention will be described with reference to the drawings.

  First, a color filter having a pattern formation manufactured using a droplet discharge head will be described. FIG. 1A is a plan view showing a planar structure of a color filter, and FIG. 1B is a plan view of a mother substrate that is the basis of the color filter.

  In this embodiment, the color filter 1 has a plurality of filter elements 3 in a dot pattern (in this embodiment, a dot matrix in the surface of a square and translucent substrate 2 formed of, for example, glass or plastic). Formed). The filter element 3 is defined by partition walls 6 formed in a lattice pattern with a resin material having no translucency, and is formed by filling a plurality of rectangular regions arranged in a dot / matrix shape with a functional liquid. The Each of these filter elements 3 is formed of a functional liquid of any one of R (red), G (green), and B (blue), and each of these color filter elements 3 is arranged in a predetermined arrangement. Are lined up. As this arrangement, for example, a stripe arrangement, a mosaic arrangement, a delta arrangement, and the like are known.

  In FIG. 1A, the size of the color filter 1 is, for example, 1.8 inches. The size of one filter element 3 is, for example, 30 μm × 100 μm. The pitch of each filter element 3 is, for example, 75 μm.

  When the color filter 1 of the present embodiment is used as an optical element for full-color display, one pixel is formed by using three filter elements 3 of R, G, and B as one unit, and R in one pixel is formed. , G, and B, or a combination thereof, by selectively passing light, a full color display is performed. At this time, the partition wall 6 formed of a resin material having no transparency functions as a black mask.

  The color filter 1 is cut out from a mother substrate 12 having a large area, for example, as shown in FIG. Specifically, first, a pattern for one color filter 1 is formed on the surface of each of the plurality of color filter forming regions 11 set in the mother substrate 12, and the surroundings of these color filter forming regions 11 are further formed. The individual color filters 1 are formed by forming cut grooves in the substrate and further cutting the mother substrate 12 along the grooves.

  Next, a color filter manufacturing apparatus as a fine pattern manufacturing apparatus will be described. FIG. 2 is a perspective view showing the configuration of the color filter manufacturing apparatus.

  The color filter manufacturing apparatus 16 discharges and adheres a functional liquid of one color of R, G, and B, for example, R, as a droplet to a predetermined position in each color filter forming region 11 in the mother substrate 12. It is a device. Although a droplet discharge device for the G-color functional liquid and the B-color functional liquid can be prepared for each, the structure thereof can be the same as that in FIG. 2, and the description thereof will be omitted. In addition, it is also possible to discharge three colors of R, G, and B with one color filter manufacturing apparatus 16.

  In FIG. 2, the color filter manufacturing apparatus 16 includes a carriage 26 provided with a droplet discharge head 22, a head position control device 17 that controls the position of the droplet discharge head 22, and a substrate position that controls the position of the mother substrate 12. A control device 18, a main scanning drive device 19 for moving the droplet discharge head 22 with respect to the mother substrate 12, and a sub-scanning drive device 21 for moving the mother substrate 12 with respect to the droplet discharge head 22 in a sub-scanning manner. , An ultraviolet irradiation device 83 for irradiating the mother substrate with ultraviolet rays, a substrate supply device 23 for supplying the mother substrate 12 to a predetermined work position in the color filter manufacturing device 16, and a control for overall control of the color filter manufacturing device 16. The apparatus 24 is comprised.

  The head position control device 17, the substrate position control device 18, the main scanning drive device 19, the sub-scanning drive device 21, and the ultraviolet irradiation device 83 are installed on the base 9. These devices are covered with a cover 14 as necessary.

  The substrate supply device 23 includes a substrate accommodating portion 57 that accommodates the mother substrate 12 and a robot 58 that conveys the mother substrate 12. The robot 58 includes a base 59 placed on an installation surface such as a floor and the ground, a lift shaft 61 that moves up and down relative to the base 59, a first arm 62 that rotates about the lift shaft 61, and a first arm. The second arm 63 rotates with respect to 62, and the suction pad 64 provided on the lower surface of the tip of the second arm 63. The suction pad 64 can suck the mother substrate 12 by an air suction force or the like.

