JP2006039331A - Plastic substrate for display element - Google Patents

Plastic substrate for display element Download PDF

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JP2006039331A
JP2006039331A JP2004221072A JP2004221072A JP2006039331A JP 2006039331 A JP2006039331 A JP 2006039331A JP 2004221072 A JP2004221072 A JP 2004221072A JP 2004221072 A JP2004221072 A JP 2004221072A JP 2006039331 A JP2006039331 A JP 2006039331A
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plastic substrate
display element
epoxy resin
substrate
compound
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Kazuyuki Yoshizaki
一幸 吉崎
Wataru Oka
渉 岡
Sumio Shibahara
澄夫 柴原
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Sumitomo Bakelite Co Ltd
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Sumitomo Bakelite Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a plastic substrate for a display element, the substrate having excellent heat resistance and transparency. <P>SOLUTION: The plastic substrate for a display element contains as a structural component, epoxy resin which is a compound (a) having two or more epoxy groups and which has ≥85% purity calculated from oxirane oxygen concentration (measured oxirane oxygen concentration/proportion of oxirane oxygen in the structural formula×100). The compound (a) having two or more epoxy groups is preferably an alicyclic epoxy resin or a hydrogenated biphenyl alicyclic epoxy resin, and the resin is preferably cured with a cationic curative system catalyst. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、耐熱性および透明性に優れた表示素子用プラスチック基板に関する。   The present invention relates to a plastic substrate for display elements having excellent heat resistance and transparency.

近年、液晶表示素子には薄膜化、軽量化、大型化、曲面表示対応などの高度な要求がある。特に携帯機器については軽量化、高耐久性が強く要求され、これらの利用が拡大されるにつれて、従来のガラス基板に代わり軽くて割れ難い、透明プラスチックを基板とする液晶表示パネルが検討され一部で実用化され始めた。
表示素子用プラスチック基板に用いられる樹脂は例えば特許文献1には脂環式エポキシ樹脂、酸無水物系硬化剤、アルコール、硬化触媒からなる組成物、特許文献2には脂環式エポキシ樹脂、アルコールで部分エステル化した酸無水物系硬化剤、硬化触媒からなる樹脂組成物が、特許文献3には脂環式エポキシ樹脂、カルボン酸を有する酸無水物系硬化剤、硬化触媒からなる樹脂組成物が示されている。しかしながらこれらの文献に示される従来の表示素子基板用樹脂は、透明性は高いもののガラス転移温度が200℃以下であり高温プロセスを必要とする場合には高温での基板の強度や弾性率が不十分で基板が変形するおそれがあった。
In recent years, liquid crystal display devices have high demands such as thinning, lightening, large size, and curved display. Especially for portable devices, weight reduction and high durability are strongly demanded, and as these uses are expanded, liquid crystal display panels using transparent plastic substrates instead of conventional glass substrates are being studied. It began to be put into practical use.
Resin used for the plastic substrate for display elements is, for example, a composition comprising an alicyclic epoxy resin, an acid anhydride curing agent, alcohol and a curing catalyst in Patent Document 1, and an alicyclic epoxy resin and alcohol in Patent Document 2. A resin composition comprising an acid anhydride-based curing agent partially esterified with a curing catalyst and a curing catalyst, Patent Document 3 discloses a resin composition comprising an alicyclic epoxy resin, an acid anhydride-based curing agent having a carboxylic acid, and a curing catalyst. It is shown. However, the conventional display element substrate resins shown in these documents have high transparency, but have a glass transition temperature of 200 ° C. or lower, and when a high temperature process is required, the strength and elastic modulus of the substrate at high temperatures are poor. There was a possibility that the substrate was deformed sufficiently.

特開平6−337408JP-A-6-337408 特開2001−59015JP 2001-59015 A 特開2001−59014JP 2001-59014 A

本発明は耐熱性および透明性が高い表示素子用プラスチック基板を提供することを目的とする。   An object of this invention is to provide the plastic substrate for display elements with high heat resistance and transparency.

本発明者らは上記課題を達成すべく鋭意検討した。その結果、2つ以上のエポキシ基を有する化合物(a)であって、オキシラン酸素濃度から求めた純度が85%以上であるエポキシ樹脂を構成成分として含む表示素子用プラスチック基板が液晶表示素子、カラーフィルター、有機EL表示素子、電子ペーパー等の表示素子に好適に利用できることを見出し、本発明を完成するに至った。   The present inventors diligently studied to achieve the above problems. As a result, a plastic substrate for a display element comprising a compound (a) having two or more epoxy groups and an epoxy resin having a purity of 85% or more determined from the oxirane oxygen concentration as a constituent component is a liquid crystal display element, a color It has been found that it can be suitably used for display elements such as filters, organic EL display elements, and electronic paper, and has completed the present invention.

