JP4380476B2 - Pattern forming substrate and pattern forming substrate manufacturing method - Google Patents

Description

  The present invention relates to a pattern formation substrate and a pattern formation substrate manufacturing method.

  Conventionally, a color filter as a pattern forming substrate is manufactured by discharging a functional liquid into a filter element forming region partitioned by a partition formed on the substrate. At this time, it is necessary to secure the height of the partition wall to some extent so that the discharged functional liquid does not mix with the functional liquid in another adjacent filter element formation region. Thereafter, the discharged functional liquid is dried by heat in order to solidify. As a result, the solvent contained in the functional liquid evaporates, and the capacity of the functional film in which the functional liquid is solidified is lower than the partition wall height. Thereafter, the surface portions of the partition walls and the functional film are coated with a protective film. Due to the difference between the height of the partition wall and the height of the functional film, unevenness occurs on the surface of the color filter, which causes a problem that a uniform surface state cannot be obtained. When unevenness occurs, when incorporated in a liquid crystal display such as a TFT, variation in light transmittance and contrast deteriorate, causing color unevenness.

  In order to solve such problems, the surface portion of the color filter is added to the unevenness of the surface of the color filter caused by the difference in height between the solidified functional film and the protective film using a metal roller or a press device. A method of reducing unevenness on the surface of a color filter by pressing is known (Patent Document 1).

JP-A-8-220335

  However, since the above-described method originally pressurizes a thin substrate, there is a problem that the substrate is lost. In addition, the pressurization control considering the impact force on the substrate becomes complicated. Furthermore, since pressure is applied in contact with the surface of the color filter, there is a concern about adhesion of dust and the like.

  An object of the present invention is to solve the above-described problem, and the unevenness of the pattern forming substrate surface caused by the difference in height between the solidified functional film and the partition wall An object of the present invention is to provide a pattern-formed substrate and a method for producing a pattern-formed substrate that can reduce irregularities on the surface of the pattern-formed substrate without directly applying an external force to the surface portion.

  In order to solve the above-described problems, a pattern formation substrate of the present invention protects a partition formed on a substrate, a functional film formed in a region partitioned by the partition, and a partition and a surface of the functional film. The gist is that at least the upper part of the partition wall and the protective film have a protective film and are made of materials that are mutually soluble and different from the functional film.

  According to this, since the partition wall and the protective film are melted and integrated with each other, the surface state of pattern formation can be made uniform.

  In the pattern forming substrate of the present invention, the partition walls and the protective film may be an ultraviolet curable resin, and the functional film may include a thermosetting resin.

  According to this, since the partition wall and the protective film are fused and integrated with each other by the ultraviolet curable resin, the surface state of the pattern forming substrate can be made uniform.

  In the pattern forming substrate of the present invention, the partition walls and the protective film may be thermosetting resins, and the functional film may contain an ultraviolet curable resin.

  According to this, the partition wall and the protective film are fused and integrated with each other by the thermosetting resin, so that the surface state of the pattern forming substrate can be made uniform.

  A pattern-formed substrate manufacturing method of the present invention is a pattern-formed substrate manufacturing method for manufacturing a pattern-formed substrate by discharging a functional liquid onto a substrate, the partition layer forming step for forming a partition layer on the substrate, and the partition layer A first ultraviolet irradiation step of making a semi-cured state by ultraviolet irradiation, a partition forming step of forming a partition by etching the partition layer, a functional liquid discharging step of discharging a functional liquid into a region partitioned by the partition, Having a drying step of drying the functional liquid to form a functional film, a protective film forming step of forming a protective film on the surfaces of the partition walls and the functional film, and a second ultraviolet irradiation step of permanently curing the protective film by ultraviolet irradiation. Is the gist.

  According to this, since the partition walls and the protective film are made of an ultraviolet curable resin, and the functional liquid is made of a thermosetting resin, the surface state is uniform without mixing the partition walls and the protective film with the functional liquid. A forming substrate can be manufactured.

  A pattern-formed substrate manufacturing method of the present invention is a pattern-formed substrate manufacturing method for manufacturing a pattern-formed substrate by discharging a functional liquid onto a substrate, the partition layer forming step for forming a partition layer on the substrate, and the partition layer A first heat drying step for making the semi-cured state by heat drying, a partition forming step for forming the partition by etching the partition layer, a functional liquid discharging step for discharging the functional liquid into a region partitioned by the partition, An ultraviolet irradiation process in which the functional liquid is solidified by ultraviolet irradiation to form a functional film, a protective film forming process in which a protective film is formed on the surfaces of the partition walls and the functional film, and a second thermal drying in which the protective film is fully cured by thermal drying. And having a process.