  A capping device 76 and a cleaning device 77 are disposed at one side position of the sub-scanning driving device 21 under the trajectory of the droplet discharge head 22 that is driven by the main scanning driving device 19 and moves in the main scanning direction. An electronic balance 78 is disposed at the other side position. The cleaning device 77 is a device for cleaning the droplet discharge head 22. The electronic balance 78 is a device that measures the weight of the droplet 8 of the filter element material M as a functional liquid discharged from a nozzle 27 provided in the droplet discharge head 22 described later. The capping device 76 is a device for preventing the nozzle 27 from drying when the droplet discharge head 22 is in a standby state.

  In the vicinity of the droplet discharge head 22, a head camera 81 that moves integrally with the droplet discharge head 22 is disposed. A substrate camera 82 supported by a support device (not shown) provided on the base 9 is disposed at a position where the mother substrate 12 can be photographed.

  The ultraviolet irradiation device 83 is a device that irradiates the mother substrate 12 with ultraviolet rays, and includes a tray portion 84 on which the mother substrate 12 can be placed and taken in and out of the ultraviolet irradiation device 83 and a lamp 85 that irradiates ultraviolet rays. ing. The lamp 85 is, for example, a low pressure mercury lamp. The tray portion 84 is provided with an opening in a portion where the mother substrate 12 is placed, and is configured to be irradiated with ultraviolet rays from a surface opposite to the pattern forming surface of the mother substrate 12. Accordingly, the lamp 85 is provided in the lower portion of the tray portion 84.

  The ultraviolet irradiation device 83 is installed in the vicinity of the component device that discharges the functional liquid to the mother substrate 12 described above. The mother substrate 12 can be transported from the table 49 to the tray unit 84 and from the tray unit 84 to the substrate housing unit 57 by the robot 58. In the present embodiment, the ultraviolet irradiation device 83 is installed on the base 9. However, in consideration of work efficiency, for example, the ultraviolet irradiation device 83 is installed on a belt conveyor, and the mother substrate 12 is removed from the table 49 by the robot 58. You may employ | adopt the structure which moves to the said belt conveyance machine and irradiates an ultraviolet-ray, conveying a belt. Although not shown, a reflector, an exhaust fan, an exhaust pipe, an intake port, and the like necessary for the ultraviolet irradiation device 83 are appropriately provided. In FIG. 2, only one lamp 85 is shown, but a plurality of lamps may be used according to use.

  The control device 24 includes a computer main body 66 containing a processor, a keyboard 67 as an input device, and a display 68 such as a CRT as a display device.

  FIG. 3 is an electric control block diagram of the color filter manufacturing apparatus 16. In FIG. 3, a CPU (arithmetic processing unit) 69 that performs various arithmetic processes as a processor and a memory that stores various information, that is, an information storage medium 71 are included.

  The head position control device 17, the substrate position control device 18, the main scanning drive device 19, the sub-scanning drive device 21, the head drive circuit 72 that drives the piezoelectric element material 41 in the droplet discharge head 22, and the ultraviolet irradiation device 83. Are connected to the CPU 69 and the memory 71 via the input / output interface 73 and the bus 74. Further, the substrate supply device 23, the input device 67, the display 68, the electronic balance 78, the cleaning device 77, and the capping device 76 are also connected to the CPU 69 and the memory 71 via the input / output interface 73 and the bus 74.

  The memory 71 is a concept including a semiconductor memory such as a RAM and a ROM, and an external storage device such as a hard disk and a CD-ROM. Functionally, the memory 71 stores a program in which the operation control procedure of the color filter manufacturing apparatus 16 is described. Storage area for storing the discharge position in the mother substrate 12 of one color of R, G, and B as coordinate data, and the amount of sub-scan movement of the mother substrate 12 in the sub-scanning direction Y A storage area for storing, a storage area for storing the ultraviolet irradiation position with respect to the mother board 12, a work area for the CPU 69, an area functioning as a temporary file, and other various storage areas are set.

