JP2005512160A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005512160A5 JP2005512160A5 JP2003552677A JP2003552677A JP2005512160A5 JP 2005512160 A5 JP2005512160 A5 JP 2005512160A5 JP 2003552677 A JP2003552677 A JP 2003552677A JP 2003552677 A JP2003552677 A JP 2003552677A JP 2005512160 A5 JP2005512160 A5 JP 2005512160A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- laser
- polymer coating
- numerical aperture
- laser beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 8
- 239000011248 coating agent Substances 0.000 claims 5
- 238000000576 coating method Methods 0.000 claims 5
- 229920000642 polymer Polymers 0.000 claims 5
- 239000011521 glass Substances 0.000 claims 3
- 230000003287 optical Effects 0.000 claims 3
- 230000001681 protective Effects 0.000 claims 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims 1
- -1 B 2 O 3 Inorganic materials 0.000 claims 1
- 229910005793 GeO 2 Inorganic materials 0.000 claims 1
- 229910010413 TiO 2 Inorganic materials 0.000 claims 1
- 230000001939 inductive effect Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
Claims (7)
- 保護高分子コーティングを有するガラス基材を選択するステップと、
高開口数レンズを用いて、フェムト秒レーザービームが該高分子コーティングを通過して該基材中の点に集束するようにすることにより、該高分子コーティングに損傷を与えることなく該基材の屈折率変化を誘起するステップと、
を含む、光デバイスの作製方法。 - 前記レーザービームを集束させるために使用する前記高開口数レンズが、0.6〜1.4の開口数を有する、請求項1に記載の方法。
- 前記レーザーのパルス幅が約20〜約600フェムト秒である、請求項1に記載の方法。
- 前記レーザーのパルス繰返し数が約10ヘルツ〜約200メガヘルツである、請求項1に記載の方法。
- 前記基材が前記レーザーに暴露されながら前記レーザービームに対して約10μm/秒〜約10cm/秒の速度で平行移動される、請求項1に記載の方法。
- 保護高分子コーティングを有するガラス基材を備え、該基材中または該基材上の少なくとも1つの領域が、変化した屈折率を有し、その変化が、該基材上に該保護高分子層が存在する状態で引き起こされたものである、光デバイス。
- 前記ガラス基材が、GeO2、B2O3、Al2O3、TiO2、およびP2O5よりなる群から選択される1つ以上の材料でドーピングされている、請求項6に記載の光デバイス。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34156501P | 2001-12-14 | 2001-12-14 | |
US10/295,804 US6853785B2 (en) | 2001-12-14 | 2002-11-15 | Index modulation in glass using a femtosecond laser |
PCT/US2002/037371 WO2003051785A2 (en) | 2001-12-14 | 2002-11-21 | Refractive index modulation in glass using a femtosecond laser |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005512160A JP2005512160A (ja) | 2005-04-28 |
JP2005512160A5 true JP2005512160A5 (ja) | 2006-01-05 |
Family
ID=26969340
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003552677A Pending JP2005512160A (ja) | 2001-12-14 | 2002-11-21 | フェムト秒レーザーを用いるガラスの屈折率変調 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6853785B2 (ja) |
EP (1) | EP1453764A2 (ja) |
JP (1) | JP2005512160A (ja) |
KR (1) | KR20040068219A (ja) |
AU (1) | AU2002352848A1 (ja) |
WO (1) | WO2003051785A2 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003091774A1 (fr) * | 2002-04-26 | 2003-11-06 | Japan Science And Technology Corporation | Reseau de fibre et procede de fabrication correspondant |
CA2396831A1 (en) * | 2002-08-02 | 2004-02-02 | Femtonics Corporation | Microstructuring optical wave guide devices with femtosecond optical pulses |
US6941052B2 (en) * | 2002-12-19 | 2005-09-06 | 3M Innovative Properties Company | Sensitized optical fiber method and article |
US7515792B2 (en) * | 2003-03-21 | 2009-04-07 | Her Majesty The Queen In Right Of Canada As Represented By The Minister Of Industry, Through The Communications Research Centre Canada | Method of increasing photosensitivity of glasses to ultrafast infrared laser radiation using hydrogen or deuterium |