  According to this, since the partition walls and the protective film are thermosetting resins and the functional liquid is composed of an ultraviolet curable resin, the pattern of the surface state is uniform without mixing the partition walls and the protective film with the functional liquid. A forming substrate can be manufactured.

  The color filter of the present invention includes a partition formed on the substrate, a filter element formed in a region partitioned by the partition, and a protective film that protects the partition and the surface of the filter element. The gist is that at least the upper portion and the protective film are materials that are mutually soluble and different from the filter element.

  According to this, since the partition wall and the protective film are fused and integrated with each other, the surface state of the color filter can be made uniform.

  In the color filter of the present invention, the partition walls and the protective film are made of an ultraviolet curable resin, and the filter element may contain a thermosetting resin.

  According to this, the partition wall and the protective film are fused and integrated with each other by the ultraviolet curable resin, so that the surface state of the color filter can be made uniform.

  In the color filter of the present invention, the partition walls and the protective film are thermosetting resins, and the filter element may contain an ultraviolet curable resin.

  According to this, since the partition wall and the protective film are melted and integrated with each other by the thermosetting resin, the surface state of the color filter can be made uniform.

  A color filter manufacturing method of the present invention is a color filter manufacturing method for manufacturing a color filter by discharging a functional liquid onto a substrate, and includes a partition layer forming step of forming a partition layer on the substrate, and a partition layer A first ultraviolet irradiation step for making a semi-cured state by ultraviolet irradiation; a partition formation step for forming a partition by etching the partition layer; a functional liquid discharge step for discharging a functional liquid into a region partitioned by the partition; A drying process for drying the liquid to form a filter element; a protective film forming process for forming a protective film on the surfaces of the partition walls and the filter element; and a second ultraviolet irradiation process for permanently curing the protective film by ultraviolet irradiation. Is the gist.

  According to this, since the partition walls and the protective film are made of an ultraviolet curable resin and the functional liquid is composed of a thermosetting resin, the partition wall and the protective film are not mixed with the functional liquid, and the surface state is uniform. A filter can be manufactured.

  The color filter manufacturing apparatus of the present invention is a color filter manufacturing method for manufacturing a color filter by discharging a functional liquid onto a substrate, the partition layer forming step for forming a partition layer on the substrate, and the partition layer A first heat drying step for making a semi-cured state by thermal drying, a partition formation step for etching the partition layer to form a partition, a functional liquid discharge step for discharging a functional liquid into a region partitioned by the partition, UV irradiation step for solidifying the liquid by UV irradiation to form a filter element, a protective film forming step for forming a protective film on the surfaces of the partition walls and the filter element, and a second thermal drying step for main curing the protective film by thermal drying It is summarized as having.

  According to this, since the partition walls and the protective film are thermosetting resins, and the functional liquid is composed of an ultraviolet curable resin, the partition wall and the protective film are not mixed with the functional liquid, and the surface state is uniform. A filter can be manufactured.

  Hereinafter, a pattern formation substrate and a pattern formation substrate manufacturing method according to the first and second embodiments of the present invention will be described with reference to the drawings.

[First embodiment]
First, a color filter as a pattern forming substrate manufactured using a droplet discharge head will be described. FIG. 1A is a plan view showing a planar structure of a color filter, and FIG. 1B is a plan view of a mother substrate that is the basis of the color filter.

  In the color filter 1, a plurality of filter elements 3 are formed in a dot pattern (dot matrix) on the surface of a rectangular substrate 2 formed of glass, plastic, or the like. The filter element 3 is partitioned by a protective film 6c having partition walls formed in a lattice pattern, and is formed by filling a plurality of square regions arranged in a dot matrix shape with a functional liquid. Each of these filter elements 3 is formed of a functional liquid of any one of R (red), G (green), and B (blue), and each of these color filter elements 3 is arranged in a predetermined arrangement. Are lined up. As this arrangement, for example, a stripe arrangement, a mosaic arrangement, a delta arrangement, and the like are known.

  In FIG. 1A, the size of the color filter 1 is, for example, 1.8 inches. The size of one filter element 3 is, for example, 30 μm × 100 μm. The pitch of each filter element 3 is, for example, 75 μm.

  When the color filter 1 of the present embodiment is used as an optical element for full-color display, one pixel is formed by using three filter elements 3 of R, G, and B as one unit, and R in one pixel is formed. , G, and B, or a combination thereof, by selectively passing light, a full color display is performed.