  The CPU 69 performs control for discharging functional liquid droplets to a predetermined position on the surface of the mother substrate 12 or irradiating the mother substrate with ultraviolet rays in accordance with a program stored in the memory 71. As a function implementation unit, a cleaning operation unit that performs an operation for realizing a cleaning process, a capping operation unit for realizing a capping process, and a weight measurement that performs an operation for realizing a weight measurement using the electronic balance 78 A calculation unit, a discharge calculation unit that performs calculation for discharging the functional liquid by the droplet discharge head 22, and an ultraviolet irradiation calculation unit that performs calculation for irradiating the mother substrate with ultraviolet rays.

  If the discharge calculation unit is divided in detail, the discharge start position calculation unit for setting the droplet discharge head 22 to the initial position for droplet discharge, and the droplet discharge head 22 in the main scanning direction X at a predetermined speed. A main scanning control calculation unit that calculates control for scanning movement, a sub-scanning control calculation unit that calculates control for moving a predetermined sub-scanning amount in the sub-scanning direction Y of the mother substrate 12, and a droplet discharge head 22 includes various function calculation units such as a nozzle discharge control calculation unit that performs a calculation for controlling which of the plurality of nozzles 27 in 22 is operated to discharge the functional liquid.

  In the present embodiment, each of the above functions is realized by software using the CPU 69. However, if each of the above functions can be realized by a single electronic circuit that does not use the CPU, such electronic It is also possible to use a circuit.

  Next, the droplet discharge head 22 provided in the color filter manufacturing apparatus 16 configured as described above will be described. 4A is a partially broken perspective view of the droplet discharge head 22, and FIG. 4B is a side sectional view showing a part of the droplet discharge head 22.

  4A, the droplet discharge head 22 includes, for example, a stainless steel nozzle plate 29, a diaphragm 31 on a facing surface thereof, and a plurality of partition members 32 that join them together. A plurality of functional liquid chambers 33 and functional liquid reservoirs 34 are formed by the partition member 32 between the nozzle plate 29 and the diaphragm 31. The plurality of functional liquid chambers 33 and the functional liquid reservoir 34 communicate with each other through a passage 38. The functional liquid chambers 33 are partitioned by the partition member 32 and are arranged at equal intervals.

  A functional liquid supply hole 36 is formed at an appropriate position of the diaphragm 31, and a functional liquid supply device 37 is connected to the functional liquid supply hole 36. The functional liquid supply device 37 supplies the filter element material M of one color among R, G, and B, for example, R color as the functional liquid, to the functional liquid supply hole 36. The supplied filter element material M fills the functional liquid reservoir 34 and further fills the functional liquid chamber 33 through the passage 38.

  The nozzle plate 29 is provided with a nozzle 27 for ejecting the filter element material M from the functional liquid chamber 33 in a jet form. In addition, a functional liquid pressurizing body 39 is attached to the back surface of the surface of the diaphragm 31 where the functional liquid chamber 33 is formed so as to correspond to the functional liquid chamber 33. As shown in FIG. 4B, the functional fluid pressurizing body 39 includes a piezoelectric element material 41 and a pair of electrodes 42a and 42b that hold the piezoelectric element material 41 therebetween. The piezoelectric element material 41 is bent and deformed so as to protrude outward as indicated by the arrow B by energization of the electrodes 42 a and 42 b, thereby increasing the volume of the functional liquid chamber 33. Then, the filter element material M corresponding to the increased capacity flows into the functional liquid chamber 33 from the functional liquid reservoir 34 through the passage 38.

  Next, when the energization to the piezoelectric element material 41 is released, both the piezoelectric element material 41 and the diaphragm 31 return to their original shapes. As a result, the functional fluid chamber 33 also returns to its original volume, so that the pressure of the filter element material M inside the functional fluid chamber 33 rises, and the filter element material M is separated from the droplets 8 from the nozzle 27 toward the mother substrate 12. Become a jet. In addition, in order to prevent the bending of the droplet 8 and the clogging of the nozzle 27 and the like at the periphery of the nozzle 27, a functional repellent liquid layer 43 made of, for example, a Ni-tetrafluoroethylene eutectoid plating layer is provided. Yes.

