JP2006055935A - Protective tape sticking device - Google Patents

Protective tape sticking device Download PDF

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Publication number
JP2006055935A
JP2006055935A JP2004239502A JP2004239502A JP2006055935A JP 2006055935 A JP2006055935 A JP 2006055935A JP 2004239502 A JP2004239502 A JP 2004239502A JP 2004239502 A JP2004239502 A JP 2004239502A JP 2006055935 A JP2006055935 A JP 2006055935A
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Japan
Prior art keywords
cutter blade
protective tape
adjusting means
wafer
cutter
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JP2004239502A
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JP4450696B2 (en
Inventor
Masayuki Yamamoto
雅之 山本
Norio Mori
則雄 森
Takashi Nishinohama
賢志 西之濱
Atsushi Ogawa
敦司 小川
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Nitto Denko Corp
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Nitto Denko Corp
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Priority to JP2004239502A priority Critical patent/JP4450696B2/en
Priority to US11/182,761 priority patent/US7516768B2/en
Priority to KR1020050073120A priority patent/KR101145517B1/en
Priority to TW94128145A priority patent/TWI389781B/en
Priority to CN2005100927263A priority patent/CN1738005B/en
Publication of JP2006055935A publication Critical patent/JP2006055935A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D3/00Cutting work characterised by the nature of the cut made; Apparatus therefor
    • B26D3/02Bevelling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26DCUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
    • B26D3/00Cutting work characterised by the nature of the cut made; Apparatus therefor
    • B26D3/10Making cuts of other than simple rectilinear form
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C63/00Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor
    • B29C63/02Lining or sheathing, i.e. applying preformed layers or sheathings of plastics; Apparatus therefor using sheet or web-like material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C2793/00Shaping techniques involving a cutting or machining operation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1052Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10Methods of surface bonding and/or assembly therefor
    • Y10T156/1052Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/108Flash, trim or excess removal
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/12Surface bonding means and/or assembly means with cutting, punching, piercing, severing or tearing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00Cutting
    • Y10T83/02Other than completely through work thickness
    • Y10T83/0259Edge trimming [e.g., chamfering, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00Cutting
    • Y10T83/04Processes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T83/00Cutting
    • Y10T83/04Processes
    • Y10T83/05With reorientation of tool between cuts

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Forests & Forestry (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To smoothly cut out a protective tape along the outer size of a semiconductor wafer in an excellent state by quickly adjusting and setting a cutter blade at proper position and attitude corresponding to the semiconductor wafer and the protective tape. <P>SOLUTION: A protective tape cutting mechanism 9 is provided with: a cutter elevating means for elevating the cutter blade 12 from a standby position on an upper side to a cutting acting position on a lower side; a cutter turning means for turning the cutter blade 12 at the cutting action position around a vertical axial center X passing an almost center of a chuck table 5; and an adjusting means for changing the direction of the cutter blade 12 around prescribed axial centers Z and P, or a plurality of adjusting means for changing the position of the cutter blade 12 in a prescribed direction Y. Each of the plurality of adjusting means is constituted to independently control actuators 29 and 37, etc. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、チャックテーブルに載置保持された半導体ウエハの表面に保護テープを貼付けた後、貼付けられた保護テープにカッタ刃を突き刺した状態でウエハの外周に沿ってカッタ刃を走行させて、貼付けられた保護テープをウエハ外形に沿って切り抜くよう構成した保護テープ貼付け装置に関する。   The present invention, after pasting the protective tape on the surface of the semiconductor wafer placed and held on the chuck table, then running the cutter blade along the outer periphery of the wafer in a state where the cutter blade is stuck into the stuck protective tape, The present invention relates to a protective tape attaching apparatus configured to cut out an attached protective tape along a wafer outer shape.

半導体ウエハの表面に貼付けられた保護テープを切り抜き切断する手段としては、例えば特許文献1に示されているように、チャックテーブルに載置保持されたウエハの表面に保護テープを供給し、貼付けローラを転動移動させて保護テープをウエハの表面に貼付け、その後、保護テープにカッタ刃を突き刺した状態で、テーブルを回転させることでウエハの外周に沿ってカッタ刃を相対走行させ、保護テープをウエハ外周に沿って切断し、また、ウエハの表面に対するカッタ刃の交差角度を変更調節することで、ウエハの外周縁に対する保護テープのはみ出し量を、ウエハの厚さやウエハ外周縁の面取り形態などに応じて任意に調整することができるよう構成したものが知られている。
特開2004−25438号公報
As a means for cutting out and cutting the protective tape attached to the surface of the semiconductor wafer, for example, as disclosed in Patent Document 1, the protective tape is supplied to the surface of the wafer placed and held on the chuck table, and the attaching roller The protective tape is affixed to the surface of the wafer by rolling, and then the cutter blade is moved along the outer periphery of the wafer by rotating the table with the cutter blade stuck into the protective tape. By cutting along the wafer periphery and changing and adjusting the crossing angle of the cutter blade with respect to the wafer surface, the amount of protrusion of the protective tape with respect to the outer periphery of the wafer can be adjusted to the thickness of the wafer and the chamfering form of the wafer outer periphery. What was comprised so that it can adjust arbitrarily according to it is known.
JP 2004-25438 A

上記保護テープの切断手段においては、ウエハの表面に対するカッタ刃の交差角度を変更調節する手段として、テーブル上方の高い位置に設定された支点を中心としてカッタユニットの傾斜角度を変更調整する構造が採用されているために、カッタ刃の角度を変更するとカッタ刃全体の上下方向位置が変化して保護テープの切断位置が変化することになり、カッタ刃の角度調整と高さ調整とを行う必要があり、調整に手間取るものとなっていた。   The protective tape cutting means adopts a structure that changes and adjusts the tilt angle of the cutter unit around a fulcrum set at a high position above the table as means for changing and adjusting the crossing angle of the cutter blade with respect to the wafer surface. Therefore, if the angle of the cutter blade is changed, the vertical position of the entire cutter blade will change and the cutting position of the protective tape will change, and it will be necessary to adjust the angle and height of the cutter blade. Yes, it took time to make adjustments.

本発明はこのような実情に着目してなされたものであって、カッタ刃を半導体ウエハや保護テープに対応した適切な位置姿勢に速やかに調整セットして、ウエハ外形に沿った保護テープ切り抜き切断を円滑良好に行うことができる保護テープ貼付け装置を提供することを主たる目的としている。   The present invention has been made paying attention to such a situation, and the cutter blade is quickly adjusted and set to an appropriate position and orientation corresponding to the semiconductor wafer and the protective tape, and the protective tape is cut and cut along the outer shape of the wafer. The main purpose is to provide a protective tape applying device that can smoothly and smoothly perform the above.