すなわち本発明は
(1) 2つ以上のエポキシ基を有する化合物(a)であって、オキシラン酸素濃度から求めた純度が85%以上であるエポキシ樹脂を構成成分として含む表示素子用プラスチック基板、
(2) 前記2つ以上のエポキシ基を有する化合物(a)が下記化学式(1)で示される脂環式エポキシ樹脂である(1)の表示素子用プラスチック基板、

Figure 2006039331
(3) 前記2つ以上のエポキシ基を有する化合物(a)が下記化学式(2)で示される脂環式エポキシ樹脂である(1)の表示素子用プラスチック基板、
Figure 2006039331
(4) カチオン硬化系触媒(b)で硬化した(1)〜(3)いずれかの表示素子用プラスチック基板、
(5) 前記カチオン系硬化触媒(b)が、加熱によりカチオン重合を開始させる物質を放出する開始剤であり、芳香族スルホニウム塩、芳香族ヨードニウム塩、アルミニウムキレートから選ばれた1種以上である(1)〜(4)の表示素子基板用エポキシ樹脂組成物

(6) ガラス転移温度が200℃以上であり、かつ波長400nm以上における光線透過率が80%以上であるである(1)〜(5)いずれかの表示素子用プラスチック基板、である。 That is, the present invention provides (1) a plastic substrate for a display element, which is a compound (a) having two or more epoxy groups, and contains an epoxy resin having a purity of 85% or more determined from the oxirane oxygen concentration as a constituent component,
(2) The plastic substrate for a display element according to (1), wherein the compound (a) having two or more epoxy groups is an alicyclic epoxy resin represented by the following chemical formula (1):
Figure 2006039331
(3) The plastic substrate for a display element according to (1), wherein the compound (a) having two or more epoxy groups is an alicyclic epoxy resin represented by the following chemical formula (2):
Figure 2006039331
(4) The plastic substrate for a display element according to any one of (1) to (3) cured with a cationic curing catalyst (b),
(5) The cationic curing catalyst (b) is an initiator that releases a substance that initiates cationic polymerization by heating, and is at least one selected from aromatic sulfonium salts, aromatic iodonium salts, and aluminum chelates. (1) to (4) epoxy resin composition for display element substrate,
(6) The plastic substrate for a display element according to any one of (1) to (5), wherein the glass transition temperature is 200 ° C. or higher and the light transmittance at a wavelength of 400 nm or higher is 80% or higher.

本発明の表示素子用プラスチック基板は耐熱性、及び透明性に優れ、液晶表示素子用プラスチック基板、カラーフィルター用基板、有機EL用基板、タッチパネル、電子ペーパーなどに好適に利用できる。   The plastic substrate for display element of the present invention is excellent in heat resistance and transparency, and can be suitably used for a liquid crystal display element plastic substrate, a color filter substrate, an organic EL substrate, a touch panel, electronic paper, and the like.

以下、本発明を詳細に説明する。
本発明に用いられるエポキシ樹脂は、2つ以上のエポキシ基を有する化合物(a)であって、オキシラン酸素濃度から求めた純度が85%以上である。好ましくは、90%以上、より好ましくは92%以上、最も好ましくは95%以上である。ここで、オキシラン酸素濃度から求めた純度とは、(オキシラン酸素濃度の測定値)/(構造式中のオキシラン酸素の割合)×100 で求めることができる。また、オキシラン酸素濃度は、ASTM−1652に従って測定できる。本発明者らは、オキシラン酸素濃度から求めた純度が85%以下のエポキシ樹脂を用いて表示素子用プラスチック基板を作成すると、耐熱性や耐薬品性が劣り、好ましくないことを見出した。
前記2つ以上のエポキシ基を有する化合物(a)の好ましい例としては、特に限定されないが、表示素子用プラスチック基板に適した耐熱性と透明性を有することから脂環式エポキシ樹脂が好ましい。中でも一般式(1)で表される脂環式エポキシ樹脂、一般式(2)で表される水添ビフェニル型脂環式エポキシ樹脂がより好ましく、一般式(1)で表される脂環式エポキシ樹脂の中では、Xが−C(CH3)2−である2,2−ビス(3’,4’
−エポキシシクロヘキシル)プロパンがさらに好ましい。
Hereinafter, the present invention will be described in detail.
The epoxy resin used in the present invention is a compound (a) having two or more epoxy groups, and the purity determined from the oxirane oxygen concentration is 85% or more. Preferably, it is 90% or more, more preferably 92% or more, and most preferably 95% or more. Here, the purity obtained from the oxirane oxygen concentration can be obtained by (measured value of oxirane oxygen concentration) / (ratio of oxirane oxygen in the structural formula) × 100. The oxirane oxygen concentration can be measured according to ASTM-1652. The present inventors have found that when a plastic substrate for a display element is prepared using an epoxy resin having a purity of 85% or less determined from the oxirane oxygen concentration, the heat resistance and chemical resistance are inferior, which is not preferable.
A preferable example of the compound (a) having two or more epoxy groups is not particularly limited, but an alicyclic epoxy resin is preferable because it has heat resistance and transparency suitable for a plastic substrate for display elements. Among them, the alicyclic epoxy resin represented by the general formula (1) and the hydrogenated biphenyl type alicyclic epoxy resin represented by the general formula (2) are more preferable, and the alicyclic represented by the general formula (1). Among epoxy resins, 2,2-bis (3 ′, 4 ′) in which X is —C (CH 3 ) 2
-Epoxycyclohexyl) propane is more preferred.

