TWI776960B - Polyimide resin, polyimide varnish and polyimide film - Google Patents

Polyimide resin, polyimide varnish and polyimide film Download PDF

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TWI776960B
TWI776960B TW107133712A TW107133712A TWI776960B TW I776960 B TWI776960 B TW I776960B TW 107133712 A TW107133712 A TW 107133712A TW 107133712 A TW107133712 A TW 107133712A TW I776960 B TWI776960 B TW I776960B
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polyimide
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polyimide resin
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TW201922848A (en
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安孫子洋平
村山智壽
岡田佳奈
關口慎司
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日商三菱瓦斯化學股份有限公司
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    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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Abstract

This invention provides a polyimide resin comprising a constituting unit A derived from a tetracarboxylic acid dianhydride and a constituting unit B derived from a diamine, wherein the constituting unit A contains a constituting unit (A-1) derived from a compound represented by the following formula (a-1) and a constituting unit (A-2) derived from a compound represented by the following formula (a-2), and the constituting unit B contains a constituting unit (B-1) derived from a compound represented by the following formula (b-1).

Description

聚醯亞胺樹脂、聚醯亞胺清漆及聚醯亞胺薄膜Polyimide resin, polyimide varnish and polyimide film

本發明關於聚醯亞胺樹脂、聚醯亞胺清漆及聚醯亞胺薄膜。The present invention relates to polyimide resins, polyimide varnishes and polyimide films.

近年來伴隨高度資訊化社會的到來,於光纖、光波導等光通訊領域、及液晶配向膜、彩色濾光片等顯示裝置領域,要求兼具耐熱性與無色透明性的材料。 在顯示裝置領域中,為了器件的輕量化、可撓化,人們探討將器件所使用之玻璃基板替代為輕量化、可撓化的塑膠基板。在如從顯示元件發出的光通過塑膠基板並射出的情況,對於塑膠基板係要求無色透明性,進一步,光通過相位差薄膜、偏光板的情況(例如,液晶顯示器、觸控面板等),則除要求無色透明性外,亦要求光學等向性高。In recent years, with the advent of a highly information-based society, materials with both heat resistance and colorless transparency are required in the field of optical communication such as optical fibers and optical waveguides, and in the field of display devices such as liquid crystal alignment films and color filters. In the field of display devices, in order to reduce the weight and flexibility of the device, it is discussed to replace the glass substrate used in the device with a lightweight and flexible plastic substrate. In the case where the light emitted from the display element passes through the plastic substrate and is emitted, the plastic substrate is required to be colorless and transparent. Further, in the case where the light passes through the retardation film and the polarizing plate (for example, liquid crystal display, touch panel, etc.), then In addition to the requirement of colorless transparency, high optical isotropy is also required.

作為可滿足如上述之要求的塑膠材料,聚醯亞胺樹脂的開發正進行中。例如,專利文獻1中,就透明性、耐熱性及光學等向性良好的聚醯亞胺樹脂而言,揭示了使用1,2,4,5-環己烷四羧酸二酐作為四羧酸成分,並使用9,9-雙(3-甲基-4-胺基苯基)茀及4,4’-二胺基二苯醚作為二胺成分而合成的聚醯亞胺樹脂等。The development of polyimide resins is in progress as a plastic material that can meet the above-mentioned requirements. For example, Patent Document 1 discloses the use of 1,2,4,5-cyclohexanetetracarboxylic dianhydride as a tetracarboxylic acid as a polyimide resin having excellent transparency, heat resistance, and optical isotropy. acid component, and a polyimide resin or the like synthesized using 9,9-bis(3-methyl-4-aminophenyl)perylene and 4,4'-diaminodiphenyl ether as a diamine component.

又,近年來在微電子領域中,就將疊層有樹脂薄膜之支持體中的該支持體與該樹脂薄膜予以剝離的方法而言,稱為雷射剝離(LLO)的雷射剝離加工受到注目。故,為了使聚醯亞胺薄膜能對應於雷射剝離加工,對於聚醯亞胺薄膜亦要求雷射剝離性。為了能對應於利用波長308nm之XeCl準分子雷射所為之剝離加工,就聚醯亞胺薄膜而言要求吸收波長308nm之光的特性優異(亦即,於波長308 nm之光線透射率小)。 [先前技術文獻] [專利文獻]In addition, in the field of microelectronics in recent years, a laser lift-off process called laser lift-off (LLO) has been widely used as a method of peeling off the resin film-laminated support from the resin film. Attention. Therefore, in order to make the polyimide film compatible with the laser peeling process, the laser peelability is also required for the polyimide film. The polyimide film is required to be excellent in absorbing light at a wavelength of 308 nm (that is, a low transmittance of light at a wavelength of 308 nm) in order to be able to cope with the lift-off processing by the XeCl excimer laser at a wavelength of 308 nm. [Prior Art Literature] [Patent Literature]

[專利文獻1]日本專利第6010533號公報[Patent Document 1] Japanese Patent No. 6010533

[發明所欲解決之課題][The problem to be solved by the invention]

本發明係鑒於上述狀況而成,其課題在於提供無色透明性、光學等向性、及雷射剝離性優異的聚醯亞胺樹脂。 [解決課題之手段]The present invention is made in view of the above-mentioned circumstances, and an object of the present invention is to provide a polyimide resin excellent in colorless transparency, optical isotropy, and laser releasability. [Means of Solving Problems]

本案發明人等發現含有特定構成單元之組合的聚醯亞胺樹脂可解決上述課題,而完成了發明。The inventors of the present invention found that a polyimide resin containing a combination of specific structural units can solve the above-mentioned problems, and completed the invention.

亦即,本發明係關於下列的[1]~[8]。 [1] 一種聚醯亞胺樹脂,含有來自四羧酸二酐之構成單元A、及來自二胺之構成單元B; 構成單元A含有來自下式(a-1)表示之化合物之構成單元(A-1)、及來自下式(a-2)表示之化合物之構成單元(A-2); 構成單元B含有來自下式(b-1)表示之化合物之構成單元(B-1)。That is, the present invention relates to the following [1] to [8]. [1] A polyimide resin comprising a structural unit A derived from tetracarboxylic dianhydride and a structural unit B derived from a diamine; The structural unit A contains the structural unit (A-1) derived from the compound represented by the following formula (a-1), and the structural unit (A-2) derived from the compound represented by the following formula (a-2); The structural unit B contains the structural unit (B-1) derived from the compound represented by the following formula (b-1).

[化1]

Figure 02_image001
[hua 1]
Figure 02_image001

式(b-1)中,R各自獨立地為氫原子、氟原子或甲基。In formula (b-1), R is each independently a hydrogen atom, a fluorine atom or a methyl group.

[2] 如上述[1]之聚醯亞胺樹脂,其中,構成單元A中之構成單元(A-1)的比率為10~90莫耳%,構成單元A中之構成單元(A-2)的比率為10~90莫耳%。 [3] 如上述[1]或[2]之聚醯亞胺樹脂,其中,構成單元B中之構成單元(B-1)的比率為30~100莫耳%。 [4] 如上述[1]~[3]中任一項之聚醯亞胺樹脂,其中,構成單元B更含有構成單元(B-2),該構成單元(B-2)係選自由來自下式(b-2-1)表示之化合物之構成單元(B-2-1)、來自下式(b-2-2)表示之化合物之構成單元(B-2-2)、及來自下式(b-2-3)表示之化合物之構成單元(B-2-3)構成之群組中之至少1種。[2] The polyimide resin according to the above [1], wherein the ratio of the structural unit (A-1) in the structural unit A is 10 to 90 mol %, and the structural unit (A-2) in the structural unit A is 10 to 90 mol %. ) in a ratio of 10 to 90 mol%. [3] The polyimide resin according to the above [1] or [2], wherein the ratio of the structural unit (B-1) in the structural unit B is 30 to 100 mol %. [4] The polyimide resin according to any one of the above [1] to [3], wherein the structural unit B further contains a structural unit (B-2), and the structural unit (B-2) is selected from the group consisting of The structural unit (B-2-1) of the compound represented by the following formula (b-2-1), the structural unit (B-2-2) derived from the compound represented by the following formula (b-2-2), and the At least one of the group consisting of the structural unit (B-2-3) of the compound represented by the formula (b-2-3).

[化2]

Figure 02_image006
[hua 2]
Figure 02_image006

式(b-2-3)中, R1 ~R4 各自獨立地為一價脂肪族基或一價芳香族基, Z1 及Z2 各自獨立地為二價脂肪族基或二價芳香族基, r為正整數。In formula (b-2-3), R 1 to R 4 are each independently a monovalent aliphatic group or a monovalent aromatic group, and Z 1 and Z 2 are each independently a divalent aliphatic group or a divalent aromatic group base, r is a positive integer.

[5] 如上述[4]之聚醯亞胺樹脂,其中,構成單元B中之構成單元(B-1)的比率為30~95莫耳%,構成單元B中之構成單元(B-2)的比率為5~70莫耳%。 [6] 如上述[1]~[5]中任一項之聚醯亞胺樹脂,其中,R表示氫原子。 [7] 一種聚醯亞胺清漆,係將如上述[1]~[6]中任一項之聚醯亞胺樹脂溶解於有機溶劑而成。 [8] 一種聚醯亞胺薄膜,含有如上述[1]~[6]中任一項之聚醯亞胺樹脂。 [發明之效果][5] The polyimide resin according to the above [4], wherein the ratio of the structural unit (B-1) in the structural unit B is 30 to 95 mol %, and the structural unit (B-2) in the structural unit B ) in a ratio of 5 to 70 mol%. [6] The polyimide resin according to any one of the above [1] to [5], wherein R represents a hydrogen atom. [7] A polyimide varnish prepared by dissolving the polyimide resin according to any one of the above [1] to [6] in an organic solvent. [8] A polyimide film comprising the polyimide resin according to any one of the above [1] to [6]. [Effect of invention]

本發明之聚醯亞胺樹脂的無色透明性、光學等向性、及雷射剝離性優異。The polyimide resin of the present invention is excellent in colorless transparency, optical isotropy, and laser releasability.

[聚醯亞胺樹脂] 本發明之聚醯亞胺樹脂係含有來自四羧酸二酐之構成單元A與來自二胺之構成單元B,構成單元A含有來自下式(a-1)表示之化合物之構成單元(A-1)與來自下式(a-2)表示之化合物之構成單元(A-2),構成單元B含有來自下式(b-1)表示之化合物之構成單元(B-1)。[Polyimide resin] The polyimide resin of the present invention contains a structural unit A derived from a tetracarboxylic dianhydride and a structural unit B derived from a diamine, and the structural unit A contains a structural unit (A- 1) With the structural unit (A-2) derived from the compound represented by the following formula (a-2), the structural unit B contains the structural unit (B-1) derived from the compound represented by the following formula (b-1).

[化3]

Figure 02_image001
[hua 3]
Figure 02_image001

式(b-1)中,R各自獨立地為氫原子、氟原子或甲基。In formula (b-1), R is each independently a hydrogen atom, a fluorine atom or a methyl group.