第1の発明は、チャックテーブルに載置保持された半導体ウエハの表面に保護テープを供給する保護テープ供給手段と、貼付けローラを転動移動させて保護テープをウエハの表面に押圧して貼付ける貼付けユニットと、貼付けられた保護テープにカッタ刃を突き刺した状態でウエハの外周に沿ってカッタ刃を走行させて貼付けられた保護テープをウエハ外形に沿って切り抜く保護テープ切断機構とを備えた保護テープ貼付け装置において、前記保護テープ切断機構に、カッタ刃を上方の待機位置と下方の切断作用位置とに亘って昇降させるカッタ昇降手段と、切断作用位置のカッタ刃をチャックテーブルの略中心を通る縦軸心周りに旋回させるカッタ旋回手段と、カッタ刃の姿勢や位置を変更する複数の調整手段とを備えるとともに、前記複数の調整手段をそれぞれアクチュエータで独立制御可能に構成してあることを特徴とする。   According to a first aspect of the present invention, there is provided a protective tape supplying means for supplying a protective tape to the surface of a semiconductor wafer placed and held on a chuck table; Protection equipped with an affixing unit and a protective tape cutting mechanism that cuts off the affixed protective tape along the wafer outline by running the cutter blade along the outer periphery of the wafer while the cutter blade is pierced into the affixed protective tape In the tape applicator, the protective tape cutting mechanism has a cutter lifting / lowering means for moving the cutter blade up and down between an upper standby position and a lower cutting action position, and the cutter blade at the cutting action position passes through the approximate center of the chuck table. A cutter turning means for turning around the longitudinal axis, and a plurality of adjusting means for changing the posture and position of the cutter blade. Characterized in that a adjusting means are independently capable of controlling an actuator, respectively.

上記構成によると、半導体ウエハの表面に保護テープを貼付けた後の保護テープ切断工程において、複数の調整手段を作動させてカッタ刃の姿勢や位置を半導体ウエハのサイズ、保護テープの種類などの各種条件に合わせて調整制御する。この場合、各調整作動はアクチュエータを用いて独立的に制御するので、予め各種の切断条件に対応した各調整制御の仕様プログラムを設定しておくことで、処理対象の条件を入力セットするだけで好適な保護テープ切断処理を速やかに遂行することができる。   According to the above configuration, in the protective tape cutting process after applying the protective tape to the surface of the semiconductor wafer, the plurality of adjusting means are operated to change the cutter blade posture and position into various types such as the size of the semiconductor wafer and the type of the protective tape. Adjust and control according to conditions. In this case, since each adjustment operation is controlled independently using an actuator, setting the specification program of each adjustment control corresponding to various cutting conditions in advance makes it easy to input and set the conditions to be processed. A suitable protective tape cutting process can be performed promptly.

第2の発明は、上記第1の発明において、前記複数の調整手段のうちの一つは、カッタ刃を所定の軸心周りに向き変更する調整手段であり、この調整手段は、カッタ刃の刃先背縁に沿った軸心を中心にカッタ刃をアクチュエータによって回動変更し、カッタ刃の進行方向に対する切り込み角度を変更するよう構成したものである。   According to a second invention, in the first invention, one of the plurality of adjusting means is an adjusting means for changing the direction of the cutter blade around a predetermined axis, and the adjusting means is provided on the cutter blade. The cutter blade is rotationally changed by an actuator around an axis along the blade edge, and the cutting angle with respect to the traveling direction of the cutter blade is changed.

上記構成によると、カッタ刃の走行位置検出に応じて切り込み角度を変更制御することで、例えば、ウエハ位置決め用のオリエンテーションフラットを備えた半導体ウエハや、位置決め用のノッチを備えた半導体ウエハなど、外形が変化するものに対しても、その外形に沿ったテープ切断を円滑に実行することができる。   According to the above configuration, by changing and controlling the cutting angle according to the travel position detection of the cutter blade, for example, a semiconductor wafer with an orientation flat for wafer positioning, a semiconductor wafer with a notch for positioning, etc. Even when the angle changes, tape cutting along the outer shape can be performed smoothly.

第3の発明は、上記第2の発明において、前記調整手段は、アクチュエータによって強制回動される部材に対して前記カッタ刃をその刃先背縁に沿った前記軸心を中心にして設定範囲で相対回動可能に支持するとともに、カッタ刃をカッタ旋回方向と逆向きに回動付勢するよう構成したものである。   In a third aspect based on the second aspect, the adjusting means is configured to set the cutter blade with respect to a member forcedly rotated by an actuator within a set range about the axis along the back edge of the blade edge. The cutter blade is supported so as to be rotatable relative to the cutter blade, and the cutter blade is urged to rotate in a direction opposite to the cutter turning direction.

上記構成によると、カッタ刃の刃先に所定以上の切断抵抗が働くと、回動付勢力に抗してカッタ刃の切り込み角度が自動的に変化して、良好な切断が続行される。   According to the above configuration, when a cutting resistance of a predetermined level or more is applied to the cutting edge of the cutter blade, the cutting angle of the cutter blade is automatically changed against the rotational biasing force, and good cutting is continued.

第4の発明は、上記第1の発明において、前記複数の調整手段のうちの一つは、カッタ刃を所定の軸心周りに姿勢変更する調整手段であり、この調整手段は、カッタ刃のテープ切断箇所を中心にしてカッタ刃をアクチュエータによって強制傾動させて半導体ウエハの表面に対するカッタ刃の交差角度を変更するよう構成したものである。   In a fourth aspect based on the first aspect, one of the plurality of adjustment means is an adjustment means for changing a posture of the cutter blade around a predetermined axis, and the adjustment means The cutter blade is forcibly tilted by an actuator around the tape cutting portion to change the crossing angle of the cutter blade with respect to the surface of the semiconductor wafer.

従って、第4の発明によると、半導体ウエハの表面に対するカッタ刃の交差角度を変更調整することで、ウエハ外周縁に対する保護テープのはみ出し量を、ウエハ厚さやウエハ外周縁の面取り形態、などに応じて調整することができる。この場合、半導体ウエハの仕様に対するカッタ刃の交差角度調整のための制御プログラムを予め設定しておくことで、処理対象の条件を操作キーやバーコードリーダなどの適宜入力手段を用いて入力セットするだけで、好適な交差角度での切断処理を速やかに開始することができる。   Therefore, according to the fourth invention, by changing and adjusting the crossing angle of the cutter blade with respect to the surface of the semiconductor wafer, the amount of protrusion of the protective tape with respect to the outer peripheral edge of the wafer depends on the wafer thickness, the chamfering form of the outer peripheral edge of the wafer, etc. Can be adjusted. In this case, by setting in advance a control program for adjusting the crossing angle of the cutter blade with respect to the specifications of the semiconductor wafer, the conditions to be processed are input and set using appropriate input means such as operation keys or a barcode reader. Only by this, the cutting process at a suitable crossing angle can be started quickly.

しかも、カッタ刃はテープ切断箇所を中心にして傾動されるものであるから、この調整によってカッタ刃の切断部位の高さが大きく変化することはなく、処理対象が変わった際の調整に要する時間は短いものとなる。   In addition, since the cutter blade is tilted about the tape cutting point, the height of the cutting portion of the cutter blade does not change greatly by this adjustment, and the time required for adjustment when the processing target changes Will be short.

第5の発明は、上記第1の発明において、前記複数の調整手段のうちの一つは、カッタ刃を所定の軸心方向に位置変更する調整手段であり、この調整手段は、カッタ刃の旋回中心からの距離が異なる複数位置にカッタ刃をアクチュエータによって強制移動させるよう構成したものである。   In a fifth aspect based on the first aspect, one of the plurality of adjusting means is an adjusting means for changing a position of the cutter blade in a predetermined axial direction. The cutter blade is forcibly moved by an actuator to a plurality of positions having different distances from the turning center.