  The color filter 1 is cut out from a mother substrate 12 having a large area, for example, as shown in FIG. Specifically, first, a pattern for one color filter 1 is formed on the surface of each of the plurality of color filter forming regions 11 set in the mother substrate 12, and the surroundings of these color filter forming regions 11 are further formed. The individual color filters 1 are formed by forming cut grooves in the substrate and further cutting the mother substrate 12 along the grooves.

  Next, a color filter manufacturing apparatus as a pattern forming substrate manufacturing apparatus will be described. FIG. 2 is a perspective view showing the configuration of the color filter manufacturing apparatus.

  The color filter manufacturing apparatus 16 discharges and adheres a functional liquid of one color of R, G, and B, for example, R, as a droplet to a predetermined position in each color filter forming region 11 in the mother substrate 12. Instead of the droplet discharge device for the R color functional liquid, a droplet discharge device for the G color functional liquid and the B color functional liquid may be used. However, since their structures can be the same as those in FIG. 2, description thereof will be omitted. In addition, it is also possible to discharge three colors of R, G, and B with one color filter manufacturing apparatus 16.

  In FIG. 2, the color filter manufacturing apparatus 16 includes a carriage 26 provided with a droplet discharge head 22, a head position control device 17 that controls the position of the droplet discharge head 22, and a substrate position that controls the position of the mother substrate 12. A control device 18, a main scanning drive device 19 for moving the droplet discharge head 22 with respect to the mother substrate 12, and a sub-scanning drive device 21 for moving the mother substrate 12 with respect to the droplet discharge head 22 in a sub-scanning manner. , An ultraviolet irradiation device 83 for irradiating the mother substrate with ultraviolet rays, a substrate supply device 23 for supplying the mother substrate 12 to a predetermined work position in the color filter manufacturing device 16, and a control for overall control of the color filter manufacturing device 16. The device 24 is configured.

  The head position control device 17, the substrate position control device 18, the main scanning drive device 19, the sub-scanning drive device 21, and the ultraviolet irradiation device 83 are installed on the base 9. These devices are covered with a cover 14 as necessary.

  The substrate supply device 23 includes a substrate accommodating portion 57 that accommodates the mother substrate 12 and a robot 58 that conveys the mother substrate 12. The robot 58 includes a base 59 placed on an installation surface such as a floor and the ground, a lift shaft 61 that moves up and down relative to the base 59, a first arm 62 that rotates about the lift shaft 61, and a first arm. The second arm 63 rotates with respect to 62, and the suction pad 64 provided on the lower surface of the tip of the second arm 63. The suction pad 64 can suck the mother substrate 12 by an air suction force or the like.

  A capping device 76 and a cleaning device 77 are disposed at one side position of the sub-scanning driving device 21 under the trajectory of the droplet discharge head 22 that is driven by the main scanning driving device 19 and moves in the main scanning direction. An electronic balance 78 is disposed at the other side position. The cleaning device 77 cleans the droplet discharge head 22. The electronic balance 78 is a device that measures the weight of the droplet 8 of the filter element material M as a functional liquid discharged from a nozzle 27 provided in the droplet discharge head 22 described later. The capping device 76 prevents the nozzle 27 from drying when the droplet discharge head 22 is in a standby state.

  In the vicinity of the droplet discharge head 22, a head camera 81 that moves integrally with the droplet discharge head 22 is disposed. A substrate camera 82 supported by a support device (not shown) provided on the base 9 is disposed at a position where the mother substrate 12 can be photographed.

  The ultraviolet irradiation device 83 includes a tray portion 84 that can irradiate the mother substrate 12 with ultraviolet rays, place the mother substrate 12 on and off the ultraviolet irradiation device 83, and a lamp 85 that irradiates ultraviolet rays. The tray portion 84 is provided with an opening in a portion where the mother substrate 12 is placed, and is configured to be irradiated with ultraviolet rays from the surface on which the mother substrate 12 is placed. Accordingly, the lamp 85 is provided in the lower portion of the tray portion 84.