<構成單元A> 構成單元A係來自四羧酸二酐之構成單元,含有來自式(a-1)表示之化合物之構成單元(A-1)及來自式(a-2)表示之化合物之構成單元(A-2)。藉由構成單元(A- 1),無色透明性得到改善,藉由構成單元(A-2),耐熱性、光學等向性及雷射剝離性得到改善。 式(a-1)表示之化合物為1,2,4,5-環己烷四羧酸二酐。 式(a-2)表示之化合物為9,9’-雙(3,4-二羧基苯基)茀二酐。<Construction Unit A> The structural unit A is a structural unit derived from tetracarboxylic dianhydride, and contains a structural unit (A-1) derived from a compound represented by formula (a-1) and a structural unit (A-) derived from a compound represented by formula (a-2). 2). By the structural unit (A-1), colorless transparency is improved, and by the structural unit (A-2), heat resistance, optical isotropy, and laser peelability are improved. The compound represented by formula (a-1) is 1,2,4,5-cyclohexanetetracarboxylic dianhydride. The compound represented by formula (a-2) is 9,9'-bis(3,4-dicarboxyphenyl)indianhydride.

構成單元A中之構成單元(A-1)的比率宜為10~90莫耳%,更佳為25~75莫耳%,尤佳為40~60莫耳%。 構成單元A中之構成單元(A-2)的比率宜為10~90莫耳%,更佳為25~75莫耳%,尤佳為40~60莫耳%。 構成單元A中之構成單元(A-1)與構成單元(A-2)之合計的含有比率宜為20莫耳%以上,更佳為50莫耳%以上,尤佳為80莫耳%以上。構成單元(A-1)與構成單元(A-2)之合計的含有比率的上限值並無特別限定,亦即,為100莫耳%。構成單元A可僅由構成單元(A-1)與構成單元(A-2)構成。The ratio of the constituent unit (A-1) in the constituent unit A is preferably 10 to 90 mol %, more preferably 25 to 75 mol %, and still more preferably 40 to 60 mol %. The ratio of the constituent unit (A-2) in the constituent unit A is preferably 10-90 mol %, more preferably 25-75 mol %, and still more preferably 40-60 mol %. The content ratio of the total of the structural unit (A-1) and the structural unit (A-2) in the structural unit A is preferably 20 mol % or more, more preferably 50 mol % or more, particularly preferably 80 mol % or more . The upper limit of the content ratio of the total of the structural unit (A-1) and the structural unit (A-2) is not particularly limited, that is, 100 mol %. The structural unit A may be composed of only the structural unit (A-1) and the structural unit (A-2).

構成單元A亦可含有構成單元(A-1)及(A-2)以外的構成單元。形成如此之構成單元的四羧酸二酐並無特別限定,可列舉:均苯四甲酸二酐、3,3’,4,4’-聯苯四羧酸二酐、及4,4’-(六氟異亞丙基)二苯二甲酸酐等芳香族四羧酸二酐(惟,式(a-2)表示之化合物除外);1,2,3,4-環丁烷四羧酸二酐、降莰烷-2-螺-α-環戊酮-α’-螺-2’’-降莰烷-5,5’’,6,6’’-四羧酸二酐等脂環族四羧酸二酐(惟,式(a-1)表示之化合物除外);以及1,2,3,4-丁烷四羧酸二酐等脂肪族四羧酸二酐。 此外,本說明書中,芳香族四羧酸二酐,意指含有1個以上之芳香環的四羧酸二酐;脂環族四羧酸二酐,意指含有1個以上之脂環,且不含芳香環的四羧酸二酐;脂肪族四羧酸二酐,意指不含芳香環亦不含脂環的四羧酸二酐。 構成單元A中任意含有的構成單元(亦即,構成單元(A-1)及(A-2)以外的構成單元)可為1種,亦可為2種以上。The structural unit A may contain structural units other than the structural units (A-1) and (A-2). The tetracarboxylic dianhydride forming such a structural unit is not particularly limited, and examples thereof include pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, and 4,4'- Aromatic tetracarboxylic dianhydrides such as (hexafluoroisopropylidene)diphthalic anhydride (except compounds represented by formula (a-2)); 1,2,3,4-cyclobutanetetracarboxylic acid Alicyclic dianhydride, norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, etc. tetracarboxylic dianhydrides (except compounds represented by formula (a-1)); and aliphatic tetracarboxylic dianhydrides such as 1,2,3,4-butane tetracarboxylic dianhydride. In addition, in this specification, aromatic tetracarboxylic dianhydride means tetracarboxylic dianhydride containing one or more aromatic rings; alicyclic tetracarboxylic dianhydride means containing one or more alicyclic rings, and Tetracarboxylic dianhydride without aromatic ring; Aliphatic tetracarboxylic dianhydride means tetracarboxylic dianhydride without aromatic ring and alicyclic. The structural unit (that is, structural unit other than structural unit (A-1) and (A-2)) arbitrarily contained in structural unit A may be one type or two or more types.

<構成單元B> 構成單元B係來自二胺之構成單元,含有來自式(b-1)表示之化合物之構成單元(B-1)。藉由構成單元(B-1),耐熱性、光學等向性及雷射剝離性得到改善。<Construction unit B> The structural unit B is a structural unit derived from a diamine, and contains a structural unit (B-1) derived from the compound represented by the formula (b-1). Heat resistance, optical isotropy, and laser peelability are improved by the structural unit (B-1).

式(b-1)中,R各自獨立地選自於由氫原子、氟原子、及甲基構成之群組,宜為氫原子。式(b-1)表示之化合物可列舉:9,9-雙(4-胺基苯基)茀、9,9-雙(3-氟-4-胺基苯基)茀、及9,9-雙(3-甲基-4-胺基苯基)茀等,宜為9,9-雙(4-胺基苯基)茀。In formula (b-1), each R is independently selected from the group consisting of a hydrogen atom, a fluorine atom, and a methyl group, and is preferably a hydrogen atom. The compounds represented by the formula (b-1) include 9,9-bis(4-aminophenyl) fluoride, 9,9-bis(3-fluoro-4-aminophenyl) fluoride, and 9,9 -Bis(3-methyl-4-aminophenyl) fluoride, etc., preferably 9,9-bis(4-aminophenyl) fluoride.

構成單元B中之構成單元(B-1)的比率宜為30~100莫耳%,更佳為30~95莫耳%,尤佳為40~90莫耳%。構成單元B可僅由構成單元(B-1)構成。The ratio of the constituent unit (B-1) in the constituent unit B is preferably 30 to 100 mol %, more preferably 30 to 95 mol %, and still more preferably 40 to 90 mol %. The structural unit B may be constituted by only the structural unit (B-1).

構成單元B亦可含有構成單元(B-1)以外的構成單元,宜更含有係選自由來自下式(b-2-1)表示之化合物之構成單元(B-2-1)、來自下式(b-2-2)表示之化合物之構成單元(B-2-2)、及來自下式(b-2-3)表示之化合物之構成單元(B-2-3)構成之群組中之至少1種的構成單元(B-2)。The structural unit B may contain a structural unit other than the structural unit (B-1), and it is preferable to further contain a structural unit (B-2-1) selected from the compound represented by the following formula (b-2-1), from the following The group consisting of the structural unit (B-2-2) of the compound represented by the formula (b-2-2) and the structural unit (B-2-3) derived from the compound represented by the following formula (b-2-3) At least one of the structural units (B-2).

[化4]

Figure 02_image009
[hua 4]
Figure 02_image009

式(b-2-3)中, R1 ~R4 各自獨立地為一價脂肪族基或一價芳香族基, Z1 及Z2 各自獨立地為二價脂肪族基或二價芳香族基, r為正整數。In formula (b-2-3), R 1 to R 4 are each independently a monovalent aliphatic group or a monovalent aromatic group, and Z 1 and Z 2 are each independently a divalent aliphatic group or a divalent aromatic group base, r is a positive integer.

式(b-2-1)表示之化合物為雙(4-胺基苯基)碸。 式(b-2-2)表示之化合物為2,2’-雙(三氟甲基)聯苯胺。 式(b-2-3)中之R1 、R2 、R3 及R4 各自獨立地表示一價脂肪族基或一價芳香族基, 該等也可經氟原子取代。一價脂肪族基可列舉一價飽和烴基或一價不飽和烴基。 一價飽和烴基可列舉碳數1~22之烷基,例如可例示甲基、乙基、丙基。一價不飽和烴基可列舉碳數2~22之烯基,例如可例示乙烯基、丙烯基。一價芳香族基可例示碳數6~24之芳基、芳烷基等。就R1 、R2 、R3 及R4 而言,尤其宜為甲基或苯基。 又,Z1 及Z2 各自獨立地表示二價脂肪族基或二價芳香族基,該等基也可經氟原子取代。二價脂肪族基可列舉二價飽和烴基或二價不飽和烴基。二價飽和烴基可列舉碳數1~22之伸烷基,例如可例示亞甲基、伸乙基、伸丙基。二價不飽和烴基可列舉碳數2~22之不飽和烴基,例如可例示伸乙烯基、伸丙烯基、末端具有不飽和雙鍵之伸烷基。二價芳香族基可例示碳數6~24之伸苯基、經烷基取代之伸苯基、伸芳烷基(aralkylene)等。就Z1 及Z2 而言,尤其宜為伸丙基、伸苯基、伸芳烷基。 又,r表示正整數,宜為10~10,000之整數。 就式(b-2-3)表示之化合物之市售品而言,能取得者可列舉信越化學工業(股)公司製的「X-22-9409」、「X-22-1660B」、「X-22-161AS」、「X-22-161A」、「X-22-161B」等。The compound represented by the formula (b-2-1) is bis(4-aminophenyl) benzene. The compound represented by formula (b-2-2) is 2,2'-bis(trifluoromethyl)benzidine. R 1 , R 2 , R 3 and R 4 in formula (b-2-3) each independently represent a monovalent aliphatic group or a monovalent aromatic group, which may also be substituted with a fluorine atom. The monovalent aliphatic group includes a monovalent saturated hydrocarbon group or a monovalent unsaturated hydrocarbon group. The monovalent saturated hydrocarbon group includes an alkyl group having 1 to 22 carbon atoms, for example, a methyl group, an ethyl group, and a propyl group. The monovalent unsaturated hydrocarbon group includes an alkenyl group having 2 to 22 carbon atoms, and examples thereof include a vinyl group and a propenyl group. The monovalent aromatic group may be exemplified by an aryl group having 6 to 24 carbon atoms, an aralkyl group, and the like. For R 1 , R 2 , R 3 and R 4 , methyl or phenyl are especially preferred. Moreover, Z 1 and Z 2 each independently represent a divalent aliphatic group or a divalent aromatic group, and these groups may be substituted with a fluorine atom. The divalent aliphatic group includes a divalent saturated hydrocarbon group or a divalent unsaturated hydrocarbon group. The divalent saturated hydrocarbon group includes an alkylene group having 1 to 22 carbon atoms, for example, a methylene group, an ethylidene group, and a propylidene group. Examples of the divalent unsaturated hydrocarbon group include unsaturated hydrocarbon groups having 2 to 22 carbon atoms, and examples thereof include vinylidene groups, propenylene groups, and alkylene groups having unsaturated double bonds at the terminals. Examples of the divalent aromatic group include a phenylene group having 6 to 24 carbon atoms, a phenylene group substituted with an alkyl group, an aralkylene group, and the like. As for Z 1 and Z 2 , propylidene, phenylene and aralkylene are especially suitable. In addition, r represents a positive integer, and is preferably an integer of 10 to 10,000. Commercial products of the compound represented by the formula (b-2-3) include "X-22-9409", "X-22-1660B", "X-22-9409", "X-22-1660B", "Shin-Etsu Chemical Industry Co., Ltd."X-22-161AS","X-22-161A","X-22-161B", etc.