上記構成によると、処理対象を適宜入力手段を用いて入力セットすることで、処理対象に好適な旋回半径にカッタ刃が位置変更することが可能となる。   According to the above configuration, the cutter blade can be repositioned to a turning radius suitable for the processing target by appropriately setting the processing target using the input means.

第6の発明は、上記第1の発明において、前記複数の調整手段のうちの一つは、カッタ刃を所定の軸心方向に位置変更する調整手段であり、この調整手段は、カッタ刃をその旋回半径方向に移動可能に支持するとともに、カッタ刃を旋回中心に接近する方向に付勢し、付勢されたカッタ刃をアクチュエータによって付勢方向と反対方向に強制移動させるよう構成したものである。   In a sixth aspect based on the first aspect, one of the plurality of adjusting means is an adjusting means for changing a position of the cutter blade in a predetermined axial direction. The cutter blade is supported so as to be movable in the turning radius direction, and the cutter blade is urged in a direction approaching the turning center, and the urged cutter blade is forcibly moved in a direction opposite to the urging direction by an actuator. is there.

上記構成によると、テープ切断工程の最初では、アクチュエータを用いてカッタ刃をウエハ外形から少し外側に外れた位置に強制変位させておくことで、ウエハに接触することなくカッタ刃を下降させて保護テープに突き刺すことができ、その後、アクチュエータによる強制変位作動を解除することでカッタ刃を旋回中心に向けて付勢移動可能にし、カッタ刃を付勢力によってウエハ外周に適度に弾性押圧しながら走行させて、ウエハ外形に沿った精度の高いテープ切断を行うことができる。   According to the above configuration, at the beginning of the tape cutting process, the cutter blade is forcibly displaced to a position slightly outside the wafer outline by using an actuator, so that the cutter blade can be lowered and protected without contacting the wafer. The cutter blade can be stabbed, and then the forced displacement operation by the actuator is released to enable the cutter blade to be urged and moved toward the center of rotation. Thus, highly accurate tape cutting along the wafer outer shape can be performed.

従って、本発明によれば、保護テープの貼付けから切り抜き切断までの処理を、処理対象に対応した調整に時間をかけるようなことなく速やかに行うことができ、半導体ウエハへの保護テープ貼付け切断処理を能率よく行うことができる。   Therefore, according to the present invention, the process from sticking of the protective tape to cutting and cutting can be performed quickly without taking time for adjustment corresponding to the processing target, and the protective tape sticking and cutting process to the semiconductor wafer is performed. Can be performed efficiently.

以下、図面を参照して本発明の実施例を説明する。   Embodiments of the present invention will be described below with reference to the drawings.

図1は、保護テープ貼付け装置の全体構成を示す斜視図である。この保護テープ貼付け装置は、半導体ウエハ(以下、単に「ウエハ」と略称する)Wを収納したカセットCが装填されるウエハ供給/回収部1、ロボットアーム2を備えたウエハ搬送機構3、アライメントステージ4、ウエハWを載置して吸着保持するチャックテーブル5、ウエハWに向けて表面保護用の保護テープTを供給するテープ供給部6、テープ供給部6から供給されたセパレータ付きの保護テープTからセパレータsを剥離回収するセパレータ回収部7、チャックテーブル5に載置されて吸着保持されたウエハWに保護テープTを貼付ける貼付けユニット8、ウエハWに貼付けられた保護テープTをウエハWの外形に沿って切り抜き切断するテープ切断機構9、ウエハWに貼付けて切断処理した後の不要テープT’を剥離する剥離ユニット10、剥離ユニット10で剥離された不要テープT’を巻き取り回収するテープ回収部11、等が備えられており、上記各構造部および機構についての具体的な構成を以下に説明する。   FIG. 1 is a perspective view showing the overall configuration of the protective tape attaching device. This protective tape affixing device includes a wafer supply / recovery unit 1 loaded with a cassette C containing a semiconductor wafer (hereinafter simply referred to as “wafer”) W, a wafer transfer mechanism 3 having a robot arm 2, an alignment stage. 4. Chuck table 5 on which the wafer W is placed and sucked and held, a tape supply unit 6 for supplying a protective tape T for surface protection toward the wafer W, and a protective tape T with a separator supplied from the tape supply unit 6 The separator s from the separator W, the sticking unit 8 for sticking the protective tape T to the wafer W placed on the chuck table 5 and sucked and held, and the protective tape T attached to the wafer W on the wafer W. A tape cutting mechanism 9 that cuts and cuts along the outer shape, and a peeling unit that peels off the unnecessary tape T ′ after being attached to the wafer W and cut. A knit 10, a tape collecting unit 11 for winding and collecting the unnecessary tape T 'peeled off by the peeling unit 10, and the like are provided, and a specific configuration of each of the structural units and mechanisms will be described below.

ウエハ供給/回収部1には2台のカセットCを並列して装填可能であり、各カセットCには、配線パターン面を上向きにした多数枚のウエハWが多段に水平姿勢で差込み収納されている。   The wafer supply / collection unit 1 can be loaded with two cassettes C in parallel. In each cassette C, a large number of wafers W with the wiring pattern surface facing upward are inserted and stored in multiple stages in a horizontal posture. Yes.

ウエハ搬送機構3に備えられたロボットアーム2は、水平に進退移動可能に構成されるとともに、全体が駆動旋回および昇降可能となっている。そして、ロボットアーム2の先端には、馬蹄形をした真空吸着式のウエハ保持部2aが備えられており、カセットCに多段に収納されたウエハW同士の間隙にウエハ保持部2aを差し入れてウエハWを裏面から吸着保持し、吸着保持したウエハWをカセットCから引き出して、アライメントステージ4、チャックテーブル5、およびウエハ供給/回収部1の順に搬送するようになっている。   The robot arm 2 provided in the wafer transfer mechanism 3 is configured to be able to move forward and backward horizontally, and can be driven and swung up and down as a whole. At the tip of the robot arm 2, a horseshoe-shaped vacuum suction type wafer holder 2a is provided, and the wafer holder 2a is inserted into the gap between the wafers W stored in multiple stages in the cassette C. Are sucked and held from the back surface, and the wafer W sucked and held is pulled out from the cassette C and conveyed in the order of the alignment stage 4, the chuck table 5, and the wafer supply / recovery unit 1.

アライメントステージ4は、ウエハ搬送機構3によって搬入載置されたウエハWを、その外周に形成されたオリエンテーションフラットやノッチなどに基づいて位置合わせを行うようになっている。   The alignment stage 4 aligns the wafer W loaded and placed by the wafer transport mechanism 3 based on an orientation flat, a notch or the like formed on the outer periphery thereof.

チャックテーブル5は、ウエハ搬送機構3から移載されて所定の位置合わせ姿勢で載置されたウエハWを真空吸着するようになっている。また、このチャックテーブル5の上面には、後述するテープ切断機構9に備えたカッタ刃12をウエハWの外形に沿って旋回移動させて保護テープTを切断するためにカッタ走行溝13(図2参照)が形成されている。   The chuck table 5 is configured to vacuum-suck the wafer W transferred from the wafer transfer mechanism 3 and placed in a predetermined alignment posture. Further, a cutter running groove 13 (FIG. 2) is provided on the upper surface of the chuck table 5 in order to cut a protective tape T by rotating a cutter blade 12 provided in a tape cutting mechanism 9 to be described later along the outer shape of the wafer W. Reference) is formed.

