JP2005537203A - 錯体ペロブスカイトよりなる断熱材料層 - Google Patents
錯体ペロブスカイトよりなる断熱材料層 Download PDFInfo
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- JP2005537203A JP2005537203A JP2004513208A JP2004513208A JP2005537203A JP 2005537203 A JP2005537203 A JP 2005537203A JP 2004513208 A JP2004513208 A JP 2004513208A JP 2004513208 A JP2004513208 A JP 2004513208A JP 2005537203 A JP2005537203 A JP 2005537203A
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- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/495—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on vanadium, niobium, tantalum, molybdenum or tungsten oxides or solid solutions thereof with other oxides, e.g. vanadates, niobates, tantalates, molybdates or tungstates
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Abstract
または断熱材料が一般式 A1+r (B’1/2+x B”1/2+y )O3+z で表されるペロブスカイト構造を有し、その際にAはBa、Sr、Ca、Beよりなる群の少なくとも1つの元素であり、B’はAl、La、Nd、Gd、Er、Lu、Dy、Tbよりなる群の少なくとも1つの元素でありそしてB”はTa、Nbよりなる群の少なくとも1つの元素でありそして−0.1<r、x、y、z<0.1であることに特徴がある。
Description
A1+r (B’1/3+xB”2/3+y )O3+z
この場合、AはBa、Sr、Ca、Beよりなる群の少なくとも1つの元素を意味し、B’はMg、Ba、Sr、Ca、Beよりなる群の少なくとも1つの元素を意味しそしてB”はTa、Nbよりなる群の少なくとも1つの元素を意味する。場合によってはこの断熱材料は以下の式の組成を有していてもよい:
A1+r (B’1/2+x B”1/2+y )O3+z
この場合、AはBa、Sr、Ca、Beよりなる群の少なくとも1つの元素を、B’はAl、La、Nd、Gd、Er、Lu、Dy、Tbよりなる群の少なくとも1つの元素をそしてB”はTa、Nbよりなる群の少なくとも1つの元素を選択することができる。上記の両方の組成について化学量論から僅かにずれた化合物も、即ち−0.1<r、x、y、z<0.1の化合物が本発明の範囲に包含される。
以下の本発明の対象を実験的態様との関連で更に詳細に説明するが、本発明はこれらに限定されない。
以下の組成を有する有利な断熱材料から得られる特に適する断熱層を
Ba(Mg1/3 Ta2/3 )O3
最初にBaCO3 、MgOおよびTa2 O5 の固体反応によって製造する。この材料をプレス成形した後に、顕著な焼結収縮を生じることなく1600℃で数時間焼結する。それ故にこの材料は、小さい焼結傾向が望まれる断熱層として使用するのに適している。これは断熱層として使用するのに必要とされる、材料の小さい焼結傾向を証明している。
実施例1と同様に固体反応によって製造されるBa(Mg1/3 Ta2/3 )O3 組成を有する断熱材料を噴霧乾燥によって更に粉砕し、次いで大気プラズマ溶射(APS)の様な熱溶射法によってWDS−系に加工する。この目的のためにニッケル−またはコバルト−ベース合金を(真空)プラズマ溶射によって最初にMCrAlY(M=Co、Ni)接着促進層と一緒に設ける(この層の厚さ:約50〜500μm)。次いで大気プラズマ溶射(APS)によって本発明の材料よりなる断熱層を約50〜3000μmの層厚で設ける。場合によっては、最初に標準WDS材料のYSZよりなる層を設けそして上側層として本発明の断熱材料、例えばBa(Mg1/3 Ta2/3 )O3 (BMT)を析出させることによって二層断熱層も製造することができる。
WDS = 断熱層
YSZ = イットリウムで部分的に安定化した酸化ジルコン
APS = 大気プラズマ溶射
PVD = 物理蒸着法
BMT = Ba(Mg,Ta)O3
Claims (10)
- 2500℃以上の融点、8×10-6K-1より大きい熱膨張係数並びに1400℃より高い焼結温度を有する断熱材料において、該断熱材料が一般式
A1+r (B’1/3+x B”2/3+y )O3+z
で表されるペロブスカイト構造を有し、その際にAはBa、Sr、Ca、Beよりなる群の少なくとも1つの元素であり、B’はMg、Ca、Sr、Ba、Beよりなる群の少なくとも1つの元素であり、B”はTa、Nbよりなる群の少なくとも1つの元素でありそして−0.1<r、x、y、z<0.1であるか
または断熱材料が一般式
A1+r (B’1/2+x B”1/2+y )O3+z
で表されるペロブスカイト構造を有し、その際にAはBa、Sr、Ca、Beよりなる群の少なくとも1つの元素であり、B’はAl、La、Nd、Gd、Er、Lu、Dy、Tbよりなる群の少なくとも1つの元素でありそしてB”はTa、Nbよりなる群の少なくとも1つの元素でありそして−0.1<r、x、y、z<0.1であることを特徴とする、上記断熱材料。 - 断熱材料がr=x=y=z=0である組成を有する、請求項1に記載の断熱材料。
- 式 Ba(Mg1/3 Ta2/3 )O3 で表される断熱層組成を有する、請求項1または2に記載の断熱材料。