構成單元(B-2-1)就改善無色透明性的觀點係較佳。構成單元(B-2-2)就改善無色透明性的觀點及賦予低吸水性的觀點係較佳。構成單元(B-2-3)就賦予光學等向性及低吸水性的觀點係較佳。此外,低吸水性之聚醯亞胺樹脂的吸濕尺寸穩定性良好。The structural unit (B-2-1) is preferable from the viewpoint of improving colorless transparency. The structural unit (B-2-2) is preferable from the viewpoint of improving colorless transparency and from the viewpoint of imparting low water absorption. The structural unit (B-2-3) is preferable from the viewpoint of imparting optical isotropy and low water absorption. In addition, the low water absorption polyimide resin has good hygroscopic dimensional stability.

構成單元B含有構成單元(B-1)及構成單元(B-2)時,構成單元B中之構成單元(B-1)的比率宜為30~95莫耳%,更佳為40~90莫耳%,構成單元B中之構成單元(B- 2)的比率宜為5~70莫耳%,更佳為10~60莫耳%。 構成單元B中之構成單元(B-1)與構成單元(B-2)之合計的含有比率宜為35莫耳%以上,更佳為50莫耳%以上。構成單元(B-1)與構成單元(B-2)之合計的含有比率的上限值並無特別限定,亦即,為100莫耳%。構成單元B可僅由構成單元(B- 1)與構成單元(B-2)構成。When the structural unit B contains the structural unit (B-1) and the structural unit (B-2), the ratio of the structural unit (B-1) in the structural unit B is preferably 30~95 mol%, more preferably 40~90 mol% The ratio of the constituent unit (B-2) in the constituent unit B is preferably 5-70 mol %, more preferably 10-60 mol %. The content ratio of the total of the structural unit (B-1) and the structural unit (B-2) in the structural unit B is preferably 35 mol % or more, more preferably 50 mol % or more. The upper limit of the content ratio of the total of the structural unit (B-1) and the structural unit (B-2) is not particularly limited, that is, 100 mol %. The structural unit B may be composed of only the structural unit (B-1) and the structural unit (B-2).

構成單元(B-2)可僅為構成單元(B-2-1),亦可僅為構成單元(B-2-2),也可僅為構成單元(B-2-3)。 又,構成單元(B-2)可為構成單元(B-2-1)與構成單元(B-2-2)之組合,亦可為構成單元(B-2-2)與構成單元(B-2-3)之組合,也可為構成單元(B-2-1)與構成單元(B-2-3)之組合。 又,構成單元(B-2)也可為構成單元(B-2-1)與構成單元(B-2-2)與構成單元(B- 2-3)之組合。The structural unit (B-2) may be only the structural unit (B-2-1), only the structural unit (B-2-2), or only the structural unit (B-2-3). In addition, the structural unit (B-2) may be a combination of the structural unit (B-2-1) and the structural unit (B-2-2), or may be the structural unit (B-2-2) and the structural unit (B-2-2). The combination of -2-3) may be a combination of the structural unit (B-2-1) and the structural unit (B-2-3). Moreover, the structural unit (B-2) may be a combination of the structural unit (B-2-1), the structural unit (B-2-2), and the structural unit (B-2-3).

構成單元B中任意含有的構成單元(亦即,構成單元(B-1)以外的構成單元)不限定於上述構成單元(B-2)。形成如此之任意構成單元的二胺並無特別限定,可列舉:1,4-苯二胺、對亞二甲苯二胺、3,5-二胺基苯甲酸、2,2’-二甲基聯苯-4,4’-二胺、4,4’-二胺基二苯醚、4,4’-二胺基二苯基甲烷、2,2-雙(4-胺基苯基)六氟丙烷、4,4’-二胺基苯醯替苯胺、1-(4-胺基苯基)-2,3-二氫-1,3,3-三甲基-1H-茚-5-胺、α,α’-雙(4-胺基苯基)-1,4-二異丙苯、N,N’-雙(4-胺基苯基)對苯二甲醯胺、4,4’-雙(4-胺基苯氧基)聯苯、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、及2,2-雙(4-(4-胺基苯氧基)苯基)六氟丙烷等芳香族二胺(惟,式(b-1)表示之化合物、式(b-2-1)表示之化合物、 式(b-2-2)表示之化合物及式(b-2-3)表示之化合物除外);1,3-雙(胺基甲基)環己烷及1,4-雙(胺基甲基)環己烷等脂環族二胺;以及乙二胺及六亞甲基二胺等脂肪族二胺(惟,式(b-2-3)表示之化合物除外)。 此外,本說明書中,芳香族二胺,意指含有1個以上之芳香環的二胺;脂環族二胺,意指含有1個以上之脂環,且不含芳香環的二胺;脂肪族二胺,意指不含芳香環亦不含脂環的二胺。 構成單元B中任意含有的構成單元(亦即,(B-1)以外的構成單元)可為1種,亦可為2種以上。The structural unit arbitrarily included in the structural unit B (that is, the structural unit other than the structural unit (B-1)) is not limited to the above-mentioned structural unit (B-2). The diamine that forms such an arbitrary structural unit is not particularly limited, and examples thereof include 1,4-phenylenediamine, p-xylylenediamine, 3,5-diaminobenzoic acid, and 2,2'-dimethyl Biphenyl-4,4'-diamine, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane, 2,2-bis(4-aminophenyl)hexa Fluoropropane, 4,4'-diaminobenzidine, 1-(4-aminophenyl)-2,3-dihydro-1,3,3-trimethyl-1H-indene-5- Amine, α,α'-bis(4-aminophenyl)-1,4-dicumene, N,N'-bis(4-aminophenyl)terephthalamide, 4,4 '-Bis(4-aminophenoxy)biphenyl, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, and 2,2-bis(4-(4-amine) Aromatic diamines such as phenylphenoxy) phenyl) hexafluoropropane (only, the compound represented by the formula (b-1), the compound represented by the formula (b-2-1), the compound represented by the formula (b-2-2) 1,3-bis(aminomethyl)cyclohexane and 1,4-bis(aminomethyl)cyclohexane and other alicyclic Diamines; and aliphatic diamines such as ethylenediamine and hexamethylenediamine (except for compounds represented by formula (b-2-3)). In addition, in this specification, an aromatic diamine means a diamine containing one or more aromatic rings; an alicyclic diamine means a diamine containing one or more alicyclic rings and no aromatic ring; aliphatic diamines The aliphatic diamine means a diamine containing neither an aromatic ring nor an alicyclic ring. The structural unit (that is, a structural unit other than (B-1)) arbitrarily contained in the structural unit B may be one type or two or more types.

本發明之聚醯亞胺樹脂之數量平均分子量,考量獲得之聚醯亞胺薄膜之機械強度的觀點,宜為5,000~100,000。此外,聚醯亞胺樹脂之數量平均分子量,例如可由利用凝膠過濾層析測定而得之標準聚甲基丙烯酸甲酯(PMMA)換算值求出。The number average molecular weight of the polyimide resin of the present invention is preferably 5,000 to 100,000 in consideration of the mechanical strength of the obtained polyimide film. Moreover, the number average molecular weight of a polyimide resin can be calculated|required from the standard polymethyl methacrylate (PMMA) conversion value measured by gel filtration chromatography, for example.

本發明之聚醯亞胺樹脂,係無色透明性、光學等向性、及雷射剝離性優異者,故可具有如以下之物性值。The polyimide resin of the present invention is excellent in colorless transparency, optical isotropy, and laser releasability, and therefore may have the following physical property values.

本發明之聚醯亞胺樹脂,製成厚度10μm之聚醯亞胺薄膜時全光線透射率宜為85%以上,更佳為86%以上,尤佳為87%以上,特佳88%以上。 本發明之聚醯亞胺樹脂,製成厚度10μm之聚醯亞胺薄膜時黃色指數(YI)宜為3.0以下,更佳為2.4以下,尤佳為2.0以下,特佳為1.8以下。When the polyimide resin of the present invention is made into a polyimide film with a thickness of 10 μm, the total light transmittance is preferably 85% or more, more preferably 86% or more, particularly preferably 87% or more, and particularly preferably 88% or more. When the polyimide resin of the present invention is made into a polyimide film with a thickness of 10 μm, the yellowness index (YI) is preferably 3.0 or less, more preferably 2.4 or less, particularly preferably 2.0 or less, and particularly preferably 1.8 or less.

本發明之聚醯亞胺樹脂,製成厚度10μm之聚醯亞胺薄膜時的厚度相位差(R th)的絕對值宜為100nm以下,更佳為85nm以下,尤佳為60nm以下,特佳為45nm以下。When the polyimide resin of the present invention is made into a polyimide film with a thickness of 10 μm, the absolute value of the thickness retardation (R th) is preferably 100 nm or less, more preferably 85 nm or less, particularly preferably 60 nm or less, particularly preferably 45nm or less.

本發明之聚醯亞胺樹脂,製成厚度10μm之聚醯亞胺薄膜時於波長308nm之光線透射率宜為1.0%以下,更佳為0.8%以下,尤佳為0.5%以下,特佳為0.3%以下。於波長308nm之光線透射率越小,利用波長308nm之XeCl準分子雷射之雷射剝離性越優異。 此外,本發明中之線全光線透射率、黃色指數(YI)、厚度相位差(Rth)、於波長308nm之光線透射率,具體而言可利用實施例記載之方法進行測定。When the polyimide resin of the present invention is made into a polyimide film with a thickness of 10 μm, the light transmittance at a wavelength of 308 nm is preferably 1.0% or less, more preferably 0.8% or less, particularly preferably 0.5% or less, particularly preferably Below 0.3%. The smaller the light transmittance at the wavelength of 308 nm, the better the laser peelability by the XeCl excimer laser at the wavelength of 308 nm. In addition, the total linear light transmittance, yellow index (YI), thickness retardation (Rth), and light transmittance at a wavelength of 308 nm in the present invention can be specifically measured by the methods described in the examples.