テープ供給部6は、供給ボビン14から繰り出されたセパレータ付きの保護テープTをガイドローラ15群に巻回案内し、セパレータsを剥離した保護テープTを貼付けユニット8に導くよう構成されており、供給ボビン14に適度の回転抵抗を与えて過剰なテープ繰り出しが行われないように構成されている。   The tape supply unit 6 is configured to guide the protective tape T with a separator drawn out from the supply bobbin 14 around the guide roller 15 group and guide the protective tape T from which the separator s has been peeled off to the affixing unit 8. The supply bobbin 14 is configured to give an appropriate rotational resistance so that excessive tape feeding is not performed.

セパレータ回収部7は、保護テープTから剥離されたセパレータsを巻き取る回収ボビン16が巻き取り方向に回転駆動されるようになっている。   In the separator collection unit 7, the collection bobbin 16 that winds up the separator s peeled from the protective tape T is driven to rotate in the winding direction.

貼付けユニット8には貼付けローラ17が前向き水平に備えられており、スライド案内機構18(図7参照)および図示されないネジ送り式の駆動機構によって左右水平に往復駆動されるようになっている。   The affixing unit 8 is provided with an affixing roller 17 that faces forward and horizontally, and is reciprocated horizontally by a slide guide mechanism 18 (see FIG. 7) and a screw feed type drive mechanism (not shown).

剥離ユニット10には剥離ローラ19が前向き水平に備えられており、前記スライド案内機構18および図示されないネジ送り式の駆動機構によって左右水平に往復駆動されるようになっている。   The peeling unit 10 is provided with a peeling roller 19 that is horizontally oriented forward, and is reciprocated horizontally by the slide guide mechanism 18 and a screw feed type driving mechanism (not shown).

テープ回収部11は、不要テープT’を巻き取る回収ボビン20が巻き取り方向に回転駆動されるようになっている。   The tape collecting unit 11 is configured so that the collecting bobbin 20 that takes up the unnecessary tape T ′ is driven to rotate in the winding direction.

テープ切断機構9は、基本的には、駆動昇降可能な可動台21の下部に、チャックテーブル5の略中心を通る縦向きの軸心Xを旋回中心として駆動旋回可能に支持アーム22(図2参照)が片持ち水平姿勢で装備されるとともに、この支持アーム22の先端側に備えたカッタユニット23に、刃先を下向きにしたカッタ刃12が装着され、支持アーム22が軸心X周りに旋回することでカッタ刃12がウエハWの外周に沿って走行して保護テープTを切り抜くよう構成されており、その詳細な構造が図2〜図5に示されている。   The tape cutting mechanism 9 basically has a support arm 22 (see FIG. 2) that can be driven and swiveled around a vertical axis X passing through the approximate center of the chuck table 5 at the bottom of a movable base 21 that can be driven up and down. Is mounted in a cantilevered horizontal posture, and a cutter blade 12 with its blade tip facing downward is mounted on a cutter unit 23 provided on the distal end side of the support arm 22, and the support arm 22 pivots around the axis X Thus, the cutter blade 12 is configured to travel along the outer periphery of the wafer W to cut out the protective tape T, and its detailed structure is shown in FIGS.

図2に示すように、可動台21は、モータ24を正逆回転駆動することで縦レール25に沿ってねじ送り昇降されるようになっており、この可動台21の遊端部に備えられたボス部21aに回動体26が前記縦軸心X周りに回動可能に支持されている。この回動体26は可動台21の上に配備されたモータ27に2本のベルト28を介して減速連動されており、モータ27の作動によって回動体26が所定の方向に低速で回動されるようになっている。   As shown in FIG. 2, the movable base 21 is screwed up and down along the vertical rail 25 by driving the motor 24 forward and backward, and is provided at the free end of the movable base 21. A rotating body 26 is supported by the boss portion 21a so as to be rotatable about the longitudinal axis X. The rotating body 26 is decelerated and linked to a motor 27 provided on the movable base 21 via two belts 28, and the rotating body 26 is rotated in a predetermined direction at a low speed by the operation of the motor 27. It is like that.

そして、回動体26の下部に、支持アーム22がエアーシリンダ(アクチュエータ)29によって水平方向Yに進退可能に支持されるとともに、この支持アーム22の遊端部22aにカッタユニット23が後述のように装着支持されており、エアーシリンダ29を作動制御して支持アーム22を水平方向Yに移動調節することでカッタ刃12の旋回半径をウエハ径に対応して調節制御することが可能となっている。   A support arm 22 is supported below the rotating body 26 by an air cylinder (actuator) 29 so as to advance and retreat in the horizontal direction Y, and a cutter unit 23 is mounted on the free end 22a of the support arm 22 as will be described later. By mounting and supporting the air cylinder 29 and controlling the movement of the support arm 22 in the horizontal direction Y, the turning radius of the cutter blade 12 can be adjusted and controlled in accordance with the wafer diameter. .

図3に示すように、カッタユニット23は、支持アーム22の先端部22aに支軸30を介して縦向きの軸心Zを中心として回動可能に支持された逆L形の回動ブラケット31、この回動ブラケット31における縦辺部31aの前面に支持された可動部材32、この可動部材32の前面に連結支持されたカッタ支持部材33、このカッタ支持部材33に取り付けられたカッタホルダ34、等から構成され、カッタ刃12はカッタホルダ34に、その刃先背縁が軸心Zと略一致するように取り付けられている。   As shown in FIG. 3, the cutter unit 23 is an inverted L-shaped rotation bracket 31 that is supported by a tip end portion 22 a of a support arm 22 via a support shaft 30 so as to be rotatable about a longitudinal axis Z. The movable member 32 supported on the front surface of the vertical side portion 31a of the rotating bracket 31, the cutter support member 33 connected and supported on the front surface of the movable member 32, the cutter holder 34 attached to the cutter support member 33, etc. The cutter blade 12 is attached to the cutter holder 34 such that the blade edge of the cutter tip substantially coincides with the axis Z.

回動ブラケット31の基端ボス31bの上端には回動プレート31cが連設されるとともに、この回動プレート31cに対して軸心Z周りに相対回転可能に支持プレート35が配備され、支持アーム22の先端部にステー36を介して取り付けたパルスモータ(アクチュエータ)37と支持プレート35とがベルト38を介して巻き掛け連動されている。   A rotation plate 31c is connected to the upper end of the base end boss 31b of the rotation bracket 31, and a support plate 35 is provided so as to be relatively rotatable around the axis Z with respect to the rotation plate 31c. A pulse motor (actuator) 37 attached to the tip of 22 via a stay 36 and a support plate 35 are wound and interlocked via a belt 38.