Figure 2006039331
Figure 2006039331

Figure 2006039331
Figure 2006039331

本発明で用いられるカチオン系硬化触媒(b)としては、加熱によりカチオン重合を開始させる物質を放出する開始剤や活性エネルギー線によってカチオン重合を開始させる物質を放出させる開始剤などがあげられるが、耐熱性が高い硬化物が得られることから加熱によりカチオン重合を開始する物質を放出する開始剤、すなわち熱カチオン系硬化触媒が好ましい。   Examples of the cationic curing catalyst (b) used in the present invention include an initiator that releases a substance that initiates cationic polymerization by heating, an initiator that releases a substance that initiates cationic polymerization by active energy rays, and the like. Since a cured product having high heat resistance is obtained, an initiator that releases a substance that initiates cationic polymerization by heating, that is, a thermal cationic curing catalyst is preferable.

好ましい熱カチオン硬化触媒としては、芳香族スルホニウム塩、芳香族ヨードニウム塩、アルミニウムキレートなどがある。具体的な例としては、芳香族スルホニウム塩としては三新化学工業製のSI−60L、SI−80L、SI−100L、旭電化工業製のCP−66やCP−77などがあり、アルミニウムキレートとしては、ダイセル化学工業製DAICAT EX−1などがあげられる。   Preferred thermal cation curing catalysts include aromatic sulfonium salts, aromatic iodonium salts, aluminum chelates and the like. Specific examples of the aromatic sulfonium salt include SI-60L, SI-80L, SI-100L manufactured by Sanshin Chemical Industry, CP-66 and CP-77 manufactured by Asahi Denka Kogyo Co., Ltd. Is Daicel Chemical Industries' DAICAT EX-1.

本発明の表示素子用プラスチック基板を液晶表示素子用基板、カラーフィルター用基板、有機EL表示素子用プラスチック基板、太陽電池基板、タッチパネル用基板、電子ペーパー用基板等として用いる場合は、基板の厚さが50〜2000μmであることが好ましく、ガラス転移温度が200℃以上であり、かつ波長400nmの光線透過率が80%以上であることが好ましい。基板の厚さがこの範囲内にあれば、平坦性に優れ、ガラス基板と比較して、基板の軽量化を図ることができる。ガラス転移温度は、より好ましくは220℃以上、最も好ましくは250℃以上である。ガラス転移温度が200℃以下であると高温プロセスにおいて、高温での基板の強度や弾性率が低下し、基板が変形する恐れがある。波長400nmの光線透過率は、より好ましくは85%以上である。波長400nmの光線透過率が80%以下の場合は、着色が認められる傾向にあり好ましくない。   When the plastic substrate for a display element of the present invention is used as a substrate for a liquid crystal display element, a substrate for a color filter, a plastic substrate for an organic EL display element, a solar cell substrate, a touch panel substrate, an electronic paper substrate, etc. The glass transition temperature is preferably 200 ° C. or higher, and the light transmittance at a wavelength of 400 nm is preferably 80% or higher. If the thickness of the substrate is within this range, the flatness is excellent, and the weight of the substrate can be reduced as compared with the glass substrate. The glass transition temperature is more preferably 220 ° C. or higher, and most preferably 250 ° C. or higher. If the glass transition temperature is 200 ° C. or lower, in a high-temperature process, the strength and elastic modulus of the substrate at a high temperature may decrease, and the substrate may be deformed. The light transmittance at a wavelength of 400 nm is more preferably 85% or more. When the light transmittance at a wavelength of 400 nm is 80% or less, coloring tends to be observed, which is not preferable.

