JP2005525001A5 - - Google Patents
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- JP2005525001A5 JP2005525001A5 JP2004508383A JP2004508383A JP2005525001A5 JP 2005525001 A5 JP2005525001 A5 JP 2005525001A5 JP 2004508383 A JP2004508383 A JP 2004508383A JP 2004508383 A JP2004508383 A JP 2004508383A JP 2005525001 A5 JP2005525001 A5 JP 2005525001A5
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- JP
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- Prior art keywords
- laser light
- laser
- light
- transmission
- partial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000206 photolithography Methods 0.000 claims 2
- 238000001459 lithography Methods 0.000 description 27
- 239000007789 gas Substances 0.000 description 20
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
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- WUKWITHWXAAZEY-UHFFFAOYSA-L Calcium fluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
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- GKAOGPIIYCISHV-UHFFFAOYSA-N neon(0) Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 2
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- ATJFFYVFTNAWJD-UHFFFAOYSA-N tin hydride Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
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- BJQHLKABXJIVAM-UHFFFAOYSA-N Bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
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- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium(0) Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
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- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton(0) Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/141,216 US6693939B2 (en) | 2001-01-29 | 2002-05-07 | Laser lithography light source with beam delivery |
| US10/233,253 US6704339B2 (en) | 2001-01-29 | 2002-08-30 | Lithography laser with beam delivery and beam pointing control |
| US10/255,806 US6704340B2 (en) | 2001-01-29 | 2002-09-25 | Lithography laser system with in-place alignment tool |
| US44367303P | 2003-01-28 | 2003-01-28 | |
| US10/425,361 US7230964B2 (en) | 2001-04-09 | 2003-04-29 | Lithography laser with beam delivery and beam pointing control |
| PCT/US2003/014387 WO2003100826A2 (en) | 2002-05-07 | 2003-05-05 | Lithography laser with beam delivery and beam pointing control |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005525001A JP2005525001A (ja) | 2005-08-18 |
| JP2005525001A5 true JP2005525001A5 (US06704340-20040309-M00001.png) | 2006-08-03 |
Family
ID=29587902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004508383A Pending JP2005525001A (ja) | 2002-05-07 | 2003-05-05 | ビーム伝達及びビーム照準制御を備えるリソグラフィレーザ |
Country Status (6)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7258842B2 (ja) | 2017-07-13 | 2023-04-17 | コーニンクレッカ フィリップス エヌ ヴェ | 回折光学素子を用いたレーザ発生器 |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US7190707B2 (en) * | 2001-01-29 | 2007-03-13 | Cymer, Inc. | Gas discharge laser light source beam delivery unit |
| US7415056B2 (en) * | 2006-03-31 | 2008-08-19 | Cymer, Inc. | Confocal pulse stretcher |
| US20050100072A1 (en) * | 2001-11-14 | 2005-05-12 | Rao Rajasekhar M. | High power laser output beam energy density reduction |
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| US7158553B2 (en) * | 2003-02-14 | 2007-01-02 | Lambda Physik Ag | Master oscillator/power amplifier excimer laser system with pulse energy and pointing control |
| US7184204B2 (en) * | 2003-07-01 | 2007-02-27 | Lambda Physik Ag | Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime |
| KR100531416B1 (ko) * | 2003-09-17 | 2005-11-29 | 엘지.필립스 엘시디 주식회사 | Ｓｌｓ 장비 및 이를 이용한 실리콘 결정화 방법 |
| US7087914B2 (en) * | 2004-03-17 | 2006-08-08 | Cymer, Inc | High repetition rate laser produced plasma EUV light source |
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| US7307688B2 (en) * | 2004-11-19 | 2007-12-11 | Asml Netherlands B.V. | Clamping device for optical elements, lithographic apparatus with optical elements in a clamping device, and method for manufacturing such apparatus |