そして、図13に示すように、支持プレート35と回動プレート31cとは、回動プレート31cに形成した切欠き凹部39に支持プレート35に設けたストッパーピン40が係合されることによって軸心Z周りの相対回動範囲が制限されるとともに、回動プレート31cに設けたピン41と支持プレート35のストッパーピン40とに亘ってバネ42が張設され、このバネ42の張力によって回動プレート31cが支持プレート35に対して軸心Z周りにカッタ旋回方向Fと逆向きに回動付勢されており、通常、回動プレート31cは、図13(a)に示すように、相対回動範囲の一端に付勢保持されている。   As shown in FIG. 13, the support plate 35 and the rotation plate 31 c are axially centered by engaging a stopper pin 40 provided on the support plate 35 with a notch recess 39 formed in the rotation plate 31 c. The relative rotation range around Z is limited, and a spring 42 is stretched between the pin 41 provided on the rotation plate 31 c and the stopper pin 40 of the support plate 35. 31c is urged to rotate around the axis Z with respect to the support plate 35 in the direction opposite to the cutter turning direction F. Normally, the rotating plate 31c is relatively rotated as shown in FIG. Energized and held at one end of the range.

上記構成によると、パルスモータ37を作動させて支持プレート35の回動姿勢を制御することで、回動プレート31cを介して回動ブラケット31全体を軸心Z周りに回動させることができ、これによってカッタ刃12の進行方向に対する切込み角α(図11参照)を制御することができるのである。また、所定の切込み角αがもたらされた状態で回動プレート31cがバネ42に抗して強制的に軸心Z周りに回動されると、カッタ刃12が軸心Z周りにカッタ旋回方向と同方向に回動されて、切込み角αが支持プレート35の回動調節によって設定された切込み角αよりも大きくなるように構成されている。   According to the above configuration, by operating the pulse motor 37 to control the rotation posture of the support plate 35, the entire rotation bracket 31 can be rotated around the axis Z via the rotation plate 31c. Thus, the cutting angle α (see FIG. 11) with respect to the traveling direction of the cutter blade 12 can be controlled. Further, when the rotation plate 31c is forcibly rotated around the axis Z against the spring 42 in a state where the predetermined cutting angle α is provided, the cutter blade 12 is rotated around the axis Z. The angle of cut α is set to be larger than the angle of cut α set by adjusting the rotation of the support plate 35.

図3〜図5に示すように、可動部材32は回動ブラケット31の縦辺部31aに対してスライド案内機構45を介してスライド移動可能に連結されている。このスライド案内機構45は、縦辺部31aの前面に取り付けられた部分円弧状の案内レール46と、可動部材32の背面に取り付けられて案内レール46に摺動自在に外嵌されたスライドブロック47とからなり、スライドブロック47を案内レール46に沿って移動させることで、案内レール46の曲率中心Pを支点にして可動部材32が縦辺部31aに対してスライド回動することができるようになっている。そして、案内レール46の曲率中心Pがカッタ刃12の刃先におけるテープ切断部位Cに位置するよう設定されており、このスライド回動調節によって、ウエハ表面に対するカッタ刃12の交差角度β(図6参照)を所定範囲内で変更調節することが可能となっている。   As shown in FIGS. 3 to 5, the movable member 32 is slidably connected to the vertical side portion 31 a of the rotating bracket 31 via a slide guide mechanism 45. The slide guide mechanism 45 includes a partially arcuate guide rail 46 attached to the front surface of the vertical side portion 31a, and a slide block 47 attached to the back surface of the movable member 32 and slidably fitted to the guide rail 46. By moving the slide block 47 along the guide rail 46, the movable member 32 can slide and rotate with respect to the vertical side portion 31a with the center of curvature P of the guide rail 46 as a fulcrum. It has become. The center of curvature P of the guide rail 46 is set so as to be positioned at the tape cutting portion C at the cutting edge of the cutter blade 12. By this slide rotation adjustment, the crossing angle β of the cutter blade 12 with respect to the wafer surface (see FIG. 6). ) Can be changed and adjusted within a predetermined range.

そして、可動部材32を案内レール46に沿って駆動移動させる駆動構造が以下のように構成されている。つまり、可動部材32の下部に下向きに凹曲した円弧状のラックギヤ48が備えられるとともに、回動ブラケット31における縦辺部31aの下部前面にはラックギヤ48に咬合されたピニオンギヤ49が軸支され、かつ、このピニオンギヤ49が、回動ブラケット31の上部に設けられたパルスモータ(アクチュエータ)50にベルト51を介して巻き掛け連動されており、パルスモータ51を作動させてピニオンギヤ49を回動制御することで相対的にラックギヤ48が咬合移動され、このラックギヤ48を備えた可動部材32が案内レール46に沿ってスライド移動制御されるようになっているのである。   And the drive structure which drives the movable member 32 along the guide rail 46 is comprised as follows. That is, an arc-shaped rack gear 48 that is bent downward is provided at the lower portion of the movable member 32, and a pinion gear 49 that is engaged with the rack gear 48 is pivotally supported on the lower front surface of the vertical side portion 31a of the rotating bracket 31. The pinion gear 49 is wound around and interlocked with a pulse motor (actuator) 50 provided on the upper portion of the rotation bracket 31 via a belt 51, and the pulse motor 51 is operated to control the rotation of the pinion gear 49. As a result, the rack gear 48 is relatively engaged and moved, and the movable member 32 having the rack gear 48 is controlled to slide along the guide rail 46.

また、上記のようにスライド回動制御される可動部材32に対してカッタ支持部材33は、直線案内レール52とこれに外嵌されたスライドブロック53を介して支持アーム22の進退方向Yと平行に直線スライド自在に支持されている。そして、可動部材32に設けたバネ受け金具54とカッタ支持部材33に設けたバネ受け金具55とに亘って張設されたバネ56によってカッタ支持部材33がカッタ旋回中心である軸心Xに接近するようスライド付勢されるとともに、可動部材32にブラケット57を介して取り付けたエアーシリンダ(アクチュエータ)58のピストンロッド58aがバネ受け金具55に当接可能に配備されており、ピストンロッド58aが伸出駆動されてバネ受け金具55を押圧することで、カッタ支持部材33がバネ54に抗して軸心Xから遠ざかる方向にスライド変位されるようになっている。   Further, the cutter support member 33 is parallel to the advancing / retreating direction Y of the support arm 22 via the linear guide rail 52 and the slide block 53 fitted to the movable guide 32 with respect to the movable member 32 controlled to slide and rotate as described above. It is supported so that it can slide linearly. Then, the cutter support member 33 approaches the axis X, which is the center of cutter rotation, by a spring 56 stretched between the spring support fitting 54 provided on the movable member 32 and the spring support fitting 55 provided on the cutter support member 33. The piston rod 58a of the air cylinder (actuator) 58 attached to the movable member 32 via the bracket 57 is arranged so as to be able to contact the spring receiving bracket 55, and the piston rod 58a is extended. The cutter support member 33 is slid and displaced in a direction away from the axis X against the spring 54 by being driven out and pressing the spring support 55.

次に、上記実施例装置を用いて保護テープTをウエハWの表面に貼付けて切り抜き切断するための一連の基本動作を説明する。   Next, a series of basic operations for sticking the protective tape T on the surface of the wafer W and cutting it out using the above-described embodiment apparatus will be described.