以下、本発明の内容を実施例により詳細に説明するが、本発明は、その要旨を越えない限り以下の例に限定されるものではない。   EXAMPLES Hereinafter, although the content of this invention is demonstrated in detail by an Example, this invention is not limited to the following examples, unless the summary is exceeded.

(実施例1)
オキシラン酸素濃度から求めた純度が87%の水添ビフェニル型脂環式エポキシ樹脂(E−BP)100重量部に芳香族スルホニウム系熱カチオン触媒(三新化学工業製、SI−100L)1重量部を溶融混合し、80℃/2h、200℃/2h硬化し厚さ300μmのシートを得た。
(実施例2)
オキシラン酸素濃度から求めた純度が95%の2,2−ビス(3’,4’−エポキシシクロヘキシル)プロパン(E−DOA)100重量部に芳香族スルホニウム系熱カチオン触媒(三新化学工業製、SI−100L)1重量部を溶融混合し、80℃/2h、250℃/2h硬化し厚さ300μmのシートを得た。
(実施例3)
オキシラン酸素濃度から求めた純度が98%の2,2−ビス(3’,4’−エポキシシクロヘキシル)プロパン(E−DOA)100重量部に芳香族スルホニウム系熱カチオン触媒(三新化学工業製、SI−100L)1重量部を溶融混合し、80℃/2h、250℃/2h硬化し厚さ300μmのシートを得た。
Example 1
100 parts by weight of hydrogenated biphenyl type alicyclic epoxy resin (E-BP) having a purity determined from oxirane oxygen concentration of 87% and 1 part by weight of an aromatic sulfonium-based thermal cation catalyst (SI-100L, manufactured by Sanshin Chemical Industry) Were melt-mixed and cured at 80 ° C./2 h and 200 ° C./2 h to obtain a sheet having a thickness of 300 μm.
(Example 2)
An aromatic sulfonium-based thermal cation catalyst (manufactured by Sanshin Chemical Industry Co., Ltd.) was added to 100 parts by weight of 2,2-bis (3 ′, 4′-epoxycyclohexyl) propane (E-DOA) having a purity determined from the oxirane oxygen concentration of 95%. (SI-100L) 1 part by weight was melt-mixed and cured at 80 ° C./2 h and 250 ° C./2 h to obtain a sheet having a thickness of 300 μm.
(Example 3)
An aromatic sulfonium-based thermal cation catalyst (manufactured by Sanshin Chemical Industry Co., Ltd.) was added to 100 parts by weight of 2,2-bis (3 ′, 4′-epoxycyclohexyl) propane (E-DOA) having a purity determined from oxirane oxygen concentration of 98%. (SI-100L) 1 part by weight was melt-mixed and cured at 80 ° C./2 h and 250 ° C./2 h to obtain a sheet having a thickness of 300 μm.

(比較例1)
オキシラン酸素濃度から求めた純度が80%の2,2−ビス(3’,4’−エポキシシクロヘキシル)プロパン(E−DOA)100重量部に芳香族スルホニウム系熱カチオン触媒(三新化学工業製、SI−100L)1重量部を溶融混合し、80℃/2h、250℃/2h硬化し厚さ300μmのシートを得た。
以上のようにして作製した光学シートについて、下記に示す評価方法により、各種特性を測定した。
(Comparative Example 1)
An aromatic sulfonium-based thermal cation catalyst (manufactured by Sanshin Chemical Industry Co., Ltd.) was added to 100 parts by weight of 2,2-bis (3 ′, 4′-epoxycyclohexyl) propane (E-DOA) having a purity determined from the oxirane oxygen concentration of 80%. (SI-100L) 1 part by weight was melt-mixed and cured at 80 ° C./2 h and 250 ° C./2 h to obtain a sheet having a thickness of 300 μm.
About the optical sheet produced as mentioned above, various characteristics were measured by the evaluation method shown below.