  The ultraviolet irradiation device 83 is installed in the vicinity of the component device that discharges the functional liquid to the mother substrate 12 described above. The mother substrate 12 can be transported from the table 49 to the tray unit 84 and from the tray unit 84 to the substrate housing unit 57 by the robot 58. In place of installing the ultraviolet irradiation device 83 on the base 9, in consideration of work efficiency, for example, the ultraviolet irradiation device 83 is installed on a belt conveyance machine, and the mother substrate 12 is moved from the table 49 to the belt by the robot 58. You may employ | adopt the structure which moves to a conveyance machine and irradiates an ultraviolet-ray, conveying a belt. In addition, a reflector, an exhaust fan, an exhaust pipe, an intake port, and the like necessary for the ultraviolet irradiation device 83 are appropriately provided (not shown). In FIG. 2, a plurality of lamps may be used instead of one lamp 85 according to use.

  The control device 24 includes a computer main body 66 containing a processor, a keyboard 67 as an input device, and a display 68 such as a CRT as a display device.

  FIG. 3 is an electric control block diagram of the color filter manufacturing apparatus 16. In FIG. 3, a CPU (arithmetic processing unit) 69 that performs various arithmetic processes as a processor and a memory that stores various information, that is, an information storage medium 71 are included.

  The head position control device 17, the substrate position control device 18, the main scanning drive device 19, the sub-scanning drive device 21, the head drive circuit 72 that drives the piezoelectric element material 41 in the droplet discharge head 22, and the ultraviolet irradiation device 83. Are connected to the CPU 69 and the memory 71 via the input / output interface 73 and the bus 74. Further, the substrate supply device 23, the input device 67, the display 68, the electronic balance 78, the cleaning device 77, and the capping device 76 are also connected to the CPU 69 and the memory 71 via the input / output interface 73 and the bus 74.

  The memory 71 is a concept including a semiconductor memory such as a RAM and a ROM, and an external storage device such as a hard disk and a CD-ROM. Functionally, the memory 71 stores a program in which the operation control procedure of the color filter manufacturing apparatus 16 is described. Storage area for storing the discharge position in the mother substrate 12 of one color of R, G, and B as coordinate data, and the amount of sub-scan movement of the mother substrate 12 in the sub-scanning direction Y A storage area for storing, a storage area for storing the ultraviolet irradiation position with respect to the mother board 12, a work area for the CPU 69, an area functioning as a temporary file, and other various storage areas are set.

  In accordance with a program stored in the memory 71, the CPU 69 performs control for ejecting a functional liquid droplet to a predetermined position on the surface of the mother substrate 12 or irradiating the mother substrate with ultraviolet rays, and a specific function realizing unit. A cleaning operation unit that performs an operation for realizing the cleaning process, a capping operation unit for realizing the capping process, and a weight measurement operation unit that performs an operation for realizing weight measurement using the electronic balance 78 The liquid discharge head 22 includes a discharge calculation unit that performs a calculation for discharging the functional liquid, and an ultraviolet irradiation calculation unit that performs a calculation for irradiating the mother substrate with ultraviolet rays.

  The ejection calculation unit scans and moves the droplet discharge head 22 in the main scanning direction X at a predetermined speed, and an ejection start position calculation unit for setting the droplet ejection head 22 to an initial position for droplet ejection. A main scanning control calculation unit that calculates the control of the above, a sub-scanning control calculation unit that calculates control for moving the mother substrate 12 in the sub-scanning direction Y by a predetermined sub-scanning amount, and a plurality of units in the droplet discharge head 22 Various function calculation units such as a nozzle discharge control calculation unit that performs calculation for controlling which one of the nozzles 27 is operated to discharge the functional liquid are provided.

  In the present embodiment, each of the above functions can be realized by a single electronic circuit that does not use a CPU, instead of being realized by software using the CPU 69. It is also possible to use a circuit.

  Next, the droplet discharge head 22 provided in the color filter manufacturing apparatus 16 configured as described above will be described. 4A is a partially broken perspective view of the droplet discharge head 22, and FIG. 4B is a side sectional view showing a part of the droplet discharge head 22.

  4A, the droplet discharge head 22 includes, for example, a stainless steel nozzle plate 29, a diaphragm 31 on a facing surface thereof, and a plurality of partition members 32 that join them together. A plurality of functional liquid chambers 33 and functional liquid reservoirs 34 are formed by the partition member 32 between the nozzle plate 29 and the diaphragm 31. The plurality of functional liquid chambers 33 and the functional liquid reservoir 34 communicate with each other through a passage 38. The functional liquid chambers 33 are partitioned by the partition member 32 and are arranged at equal intervals.

  A functional liquid supply hole 36 is formed at an appropriate position of the diaphragm 31, and a functional liquid supply device 37 is connected to the functional liquid supply hole 36. The functional liquid supply device 37 supplies the filter element material M of one color among R, G, and B, for example, R color as the functional liquid, to the functional liquid supply hole 36. The supplied filter element material M fills the functional liquid reservoir 34 and further fills the functional liquid chamber 33 through the passage 38.