又,本發明之一態樣之聚醯亞胺樹脂具有低吸水性。因此,吸水率宜為2.5%以下,更佳為2.0%以下,尤佳為1.5%以下,特佳為1.2%以下。 此外,本發明中之吸水率,具體而言可利用實施例記載之方法進行測定。Moreover, the polyimide resin of one aspect of this invention has low water absorption. Therefore, the water absorption rate is preferably 2.5% or less, more preferably 2.0% or less, particularly preferably 1.5% or less, and particularly preferably 1.2% or less. In addition, the water absorption rate in this invention can be measured specifically by the method described in an Example.

[聚醯亞胺樹脂之製造方法] 本發明之聚醯亞胺樹脂,可藉由使含有提供上述構成單元(A-1)之化合物及提供上述構成單元(A-2)之化合物的四羧酸成分、和含有提供上述構成單元(B-1)之化合物的二胺成分反應而製造。[Manufacturing method of polyimide resin] The polyimide resin of the present invention can be prepared by containing a tetracarboxylic acid component that provides the compound providing the above-mentioned structural unit (A-1) and the compound providing the above-mentioned structural unit (A-2), and contains the above-mentioned structural unit (A-2). It is produced by reacting the diamine component of the compound of B-1).

提供構成單元(A-1)之化合物可列舉式(a-1)表示之化合物,但不限於此,在能形成相同構成單元的範圍內亦可為其衍生物。該衍生物可列舉對應於式(a-1)表示之四羧酸二酐的四羧酸(亦即,1,2,4,5-環己烷四羧酸)、及該四羧酸之烷酯。提供構成單元(A-1)之化合物宜為式(a-1)表示之化合物(亦即,二酐)。 提供構成單元(A-2)之化合物可列舉式(a-2)表示之化合物,但不限於此,在能形成相同構成單元的範圍內亦可為其衍生物。該衍生物可列舉對應於式(a-2)表示之四羧酸二酐的四羧酸及該四羧酸之烷酯。提供構成單元(A-2)之化合物宜為式(a-2)表示之化合物(亦即,二酐)。The compound that provides the structural unit (A-1) includes the compound represented by the formula (a-1), but it is not limited thereto, and a derivative thereof may also be used as long as the same structural unit can be formed. Examples of the derivatives include tetracarboxylic acids (that is, 1,2,4,5-cyclohexanetetracarboxylic acid) corresponding to the tetracarboxylic dianhydride represented by the formula (a-1), and derivatives of the tetracarboxylic acids. Alkyl ester. The compound providing the structural unit (A-1) is preferably a compound represented by the formula (a-1) (ie, dianhydride). The compound that provides the structural unit (A-2) includes the compound represented by the formula (a-2), but it is not limited thereto, and a derivative thereof may also be used within the scope of forming the same structural unit. Examples of the derivatives include tetracarboxylic acids corresponding to the tetracarboxylic dianhydride represented by the formula (a-2), and alkyl esters of the tetracarboxylic acids. The compound providing the structural unit (A-2) is preferably a compound represented by the formula (a-2) (ie, dianhydride).

提供構成單元(B-1)之化合物可列舉式(b-1)表示之化合物,但不限於此,在能形成相同構成單元的範圍內亦可為其衍生物。該衍生物可列舉對應於式(b-1)表示之二胺的二異氰酸酯。提供構成單元(B-1)之化合物宜為式(b-1)表示之化合物(亦即,二胺)。The compound that provides the structural unit (B-1) includes the compound represented by the formula (b-1), but it is not limited thereto, and a derivative thereof may also be used insofar as the same structural unit can be formed. Examples of the derivatives include diisocyanates corresponding to the diamines represented by the formula (b-1). The compound providing the structural unit (B-1) is preferably a compound represented by the formula (b-1) (ie, a diamine).

四羧酸成分宜含有10~90莫耳%之提供構成單元(A-1)之化合物,更佳為含有25~75莫耳%,尤佳為含有40~60莫耳%。 四羧酸成分宜含有10~90莫耳%之提供構成單元(A-2)之化合物,更佳為含有25~75莫耳%,尤佳為含有40~60莫耳%。 四羧酸成分宜按合計含有20莫耳%以上之提供構成單元(A-1)之化合物與提供構成單元(A-2)之化合物,更佳為含有50莫耳%以上,尤佳為含有80%以上。提供構成單元(A-1)之化合物與提供構成單元(A-2)之化合物之合計的含有比率的上限值並無特別限定,亦即,為100莫耳%。四羧酸成分可僅由提供構成單元(A-1)之化合物與提供構成單元(A-2)之化合物構成。The tetracarboxylic acid component preferably contains 10-90 mol % of the compound providing the constituent unit (A-1), more preferably 25-75 mol %, and particularly preferably 40-60 mol %. The tetracarboxylic acid component preferably contains 10-90 mol % of the compound providing the constituent unit (A-2), more preferably 25-75 mol %, particularly preferably 40-60 mol %. The tetracarboxylic acid component preferably contains 20 mol % or more of the compound providing the structural unit (A-1) and the compound providing the structural unit (A-2) in total, more preferably 50 mol % or more, particularly preferably 50 mol % or more. more than 80%. The upper limit of the content ratio of the total of the compound providing the structural unit (A-1) and the compound providing the structural unit (A-2) is not particularly limited, that is, 100 mol %. The tetracarboxylic acid component may consist of only the compound providing the structural unit (A-1) and the compound providing the structural unit (A-2).

四羧酸成分也可含有提供構成單元(A-1)之化合物及提供構成單元(A-2)之化合物以外的化合物,該化合物可列舉:上述芳香族四羧酸二酐、脂環族四羧酸二酐、及脂肪族四羧酸二酐、以及它們的衍生物(四羧酸、四羧酸之烷酯等)。 四羧酸成分中任意含有的化合物(亦即,提供構成單元(A-1)之化合物及提供構成單元(A-2)之化合物以外的化合物)可為1種,亦可為2種以上。The tetracarboxylic acid component may contain compounds other than the compound providing the structural unit (A-1) and the compound providing the structural unit (A-2), and examples of the compound include the above-mentioned aromatic tetracarboxylic dianhydride, alicyclic tetracarboxylic acid Carboxylic dianhydrides, aliphatic tetracarboxylic dianhydrides, and derivatives thereof (tetracarboxylic acids, alkyl esters of tetracarboxylic acids, etc.). The compound (that is, the compound other than the compound which provides a structural unit (A-1) and the compound which provides a structural unit (A-2)) arbitrarily contained in a tetracarboxylic-acid component may be 1 type or 2 or more types.

二胺成分宜含有30~100莫耳%之提供構成單元(B-1)之化合物,更佳為含有30~95莫耳%,尤佳為含有40~90莫耳%。二胺成分可僅由提供構成單元(B-1)之化合物構成。The diamine component preferably contains 30-100 mol % of the compound providing the constituent unit (B-1), more preferably 30-95 mol %, and particularly preferably 40-90 mol %. The diamine component may be composed of only the compound that provides the structural unit (B-1).

二胺成分亦可含有提供構成單元(B-1)之化合物以外的化合物,宜更含有提供構成單元(B-2)之化合物。 提供構成單元(B-2)之化合物可列舉:式(b-2-1)表示之化合物、式(b-2-2)表示之化合物、及式(b-2-3)表示之化合物,但不限於此,在能形成相同構成單元的範圍內亦可為其衍生物。該衍生物可列舉對應於式(b-2-1)~式(b-2-3)表示之二胺的二異氰酸酯。提供構成單元(B-2)之化合物宜為式(b-2-1)~式(b-2-3)表示之化合物(亦即,二胺)。The diamine component may contain a compound other than the compound providing the structural unit (B-1), and it is preferable to further contain the compound providing the structural unit (B-2). The compound that provides the structural unit (B-2) includes the compound represented by the formula (b-2-1), the compound represented by the formula (b-2-2), and the compound represented by the formula (b-2-3), However, it is not limited to this, and derivatives thereof may also be obtained within the scope of forming the same structural unit. Examples of the derivatives include diisocyanates corresponding to diamines represented by formula (b-2-1) to formula (b-2-3). The compound that provides the structural unit (B-2) is preferably a compound (that is, a diamine) represented by the formula (b-2-1) to the formula (b-2-3).

二胺成分含有提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物時,二胺成分宜含有30~95莫耳%之提供構成單元(B-1)之化合物,更佳為含有40~ 90莫耳%,且宜含有5~70莫耳%之提供構成單元(B-2)之化合物,更佳為含有10~60莫耳%。 二胺成分宜按合計含有35莫耳%以上之提供構成單元(B-1)之化合物與提供構成單元(B-2)之化合物,更佳為含有50莫耳%以上。提供構成單元(B-1)之化合物與提供構成單元(B-2)之化合物之合計的含有比率的上限值並無特別限定,亦即,為100莫耳%。二胺成分可僅由提供構成單元(B-1)之化合物與提供構成單元(B-2)之化合物構成。When the diamine component contains the compound providing the structural unit (B-1) and the compound providing the structural unit (B-2), the diamine component preferably contains 30 to 95 mol% of the compound providing the structural unit (B-1), More preferably, it contains 40-90 mol %, and preferably contains 5-70 mol % of the compound providing the constituent unit (B-2), more preferably 10-60 mol %. The diamine component is preferably contained in a total of 35 mol% or more of the compound providing the structural unit (B-1) and the compound providing the structural unit (B-2), more preferably 50 mol% or more. The upper limit of the content ratio of the total of the compound providing the structural unit (B-1) and the compound providing the structural unit (B-2) is not particularly limited, that is, 100 mol %. The diamine component may consist of only the compound providing the structural unit (B-1) and the compound providing the structural unit (B-2).

又,二胺成分中任意含有的化合物(亦即,提供構成單元(B-1)之化合物以外的化合物)並不限定於提供構成單元(B-2)之化合物。如此之任意化合物可列舉:上述芳香族二胺、脂環族二胺、及脂肪族二胺、以及它們的衍生物(二異氰酸酯等)。 二胺成分中任意含有的化合物(亦即,提供構成單元(B-1)之化合物以外的化合物)可為1種,亦可為2種以上。In addition, the compound (that is, a compound other than the compound which provides a structural unit (B-1)) arbitrarily contained in a diamine component is not limited to the compound which provides a structural unit (B-2). Such arbitrary compounds include the above-mentioned aromatic diamines, alicyclic diamines, and aliphatic diamines, and derivatives thereof (diisocyanates, etc.). The compound (that is, the compound other than the compound which provides a structural unit (B-1)) arbitrarily contained in a diamine component may be 1 type, and may be 2 or more types.

本發明中,就聚醯亞胺樹脂之製造所使用之四羧酸成分與二胺成分的進料量比而言,相對於四羧酸成分1莫耳,二胺成分宜為0.9~1.1莫耳。In the present invention, in terms of the feeding amount ratio of the tetracarboxylic acid component and the diamine component used in the production of the polyimide resin, the diamine component is preferably 0.9 to 1.1 mol relative to 1 mol of the tetracarboxylic acid component. Ear.