  The operation of the color filter manufacturing apparatus 16 and the color filter manufacturing method configured as described above will be described below with reference to FIG. FIG. 5 is a schematic view showing the method of manufacturing the color filter 1 in the order of steps.

  As shown in FIG. 5A, the barrier ribs are formed in the barrier rib forming step. First, the partition wall 6 is formed on the surface of the mother substrate 12 in a lattice pattern when viewed from the direction of arrow A by a resin material having no transparency. The lattice hole portion of the lattice pattern is a region where the filter element 3 is formed, that is, a filter element forming region 7. The planar dimensions of the individual filter element forming regions 7 formed by the partition walls 6 when viewed from the direction of the arrow A are, for example, about 30 μm × 100 μm.

  The partition wall 6 functions to prevent the filter element material 13 as the functional liquid supplied to the filter element forming region 7 from flowing into the filter element material 13 supplied to another adjacent filter element forming region 7. Water repellent treatment is applied. Further, the partition wall 6 also has a function of a black mask for full color display. The partition wall 6 is formed by an arbitrary patterning method, for example, a photolithography method, and further heated and baked by a heater as necessary.

  After the partition wall 6 is formed, as shown in FIG. 5B, each filter element is supplied by supplying droplets 8 of the filter element material 13 as a functional liquid to each filter element forming region 7 in the functional liquid discharging step. The formation region 7 is filled. In FIG. 5B, reference numeral 13R indicates a filter element material having a color of R (red), reference numeral 13G indicates a filter element material having a color of G (green), and reference numeral 13B indicates a color of B (blue). 1 shows a filter element material having

After the filter element material 13 is supplied to each filter element forming region 7, while the filter element material 13 is fluid, the partition wall 6 is formed in the ultraviolet irradiation step as shown in FIG. The ultraviolet ray 86 is irradiated from the lamp 85 to the surface opposite to the mother substrate 12 surface. Specifically, in FIG. 2, after discharging the filter element material 13 from the droplet discharge head 22, the mother substrate 12 is transported to the tray unit 84 of the ultraviolet irradiation device 83 by the robot 58 and placed on the tray unit 84. The mother substrate 12 thus inserted is inserted into the ultraviolet irradiation device 83. Thereafter, the ultraviolet irradiation calculation unit of the CPU 69 is operated from the memory 71 by the ultraviolet irradiation program, and the ultraviolet rays 86 are irradiated. Ultraviolet is possible dose of ^{500mJ / cm 2 ~100,000mJ / cm 2} , wavelength of ultraviolet light is preferably irradiated time of the ultraviolet at 200~350nm 5 to 60 seconds.

  Here, when the filter element material 13 is ejected to the filter element forming region 7, for example, as shown in FIG. 6, the filter element material 13 is insufficiently wet and spread in a certain position of the filter element forming region 7. There may be a filter element forming region 7 having a color missing portion 90 where the color of the filter element material 13 is not colored. This is considered to be because the flow of the filter element material 13 is hindered, for example, because a small amount of organic matter is attached to the surface of the filter element forming region 7. Therefore, in the ultraviolet irradiation process, active oxygen is generated using ultraviolet rays, and organic substances adhering to the surface of the filter element forming region 7 are simultaneously decomposed and oxidized and volatilized and removed to clean the surface.

  After the irradiation with the ultraviolet ray 86, in a drying process, the mother substrate 12 is heated to, for example, about 70 ° C. by a heater to evaporate the solvent of the filter element material 13. By this evaporation, the volume of the filter element material 13 is reduced and flattened as shown in FIG. As a result of the above processing, only the solid content of the filter element material finally remains to form a film, whereby the desired filter element 3 is formed.

After the filter element 3 is formed as described above, the protective film 4 is formed on the surface of the filter element 3 and the partition wall 6 as shown in FIG. The protective film 4 is formed by an appropriate method such as a spin coating method, a roll coating method, a ripping method, or an ink jet method. The protective film 4 is formed to planarize the protective film such as the filter element 3 and the surface of the color filter 1.
The mother substrate 12 manufactured as described above is cut along cutting grooves around the color filter forming region 11 formed on the mother substrate 12 to form individual color filters 1.