(1)貼付け指令が出されると、先ず、ウエハ搬送機構3におけるロボットアーム2がウエハ供給/回収部1に載置装填されたカセットCに向けて移動され、ウエハ保持部2aがカセットCに収容されているウエハ同士の隙間に挿入され、ウエハ保持部2aでウエハWを裏面(下面)から吸着保持して搬出し、取り出したウエハWをアライメントステージ4に移載する。   (1) When a sticking command is issued, first, the robot arm 2 in the wafer transfer mechanism 3 is moved toward the cassette C mounted and loaded on the wafer supply / recovery unit 1, and the wafer holding unit 2a is accommodated in the cassette C. The wafer W is inserted into the gap between the wafers, and the wafer W is sucked and held from the back surface (lower surface) by the wafer holder 2a, and the wafer W taken out is transferred to the alignment stage 4.

(2)アライメントステージ4に載置されたウエハWは、ウエハWの外周に形成されているノッチを利用して位置合わせされ、位置合わせの済んだウエハWは再びロボットアーム2によって搬出されてチャックテーブル5に載置される。   (2) The wafer W placed on the alignment stage 4 is aligned using a notch formed on the outer periphery of the wafer W, and the aligned wafer W is unloaded again by the robot arm 2 and chucked. Placed on the table 5.

(3)チャックテーブル5に載置されたウエハWは、その中心がチャックテーブル5の中心上にあるように位置合わせされた状態で吸着保持される。この時、図7に示すように、貼付けユニット8と剥離ユニット10は左側の初期位置に、また、テープ切断機構9のカッタ刃12は上方の初期位置でそれぞれ待機している。   (3) The wafer W placed on the chuck table 5 is sucked and held in a state where the wafer W is aligned so that the center thereof is on the center of the chuck table 5. At this time, as shown in FIG. 7, the affixing unit 8 and the peeling unit 10 are waiting at the left initial position, and the cutter blade 12 of the tape cutting mechanism 9 is waiting at the upper initial position.

(4)次に、図7中の仮想線で示すように、貼付けユニット8の貼付けローラ17が下降されるとともに、この貼付けローラ17で保護テープTを下方に押圧しながらウエハW上を前方(図7では右方向)に転動し、これによって保護テープTがウエハWの表面全体に貼付けられる(図8参照)。   (4) Next, as shown by the phantom line in FIG. 7, the affixing roller 17 of the affixing unit 8 is lowered, and the adhering roller 17 moves forward on the wafer W while pressing the protective tape T downward ( In this way, the protective tape T is applied to the entire surface of the wafer W (see FIG. 8).

(5)次に、貼付けユニット8が終端位置に達すると、図9に示すように、上方の所定旋回位相で待機していたカッタ刃12が下降されて、チャックテーブル5のカッタ走行溝13において保護テープTに突き刺される。   (5) Next, when the affixing unit 8 reaches the end position, as shown in FIG. 9, the cutter blade 12 that has been waiting in the upper predetermined turning phase is lowered, and in the cutter running groove 13 of the chuck table 5. The protective tape T is pierced.

なお、カッタ刃12の下降作動に先立って、予め入力されたウエハWの種類やサイズ、保護テープTの種類、ウエハ外周縁の面取り仕様、などの処理対象の情報に基づいて、カッタ刃12の調整制御がなされる。   Prior to the lowering operation of the cutter blade 12, based on the information of the processing target such as the type and size of the wafer W inputted in advance, the type of the protective tape T, the chamfering specification of the outer peripheral edge of the wafer, Adjustment control is performed.

つまり、入力情報に基づいて図2に示したエアーシリンダ29が作動制御されて支持アーム22が進退され、カッタ刃12の旋回半径がウエハ半径となる基準の位置にまでカッタ刃12が移動調整されるとともに、図5に示したエアーシリンダ58のピストンロッド58aがバネ受け金具55をバネに抗して少し押圧移動させる所定の位置まで伸出駆動されて、カッタ刃12がウエハWの外周縁から若干外側に外れた位置に修正され、この状態で下降されることでカッタ刃s12がウエハWに干渉接触することなく保護テープTに突き刺されるのである。   That is, the operation of the air cylinder 29 shown in FIG. 2 is controlled based on the input information, the support arm 22 is advanced and retracted, and the cutter blade 12 is moved and adjusted to a reference position where the turning radius of the cutter blade 12 becomes the wafer radius. At the same time, the piston rod 58a of the air cylinder 58 shown in FIG. 5 is driven to extend to a predetermined position where the spring receiving metal 55 is pushed and moved slightly against the spring, and the cutter blade 12 is moved from the outer peripheral edge of the wafer W. The cutter blade s12 is pierced into the protective tape T without interfering contact with the wafer W by being corrected to a position slightly outside and being lowered in this state.

この場合、入力情報に基づいて図3に示したパルスモータ37が制御されて、カッタ刃12の進行方向に対する切込み角度αが調整された状態でカッタ刃12が保護テープTに突き刺される。また、その後、入力情報に基づいて図3に示したパルスモータ50が制御されてカッタ刃12のウエハ表面に対する交差角度βが調整される。   In this case, the pulse motor 37 shown in FIG. 3 is controlled based on the input information, and the cutter blade 12 is pierced into the protective tape T in a state where the cutting angle α with respect to the traveling direction of the cutter blade 12 is adjusted. Thereafter, the pulse motor 50 shown in FIG. 3 is controlled based on the input information to adjust the crossing angle β of the cutter blade 12 with respect to the wafer surface.

(6)カッタ刃12が所定の位置において所定の姿勢で保護テープTに突き刺されると、図2に示したモータ27によって支持アーム22が所定の方向に駆動回転され、これに伴ってカッタ刃12が軸心X周りに旋回移動して保護テープTがウエハ外形に沿って切断される。この場合、カッタ刃12の前進走行が開始されると図5のエアーシリンダ58が伸縮自由状態に切り換えられ、カッタ支持部材33がバネ56によってカッタ刃旋回中心に向けてスライド付勢された状態になる。従って、カッタ刃12は、バネ56によるスライド付勢力によってウエハWの外周縁に適度の圧力で摺接しながら走行し、ウエハWの外形に沿ったテープ切断が行われるのである。   (6) When the cutter blade 12 is stabbed into the protective tape T in a predetermined position at a predetermined position, the support arm 22 is driven and rotated in a predetermined direction by the motor 27 shown in FIG. Rotates around the axis X, and the protective tape T is cut along the outer shape of the wafer. In this case, when the forward travel of the cutter blade 12 is started, the air cylinder 58 in FIG. 5 is switched to the freely stretchable state, and the cutter support member 33 is slid and urged toward the cutter blade turning center by the spring 56. Become. Accordingly, the cutter blade 12 travels while being in sliding contact with the outer peripheral edge of the wafer W with an appropriate pressure by the sliding biasing force of the spring 56, and the tape cutting along the outer shape of the wafer W is performed.