又,本發明中,聚醯亞胺樹脂之製造除使用前述四羧酸成分及二胺成分外,亦可使用封端劑。封端劑宜為單胺類或二羧酸類。就所導入的封端劑之進料量而言,相對於四羧酸成分1莫耳宜為0.0001~0.1莫耳,為0.001~0.06莫耳特佳。就單胺類封端劑而言,例如推薦:甲胺、乙胺、丙胺、丁胺、苄胺、4-甲基苄胺、4-乙基苄胺、4-十二烷基苄胺、3-甲基苄胺、3-乙基苄胺、苯胺、3-甲基苯胺、4-甲基苯胺等。該等之中,可理想地使用苄胺、苯胺。二羧酸類封端劑宜為二羧酸類,亦可使其一部分形成閉環。例如推薦:苯二甲酸、苯二甲酸酐、4-氯苯二甲酸、四氟苯二甲酸、2,3-二苯甲酮二羧酸、3,4-二苯甲酮二羧酸、環己烷-1,2-二羧酸、環戊烷-1,2-二羧酸、4-環己烯-1,2-二羧酸等。該等之中,可理想地使用苯二甲酸、苯二甲酸酐。Moreover, in this invention, in addition to the said tetracarboxylic-acid component and a diamine component, you may use a terminal blocking agent for manufacture of a polyimide resin. The end-capping agents are preferably monoamines or dicarboxylic acids. The feed amount of the introduced end-capping agent is preferably 0.0001-0.1 mol, preferably 0.001-0.06 mol, relative to 1 mol of the tetracarboxylic acid component. For monoamine end-capping agents, for example, recommended: methylamine, ethylamine, propylamine, butylamine, benzylamine, 4-methylbenzylamine, 4-ethylbenzylamine, 4-dodecylbenzylamine, 3-methylbenzylamine, 3-ethylbenzylamine, aniline, 3-methylaniline, 4-methylaniline, etc. Among these, benzylamine and aniline can be preferably used. The dicarboxylic acid type end-capping agent is preferably a dicarboxylic acid type, and a part thereof may form a closed ring. For example, recommended: phthalic acid, phthalic anhydride, 4-chlorophthalic acid, tetrafluorophthalic acid, 2,3-benzophenone dicarboxylic acid, 3,4-benzophenone dicarboxylic acid, cyclic Hexane-1,2-dicarboxylic acid, cyclopentane-1,2-dicarboxylic acid, 4-cyclohexene-1,2-dicarboxylic acid, etc. Among these, phthalic acid and phthalic anhydride can be preferably used.

使前述四羧酸成分與二胺成分反應的方法並無特別限制,可使用公知的方法。 就具體的反應方法而言,可列舉:(1)將四羧酸成分、二胺成分、及反應溶劑加入至反應器中,在室溫~80℃攪拌0.5~30小時,之後,升溫並進行醯亞胺化反應的方法;(2)將二胺成分及反應溶劑加入至反應器中並使其溶解後,加入四羧酸成分,視需要在室溫~80℃攪拌0.5~30小時,之後,升溫並進行醯亞胺化反應的方法;(3)將四羧酸成分、二胺成分、及反應溶劑加入至反應器中,立即升溫並進行醯亞胺化反應的方法等。The method in particular of making the said tetracarboxylic-acid component and diamine component react is not restrict|limited, A well-known method can be used. Specific reaction methods include: (1) adding a tetracarboxylic acid component, a diamine component, and a reaction solvent to a reactor, stirring at room temperature to 80° C. for 0.5 to 30 hours, and then heating up and performing the reaction. The method for imidization reaction; (2) after adding the diamine component and the reaction solvent into the reactor and making it dissolved, add the tetracarboxylic acid component, and stir at room temperature ~ 80 ° C for 0.5 ~ 30 hours as needed, and then (3) The tetracarboxylic acid component, the diamine component, and the reaction solvent are added to the reactor, the temperature is raised immediately, and the imidization reaction is carried out.

聚醯亞胺樹脂之製造所使用的反應溶劑,只要是不會妨礙醯亞胺化反應,且可溶解生成的聚醯亞胺者即可。例如可列舉非質子性溶劑、酚系溶劑、醚系溶劑、碳酸酯系溶劑等。The reaction solvent used for the production of the polyimide resin may be one that does not interfere with the imidization reaction and can dissolve the produced polyimide. For example, an aprotic solvent, a phenol type solvent, an ether type solvent, a carbonate type solvent, etc. are mentioned.

非質子性溶劑之具體例可列舉:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯烷酮、N-甲基己內醯胺、1,3-二甲基咪唑啶酮、四甲基脲等醯胺系溶劑;γ-丁內酯、γ-戊內酯等內酯系溶劑;六甲基磷酸醯胺、六甲基膦三醯胺等含磷系醯胺系溶劑;二甲基碸、二甲基亞碸、環丁碸等含硫系溶劑;丙酮、環己酮、甲基環己酮等酮系溶劑;甲基吡啶、吡啶等胺系溶劑;乙酸(2-甲氧基-1-甲基乙酯)等酯系溶劑等。Specific examples of the aprotic solvent include N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methylcaprolactamide, 1,3-dimethylimidazolidinone, tetramethylurea and other amide-based solvents; γ-butyrolactone, γ-valerolactone and other lactone-based solvents; hexamethylphosphoric acid amide, hexamethylphosphine Phosphorus-containing amide-based solvents such as amide; sulfur-containing solvents such as dimethyl sulfoxide, dimethyl sulfoxide, and cyclobutane; ketone-based solvents such as acetone, cyclohexanone, and methylcyclohexanone; picoline , amine-based solvents such as pyridine; ester-based solvents such as acetic acid (2-methoxy-1-methylethyl ester), etc.

酚系溶劑之具體例可列舉:苯酚、鄰甲酚、間甲酚、對甲酚、2,3-二甲酚、2,4-二甲酚、2,5-二甲酚、2,6-二甲酚、3,4-二甲酚、3,5-二甲酚等。 醚系溶劑之具體例可列舉:1,2-二甲氧基乙烷、雙(2-甲氧基乙基)醚、1,2-雙(2-甲氧基乙氧基)乙烷、雙[2-(2-甲氧基乙氧基)乙基]醚、四氫呋喃、1,4-二

Figure 107133712-A0304-12-01
烷等。 又,碳酸酯系溶劑的具體例可列舉:碳酸二乙酯、碳酸甲基乙酯、碳酸伸乙酯、碳酸伸丙酯等。 上述反應溶劑之中,宜為醯胺系溶劑或內酯系溶劑。又,上述反應溶劑可單獨使用或將2種以上混合使用。Specific examples of the phenolic solvent include: phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol -Xylenol, 3,4-Xylenol, 3,5-Xylenol, etc. Specific examples of the ether-based solvent include 1,2-dimethoxyethane, bis(2-methoxyethyl)ether, 1,2-bis(2-methoxyethoxy)ethane, Bis[2-(2-methoxyethoxy)ethyl]ether, tetrahydrofuran, 1,4-bis
Figure 107133712-A0304-12-01
alkane etc. Moreover, as a specific example of a carbonate-type solvent, diethyl carbonate, methyl ethyl carbonate, ethylene carbonate, propylene carbonate, etc. are mentioned. Among the above-mentioned reaction solvents, an amide-based solvent or a lactone-based solvent is preferable. Moreover, the said reaction solvent can be used individually or in mixture of 2 or more types.

就醯亞胺化反應,宜使用Dean-Stark裝置等,邊將製造時生成的水除去邊進行反應。藉由進行如此之操作,可使聚合度及醯亞胺化率更為上升。For the imidization reaction, a Dean-Stark apparatus or the like is preferably used, and the reaction is carried out while removing water generated during production. By performing such an operation, the degree of polymerization and the imidization rate can be further increased.

上述醯亞胺化反應中,可使用公知的醯亞胺化觸媒。就醯亞胺化觸媒而言,可列舉鹼觸媒或酸觸媒。 鹼觸媒可列舉:吡啶、喹啉、異喹啉、α-甲基吡啶、β-甲基吡啶、2,4-二甲基吡啶、2,6-二甲基吡啶、三甲胺、三乙胺、三丙胺、三丁胺、三乙二胺、咪唑、N,N-二甲基苯胺、N,N-二乙基苯胺等有機鹼觸媒;氫氧化鉀或氫氧化鈉、碳酸鉀、碳酸鈉、碳酸氫鉀、碳酸氫鈉等無機鹼觸媒。 又,酸觸媒可列舉:巴豆酸、丙烯酸、反式-3-己烯酸、桂皮酸、苯甲酸、甲基苯甲酸、羥基苯甲酸、對苯二甲酸、苯磺酸、對甲苯磺酸、萘磺酸等。上述醯亞胺化觸媒可單獨使用或2種以上組合使用。 上述之中,考量操作性的觀點,宜使用鹼觸媒,使用有機鹼觸媒更佳,使用三乙胺尤佳,將三乙胺與三乙二胺組合使用特佳。In the above imidization reaction, a known imidization catalyst can be used. As the imidization catalyst, an alkali catalyst or an acid catalyst can be mentioned. Examples of the base catalyst include: pyridine, quinoline, isoquinoline, α-picoline, β-picoline, 2,4-lutidine, 2,6-lutidine, trimethylamine, triethyl Amine, tripropylamine, tributylamine, triethylenediamine, imidazole, N,N-dimethylaniline, N,N-diethylaniline and other organic base catalysts; potassium hydroxide or sodium hydroxide, potassium carbonate, Inorganic alkali catalysts such as sodium carbonate, potassium bicarbonate, and sodium bicarbonate. Moreover, as an acid catalyst, crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, toluic acid, hydroxybenzoic acid, terephthalic acid, benzenesulfonic acid, p-toluenesulfonic acid can be mentioned. , naphthalene sulfonic acid, etc. The above-mentioned imidization catalysts may be used alone or in combination of two or more. Among the above, from the viewpoint of operability, an alkali catalyst is preferably used, an organic alkali catalyst is more preferably used, triethylamine is particularly preferably used, and triethylamine and triethylenediamine are particularly preferably used in combination.

就醯亞胺化反應的溫度而言,考量反應率及抑制凝膠化等的觀點,宜為120~ 250℃,更佳為160~200℃。又,就反應時間而言,生成水的餾出開始後宜為0.5~10小時。The temperature of the imidization reaction is preferably 120 to 250°C, more preferably 160 to 200°C, in consideration of the reaction rate and the inhibition of gelation. In addition, the reaction time is preferably 0.5 to 10 hours after the start of the distillation of the produced water.