実施例、比較例の配合及び結果を表1、表2にそれぞれ示す。
a)耐熱性(Tg)
セイコー電子(株)製DMS―210型粘弾性測定装置で測定し、1Hzでのtanδの最大値をガラス転移温度(Tg)とした。
b)光線透過率
分光光度計U3200(島津製作所製)で400nm及び550nmの光線透過率を測定した。
The formulations and results of Examples and Comparative Examples are shown in Tables 1 and 2, respectively.
a) Heat resistance (Tg)
Measured with a DMS-210 viscoelasticity measuring device manufactured by Seiko Electronics Co., Ltd., and the maximum value of tan δ at 1 Hz was defined as the glass transition temperature (Tg).
b) Light transmittance The light transmittance at 400 nm and 550 nm was measured with a spectrophotometer U3200 (manufactured by Shimadzu Corporation).

Figure 2006039331
Figure 2006039331

オキシラン酸素濃度から求めた純度が85%以上のエポキシ樹脂からなる実施例1、2および3の表示素子用プラスチック基板はガラス転移温度が250℃以上でかつ光線透過率も85%で以上であり、耐熱性、透明性ともに優れていた。一方、純度が80%の比較例−1ではガラス転移温度が200℃以下であり、耐熱性が実施例に比較して劣っていた。   The plastic substrates for display elements of Examples 1, 2, and 3 comprising an epoxy resin having a purity determined from the oxirane oxygen concentration of 85% or higher have a glass transition temperature of 250 ° C. or higher and a light transmittance of 85% or higher, Excellent heat resistance and transparency. On the other hand, in Comparative Example-1 having a purity of 80%, the glass transition temperature was 200 ° C. or lower, and the heat resistance was inferior to that of the Examples.

本発明のエポキシ樹脂組成物は液晶表示素子用プラスチック基板、カラーフィルター用基板、有機EL表示素子用プラスチック基板、タッチパネル、電子ペーパー等に好適に利用できる。   The epoxy resin composition of the present invention can be suitably used for a liquid crystal display element plastic substrate, a color filter substrate, an organic EL display element plastic substrate, a touch panel, electronic paper, and the like.

Claims (6)

2つ以上のエポキシ基を有する化合物(a)であって、オキシラン酸素濃度から求めた純度が85%以上であるエポキシ樹脂を構成成分として含む表示素子用プラスチック基板。 A plastic substrate for a display element, comprising a compound (a) having two or more epoxy groups and having an epoxy resin having a purity of 85% or more determined from an oxirane oxygen concentration as a constituent component. 前記2つ以上のエポキシ基を有する化合物(a)が下記化学式(1)で示される脂環式エ
ポキシ樹脂である請求項1記載の表示素子用プラスチック基板。
Figure 2006039331
The plastic substrate for a display element according to claim 1, wherein the compound (a) having two or more epoxy groups is an alicyclic epoxy resin represented by the following chemical formula (1).
Figure 2006039331
前記2つ以上のエポキシ基を有する化合物(a)が下記化学式(2)で示される脂環式エポキシ樹脂である請求項1記載の表示素子用プラスチック基板。
Figure 2006039331
The plastic substrate for a display element according to claim 1, wherein the compound (a) having two or more epoxy groups is an alicyclic epoxy resin represented by the following chemical formula (2).
Figure 2006039331
カチオン硬化系触媒(b)で硬化した請求項1〜3いずれか記載の表示素子用プラスチック基板。 The plastic substrate for display elements according to any one of claims 1 to 3, which is cured with a cationic curing catalyst (b). 前記カチオン系硬化触媒(b)が、活性エネルギー線及び/又は加熱によりカチオン重合を開始させる物質を放出する開始剤であり、芳香族スルホニウム塩、芳香族ヨードニウム塩、アルミニウムキレートから選ばれた1種以上である請求項1〜4いずれか記載の表示
素子用プラスチック基板。
The cationic curing catalyst (b) is an initiator that releases a substance that initiates cationic polymerization by active energy rays and / or heating, and is selected from aromatic sulfonium salts, aromatic iodonium salts, and aluminum chelates. It is the above, The plastic substrate for display elements in any one of Claims 1-4.
ガラス転移温度が200℃以上であり、かつ波長400nmにおける光線透過率が80%以上であるである請求項1〜5いずれか記載の表示素子用プラスチック基板 The glass substrate has a glass transition temperature of 200 ° C. or higher, and has a light transmittance of 80% or higher at a wavelength of 400 nm.
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* Cited by examiner, † Cited by third party
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JP2001004985A (en) * 1999-06-21 2001-01-12 Nitto Denko Corp Cell substrate, liquid crystal cell, liquid crystal display device and method for forming electrode
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JP2007238778A (en) * 2006-03-09 2007-09-20 Sumitomo Bakelite Co Ltd Transparent composite sheet

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