JP2005526885A5 - - Google Patents

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Publication number
JP2005526885A5
JP2005526885A5 JP2003586200A JP2003586200A JP2005526885A5 JP 2005526885 A5 JP2005526885 A5 JP 2005526885A5 JP 2003586200 A JP2003586200 A JP 2003586200A JP 2003586200 A JP2003586200 A JP 2003586200A JP 2005526885 A5 JP2005526885 A5 JP 2005526885A5
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JP
Japan
Prior art keywords
polymer
solvent
separation
crude polymer
purification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003586200A
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English (en)
Japanese (ja)
Other versions
JP4943634B2 (ja
JP2005526885A (ja
Filing date
Publication date
Priority claimed from US10/126,287 external-priority patent/US6593431B2/en
Priority claimed from US10/373,409 external-priority patent/US6787611B2/en
Application filed filed Critical
Publication of JP2005526885A publication Critical patent/JP2005526885A/ja
Publication of JP2005526885A5 publication Critical patent/JP2005526885A5/ja
Application granted granted Critical
Publication of JP4943634B2 publication Critical patent/JP4943634B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2003586200A 2002-04-19 2003-04-10 アルコキシスチレンポリマーの精製方法 Expired - Lifetime JP4943634B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10/126,287 2002-04-19
US10/126,287 US6593431B2 (en) 2000-06-27 2002-04-19 Purification means
US10/373,409 US6787611B2 (en) 2000-06-27 2003-02-24 Purification means
US10/373,409 2003-02-24
PCT/US2003/011262 WO2003089481A1 (en) 2002-04-19 2003-04-10 Process fpr purification of alkoxystyrene polymers

Publications (3)

Publication Number Publication Date
JP2005526885A JP2005526885A (ja) 2005-09-08
JP2005526885A5 true JP2005526885A5 (https=) 2008-04-24
JP4943634B2 JP4943634B2 (ja) 2012-05-30

Family

ID=29254007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003586200A Expired - Lifetime JP4943634B2 (ja) 2002-04-19 2003-04-10 アルコキシスチレンポリマーの精製方法

Country Status (12)

Country Link
US (1) US6787611B2 (https=)
EP (1) EP1509551B1 (https=)
JP (1) JP4943634B2 (https=)
KR (1) KR101099861B1 (https=)
CN (1) CN1300184C (https=)
AR (1) AR039432A1 (https=)
AT (1) ATE473246T1 (https=)
AU (1) AU2003223576A1 (https=)
CA (1) CA2482900A1 (https=)
DE (1) DE60333287D1 (https=)
TW (1) TWI267522B (https=)
WO (1) WO2003089481A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7312281B2 (en) * 2002-04-19 2007-12-25 Dupont Electronic Polymers L.P. Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity
US20040242798A1 (en) * 2003-05-08 2004-12-02 Sounik James R. Photoresist compositions and processes for preparing the same
US7834113B2 (en) * 2003-05-08 2010-11-16 E. I. Du Pont De Nemours And Company Photoresist compositions and processes for preparing the same
US7534837B2 (en) * 2005-09-26 2009-05-19 E.I. Du Pont De Nemours And Company Random copolymers of ethylene and 4-vinylphenyl esters and method for preparing the same
JP4957148B2 (ja) * 2006-09-26 2012-06-20 富士通株式会社 鍵管理機能を持つセキュア素子および情報処理装置
JP5297015B2 (ja) * 2006-12-19 2013-09-25 花王株式会社 インクジェット記録用水系インク
JP4984067B2 (ja) * 2007-07-23 2012-07-25 信越化学工業株式会社 フォトレジスト組成物用高分子化合物の合成方法
JP5416774B2 (ja) 2008-08-25 2014-02-12 デュポン・エレクトロニック・ポリマーズ・エル・ピー 新規プロパノエート及びその製造法
US20120286217A1 (en) * 2011-05-12 2012-11-15 Headwaters Technology Innovation, Llc Methods for mitigating agglomeration of carbon nanospheres using extraction
US9116137B1 (en) 2014-07-15 2015-08-25 Leeo, Inc. Selective electrical coupling based on environmental conditions
EP3056527A1 (fr) * 2015-02-11 2016-08-17 Total Marketing Services Copolymeres a blocs et leur utilisation pour ameliorer les proprietes a froid de carburants ou combustibles

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US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4636540A (en) * 1985-07-08 1987-01-13 Atlantic Richfield Company Purification of polymer solutions
US4689371A (en) * 1986-07-07 1987-08-25 Celanese Corporation Process for the preparation of poly (vinylphenol) from poly (acetoxystyrene)
US4939070A (en) * 1986-07-28 1990-07-03 Brunsvold William R Thermally stable photoresists with high sensitivity
EP0260104A3 (en) * 1986-09-09 1989-03-15 Celanese Corporation Process for the preparation of poly (vinylphenol) by simultaneous methanolysis and polymerization of 4-acetoxystryene
US4678843A (en) * 1986-09-29 1987-07-07 Celanese Corporation Process for the ammonium hydroxide hydrolysis of polymers of acetoxystyrene to polymers of vinylphenol
US4931379A (en) * 1986-10-23 1990-06-05 International Business Machines Corporation High sensitivity resists having autodecomposition temperatures greater than about 160° C.
US4822862A (en) * 1987-01-28 1989-04-18 Hoechst Celanese Corporation Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol
EP0277721A3 (en) * 1987-01-28 1989-03-15 Hoechst Celanese Corporation Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol)
US4898916A (en) * 1987-03-05 1990-02-06 Hoechst Celanese Corporation Process for the preparation of poly(vinylphenol) from poly(acetoxystyrene) by acid catalyzed transesterification
US4877843A (en) * 1987-09-11 1989-10-31 Hoechst Celanese Corporation Selective hydrolysis of copolymers of para-acetoxy styrene and allyl esters of ethylenically unsaturated acids
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US5239015A (en) * 1990-06-29 1993-08-24 Hoechst Celanese Corporation Process for making low optical density polymers and copolymers for photoresists and optical applications
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US5708133A (en) * 1993-11-09 1998-01-13 Mitsubishi Gas Chemical Company, Inc. Process for purifying polymer
US5861231A (en) * 1996-06-11 1999-01-19 Shipley Company, L.L.C. Copolymers and photoresist compositions comprising copolymer resin binder component
US5789522A (en) * 1996-09-06 1998-08-04 Shipley Company, L.L.C. Resin purification process
US5919597A (en) * 1997-10-30 1999-07-06 Ibm Corporation Of Armonk Methods for preparing photoresist compositions
ATE262542T1 (de) * 1998-05-05 2004-04-15 Triquest L P Herstellung von co- und terpolymeren von p- hydroxystyrol und alkylacrylaten
US5945251A (en) * 1998-05-08 1999-08-31 Olin Corporation Process for producing purified solutions of blocked polyhydroxystyrene resins
JP2002514664A (ja) * 1998-05-08 2002-05-21 アーチ・スペシャルティ・ケミカルズ・インコーポレイテッド 遮断(blocked)ポリヒドロキシスチレン樹脂の精製溶液を製造する方法
US6414110B1 (en) * 1999-11-12 2002-07-02 Triquest Lp Purification means
US6203922B1 (en) * 2000-03-20 2001-03-20 The Regents Of The University Of Michigan High glass transition temperature, ductile, and processable thermoplastic containing conformable ring segments
EP1285007A2 (en) * 2000-06-27 2003-02-26 Triquest, L.P. Purification process of polymers of alkoxystyrene
US6593431B2 (en) * 2000-06-27 2003-07-15 Chemfirst Electronic Materials Lp Purification means

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