- 構造要素の表面に断熱層としての、請求項1〜3のいずれか一つに記載の断熱材料の用途。
- 構造要素と断熱層との間にセラミック、ガラスまたは金属材料よりなる1つ以上の中間層を設ける、請求項4に記載の用途。
- 構造要素と断熱層との間に中間層の材料としてMCrAlY合金(M=Co,Ni)を設けている、請求項5に記載の用途。
- 構造要素と断熱層との間に中間層の材料として(白金)アルミニド層を設けている、請求項5に記載の用途。
- 請求項1〜3のいずれか一つに記載の断熱材料を製造する方法において、炭酸塩および/または酸化物としての原料を上述の化学量論に相応して混合物として存在させ、そしてこの混合物を固体反応に付し、その際に生じた断熱材料が相応する化学量論およびペロブスカイト構造を有していることを特徴とする、上記方法。
- 固体反応後のペロブスカイトが式
A1+r (B’1/3+x B”2/3+y )O3+z
に従うかまたは式
A1+r (B’1/2+x B”1/2+y )O3+z
に従う組成を有しそして−0.1<r、x、y、z<0.1であるように混合物を製造する、請求項8に記載の方法。 - 固体反応の後のペロブスカイトが式 A1 (B’1/3 B”2/3 )O3 または式 A1 (B’1/2 B”1/2 )O3 で表される組成を有するように混合物を製造する、請求項8または9に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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DE10226295.0 | 2002-06-13 | ||
DE10226295A DE10226295A1 (de) | 2002-06-13 | 2002-06-13 | Wärmedämmschicht aus einem komplexen Perowskit |
PCT/DE2003/001924 WO2003106372A1 (de) | 2002-06-13 | 2003-06-10 | Wärmedämmschicht aus einem komplexen perowskit |
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JP2005537203A true JP2005537203A (ja) | 2005-12-08 |
JP2005537203A5 JP2005537203A5 (ja) | 2006-06-01 |
JP4823516B2 JP4823516B2 (ja) | 2011-11-24 |
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US (2) | US7468213B2 (ja) |
EP (1) | EP1513781B9 (ja) |
JP (1) | JP4823516B2 (ja) |
AT (1) | ATE326439T1 (ja) |
DE (2) | DE10226295A1 (ja) |
WO (1) | WO2003106372A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006124734A (ja) * | 2004-10-26 | 2006-05-18 | Mitsubishi Heavy Ind Ltd | 皮膜材料 |
JP2006124735A (ja) * | 2004-10-26 | 2006-05-18 | Mitsubishi Heavy Ind Ltd | 遮熱コーティング材料 |
KR101583005B1 (ko) * | 2014-09-24 | 2016-01-06 | 주식회사에이치케이시스템 | 실리카 에어로겔 시트가 구비된 단열유리 |
KR20160069680A (ko) * | 2014-12-09 | 2016-06-17 | 주식회사 빛나시스템창호 | 단열창호 프레임 |
KR20160071834A (ko) * | 2014-12-12 | 2016-06-22 | 주식회사 빛나시스템창호 | 스테인리스 단열 창호 프레임 |
KR101680722B1 (ko) * | 2014-12-09 | 2016-11-29 | 주식회사 빛나시스템창호 | 단열 창호프레임 |
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GB2184432B (en) | 1985-10-18 | 1989-10-18 | Sumitomo Metal Mining Co | Dielectric ceramic |
EP0252668B1 (en) | 1986-02-21 | 1992-01-29 | Sumitomo Metal Mining Company Limited | Dielectric ceramics |
US4853199A (en) * | 1987-01-08 | 1989-08-01 | Matsushita Electric Industrial Co., Ltd. | Method for producing crystalline complex perovskite compounds |
US5238752A (en) * | 1990-05-07 | 1993-08-24 | General Electric Company | Thermal barrier coating system with intermetallic overlay bond coat |
EP0838446B1 (en) | 1996-10-25 | 2007-08-15 | Ngk Spark Plug Co., Ltd | A dielectric material, a method for producing the same and a dielectric resonator device comprising same |