[聚醯亞胺清漆] 本發明之聚醯亞胺清漆係將本發明之聚醯亞胺樹脂溶解於有機溶劑而成。亦即,本發明之聚醯亞胺清漆含有本發明之聚醯亞胺樹脂及有機溶劑,該聚醯亞胺樹脂溶解於該有機溶劑。 有機溶劑只要是溶解聚醯亞胺樹脂者即可,並無特別限定,宜單獨或混合2種以上使用作為聚醯亞胺樹脂之製造所使用之反應溶劑的上述化合物。 本發明之聚醯亞胺樹脂具有溶劑溶解性,故可製成在室溫穩定的高濃度清漆。本發明之聚醯亞胺清漆宜含有5~40質量%之本發明之聚醯亞胺樹脂,含有10~ 30質量%更佳。聚醯亞胺清漆的黏度宜為1~200Pa・s,為5~150Pa・s更佳。 又,本發明之聚醯亞胺清漆,在不損及聚醯亞胺薄膜之要求特性的範圍內,亦可含有無機填料、黏接促進劑、剝離劑、阻燃劑、紫外線穩定劑、界面活性劑、調平劑、消泡劑、螢光增白劑、交聯劑、聚合引發劑、感光劑等各種添加劑。 本發明之聚醯亞胺清漆之製造方法並無特別限定,可使用公知的方法。[Polyimide Varnish] The polyimide varnish of the present invention is obtained by dissolving the polyimide resin of the present invention in an organic solvent. That is, the polyimide varnish of the present invention contains the polyimide resin of the present invention and an organic solvent, and the polyimide resin is dissolved in the organic solvent. The organic solvent is not particularly limited as long as it dissolves the polyimide resin, and it is preferable to use the above-mentioned compounds as the reaction solvent used in the production of the polyimide resin alone or in combination of two or more. The polyimide resin of the present invention has solvent solubility, so it can be made into a high-concentration varnish that is stable at room temperature. The polyimide varnish of the present invention preferably contains 5 to 40% by mass of the polyimide resin of the present invention, more preferably 10 to 30% by mass. The viscosity of the polyimide varnish is preferably 1~200Pa・s, more preferably 5~150Pa・s. In addition, the polyimide varnish of the present invention may also contain inorganic fillers, adhesion promoters, release agents, flame retardants, UV stabilizers, interface Activating agent, leveling agent, defoaming agent, optical brightener, crosslinking agent, polymerization initiator, sensitizer and other additives. The manufacturing method of the polyimide varnish of this invention is not specifically limited, A well-known method can be used.

[聚醯亞胺薄膜] 本發明之聚醯亞胺薄膜含有本發明之聚醯亞胺樹脂。故,本發明之聚醯亞胺薄膜的無色透明性、光學等向性、及雷射剝離性優異。 本發明之聚醯亞胺薄膜的製作方法並無特別限制,可使用公知的方法。例如可列舉將本發明之聚醯亞胺清漆塗布或成形成薄膜狀後,將有機溶劑除去的方法等。[Polyimide film] The polyimide film of the present invention contains the polyimide resin of the present invention. Therefore, the polyimide film of the present invention is excellent in colorless transparency, optical isotropy, and laser peelability. The method for producing the polyimide film of the present invention is not particularly limited, and a known method can be used. For example, the method of removing an organic solvent after coating or shaping|molding the polyimide varnish of this invention into a thin film, etc. are mentioned.

本發明之聚醯亞胺薄膜,係無色透明性、光學等向性、及雷射剝離性優異者,故可理想地用作彩色濾光片、撓性顯示器、半導體零件、光學構件等各種構件用的薄膜。本發明之聚醯亞胺薄膜尤其可理想地用作液晶顯示器、OLED顯示器等影像顯示裝置的基板。 [實施例]The polyimide film of the present invention is excellent in colorless transparency, optical isotropy, and laser releasability, so it can be ideally used as various members such as color filters, flexible displays, semiconductor parts, and optical members. film used. In particular, the polyimide film of the present invention can be ideally used as a substrate for image display devices such as liquid crystal displays and OLED displays. [Example]

以下,藉由實施例更具體地說明本發明。惟,本發明並不限定於該等實施例。 實施例及比較例中獲得之聚醯亞胺清漆的固體成分濃度及聚醯亞胺薄膜的各物性係利用以下所示之方法進行測定。Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to these embodiments. The solid content concentration of the polyimide varnishes obtained in Examples and Comparative Examples and the physical properties of the polyimide films were measured by the methods shown below.

(1) 固體成分濃度 聚醯亞胺清漆之固體成分濃度的測定,係利用AS ONE(股)公司製的小型電氣爐「MMF-1」將試樣進行320℃×120min的加熱,並由加熱前後之試樣的質量差算出。 (2) 薄膜厚度 薄膜厚度係使用Mitutoyo(股)公司製的測微計進行測定。 (3) 全光線透射率、黃色指數(YI) 測定係依據JIS K7361-1,使用日本電色工業(股)公司製的色彩-濁度同時測定器「COH400」進行。 (4) 厚度相位差(Rth) 厚度相位差(Rth)係使用日本分光(股)公司製的橢圓偏光計「M-220」進行測定。測定於測定波長590nm的厚度相位差之值。此外,令聚醯亞胺薄膜之面內折射率中之最大折射率為nx,最小折射率為ny,並令厚度方向之折射率為nz,薄膜之厚度為d時,Rth係由下式表示者。 Rth={[(nx+ny)/2]-nz}×d (5) 於波長308nm之光線透射率 使用島津製作所(股)公司製的紫外/可見/近紅外分光光度計「UV-3100PC」進行測定。 (6) 吸水率 根據JIS K7209求出。將50mm×50mm之聚醯亞胺薄膜在50℃乾燥24小時後,於乾燥器中恢復至室溫,並於23℃、濕度50±5%之環境下測定重量(W0)。然後,將該薄膜在23℃之蒸餾水中浸漬24小時,擦掉表面的水分後,測定1分鐘後的重量(W1)。依下式算出吸水率。 吸水率(%)=[(W1-W0)/W0]×100(1) Solid content concentration The solid content concentration of the polyimide varnish was measured by heating the sample at 320°C × 120min using a small electric furnace "MMF-1" manufactured by AS ONE Co., Ltd., and the mass of the sample before and after heating was determined. The difference is calculated. (2) Film thickness The film thickness was measured using a micrometer manufactured by Mitutoyo Co., Ltd. (3) Total light transmittance, yellow index (YI) The measurement was performed according to JIS K7361-1 using a color-turbidity simultaneous measuring device "COH400" manufactured by Nippon Denshoku Industries Co., Ltd. (4) Thickness retardation (Rth) The thickness retardation (Rth) was measured using an ellipsometry "M-220" manufactured by JASCO Corporation. The value of the thickness retardation was measured at a measurement wavelength of 590 nm. In addition, let the maximum refractive index of the in-plane refractive index of the polyimide film be nx, the minimum refractive index be ny, and let the refractive index in the thickness direction be nz, and the thickness of the film be d, Rth is represented by the following formula By. Rth={[(nx+ny)/2]-nz}×d (5) Light transmittance at wavelength 308nm The measurement was performed using an ultraviolet/visible/near-infrared spectrophotometer "UV-3100PC" manufactured by Shimadzu Corporation. (6) Water absorption Obtained according to JIS K7209. After drying the 50mm×50mm polyimide film at 50°C for 24 hours, return to room temperature in a desiccator, and measure the weight (W0) at 23°C and humidity 50±5%. Then, the film was immersed in distilled water at 23° C. for 24 hours, and the water on the surface was wiped off, and then the weight (W1) after 1 minute was measured. The water absorption rate was calculated according to the following formula. Water absorption (%)=[(W1-W0)/W0]×100

<實施例1> 在配備有不銹鋼製半月型攪拌翼、氮氣導入管、安裝有冷卻管之Dean-Stark、 溫度計、玻璃製端蓋的500mL之5口圓底燒瓶中,投入9,9-雙(4-胺基苯基)茀(田岡化學工業(股)公司製)34.845g(0.100莫耳)、γ-丁內酯(三菱化學(股)公司製)83.018 g,並於系內溫度70℃、氮氣環境下,以轉速200rpm攪拌而得到溶液。 在該溶液中一次添加1,2,4,5-環己烷四羧酸二酐(三菱瓦斯化學(股)公司製) 11.209g(0.050莫耳)、9,9’-雙(3,4-二羧基苯基)茀二酐(JFE化學(股)公司製)22.922g (0.050莫耳)、及γ-丁內酯(三菱化學(股)公司製)20.755g,然後,投入作為醯亞胺化觸媒之三乙胺(關東化學(股)公司製)5.060g及三乙二胺(東京化成工業(股)公司製)0.561g,利用加熱套進行加熱,歷時約20分鐘使反應系內溫度上升至190℃。收集餾去的成分,邊配合黏度上升調整轉速,邊將反應系內溫度保持在190℃並回流5小時。 之後,添加γ-丁內酯(三菱化學(股)公司製)158.54g,並將反應系內溫度冷卻至120℃後,進一步攪拌約3小時而使其均勻化,得到固體成分濃度20質量%之聚醯亞胺清漆。然後,將獲得之聚醯亞胺清漆塗布於玻璃板上,利用加熱板在80℃保持20分鐘,之後,於氮氣環境下、熱風乾燥機中在300℃加熱30分鐘,使溶劑蒸發,得到厚度14μm之薄膜。結果示於表1。<Example 1> 9,9-bis(4-amino) was placed in a 500 mL 5-neck round-bottomed flask equipped with a half-moon stirring blade made of stainless steel, a nitrogen introduction tube, a Dean-Stark equipped with a cooling tube, a thermometer, and a glass end cap. 34.845 g (0.100 mol) of phenyl) fenugreek (manufactured by Tagoka Chemical Industry Co., Ltd.) and 83.018 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Co., Ltd.) were added at a temperature of 70°C in the system under a nitrogen atmosphere. , and stirred at 200 rpm to obtain a solution. To this solution, 1,2,4,5-cyclohexanetetracarboxylic dianhydride (manufactured by Mitsubishi Gas Chemical Co., Ltd.) 11.209 g (0.050 mol), 9,9'-bis(3,4 -22.922 g (0.050 mol) of -dicarboxyphenyl) fluoride (manufactured by JFE Chemical Co., Ltd.), and 20.755 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Co., Ltd.), were charged as 5.060 g of triethylamine (manufactured by Kanto Chemical Co., Ltd.) and 0.561 g of triethylenediamine (manufactured by Tokyo Chemical Industry Co., Ltd.) as amination catalysts were heated with a heating mantle, and the reaction system was heated for about 20 minutes. The internal temperature rose to 190°C. The distilled components were collected, and the internal temperature of the reaction system was maintained at 190° C. and refluxed for 5 hours while adjusting the rotational speed according to the increase in viscosity. Then, 158.54 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Co., Ltd.) was added, and the temperature in the reaction system was cooled to 120° C., and further stirred for about 3 hours to homogenize to obtain a solid content concentration of 20% by mass. of polyimide varnish. Then, the obtained polyimide varnish was coated on a glass plate, kept at 80° C. for 20 minutes on a hot plate, and then heated at 300° C. for 30 minutes in a nitrogen atmosphere in a hot air dryer to evaporate the solvent to obtain a thickness of 14μm thin film. The results are shown in Table 1.