なお、図11に示すように、外周に位置合わせ用のオリエンテーションフラットofが備えられたウエハWを対象とする場合には、カッタ刃12はオリエンテーションフラットofの一端をテープ切断基点として旋回走行され、カッタ刃12の旋回方向での位置検出に対応してパルスモータ37が予め入力設定されたプログラムに基づいて制御されることで、カッタ刃12の進行方向に対する切込み角αが所定値に維持される。   As shown in FIG. 11, when a wafer W having an orientation flat of alignment on the outer periphery is targeted, the cutter blade 12 is swung around one end of the orientation flat of as a tape cutting base point. Corresponding to the position detection of the cutter blade 12 in the turning direction, the pulse motor 37 is controlled on the basis of a program set in advance, so that the cutting angle α with respect to the traveling direction of the cutter blade 12 is maintained at a predetermined value. .

また、外周に位置合わせ用のノッチnが備えられたウエハWを対象とする場合には、図12に示すように、カッタ刃12がノッチnの形成範囲に至ると、カッタ刃12の旋回方向での位置検出に対応してパルスモータ37が予め入力設定されたプログラムに基づいて制御されることで、カッタ刃12がノッチnに食い込むようにカッタ刃12の進行に伴って切込み角αの変更制御がなされ、ノッチnの内部における保護テープTの切り残しを少なくしたテープ切断が行われる。   When the wafer W having the notch n for alignment on the outer periphery is targeted, as shown in FIG. 12, when the cutter blade 12 reaches the formation range of the notch n, the turning direction of the cutter blade 12 is reached. The pulse motor 37 is controlled in accordance with a preset input program corresponding to the position detection at, so that the cutting angle α is changed as the cutter blade 12 advances so that the cutter blade 12 bites into the notch n. Control is performed, and tape cutting is performed with less uncut portion of the protective tape T inside the notch n.

また、支持プレート35に対して一定の回動姿勢に付勢保持された回動プレート31cは、所定の角度姿勢に制御されて固定維持されている支持プレート35に対して軸心Y周りにカッタ旋回方向と同方向に相対回動可能であるので、テープ切断作動中に大きいテープ切断抵抗が働いてカッタ刃12の進行が遅れると、回動プレート31cがバネ42に抗して相対回動されることになり、その結果、カッタ刃12の進行方向に対する切込み角αが大きくなってテープ切断が続行される。このようにテープ切断作動中に大きなテープ切断抵抗が働いたときに、カッタ刃12の進行方向に対する切込み角αが大きくなる方向に変位させることにより、カッタ刃12はウエハWの周縁に食い込むように変位するので、保護テープをガタツキ無く切断することができる。   Further, the rotation plate 31c biased and held in a fixed rotation posture with respect to the support plate 35 is cuttered about the axis Y with respect to the support plate 35 that is controlled and fixed to a predetermined angle posture. Since relative rotation is possible in the same direction as the turning direction, when a large tape cutting resistance acts during tape cutting operation and the progress of the cutter blade 12 is delayed, the rotating plate 31c is rotated relative to the spring 42. As a result, the cutting angle α with respect to the traveling direction of the cutter blade 12 is increased, and the tape cutting is continued. Thus, when a large tape cutting resistance is applied during the tape cutting operation, the cutter blade 12 bites into the periphery of the wafer W by being displaced in a direction in which the cutting angle α with respect to the traveling direction of the cutter blade 12 increases. Since it is displaced, the protective tape can be cut without rattling.

(7)ウエハWの外周に沿ったテープ切断が終了すると、図10に示すように、カッタ刃12は元の待機位置まで上昇され、次いで、剥離ユニット10が前方へ移動しながらウエハW上で切り抜き切断されて残った不要テープT’を巻き上げ剥離する。   (7) When the tape cutting along the outer periphery of the wafer W is completed, as shown in FIG. 10, the cutter blade 12 is raised to the original standby position, and then the peeling unit 10 moves forward on the wafer W. Unnecessary tape T ′ that has been cut and cut is wound up and peeled off.

(8)剥離ユニット10が剥離作業の終了位置に達すると、剥離ユニット10と貼付けユニット8とが逆方向に移動して初期位置に復帰する。この時、不要テープT’が回収ボビン20に巻き取られるとともに、一定量の保護テープTがテープ供給部6から繰り出される。   (8) When the peeling unit 10 reaches the end position of the peeling work, the peeling unit 10 and the pasting unit 8 move in the opposite directions and return to the initial position. At this time, the unnecessary tape T ′ is wound around the recovery bobbin 20 and a certain amount of the protective tape T is fed out from the tape supply unit 6.

(9)テープ貼付け作動が終了すると、チャックテーブル5における吸着が解除された後、貼付け処理のすんだウエハWはロボットアーム2のウエハ保持部2aに移載されてウエハ供給/回収部1のカセットCに差込み回収される。   (9) When the tape sticking operation is finished, after the suction on the chuck table 5 is released, the wafer W that has been stuck is transferred to the wafer holding part 2a of the robot arm 2 and the cassette of the wafer supply / recovery part 1 It is inserted into C and collected.

以上で1回のテープ貼付け処理が完了し、以後、上記作動を順次繰返してゆく。   Thus, one tape attaching process is completed, and thereafter, the above operations are sequentially repeated.

なお、上記実施例では、カッタ刃12の姿勢や位置を調整制御するアクチュエータとしてエアーシリンダ、パルスモータなど利用する場合を例示したが、電動シリンダ、電磁ソレノイドなどを使用することもでき、調整制御に必要なストローク、操作力、応答速度、などに応じてこれらを適宜選択すればよい。   In the above embodiment, the case where an air cylinder, a pulse motor, or the like is used as an actuator for adjusting and controlling the posture and position of the cutter blade 12 is exemplified. However, an electric cylinder, an electromagnetic solenoid, or the like can also be used for adjustment control. What is necessary is just to select these suitably according to a required stroke, operation force, response speed, etc.

本発明の一実施例に係る保護テープ貼付け装置の全体を示す斜視図である。It is a perspective view which shows the whole protective tape sticking apparatus which concerns on one Example of this invention. テープ切断機構の正面図である。It is a front view of a tape cutting mechanism. テープ切断機構の要部の側面図である。It is a side view of the principal part of a tape cutting mechanism. テープ切断機構の要部の正面図である。It is a front view of the principal part of a tape cutting mechanism. テープ切断機構の要部の正面図である。It is a front view of the principal part of a tape cutting mechanism. カッタ刃の交差角度の説明図である。It is explanatory drawing of the crossing angle of a cutter blade. 実施例装置の動作説明図である。It is operation | movement explanatory drawing of an Example apparatus. 実施例装置の動作説明図である。It is operation | movement explanatory drawing of an Example apparatus. 実施例装置の動作説明図である。It is operation | movement explanatory drawing of an Example apparatus. 実施例装置の動作説明図である。It is operation | movement explanatory drawing of an Example apparatus. オリエンテーションフラット付きの半導体ウエハのテープ切断処理手順の説明図である。It is explanatory drawing of the tape cutting process procedure of the semiconductor wafer with an orientation flat. ノッチ付きの半導体ウエハのテープ切断処理手順の説明図である。It is explanatory drawing of the tape cutting process procedure of the semiconductor wafer with a notch. 切り込み角度自動調整作動を説明する概略平面図である。It is a schematic plan view explaining the cutting angle automatic adjustment operation.