  Therefore, according to the present embodiment, there are the following effects.

  (1) Since the mother substrate 12 is irradiated with the ultraviolet ray 86 from the functional liquid discharge process and the end to the start of the drying process, the surface of the filter element forming region 7 prevents the cleaning effect from being lowered, and the wettability of the filter element material 13 is improved. It is possible to improve and reduce the occurrence of problems due to color loss.

  (2) Since the ultraviolet ray 86 is only irradiated from the surface opposite to the mother substrate 12 surface on which the partition wall 6 is formed, the cost for constructing a mask or the like can be reduced. Since no work time for mask alignment or the like is required, man-hours can be reduced.

  (3) When the lyophilic treatment is performed by irradiating with ultraviolet rays 86, the liquid repellency of the partition wall 6 may be inhibited, and there is a risk of causing color mixing with the adjacent filter element forming region 7, but in this embodiment, the mother substrate Since the ultraviolet ray 86 is irradiated from the surface on the opposite side of 12, the liquid repellency of the partition wall 6 can be maintained and color mixing can be prevented.

  The present invention is not limited to the above embodiment, and may be implemented as follows.

  (Modification 1) In this embodiment, the surface of the mother substrate 12 opposite to the surface on which the partition walls 6 are formed is irradiated with ultraviolet rays. However, the present invention is not limited to this. For example, as shown in FIG. 7, after discharging the filter element material 13 to the filter element forming region 7, the surface of the mother substrate 12 on which the partition walls 6 are formed may be irradiated with ultraviolet rays 86. A mask 87 is provided so as to be masked by the partition 6 when irradiating. Even in this case, since the partition wall 6 is not irradiated with the ultraviolet ray 86, the wettability of the filter element material 13 is improved by cleaning the surface of the filter element forming region 7 while maintaining the water repellent effect of the partition wall 6. Can spread, wet.

  (Modification 2) In the present embodiment, the entire surface of the mother substrate 12 is irradiated with the ultraviolet ray 86 on the surface opposite to the surface on which the partition walls 6 of the mother substrate 12 are formed, but the present invention is not limited to this. For example, as shown in FIG. 6, when the filter element material 13 is discharged to the filter element formation region 7 of the mother substrate 12, the wetting spread of the filter element material 13 is insufficient at a certain position with respect to the entire mother substrate 12. There may be a filter element forming region 7 having a color missing portion 90 where the color of the filter element material 13 is not colored. In this case, as shown in FIG. 8, another portion may be masked with a mask 88 so that the color loss portion 90 is irradiated with the ultraviolet ray 86. Further, the opening of the mask 88 may be matched with the outer shape of the filter element forming region 7, or only the corner may be opened with respect to the outer shape of the filter element forming region 7. Even in this case, by irradiating only the filter element forming region 7 in which the filter element material 13 is insufficiently wet and spread, the wettability of the filter element material 13 at a specific location can be improved and wetted and spread. In addition, the yield can be improved by correcting the portion of the color loss portion 90.

  (Modification 3) In the present embodiment, a low-pressure mercury lamp is used as the lamp 85 for irradiating the ultraviolet ray 86, but the present invention is not limited to this. For example, a maxima lamp may be used. Even in this case, it is possible to improve the wettability of the filter element material 13 by cleaning the filter element forming region 7 with excimer light from a maxima lamp.

  (Modification 4) In this embodiment, R, G, and B are used as the filter element material 13. However, the present invention is not limited to these. For example, C (cyan), M (magenta), and Y (yellow) are used. It may be adopted. Even in this case, the filter elements can be discharged by using filter element materials having C, M, and Y colors instead of the R, G, and B filter element materials.

  (Modification 5) In the present embodiment, the filter element material 13 is described as an example of the functional liquid. However, the present invention is not limited to this, and for example, an EL (Electro-Luminescence) light emitting material, a silica glass precursor, a metal compound It is possible to select a material such as a conductive material or a dielectric material. Even in this case, the pattern on the substrate can be formed.