<實施例2> 將9,9-雙(4-胺基苯基)茀(田岡化學工業(股)公司製)的量由34.845g(0.100莫耳)變更為17.423g(0.050莫耳),並追加雙(4-胺基苯基)碸(和歌山精化工業(股)公司製)12.415g(0.050莫耳),除此以外,利用與實施例1同樣之方法製作聚醯亞胺清漆,得到固體成分濃度20質量%之聚醯亞胺清漆。使用獲得之聚醯亞胺清漆,利用與實施例1同樣之方法製作薄膜,得到厚度10μm之薄膜。結果示於表1。<Example 2> The amount of 9,9-bis(4-aminophenyl) fluoride (manufactured by Tagoka Chemical Industry Co., Ltd.) was changed from 34.845 g (0.100 mol) to 17.423 g (0.050 mol), and bis(4 mol) was added. A polyimide varnish was prepared in the same manner as in Example 1, except that 12.415 g (0.050 mol) of -aminophenyl) bismuth (manufactured by Wakayama Seika Industry Co., Ltd.) was obtained to obtain a solid content concentration of 20 Mass % polyimide varnish. Using the obtained polyimide varnish, a thin film was produced in the same manner as in Example 1 to obtain a thin film having a thickness of 10 μm. The results are shown in Table 1.

<實施例3> 將雙(4-胺基苯基)碸(和歌山精化工業(股)公司製)12.415g(0.050莫耳)變更為2,2’-雙(三氟甲基)聯苯胺(和歌山精化工業(股)公司製)16.012g(0.050莫耳),除此以外,利用與實施例2同樣之方法製作聚醯亞胺清漆,得到固體成分濃度20質量%之聚醯亞胺清漆。使用獲得之聚醯亞胺清漆,利用與實施例1同樣之方法製作薄膜,得到厚度12μm之薄膜。結果示於表1。<Example 3> Changed 12.415 g (0.050 mol) of bis(4-aminophenyl) bismuth (manufactured by Wakayama Seika Industry Co., Ltd.) to 2,2'-bis(trifluoromethyl)benzidine (Wakayama Seika Industry Co., Ltd.) A polyimide varnish was produced in the same manner as in Example 2, except for 16.012 g (0.050 mol) (manufactured by Co., Ltd.), and a polyimide varnish having a solid content concentration of 20 mass % was obtained. Using the obtained polyimide varnish, a film was produced by the same method as in Example 1, and a film with a thickness of 12 μm was obtained. The results are shown in Table 1.

<實施例4> 將9,9-雙(4-胺基苯基)茀(田岡化學工業(股)公司製)的量由34.845g(0.100莫耳)變更為30.629g(0.08790莫耳),並追加兩末端胺基改性聚矽氧油「X-22-9409」(信越化學工業(股)公司製)16.214g(0.01210莫耳),除此以外,利用與實施例1同樣之方法製作聚醯亞胺清漆,得到固體成分濃度20質量%之聚醯亞胺清漆。使用獲得之聚醯亞胺清漆,利用與實施例1同樣之方法製作薄膜,得到厚度10μm之薄膜。結果示於表1。<Example 4> The amount of 9,9-bis(4-aminophenyl) fluoride (manufactured by Tagoka Chemical Industry Co., Ltd.) was changed from 34.845 g (0.100 mol) to 30.629 g (0.08790 mol), and both terminal amines were added A polyimide varnish was prepared in the same manner as in Example 1, except that 16.214 g (0.01210 mol) of base-modified polysiloxane oil "X-22-9409" (manufactured by Shin-Etsu Chemical Co., Ltd.) , to obtain a polyimide varnish with a solid content concentration of 20% by mass. Using the obtained polyimide varnish, a thin film was produced in the same manner as in Example 1 to obtain a thin film having a thickness of 10 μm. The results are shown in Table 1.

<實施例5> 將9,9-雙(4-胺基苯基)茀(田岡化學工業(股)公司製)的量由34.845g(0.100莫耳)變更為15.450g(0.04434莫耳),並追加雙(4-胺基苯基)碸(和歌山精化工業(股)公司製)11.010g(0.04434莫耳)、兩末端胺基改性聚矽氧油「X-22-9409」(信越化學工業(股)公司製)15.169g(0.01132莫耳),除此以外,利用與實施例1同樣之方法製作聚醯亞胺清漆,得到固體成分濃度20質量%之聚醯亞胺清漆。使用獲得之聚醯亞胺清漆,利用與實施例1同樣之方法製作薄膜,得到厚度8μm之薄膜。結果示於表1。<Example 5> The amount of 9,9-bis(4-aminophenyl) fluoride (manufactured by Tagoka Chemical Industry Co., Ltd.) was changed from 34.845 g (0.100 mol) to 15.450 g (0.04434 mol), and bis(4 mol) was added. -Aminophenyl) bismuth (manufactured by Wakayama Seika Industry Co., Ltd.) 11.010 g (0.04434 mol), both-terminal amino-modified polysiloxane oil "X-22-9409" (Shin-Etsu Chemical Industry Co., Ltd.) A polyimide varnish was produced by the same method as in Example 1, except that 15.169 g (0.01132 mol) produced by the company, and a polyimide varnish having a solid content concentration of 20 mass % was obtained. Using the obtained polyimide varnish, a film was produced by the same method as in Example 1, and a film with a thickness of 8 μm was obtained. The results are shown in Table 1.

<實施例6> 將9,9-雙(4-胺基苯基)茀(田岡化學工業(股)公司製)的量由15.450g(0.04434莫耳)變更為15.360g(0.04408莫耳),雙(4-胺基苯基)碸(和歌山精化工業(股)公司製)11.010g(0.04434莫耳)變更為2,2’-雙(三氟甲基)聯苯胺(和歌山精化工業(股)公司製)14.116g(0.04408莫耳),兩末端胺基改性聚矽氧油「X-22-9409」(信越化學工業(股)公司製)的量由15.169g(0.01132莫耳)變更為15.879g(0.01184莫耳),除此以外,利用與實施例5同樣之方法製作聚醯亞胺清漆,得到固體成分濃度20質量%之聚醯亞胺清漆。使用獲得之聚醯亞胺清漆,利用與實施例1同樣之方法製作薄膜,得到厚度9μm之薄膜。結果示於表1。<Example 6> The amount of 9,9-bis(4-aminophenyl) fluoride (manufactured by Tagaoka Chemical Industry Co., Ltd.) was changed from 15.450 g (0.04434 mol) to 15.360 g (0.04408 mol), bis(4-amine) 11.010 g (0.04434 mol) of phenyl) phenyl (Wakayama Seika Kogyo Co., Ltd.) was changed to 2,2'-bis(trifluoromethyl)benzidine (manufactured by Wakayama Seika Kogyo Co., Ltd.) 14.116g (0.04408mol), the amount of both-terminal amino-modified polysiloxane oil "X-22-9409" (manufactured by Shin-Etsu Chemical Co., Ltd.) was changed from 15.169g (0.01132mol) to 15.879g ( 0.01184 moles), except that a polyimide varnish was produced by the same method as in Example 5, and a polyimide varnish having a solid content concentration of 20 mass % was obtained. Using the obtained polyimide varnish, a film was produced by the same method as in Example 1, and a film with a thickness of 9 μm was obtained. The results are shown in Table 1.

<實施例7> 將9,9-雙(4-胺基苯基)茀(田岡化學工業(股)公司製)的量由15.360g(0.04408莫耳)變更為16.471g(0.04727莫耳),2,2’-雙(三氟甲基)聯苯胺(和歌山精化工業(股)公司製)的量由14.116g(0.04408莫耳)變更為15.138g(0.04727莫耳),兩末端胺基改性聚矽氧油「X-22-9409」(信越化學工業(股)公司製)的量由15.879g(0.01184莫耳)變更為7.316g(0.00546莫耳),除此以外,利用與實施例6同樣之方法製作聚醯亞胺清漆,得到固體成分濃度20質量%之聚醯亞胺清漆。使用獲得之聚醯亞胺清漆, 利用與實施例1同樣之方法製作薄膜,得到厚度8μm之薄膜。結果示於表1。<Example 7> The amount of 9,9-bis(4-aminophenyl) fluoride (manufactured by Tagoka Chemical Industry Co., Ltd.) was changed from 15.360 g (0.04408 mol) to 16.471 g (0.04727 mol), 2,2'- The amount of bis(trifluoromethyl)benzidine (manufactured by Wakayama Seika Industry Co., Ltd.) was changed from 14.116 g (0.04408 mol) to 15.138 g (0.04727 mol), and both-terminal amino group-modified polysiloxane oil It was produced by the same method as in Example 6, except that the amount of "X-22-9409" (manufactured by Shin-Etsu Chemical Co., Ltd.) was changed from 15.879 g (0.01184 mol) to 7.316 g (0.00546 mol). A polyimide varnish was obtained to obtain a polyimide varnish having a solid content concentration of 20% by mass. Using the obtained polyimide varnish, a thin film was produced in the same manner as in Example 1 to obtain a thin film having a thickness of 8 μm. The results are shown in Table 1.

<比較例1> 將1,2,4,5-環己烷四羧酸二酐(三菱瓦斯化學(股)公司製)的量由11.209g(0.050莫耳)變更為22.417g(0.100莫耳),且不添加9,9’-雙(3,4-二羧基苯基)茀二酐(JFE化學(股)公司製)22.922g(0.050莫耳),除此以外,利用與實施例1同樣之方法製作聚醯亞胺清漆,得到固體成分濃度20質量%之聚醯亞胺清漆。使用獲得之聚醯亞胺清漆,利用與實施例1同樣之方法製作薄膜,得到厚度11μm之薄膜。結果示於表2。<Comparative Example 1> The amount of 1,2,4,5-cyclohexanetetracarboxylic dianhydride (manufactured by Mitsubishi Gas Chemical Co., Ltd.) was changed from 11.209 g (0.050 mol) to 22.417 g (0.100 mol) without adding A polymer was prepared in the same manner as in Example 1, except for 22.922 g (0.050 mol) of 9,9'-bis(3,4-dicarboxyphenyl) fluoride (manufactured by JFE Chemical Co., Ltd.). An imide varnish was obtained to obtain a polyimide varnish having a solid content concentration of 20% by mass. Using the obtained polyimide varnish, a film was produced in the same manner as in Example 1, and a film with a thickness of 11 μm was obtained. The results are shown in Table 2.