  The nozzle plate 29 is provided with a nozzle 27 for ejecting the filter element material M from the functional liquid chamber 33 in a jet form. In addition, a functional liquid pressurizing body 39 is attached to the back surface of the surface of the diaphragm 31 where the functional liquid chamber 33 is formed so as to correspond to the functional liquid chamber 33. As shown in FIG. 4B, the functional fluid pressurizing body 39 includes a piezoelectric element material 41 and a pair of electrodes 42a and 42b that hold the piezoelectric element material 41 therebetween. The piezoelectric element material 41 is bent and deformed so as to protrude outward as indicated by the arrow B by energization of the electrodes 42 a and 42 b, thereby increasing the volume of the functional liquid chamber 33. Then, the filter element material M corresponding to the increased capacity flows into the functional liquid chamber 33 from the functional liquid reservoir 34 through the passage 38.

  Next, when the energization to the piezoelectric element material 41 is released, both the piezoelectric element material 41 and the diaphragm 31 return to their original shapes. As a result, the functional fluid chamber 33 also returns to its original volume, so that the pressure of the filter element material M inside the functional fluid chamber 33 rises, and the filter element material M is separated from the droplets 8 from the nozzle 27 toward the mother substrate 12. Become and spray. In addition, in the peripheral part of the nozzle 27, a functional repellent liquid layer 43 made of, for example, Ni-tetrafluoroethylene is provided in order to prevent the flying of the droplet 8 and the clogging of the nozzle 27.

  The operation of the color filter and the color filter manufacturing method manufactured by the color filter manufacturing apparatus 16 configured as described above will be described below with reference to FIG. FIG. 5 is a schematic view showing the production of the color filter 1 in the order of steps.

  As shown in FIG. 5A, first, the black matrix 5 is formed on the surface of the mother substrate 12 in a lattice pattern as viewed from the direction of the arrow A by a resin material having no transparency. Further, a partition resin layer 6 made of a transparent resin material is formed on the surface of the black matrix 5. The partition resin layer 6 is formed by an appropriate method such as a spin coating method, a roll coating method, a ripping method, or an ink jet method.

  The resin used for the partition resin layer 6 is an ultraviolet curable resin that is cured by irradiating ultraviolet rays. For example, an acrylic polymer containing a monomer such as N-methylolacrylamide and a light such as diphenyliodonium salt. In addition to resins in combination with initiators, ultraviolet curable resins described in JP-A-8-230314 and WO2002 / 048226 can be employed.

  After the partition resin layer 6 is formed, the partition resin layer 6 is irradiated with the first ultraviolet ray 86. Irradiation of the ultraviolet ray 86 is performed by controlling the ultraviolet ray irradiation device 83 so that the partition wall resin layer 6 is in a semi-cured state by the irradiation of the ultraviolet ray 86.

  After the partition resin layer 6 is made into a semi-cured state, as shown in FIG. 5, the target portion is etched to form the partition 6 a on the black matrix 5. The lattice hole portion of the lattice pattern formed by the black matrix 5 and the partition walls 6a is a region where the filter element 3 is formed, that is, a filter element formation region 7. The planar dimension when viewed from the direction of arrow A of the filter element forming region 7 is formed to be, for example, about 30 μm × 100 μm.

  In order to prevent the filter element material 13 as the functional liquid supplied to the filter element forming region 7 from flowing into the filter element material 13 supplied to another adjacent filter element forming region 7, the partition wall 6 a is approximately 2 μm. Has a height of

  After the partition wall 6a is formed, each filter element formation region 7 is filled by supplying droplets 8 of the filter element material 13 to each filter element formation region 7 as shown in FIG. In FIG. 5C, reference numeral 13R indicates a filter element material having a color of R (red), reference numeral 13G indicates a filter element material having a color of G (green), and reference numeral 13B indicates a color of B (blue). 1 shows a filter element material having The filter element material 13 is a thermosetting resin that is cured by heating.

  After the filter element material 13 is supplied to each filter element formation region 7, the mother substrate 12 is heated to, for example, about 70 ° C. by a heater to evaporate the solvent of the filter element material 13. By this evaporation, as shown in FIG. 5D, the volume of the filter element material 13 is reduced and flattened. If the volume is significantly reduced, the process returns to the step of FIG. 5C and the supply of the droplets 8 of the filter element material 13 and the filter element material 13 are continued until a sufficient film thickness is obtained as a color filter. Repeat heating and heating. As a result of the above processing, only the solid content of the filter element material finally remains to form a film, thereby forming the filter element 3 as a functional film of each desired color. The height of the filter element 3 is approximately 1 μm.