WO1998026110A1 (de) * | 1996-12-10 | 1998-06-18 | Siemens Aktiengesellschaft | Erzeugnis, welches einem heissen gas aussetzbar ist, mit einer wärmedämmschicht sowie verfahren zur herstellung |
RU2218447C2 (ru) * | 1997-11-03 | 2003-12-10 | Сименс Акциенгезелльшафт | Изделие, подвергаемое воздействию горячего агрессивного газа, в частности, деталь газовой турбины (варианты) и способ изготовления теплоизоляционного слоя для изделия |
US6017504A (en) | 1998-07-16 | 2000-01-25 | Universite Laval | Process for synthesizing perovskites using high energy milling |
JP2002528643A (ja) * | 1998-10-22 | 2002-09-03 | シーメンス アクチエンゲゼルシヤフト | 断熱層付き製品および断熱層の作成方法 |
DE10056617C2 (de) | 2000-11-15 | 2002-12-12 | Forschungszentrum Juelich Gmbh | Werkstoff für temperaturbelastete Substrate |
US20030103875A1 (en) * | 2001-09-26 | 2003-06-05 | Siemens Westinghouse Power Corporation | Catalyst element having a thermal barrier coating as the catalyst substrate |
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2002
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2003
- 2003-06-10 WO PCT/DE2003/001924 patent/WO2003106372A1/de active IP Right Grant
- 2003-06-10 EP EP03759844A patent/EP1513781B9/de not_active Expired - Lifetime
- 2003-06-10 DE DE50303375T patent/DE50303375D1/de not_active Expired - Lifetime
- 2003-06-10 JP JP2004513208A patent/JP4823516B2/ja not_active Expired - Lifetime
- 2003-06-10 US US10/518,155 patent/US7468213B2/en not_active Expired - Fee Related
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006124734A (ja) * | 2004-10-26 | 2006-05-18 | Mitsubishi Heavy Ind Ltd | 皮膜材料 |
JP2006124735A (ja) * | 2004-10-26 | 2006-05-18 | Mitsubishi Heavy Ind Ltd | 遮熱コーティング材料 |
KR101583005B1 (ko) * | 2014-09-24 | 2016-01-06 | 주식회사에이치케이시스템 | 실리카 에어로겔 시트가 구비된 단열유리 |
KR20160069680A (ko) * | 2014-12-09 | 2016-06-17 | 주식회사 빛나시스템창호 | 단열창호 프레임 |
KR101680722B1 (ko) * | 2014-12-09 | 2016-11-29 | 주식회사 빛나시스템창호 | 단열 창호프레임 |
KR101679269B1 (ko) * | 2014-12-09 | 2016-12-06 | 주식회사 빛나시스템창호 | 단열창호 프레임 |
KR20160071834A (ko) * | 2014-12-12 | 2016-06-22 | 주식회사 빛나시스템창호 | 스테인리스 단열 창호 프레임 |
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Publication number | Publication date |
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WO2003106372A1 (de) | 2003-12-24 |
DE50303375D1 (de) | 2006-06-22 |
US20050260435A1 (en) | 2005-11-24 |
EP1513781A1 (de) | 2005-03-16 |
EP1513781B1 (de) | 2006-05-17 |
US7468213B2 (en) | 2008-12-23 |
DE10226295A1 (de) | 2004-01-08 |
EP1513781B9 (de) | 2007-02-28 |
US7585575B2 (en) | 2009-09-08 |
JP4823516B2 (ja) | 2011-11-24 |
US20090098390A1 (en) | 2009-04-16 |
ATE326439T1 (de) | 2006-06-15 |
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