JP2005517875A - 信号デトレンディングを利用した振動制御 - Google Patents

信号デトレンディングを利用した振動制御 Download PDF

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Publication number
JP2005517875A
JP2005517875A JP2003568738A JP2003568738A JP2005517875A JP 2005517875 A JP2005517875 A JP 2005517875A JP 2003568738 A JP2003568738 A JP 2003568738A JP 2003568738 A JP2003568738 A JP 2003568738A JP 2005517875 A JP2005517875 A JP 2005517875A
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JP
Japan
Prior art keywords
vibration
signal
control
feedback
control drive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003568738A
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English (en)
Japanese (ja)
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JP2005517875A5 (enExample
Inventor
ロバート エヌ ジャックス
ディヴィッド ジェイ ウォーカンタン
Original Assignee
サイマー インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/074,059 external-priority patent/US6563128B2/en
Application filed by サイマー インコーポレイテッド filed Critical サイマー インコーポレイテッド
Publication of JP2005517875A publication Critical patent/JP2005517875A/ja
Publication of JP2005517875A5 publication Critical patent/JP2005517875A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/005—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion using electro- or magnetostrictive actuation means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
    • F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
    • F16F15/0275—Control of stiffness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D19/00—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase
    • G05D19/02—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase characterised by the use of electric means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F2230/00—Purpose; Design features
    • F16F2230/08—Sensor arrangement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/53—Means to assemble or disassemble
    • Y10T29/5313—Means to assemble electrical device
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/53—Means to assemble or disassemble
    • Y10T29/5313—Means to assemble electrical device
    • Y10T29/53174—Means to fasten electrical component to wiring board, base, or substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Health & Medical Sciences (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
JP2003568738A 2002-02-11 2003-01-15 信号デトレンディングを利用した振動制御 Pending JP2005517875A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/074,059 US6563128B2 (en) 2001-03-09 2002-02-11 Base stabilization system
US10/112,443 US6872961B2 (en) 2000-01-27 2002-03-29 Vibration control utilizing signal detrending
PCT/US2003/001332 WO2003069733A1 (en) 2002-02-11 2003-01-15 Vibration control utilizing signal detrending

Publications (2)

Publication Number Publication Date
JP2005517875A true JP2005517875A (ja) 2005-06-16
JP2005517875A5 JP2005517875A5 (enExample) 2006-03-02

Family

ID=27736817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003568738A Pending JP2005517875A (ja) 2002-02-11 2003-01-15 信号デトレンディングを利用した振動制御

Country Status (5)

Country Link
US (1) US6872961B2 (enExample)
EP (1) EP1474844B1 (enExample)
JP (1) JP2005517875A (enExample)
AU (1) AU2003212805A1 (enExample)
WO (1) WO2003069733A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011505025A (ja) * 2007-11-28 2011-02-17 マイ ミュージック マシンズ インコーポレイテッド 適応ｍｉｄｉ風制御システム

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050271110A1 (en) * 2003-08-22 2005-12-08 Rainer Paetzel Excimer laser system with stable beam output
EP1857878B1 (de) * 2006-05-20 2010-01-20 Integrated Dynamics Engineering GmbH Aktives Schwingungsisolationssystem mit einem kombinierten Positionsaktor
US7782446B2 (en) 2007-03-01 2010-08-24 Asml Netherlands B.V. Stage system and lithographic apparatus comprising such stage system
EP2119938A1 (en) * 2008-05-15 2009-11-18 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO A vibration sensor and a system to isolate vibrations.
DE102012004808A1 (de) * 2012-03-09 2013-09-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Beeinflussung der Schwingungsübertragung zwischen zwei Einheiten
US9837939B1 (en) 2015-04-01 2017-12-05 Lockheed Martin Corporation System and method for providing vibration isolation by magnetic levitation
US9964966B1 (en) * 2015-09-28 2018-05-08 Amazon Technologies, Inc. Controlling mechanical vibrations
KR102566136B1 (ko) * 2016-10-14 2023-08-10 삼성전자주식회사 계측 시스템 및 이를 사용하는 스테이지 제어 장치
TWI728762B (zh) * 2020-03-27 2021-05-21 財團法人工業技術研究院 減低機械手臂振動之方法
CN113031669B (zh) * 2021-02-10 2022-04-22 国机集团科学技术研究院有限公司 一种高品质晶体培植类关键工艺环境振动控制技术分析方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL77057A (en) * 1985-03-26 1990-03-19 Wright Barry Corp Active vibration isolation system
US6959484B1 (en) * 1994-01-27 2005-11-01 Cymer, Inc. System for vibration control
US5811821A (en) * 1996-08-09 1998-09-22 Park Scientific Instruments Single axis vibration reducing system
JPH1089403A (ja) 1996-09-10 1998-04-07 Nikon Corp 防振装置
JP3825869B2 (ja) * 1997-03-19 2006-09-27 キヤノン株式会社 能動除振装置
WO1999026120A1 (fr) * 1997-11-18 1999-05-27 Nikon Corporation Eliminateur de vibrations, dispositif d'alignement et procede d'exposition par projection
US6260282B1 (en) * 1998-03-27 2001-07-17 Nikon Corporation Stage control with reduced synchronization error and settling time
JP4109747B2 (ja) * 1998-05-07 2008-07-02 キヤノン株式会社 アクティブ除振装置および露光装置
US6563128B2 (en) * 2001-03-09 2003-05-13 Cymer, Inc. Base stabilization system
US6650666B2 (en) 2000-02-09 2003-11-18 Cymer, Inc. Laser wavelength control unit with piezoelectric driver

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011505025A (ja) * 2007-11-28 2011-02-17 マイ ミュージック マシンズ インコーポレイテッド 適応ｍｉｄｉ風制御システム

Also Published As

Publication number Publication date
US20030041447A1 (en) 2003-03-06
WO2003069733A1 (en) 2003-08-21
EP1474844A1 (en) 2004-11-10
EP1474844A4 (en) 2006-02-22
AU2003212805A1 (en) 2003-09-04
US6872961B2 (en) 2005-03-29
EP1474844B1 (en) 2017-03-22

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