  After the filter elements 3 are formed as described above, a heat treatment is performed at a predetermined temperature for a predetermined time in order to completely dry the filter elements 3.

  Thereafter, as shown in FIG. 5E, a protective film 6b is formed on the surfaces of the filter element 3 and the partition wall 6a. The protective film 6b is formed by an appropriate method such as a spin coating method, a roll coating method, a ripping method, or an ink jet method. The protective film 6b is a transparent resin material, and is an ultraviolet curable resin that is cured by irradiating ultraviolet rays. The protective film 6b is similar to the ultraviolet curable resin employed for the partition wall 6a.

  Here, as shown in FIG. 5E, the height of the partition wall 6a is higher than the height of the filter element 3 on the surface portion of the substrate 2 immediately after forming the protective film 6b. The surface state is not a uniform surface state because the formation part of the partition wall 6a is convex and the formation part of the filter element 3 is concave.

  However, since the partition wall 6a and the protective film 6b are both formed of the same resin material by being left in the state of FIG. 5 (e), they are melted together and protected as shown in FIG. 5 (f). The surface of the film 6b is planarized. Here, as an indication of flattening, for example, the flat width is 0.15 μm or less.

  After the surface state of the protective film 6b is made uniform, as shown in FIG. 5G, the partition wall 6a and the protective film 6b are fully cured by irradiating the second ultraviolet ray 86, and the partition wall 6a and the protective film 6b. Is formed as a protective film 6c.

  The mother substrate 12 manufactured as described above is cut along cutting grooves around the color filter forming region 11 formed on the mother substrate 12 to form individual color filters 1.

  Therefore, according to the present embodiment, there are the following effects.

  (1) The partition wall 6a and the protective film 6c are made of ultraviolet curable resin, and by melting each other, the uneven state of the surface of the color filter 1 caused by the difference in height between the partition wall 6a and the filter element 3 is reduced, and the surface state is reduced. It can be made uniform.

  (2) Since the partition wall 6a, the protective film 6b, and the filter element material 13 are described using different materials, the color filter 1 can be manufactured without being mixed with each other.

[Second Embodiment]
Next, a second embodiment will be described. The configurations of the color filter, the color filter manufacturing apparatus, the electric control block diagram, and the droplet discharge head are the same as those in the first embodiment, and a description thereof will be omitted.

  The operation of the color filter and the color filter manufacturing method manufactured by the color filter manufacturing apparatus 16 configured as described above will be described below with reference to FIG. FIG. 6 is a schematic view showing the production of the color filter 1 in the order of steps.

  As shown in FIG. 6A, first, the black matrix 5 is formed on the surface of the mother substrate 12 in a lattice pattern when viewed from the direction of the arrow A by a resin material having no transparency. Further, a partition resin layer 6 made of a transparent resin material is formed on the surface of the black matrix 5. The partition resin layer 6 is formed by an appropriate method such as a spin coating method, a roll coating method, a ripping method, or an ink jet method. The resin used for the partition resin layer 6 is a thermosetting resin that is cured by heating.

  After the partition resin layer 6 is formed, the partition resin layer 6 is heated. This heating is performed so that the partition resin layer 6 is in a semi-cured state.

  After the partition resin layer 6 is in a semi-cured state, as shown in FIG. 6B, the target portion is etched to form the partition 6a on the black matrix 5. The lattice hole portion of the lattice pattern formed by the black matrix 5 and the partition walls 6a is a region where the filter element 3 is formed, that is, a filter element formation region 7. The planar dimension when viewed from the direction of arrow A of the filter element forming region 7 is formed to be, for example, about 30 μm × 100 μm.

  In order to prevent the filter element material 13 as the functional liquid supplied to the filter element forming region 7 from flowing into the filter element material 13 supplied to another adjacent filter element forming region 7, the partition wall 6 a is approximately 2 μm. Has a height of

  After the partition wall 6a is formed, each filter element formation region 7 is filled by supplying droplets 8 of the filter element material 13 to each filter element formation region 7 as shown in FIG. 6C. In FIG. 6C, reference numeral 13R indicates a filter element material having a color of R (red), reference numeral 13G indicates a filter element material having a color of G (green), and reference numeral 13B indicates a color of B (blue). 1 shows a filter element material having

  The filter element material 13 is an ultraviolet curable resin that is solidified by irradiation with ultraviolet rays. For example, an acrylic polymer containing a monomer such as N-methylolacrylamide and a photoinitiator such as diphenyliodonium salt In addition to the resin by the combination of the above, UV curable resins described in JP-A-8-230314 and WO2002 / 048226 can be employed.