| US20060222034A1 (en) * | 2005-03-31 | 2006-10-05 | Cymer, Inc. | 6 Khz and above gas discharge laser system |
| DE102005026376C5 (de) * | 2005-06-08 | 2019-05-02 | Faurecia Emissions Control Technologies, Germany Gmbh | Fahrzeugschalldämpfer |
| JP2007059788A (ja) * | 2005-08-26 | 2007-03-08 | Komatsu Ltd | レーザシステム及びレーザ露光システム |
| US7507976B2 (en) * | 2006-05-31 | 2009-03-24 | Asml Netherlands B.V. | Lithographic apparatus, beam delivery systems, prisms and device manufacturing method |
| US8116342B2 (en) * | 2007-03-26 | 2012-02-14 | Nikon Corporation | Variable attenuator device and method |
| US8164739B2 (en) * | 2007-09-28 | 2012-04-24 | Asml Holding N.V. | Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatus |
| NL1036048A1 (nl) * | 2007-10-15 | 2009-04-16 | Asml Holding Nv | Pulse to pulse energy equalization of light beam intensity. |
| JP5429950B2 (ja) * | 2007-10-17 | 2014-02-26 | ギガフォトン株式会社 | レーザ装置 |
| JP4349497B2 (ja) * | 2007-11-29 | 2009-10-21 | 竹中システム機器株式会社 | 放射線照射の位置決め用光ビームポインティングシステム |
| US9356695B2 (en) * | 2009-03-26 | 2016-05-31 | Robert Bosch Gmbh | Automatically aligning photobeam arrangement |
| US8014432B2 (en) * | 2009-03-27 | 2011-09-06 | Cymer, Inc. | Regenerative ring resonator |
| USRE45957E1 (en) | 2009-03-27 | 2016-03-29 | Cymer, Llc | Regenerative ring resonator |
| JP5925674B2 (ja) * | 2010-02-22 | 2016-05-25 | ギガフォトン株式会社 | 露光装置用レーザ装置およびその制御方法 |
| WO2013028066A1 (en) * | 2011-07-11 | 2013-02-28 | Mapper Lithography Ip B.V. | Lithography system and method for storing positional data of a target |
| KR102163606B1 (ko) * | 2013-03-27 | 2020-10-08 | 고쿠리쓰다이가쿠호진 규슈다이가쿠 | 레이저 어닐링 장치 |
| WO2015185152A1 (de) * | 2014-06-06 | 2015-12-10 | Trumpf Lasersystems For Semiconductor Manufacturing Gmbh | Vorrichtung und verfahren zur überwachung eines laserstrahls |
| US9541840B2 (en) | 2014-12-18 | 2017-01-10 | Asml Netherlands B.V. | Faceted EUV optical element |
| JPWO2016147308A1 (ja) * | 2015-03-16 | 2017-12-28 | 国立大学法人九州大学 | レーザシステム及びレーザアニール装置 |
| US10794998B2 (en) * | 2015-06-29 | 2020-10-06 | University Corporation For Atmospheric Research | Diode laser based high spectral resolution lidar |
| NL2019924A (en) | 2016-12-14 | 2018-06-18 | Asml Netherlands Bv | An optical device and associated systems |
| CN109664502A (zh) * | 2017-10-16 | 2019-04-23 | 三纬国际立体列印科技股份有限公司 | 立体打印装置 |
| CN114008873A (zh) * | 2019-06-20 | 2022-02-01 | 西默有限公司 | 输出光束形成设备 |
| US11340531B2 (en) | 2020-07-10 | 2022-05-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Target control in extreme ultraviolet lithography systems using aberration of reflection image |
| CN114217447B (zh) * | 2021-11-22 | 2023-07-07 | 中国工程物理研究院应用电子学研究所 | 一种激光束整形变换装置 |
| CN115436028A (zh) * | 2022-11-07 | 2022-12-06 | 中国航天三江集团有限公司 | 高精度光束调控装置及其使用方法 |
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| TWI226972B (en) * | 2000-06-01 | 2005-01-21 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| US7508487B2 (en) * | 2000-06-01 | 2009-03-24 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| US6577380B1 (en) * | 2000-07-21 | 2003-06-10 | Anvik Corporation | High-throughput materials processing system |
| JP2002134389A (ja) | 2000-10-23 | 2002-05-10 | Canon Inc | 露光装置 |
| US6998620B2 (en) * | 2001-08-13 | 2006-02-14 | Lambda Physik Ag | Stable energy detector for extreme ultraviolet radiation detection |
-
2003
- 2003-04-29 US US10/425,361 patent/US7230964B2/en not_active Expired - Fee Related
- 2003-05-05 AU AU2003249614A patent/AU2003249614A1/en not_active Abandoned
- 2003-05-05 EP EP03755348A patent/EP1502288A4/en not_active Withdrawn
- 2003-05-05 KR KR10-2004-7017915A patent/KR20050010786A/ko not_active Application Discontinuation
- 2003-05-05 JP JP2004508383A patent/JP2005525001A/ja active Pending
- 2003-05-05 WO PCT/US2003/014387 patent/WO2003100826A2/en active Application Filing
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7258842B2 (ja) | 2017-07-13 | 2023-04-17 | コーニンクレッカ フィリップス エヌ ヴェ | 回折光学素子を用いたレーザ発生器 |
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