<比較例2> 將9,9-雙(4-胺基苯基)茀(田岡化學工業(股)公司製)34.845g(0.100莫耳)變更為2,2’-雙(三氟甲基)聯苯胺(和歌山精化工業(股)公司製)32.024g(0.100莫耳),除此以外,利用與比較例1同樣之方法製作聚醯亞胺清漆,得到固體成分濃度20質量%之聚醯亞胺清漆。使用獲得之聚醯亞胺清漆,利用與實施例1同樣之方法製作薄膜,得到厚度9μm之薄膜。結果示於表2。<Comparative Example 2> 34.845 g (0.100 mol) of 9,9-bis(4-aminophenyl) fluoride (manufactured by Tagoka Chemical Industry Co., Ltd.) was changed to 2,2'-bis(trifluoromethyl)benzidine (Wakayama A polyimide varnish was prepared in the same manner as in Comparative Example 1, except for 32.024 g (0.100 mol) of Seika Kogyo Co., Ltd., and a polyimide varnish having a solid content concentration of 20 mass % was obtained. Using the obtained polyimide varnish, a film was produced by the same method as in Example 1, and a film with a thickness of 9 μm was obtained. The results are shown in Table 2.

<比較例3> 將9,9’-雙(3,4-二羧基苯基)茀二酐(JFE化學(股)公司製)22.922g(0.050莫耳)變更為3,3’,4,4’-聯苯四羧酸二酐(s-BPDA)(三菱化學(股)公司製)14.710g(0.050莫耳),9,9-雙(4-胺基苯基)茀(田岡化學工業(股)公司製)的量由30.629g(0.08790莫耳)變更為31.064g(0.08915莫耳),兩末端胺基改性聚矽氧油「X-22-9409」(信越化學工業(股)公司製)的量由16.214g(0.01210莫耳)變更為14.539g(0.01085莫耳),除此以外,利用與實施例4同樣之方法製作聚醯亞胺清漆,得到固體成分濃度20質量%之聚醯亞胺清漆。使用獲得之聚醯亞胺清漆,利用與實施例1同樣之方法製作薄膜,得到厚度15μm之薄膜。結果示於表2。<Comparative Example 3> 22.922 g (0.050 mol) of 9,9'-bis(3,4-dicarboxyphenyl) fluoride (manufactured by JFE Chemical Co., Ltd.) was changed to 3,3',4,4'-biphenyl Tetracarboxylic dianhydride (s-BPDA) (manufactured by Mitsubishi Chemical Co., Ltd.) 14.710 g (0.050 moles), 9,9-bis(4-aminophenyl) fluoride (manufactured by Tagaoka Chemical Industry Co., Ltd.) ) was changed from 30.629 g (0.08790 mol) to 31.064 g (0.08915 mol), and the amount of both-terminal amino-modified polysiloxane oil "X-22-9409" (manufactured by Shin-Etsu Chemical Co., Ltd.) Except having changed from 16.214g (0.01210 mol) to 14.539 g (0.01085 mol), a polyimide varnish was produced by the same method as in Example 4, and a polyimide varnish having a solid content concentration of 20 mass % was obtained . Using the obtained polyimide varnish, a film was produced by the same method as in Example 1, and a film with a thickness of 15 μm was obtained. The results are shown in Table 2.

<比較例4> 將9,9’-雙(3,4-二羧基苯基)茀二酐(JFE化學(股)公司製)22.922g(0.050莫耳)變更為3,3’,4,4’-聯苯四羧酸二酐(s-BPDA)(三菱化學(股)公司製)14.710g(0.050莫耳),除此以外,利用與實施例1同樣之方法製作聚醯亞胺清漆,得到固體成分濃度20質量%之聚醯亞胺清漆。使用獲得之聚醯亞胺清漆,利用與實施例1同樣之方法製作薄膜,得到厚度8μm之薄膜。結果示於表2。<Comparative Example 4> 22.922 g (0.050 mol) of 9,9'-bis(3,4-dicarboxyphenyl) fluoride (manufactured by JFE Chemical Co., Ltd.) was changed to 3,3',4,4'-biphenyl A polyimide varnish was prepared in the same manner as in Example 1, except for 14.710 g (0.050 mol) of tetracarboxylic dianhydride (s-BPDA) (manufactured by Mitsubishi Chemical Corporation), and the solid content concentration was obtained. 20% by mass of polyimide varnish. Using the obtained polyimide varnish, a film was produced by the same method as in Example 1, and a film with a thickness of 8 μm was obtained. The results are shown in Table 2.

【表1】

Figure 107133712-A0304-0001
【Table 1】
Figure 107133712-A0304-0001

【表2】

Figure 107133712-A0304-0002
【Table 2】
Figure 107133712-A0304-0002

表1及2中之簡稱如下。 HPMDA:1,2,4,5-環己烷四羧酸二酐(式(a-1)表示之化合物) BPAF:9,9’-雙(3,4-二羧基苯基)茀二酐(式(a-2)表示之化合物) BPDA:3,3’,4,4’-聯苯四羧酸二酐 BAFL:9,9-雙(4-胺基苯基)茀(式(b-1)表示之化合物) 4,4-DDS:雙(4-胺基苯基)碸(式(b-2-1)表示之化合物) TFMB:2,2’-雙(三氟甲基)聯苯胺(式(b-2-2)表示之化合物) X-22-9409:兩末端胺基改性聚矽氧油(式(b-2-3)表示之化合物)The abbreviations in Tables 1 and 2 are as follows. HPMDA: 1,2,4,5-cyclohexanetetracarboxylic dianhydride (compound represented by formula (a-1)) BPAF: 9,9'-bis(3,4-dicarboxyphenyl)indianhydride (compound represented by formula (a-2)) BPDA: 3,3',4,4'-biphenyltetracarboxylic dianhydride BAFL: 9,9-bis(4-aminophenyl) fluoride (compound represented by formula (b-1)) 4,4-DDS: bis(4-aminophenyl) bismuth (compound represented by formula (b-2-1)) TFMB: 2,2'-bis(trifluoromethyl)benzidine (compound represented by formula (b-2-2)) X-22-9409: Amino-modified polysiloxane oil at both ends (compound represented by formula (b-2-3))

如表1所示,實施例1~7之聚醯亞胺薄膜,無色透明性、光學等向性、及雷射剝離性優異。又,實施例3~7之聚醯亞胺薄膜亦具有低吸水性。 另一方面,如表2所示,比較例1之聚醯亞胺薄膜的雷射剝離性顯著不佳,比較例2之聚醯亞胺薄膜的光學等向性及雷射剝離性顯著不佳,比較例3及4之聚醯亞胺薄膜的無色透明性顯著不佳。As shown in Table 1, the polyimide films of Examples 1 to 7 were excellent in colorless transparency, optical isotropy, and laser peelability. In addition, the polyimide films of Examples 3 to 7 also had low water absorption. On the other hand, as shown in Table 2, the laser peelability of the polyimide film of Comparative Example 1 was significantly poor, and the optical isotropy and laser peelability of the polyimide film of Comparative Example 2 were significantly poor , the colorless transparency of the polyimide films of Comparative Examples 3 and 4 is remarkably poor.

Figure 107133712-A0101-11-0001-1
Figure 107133712-A0101-11-0001-1

Claims (7)

一種聚醯亞胺樹脂,含有來自四羧酸二酐之構成單元A、及來自二胺之構成單元B;構成單元A含有來自下式(a-1)表示之化合物之構成單元(A-1)、及來自下式(a-2)表示之化合物之構成單元(A-2);構成單元B含有來自下式(b-1)表示之化合物之構成單元(B-1);構成單元B中之構成單元(B-1)的比率為30~100莫耳%;
Figure 107133712-A0305-02-0028-1
式(b-1)中,R各自獨立地為氫原子、氟原子或甲基。
A polyimide resin containing a structural unit A derived from tetracarboxylic dianhydride and a structural unit B derived from a diamine; the structural unit A contains a structural unit (A-1) derived from a compound represented by the following formula (a-1) ), and the structural unit (A-2) derived from the compound represented by the following formula (a-2); the structural unit B contains the structural unit (B-1) derived from the compound represented by the following formula (b-1); the structural unit B The ratio of the constituent unit (B-1) in it is 30~100 mol%;
Figure 107133712-A0305-02-0028-1
In formula (b-1), R is each independently a hydrogen atom, a fluorine atom or a methyl group.
如申請專利範圍第1項之聚醯亞胺樹脂,其中,構成單元A中之構成單元(A-1)的比率為10~90莫耳%,構成單元A中之構成單元(A-2)的比率為10~90莫耳%。 For example, the polyimide resin of claim 1, wherein the ratio of the structural unit (A-1) in the structural unit A is 10-90 mol%, and the structural unit (A-2) in the structural unit A is 10-90 mol%. The ratio of 10~90 mol%. 如申請專利範圍第1或2項之聚醯亞胺樹脂,其中,構成單元B更含有構成單元(B-2),該構成單元(B-2)係選自由來自下式(b-2-1)表示之化合物之構成單元(B-2-1)、來自下式(b-2-2)表示之化合物之構成單元(B-2-2)、及來自下式(b-2-3)表示之化合物之構成單元(B-2-3)構成之群組中之至少1種;[化2]
Figure 107133712-A0305-02-0029-2
式(b-2-3)中,R1~R4各自獨立地為一價脂肪族基或一價芳香族基,Z1及Z2各自獨立地為二價脂肪族基或二價芳香族基,r為正整數。
According to the polyimide resin of claim 1 or 2, the structural unit B further contains a structural unit (B-2), and the structural unit (B-2) is selected from the following formula (b-2- 1) The constituent unit (B-2-1) of the compound represented by the following formula (b-2-2), the constituent unit (B-2-2) derived from the compound represented by the following formula (b-2-2), and the constituent unit derived from the following formula (b-2-3) At least one of the group consisting of the structural unit (B-2-3) of the compound represented by ); [Chem. 2]
Figure 107133712-A0305-02-0029-2
In formula (b-2-3), R 1 to R 4 are each independently a monovalent aliphatic group or a monovalent aromatic group, and Z 1 and Z 2 are each independently a divalent aliphatic group or a divalent aromatic group base, r is a positive integer.
如申請專利範圍第3項之聚醯亞胺樹脂,其中,構成單元B中之構成單元(B-1)的比率為30~95莫耳%,構成單元B中之構成單元(B-2)的比率為5~70莫耳%。 Such as the polyimide resin of claim 3, wherein the ratio of the structural unit (B-1) in the structural unit B is 30-95 mol%, and the structural unit (B-2) in the structural unit B The ratio of 5 to 70 mol%. 如申請專利範圍第1或2項之聚醯亞胺樹脂,其中,R表示氫原子。 Such as the polyimide resin of claim 1 or 2, wherein, R represents a hydrogen atom. 一種聚醯亞胺清漆,係將如申請專利範圍第1至5項中任一項之聚醯亞胺樹脂溶解於有機溶劑而成。 A polyimide varnish is prepared by dissolving the polyimide resin according to any one of items 1 to 5 of the patent application scope in an organic solvent. 一種聚醯亞胺薄膜,含有如申請專利範圍第1至5項中任一項之聚醯亞胺樹脂。 A polyimide film, comprising the polyimide resin according to any one of items 1 to 5 of the patent application scope.
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