  After the filter element material 13 is supplied to each filter element formation region 7, the mother substrate 12 is heated to, for example, about 70 ° C. by a heater to evaporate the solvent of the filter element material 13. By this evaporation, as shown in FIG. 6D, the volume of the filter element material 13 is reduced and flattened. If the volume is significantly reduced, the process returns to the step of FIG. 6C, and the supply of the droplets 8 of the filter element material 13 and the filter element material 13 are continued until a sufficient film thickness is obtained as a color filter. Repeat heating and heating. Thereafter, the filter element material is cured by irradiating with ultraviolet rays 86, and finally, only the solid content of the filter element material remains to be formed into a film by the above processing, whereby the desired color filter elements 3 are formed. . The height of the filter element 3 is approximately 1 μm.

  Thereafter, as shown in FIG. 6E, a protective film 6b is formed on the surfaces of the filter element 3 and the partition wall 6a. The protective film 6b is formed by an appropriate method such as a spin coating method, a roll coating method, a ripping method, or an ink jet method. The protective film 6b is a transparent resin material and is a thermosetting resin that is solidified by heating, and the same thermosetting resin as that used for the partition wall 6a is used.

  Here, as shown in FIG. 6E, the height of the partition wall 6a is higher than the height of the filter element 3 on the surface portion of the substrate 2 immediately after the formation of the protective film 6b. The surface portion is convex, and the surface portion of the filter element 3 is concave, which is not a uniform surface state.

  However, since both the partition wall 6a and the protective film 6b are formed of the same resin material and are in a semi-cured state, they are melted together and left for a while, as shown in FIG. 6 (f). The surface of the film 6b is planarized. Here, as a standard of flattening, for example, it is 0.15 μm or less.

  After the surface state of the protective film 6b is made uniform, it is heated to fully cure the partition wall 6a and the protective film 6b as shown in FIG. 6G, and the protective film 6c in which the partition wall 6a and the protective film 6b are integrated. Is formed.

  The mother substrate 12 manufactured as described above is cut along cutting grooves around the color filter forming region 11 formed on the mother substrate 12 to form individual color filters 1.

  Therefore, according to the present embodiment, there are the following effects.

  (1) The partition wall 6a and the protective film 6c are thermosetting resins, and by melting each other, the uneven state of the surface of the color filter 1 caused by the difference in height between the partition wall 6a and the filter element 3 is reduced. Can be made uniform.

  (2) Since the partition wall 6a, the protective film 6b, and the filter element material 13 are described using different materials, the color filter 1 can be manufactured without being mixed with each other.

  The present invention is not limited to the above embodiment, and may be implemented as follows.

  (Modification 1) As shown in FIG. 5 or FIG. 6, the entire partition wall 6a is made of the same material as that of the protective film 6b. However, the present invention is not limited to this. For example, you may comprise so that only the upper part of the partition 6a may become the same material as the protective film 6b. Even in this case, since the material formed on the upper part of the partition wall 6a and the material of the protective film 6b are mutually melted, the surface state of the color filter 1 can be made uniform. In this case, the lower part of the partition wall 6a may be configured as a black matrix by a resin having no transparency.

  (Modification 2) In this embodiment, R, G, and B are used as the filter element material 13. However, the present invention is not limited to these. For example, C (cyan), M (magenta), and Y (yellow) are used. It may be adopted. Even in this case, a pattern forming substrate using filter element materials having colors of C, M, and Y can be manufactured.

  (Modification 3) In the present embodiment, the filter element material 13 has been described as an example of the functional liquid. However, the present invention is not limited to this, and a material such as a conductive material such as a metal compound or a dielectric material can be selected. It is. Even in this case, the pattern formation substrate can be formed.

  (Modification 4) In the present embodiment, the manufacturing method and manufacturing method of the color filter as the pattern formation have been described. However, the present invention is not limited to this. For example, various semiconductor elements (thin film transistors, thin film diodes, etc.), various wirings It can also be used to form patterns and insulating films.