  (Modification 6) In the present embodiment, the method for manufacturing a color filter as a pattern formation and the apparatus for manufacturing the same have been described. However, the present invention is not limited to this. (Thin film transistor, thin film diode, etc.), various wiring patterns, and formation of an insulating film can also be used.

(A) is a top view of a filter element, (b) is a top view of a mother substrate. The perspective view which shows a color filter manufacturing apparatus. The electric control block diagram of a color filter manufacturing apparatus. (A) is a perspective view of a partial cross section showing the structure of a droplet discharge head, and (b) is a side sectional view of the droplet discharge head. (A)-(e) is sectional drawing which showed typically the manufacture process of the color filter for demonstrating the effect | action of a present Example. The top view of the mother board | substrate for demonstrating insufficient wetting spread of filter element material. Sectional drawing of the color filter which shows other embodiment. Sectional drawing of the color filter which shows other embodiment.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Color filter which has a pixel pattern, 2 ... Substrate, 3 ... Filter element, 4 ... Protective film, 6 ... Partition, 7 ... Filter element formation area as a pattern area, 8 ... Droplet, 9 ... Base, 11 ... Color filter forming region, 12 ... Mother substrate, 13 ... Filter element material as functional liquid, 14 ... Cover, 16 ... Color filter manufacturing apparatus as a pattern forming substrate manufacturing apparatus, 17 ... Head position control device, 18 ... Substrate position Control device, 19 ... main scanning drive device, 21 ... sub-scanning drive device, 22 ... droplet discharge head, 23 ... substrate supply device, 24 ... control device, 26 ... carriage, 76 ... capping device, 77 ... cleaning device, 78 ... Electronic balance, 81 ... Camera for head, 82 ... Camera for substrate, 83 ... Ultraviolet irradiation device, 84 ... Tray section, 8 ... lamp, 86 ... ultraviolet rays, 87, 88 ... mask, 90 ... color missing parts.

Claims (8)

A method of manufacturing a pattern-formed substrate that forms a pattern by discharging a functional liquid onto a substrate,
A partition formation step of forming a lyophobic partition on the substrate;
A functional liquid discharging step of discharging the functional liquid to the pattern area partitioned by the partition forming step;
An ultraviolet irradiation step of irradiating the pattern region from which the functional liquid has been discharged by the functional liquid discharging step with ultraviolet rays;
And a drying step of drying the functional liquid discharged to the pattern region. In the manufacturing method of the pattern formation board | substrate of Claim 1,
The method of manufacturing a pattern-formed substrate, wherein the ultraviolet rays are applied to the pattern area from which the functional liquid excluding at least the partition wall is discharged. In the manufacturing method of the pattern formation board | substrate of Claim 1 or 2,
The method for producing a pattern-formed substrate, wherein the ultraviolet light is irradiated from a surface opposite to the substrate surface on which the partition walls are formed. In the manufacturing method of the pattern formation board | substrate as described in any one of Claims 1-3,
The method of manufacturing a pattern forming substrate, wherein the ultraviolet rays are irradiated to a local portion of the pattern region including at least a region where the functional liquid is not wet and spread. In the manufacturing method of the pattern formation board | substrate as described in any one of Claims 1-4,
The method of manufacturing a pattern forming substrate, wherein the ultraviolet rays are applied to corners in the pattern region. In the manufacturing method of the pattern formation board | substrate as described in any one of Claims 1-5,
The method of manufacturing a pattern forming substrate, wherein the ultraviolet rays are irradiated to a portion where the functional liquid is not wet and spread in the pattern region. In the manufacturing method of the pattern formation board | substrate as described in any one of Claims 1-6,
The method of manufacturing a pattern forming substrate, wherein the pattern region is a filter element forming region constituting a color filter. A pattern forming substrate manufacturing apparatus for discharging a functional liquid to a substrate to form a pattern,
A droplet discharge unit that discharges the functional liquid as droplets to the substrate;
A moving unit that relatively moves the droplet discharge head and the substrate constituting the droplet discharge unit;
An apparatus for producing a pattern-formed substrate, comprising: an ultraviolet irradiation unit that irradiates ultraviolet rays onto the substrate on which the functional liquid has been discharged.

Images