符号の説明Explanation of symbols

5 チャックテーブル
8 貼付けユニット
9 テープ切断機構
12 カッタ刃
17 貼付けローラ
29 アクチュエータ(エアーシリンダ)
37 アクチュエータ(パルスモータ)
50 アクチュエータ(パルスモータ)
58 アクチュエータ(エアーシリンダ)
C 切断箇所
F カッタ旋回方向
T 保護テープ
W 半導体ウエハ
X 軸心
Z 軸心
α 切込み角度
β 交差角度

5 Chuck Table 8 Adhesion Unit 9 Tape Cutting Mechanism 12 Cutter Blade 17 Adhesion Roller 29 Actuator (Air Cylinder)
37 Actuator (pulse motor)
50 Actuator (pulse motor)
58 Actuator (Air cylinder)
C Cutting point F Cutter turning direction T Protective tape W Semiconductor wafer X Axis Z Z Axis α Cutting angle β Crossing angle

Claims (6)

チャックテーブルに載置保持された半導体ウエハの表面に保護テープを供給する保護テープ供給手段と、貼付けローラを転動移動させて保護テープをウエハの表面に押圧して貼付ける貼付けユニットと、貼付けられた保護テープにカッタ刃を突き刺した状態でウエハの外周に沿ってカッタ刃を走行させて貼付けられた保護テープをウエハ外形に沿って切り抜く保護テープ切断機構とを備えた保護テープ貼付け装置において、
前記保護テープ切断機構に、カッタ刃を上方の待機位置と下方の切断作用位置とに亘って昇降させるカッタ昇降手段と、切断作用位置のカッタ刃をチャックテーブルの略中心を通る縦軸心周りに旋回させるカッタ旋回手段と、カッタ刃の姿勢や位置を変更する複数の調整手段とを備えるとともに、
前記複数の調整手段をそれぞれアクチュエータで独立制御可能に構成してあることを特徴とする保護テープ貼付け装置。
A protective tape supply means for supplying a protective tape to the surface of the semiconductor wafer placed and held on the chuck table, a sticking unit for rolling and moving the sticking roller and pressing the protective tape against the wafer surface, In a protective tape attaching apparatus provided with a protective tape cutting mechanism that cuts out the protective tape attached by running the cutter blade along the outer periphery of the wafer with the cutter blade being pierced into the protective tape,
The protective tape cutting mechanism includes a cutter lifting / lowering means for moving the cutter blade up and down between an upper standby position and a lower cutting action position, and the cutter blade at the cutting action position around a longitudinal axis passing through the approximate center of the chuck table. A cutter turning means for turning, and a plurality of adjusting means for changing the posture and position of the cutter blade;
The protective tape attaching apparatus, wherein the plurality of adjusting means are configured to be independently controllable by actuators.
請求項1記載の保護テープ貼付け装置において、
前記複数の調整手段のうちの一つは、カッタ刃を所定の軸心周りに向き変更する調整手段であり、この調整手段は、カッタ刃の刃先背縁に沿った軸心を中心にカッタ刃をアクチュエータによって回動変更し、カッタ刃の進行方向に対する切り込み角度を変更するよう構成したものである保護テープ貼付け装置。
In the protective tape affixing device according to claim 1,
One of the plurality of adjusting means is an adjusting means for changing the direction of the cutter blade around a predetermined axis, and the adjusting means is a cutter blade centered on an axis along the cutting edge of the cutter blade. The protective tape attaching device is configured to change the cutting angle with respect to the traveling direction of the cutter blade by changing the rotation of the blade with an actuator.
請求項2記載の保護テープ貼付け装置において、
前記調整手段は、アクチュエータによって強制回動される部材に対して前記カッタ刃をその刃先背縁に沿った前記軸心を中心にして設定範囲で相対回動可能に支持するとともに、カッタ刃をカッタ旋回方向と逆向きに回動付勢してある保護テープ貼付け装置。
In the protective tape affixing device according to claim 2,
The adjusting means supports the cutter blade with respect to a member forcedly rotated by an actuator so that the cutter blade can be relatively rotated within a set range around the axis along the back edge of the blade tip. A protective tape affixing device that is biased to rotate in the direction opposite to the turning direction.
請求項1記載の保護テープ貼付け装置において、
前記複数の調整手段のうちの一つは、カッタ刃を所定の軸心周りに姿勢変更する調整手段であり、この調整手段は、カッタ刃のテープ切断箇所を中心にしてカッタ刃をアクチュエータによって強制傾動させて半導体ウエハの表面に対するカッタ刃の交差角度を変更するよう構成したものである保護テープ貼付け装置。
In the protective tape affixing device according to claim 1,
One of the plurality of adjusting means is an adjusting means for changing the posture of the cutter blade around a predetermined axis, and this adjusting means forcibly causes the cutter blade to be forced by an actuator around the tape cutting portion of the cutter blade. A protective tape affixing device configured to change the crossing angle of the cutter blade with respect to the surface of the semiconductor wafer by tilting.
請求項1記載の保護テープ貼付け装置において、
前記複数の調整手段のうちの一つは、カッタ刃を所定の軸心方向に位置変更する調整手段であり、この調整手段は、カッタ刃の旋回中心からの距離が異なる複数位置にカッタ刃をアクチュエータによって強制移動させるよう構成したものである保護テープ貼付け装置。
In the protective tape affixing device according to claim 1,
One of the plurality of adjusting means is an adjusting means for changing the position of the cutter blade in a predetermined axial direction, and the adjusting means has the cutter blade at a plurality of positions at different distances from the turning center of the cutter blade. A protective tape affixing device configured to be forcibly moved by an actuator.
請求項1記載の保護テープ貼付け装置において、
前記複数の調整手段のうちの一つは、カッタ刃を所定の軸心方向に位置変更する調整手段であり、この調整手段は、カッタ刃をその旋回半径方向に移動可能に支持するとともに、カッタ刃を旋回中心に接近する方向に付勢し、付勢されたカッタ刃をアクチュエータによって付勢方向と反対方向に強制移動させるよう構成したものである保護テープ貼付け装置。
In the protective tape affixing device according to claim 1,
One of the plurality of adjusting means is an adjusting means for changing the position of the cutter blade in a predetermined axial direction. The adjusting means supports the cutter blade so as to be movable in the turning radius direction, and A protective tape affixing device configured to urge the blade in a direction approaching the turning center and forcibly move the urged cutter blade in a direction opposite to the urging direction by an actuator.
JP2004239502A 2004-08-19 2004-08-19 Protective tape pasting device Expired - Fee Related JP4450696B2 (en)

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JP2004239502A JP4450696B2 (en) 2004-08-19 2004-08-19 Protective tape pasting device
US11/182,761 US7516768B2 (en) 2004-08-19 2005-07-18 Method and apparatus for joining protective tape
KR1020050073120A KR101145517B1 (en) 2004-08-19 2005-08-10 Method and apparatus for joining protective tape
TW94128145A TWI389781B (en) 2004-08-19 2005-08-18 Method and apparatus for joining protective tape
CN2005100927263A CN1738005B (en) 2004-08-19 2005-08-19 Method and apparatus for joining protective tape

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JP2008124307A (en) * 2006-11-14 2008-05-29 Nitto Denko Corp Protection tape cutting method and protection tape cutting device of semiconductor wafer
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JP4450696B2 (en) 2010-04-14

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