(A) is a top view of a filter element, (b) is a top view of a mother substrate. The perspective view which shows a color filter manufacturing apparatus. The electric control block diagram of a color filter manufacturing apparatus. (A) is a perspective view of a partial cross section showing the structure of a droplet discharge head, and (b) is a side sectional view of the droplet discharge head. (A)-(g) is board | substrate sectional drawing which shows manufacture of the color filter in 1st Embodiment. (A)-(g) is board | substrate sectional drawing which shows manufacture of the color filter in 2nd Embodiment.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Color filter as a pattern formation board, 2 ... Board | substrate, 3 ... Filter element as a functional film, 5 ... Black matrix, 6 ... Partition resin layer, 6a ... Partition, 6b, 6c ... Protective film, 7 ... Filter element formation Area, 8 ... droplet, 13 ... filter element material as functional liquid, 85 ... lamp, 86 ... ultraviolet light.

Claims (10)

A partition formed on the substrate;
A functional film formed in a region partitioned by the partition;
A protective film for protecting the partition and the surface of the functional film;
At least an upper part of the partition wall and the protective film are made of a material that melts with each other and a material different from that of the functional film. The pattern forming substrate according to claim 1,
The partition wall and the protective film are made of an ultraviolet curable resin, and the functional film contains a thermosetting resin. In the pattern formation board | substrate of Claim 1 or 2,
The partition wall and the protective film are thermosetting resins, and the functional film contains an ultraviolet curable resin. A pattern forming substrate manufacturing method for manufacturing a pattern forming substrate by discharging a functional liquid to a substrate,
A partition layer forming step of forming a partition layer on the substrate;
A first ultraviolet irradiation step of making the partition wall layer semi-cured by ultraviolet irradiation;
A partition formation step of forming the partition by etching the partition layer;
A functional liquid discharge step of discharging the functional liquid into a region partitioned by the partition;
A drying step of drying the functional liquid to form a functional film;
A protective film forming step of forming a protective film on the surfaces of the partition walls and the functional film;
A pattern forming substrate manufacturing method comprising: a second ultraviolet irradiation step of performing main curing of the protective film by ultraviolet irradiation. A pattern forming substrate manufacturing method for manufacturing a pattern forming substrate by discharging a functional liquid to a substrate,
A partition layer forming step of forming a partition layer on the substrate;
A first heat drying step for bringing the partition layer into a semi-cured state by heat drying;
A partition formation step of forming the partition by etching the partition layer;
A functional liquid discharge step of discharging the functional liquid into a region partitioned by the partition;
An ultraviolet irradiation step in which the functional liquid is solidified by ultraviolet irradiation to form a functional film;
A protective film forming step of forming a protective film on the surfaces of the partition walls and the functional film;
A pattern forming substrate manufacturing method comprising: a second heat drying step of performing main curing of the protective film by heat drying. A partition formed on the substrate;
A filter element formed in a region partitioned by the partition;
A protective film for protecting the partition and the surface of the filter element;
The color filter according to claim 1, wherein at least an upper portion of the partition wall and the protective film are made of a material that is soluble with each other and different from the filter element. The color filter according to claim 6.
The partition wall and the protective film are made of an ultraviolet curable resin, and the filter element contains a thermosetting resin. The color filter according to claim 6 or 7,
The partition wall and the protective film are thermosetting resins, and the filter element contains an ultraviolet curable resin. A color filter manufacturing method for manufacturing a color filter by discharging a functional liquid onto a substrate,
A partition layer forming step of forming a partition layer on the substrate;
A first ultraviolet irradiation step of making the partition wall layer semi-cured by ultraviolet irradiation;
A partition formation step of forming the partition by etching the partition layer;
A functional liquid discharge step of discharging the functional liquid into a region partitioned by the partition;
A drying step of drying the functional liquid to form a filter element;
A protective film forming step of forming a protective film on a surface of the partition wall and the filter element;
A method for producing a color filter, comprising: a second ultraviolet irradiation step in which the protective film is fully cured by ultraviolet irradiation. A color filter manufacturing method for manufacturing a color filter by discharging a functional liquid onto a substrate,
A partition layer forming step of forming a partition layer on the substrate;
A first heat drying step for bringing the partition layer into a semi-cured state by heat drying;
A partition formation step of forming the partition by etching the partition layer;
A functional liquid discharge step of discharging the functional liquid into a region partitioned by the partition;
An ultraviolet irradiation process in which the functional liquid is solidified by ultraviolet irradiation to form a filter element;
A protective film forming step of forming a protective film on a surface of the partition wall and the filter element;
A method for producing a color filter, comprising: a second heat drying step of main-curing the protective film by heat drying.

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