JP2005522843A5 - - Google Patents

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Publication number
JP2005522843A5
JP2005522843A5 JP2003585136A JP2003585136A JP2005522843A5 JP 2005522843 A5 JP2005522843 A5 JP 2005522843A5 JP 2003585136 A JP2003585136 A JP 2003585136A JP 2003585136 A JP2003585136 A JP 2003585136A JP 2005522843 A5 JP2005522843 A5 JP 2005522843A5
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JP
Japan
Prior art keywords
substrate
uniformity
ion
raster
parallel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003585136A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005522843A (ja
JP4347068B2 (ja
Filing date
Publication date
Priority claimed from US10/119,290 external-priority patent/US6956223B2/en
Priority claimed from US10/251,780 external-priority patent/US6908836B2/en
Application filed filed Critical
Priority claimed from PCT/GB2003/001222 external-priority patent/WO2003088299A2/en
Publication of JP2005522843A publication Critical patent/JP2005522843A/ja
Publication of JP2005522843A5 publication Critical patent/JP2005522843A5/ja
Application granted granted Critical
Publication of JP4347068B2 publication Critical patent/JP4347068B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003585136A 2002-04-10 2003-03-21 基板をイオン注入する方法及びこの方法を実施する為のイオン注入装置 Expired - Fee Related JP4347068B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/119,290 US6956223B2 (en) 2002-04-10 2002-04-10 Multi-directional scanning of movable member and ion beam monitoring arrangement therefor
US10/251,780 US6908836B2 (en) 2002-09-23 2002-09-23 Method of implanting a substrate and an ion implanter for performing the method
PCT/GB2003/001222 WO2003088299A2 (en) 2002-04-10 2003-03-21 A method of implanting a substrate and an ion implanter for performing the method

Publications (3)

Publication Number Publication Date
JP2005522843A JP2005522843A (ja) 2005-07-28
JP2005522843A5 true JP2005522843A5 (enExample) 2009-07-16
JP4347068B2 JP4347068B2 (ja) 2009-10-21

Family

ID=29253953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003585136A Expired - Fee Related JP4347068B2 (ja) 2002-04-10 2003-03-21 基板をイオン注入する方法及びこの方法を実施する為のイオン注入装置

Country Status (7)

Country Link
EP (1) EP1493171A2 (enExample)
JP (1) JP4347068B2 (enExample)
KR (1) KR100982850B1 (enExample)
CN (1) CN100401449C (enExample)
AU (1) AU2003214435A1 (enExample)
TW (1) TWI319894B (enExample)
WO (1) WO2003088299A2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6908836B2 (en) 2002-09-23 2005-06-21 Applied Materials, Inc. Method of implanting a substrate and an ion implanter for performing the method
US7049210B2 (en) 2002-09-23 2006-05-23 Applied Materials, Inc. Method of implanting a substrate and an ion implanter for performing the method
US7282427B1 (en) 2006-05-04 2007-10-16 Applied Materials, Inc. Method of implanting a substrate and an ion implanter for performing the method
GB2432039B (en) * 2004-01-09 2009-03-11 Applied Materials Inc Improvements relating to ion implantation
US7473909B2 (en) * 2006-12-04 2009-01-06 Axcelis Technologies, Inc. Use of ion induced luminescence (IIL) as feedback control for ion implantation
TW201133536A (en) * 2010-03-16 2011-10-01 Kingstone Semiconductor Co Ltd Ions injection system and method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5389793A (en) * 1983-08-15 1995-02-14 Applied Materials, Inc. Apparatus and methods for ion implantation
US4980562A (en) * 1986-04-09 1990-12-25 Varian Associates, Inc. Method and apparatus for high efficiency scanning in an ion implanter
US4775796A (en) * 1987-01-06 1988-10-04 Purser Kenneth H Treating workpieces with beams
US5886356A (en) * 1997-03-17 1999-03-23 Taiwan Semiconductor Manufacturing Co., Ltd. Automatic supervision system on the ion beam map for ion implantation process
US5898179A (en) 1997-09-10 1999-04-27 Orion Equipment, Inc. Method and apparatus for controlling a workpiece in a vacuum chamber
GB2339959B (en) * 1998-07-21 2003-06-18 Applied Materials Inc Ion implantation beam monitor
JP3341749B2 (ja) * 1999-12-28 2002-11-05 日新電機株式会社 イオン注入方法およびイオン注入装置
US6323497B1 (en) * 2000-06-02 2001-11-27 Varian Semiconductor Equipment Assoc. Method and apparatus for controlling ion implantation during vacuum fluctuation

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