US7486705B2 (en) | 2004-03-31 | 2009-02-03 | Imra America, Inc. | Femtosecond laser processing system with process parameters, controls and feedback |
GB0410821D0 (en) * | 2004-05-14 | 2004-06-16 | Univ Aston | Laser inscribed structures |
EP1851837B1 (en) * | 2004-12-20 | 2015-03-04 | Imra America, Inc. | Pulsed laser source with adjustable grating compressor |
US7447410B2 (en) * | 2005-07-14 | 2008-11-04 | Massachusetts Institute Of Technology | CHG ring resonators |
JP5302611B2 (ja) * | 2008-02-08 | 2013-10-02 | 株式会社オハラ | 光学部品用ガラス部材及びそれに用いるガラス組成物 |
US10105918B2 (en) | 2011-11-10 | 2018-10-23 | Conavi Medical Inc. | Internal optical elements produced by irradiation-induced refractive index changes |
US10474002B2 (en) | 2015-06-25 | 2019-11-12 | Cornell University | Generation of high energy mid-infrared continuum laser pulses |
KR200483170Y1 (ko) | 2016-07-12 | 2017-04-11 | 권태무 | 부싱 |
EP3715917A1 (en) * | 2019-03-25 | 2020-09-30 | Thorlabs, Inc. | Technique for optimizing the coupling to optical fibers |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4090776A (en) | 1976-10-13 | 1978-05-23 | Honeywell Inc. | Fabrication of optical waveguides |
US5443743A (en) | 1991-09-11 | 1995-08-22 | Pall Corporation | Gas plasma treated porous medium and method of separation using same |
US5620495A (en) * | 1995-08-16 | 1997-04-15 | Lucent Technologies Inc. | Formation of gratings in polymer-coated optical fibers |
US5761111A (en) | 1996-03-15 | 1998-06-02 | President And Fellows Of Harvard College | Method and apparatus providing 2-D/3-D optical information storage and retrieval in transparent materials |
JP3649835B2 (ja) | 1996-03-18 | 2005-05-18 | 独立行政法人科学技術振興機構 | 光導波路の作製方法 |
US6127050A (en) | 1997-05-22 | 2000-10-03 | Fromson; Howard A. | Archival imaging medium and method therefor |
JP3349422B2 (ja) | 1998-02-12 | 2002-11-25 | 科学技術振興事業団 | 光導波路アレイ及びその製造方法 |
WO2001009899A1 (en) | 1999-07-29 | 2001-02-08 | Corning Incorporated | Direct writing of optical devices in silica-based glass using femtosecond pulse lasers |
WO2001044871A1 (en) | 1999-12-17 | 2001-06-21 | Corning Incorporated | Femtosecond laser writing of glass, including borosilicate, sulfide, and lead glasses |
US6492026B1 (en) | 2000-04-20 | 2002-12-10 | Battelle Memorial Institute | Smoothing and barrier layers on high Tg substrates |
-
2002
- 2002-11-15 US US10/295,804 patent/US6853785B2/en not_active Expired - Fee Related
- 2002-11-21 EP EP02789806A patent/EP1453764A2/en not_active Withdrawn
- 2002-11-21 AU AU2002352848A patent/AU2002352848A1/en not_active Abandoned
- 2002-11-21 JP JP2003552677A patent/JP2005512160A/ja active Pending
- 2002-11-21 KR KR10-2004-7008997A patent/KR20040068219A/ko not_active Application Discontinuation
- 2002-11-21 WO PCT/US2002/037371 patent/WO2003051785A2/en active Application Filing
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2005512160A5 (ja) | ||
US10611667B2 (en) | Method and system for forming perforations | |
JP2810151B2 (ja) | レーザマーキング方法 | |
US8487212B2 (en) | Method of marking or inscribing a workpiece | |
JP3208730B2 (ja) | 光透過性材料のマーキング方法 | |
TWI424479B (zh) | 利用飛秒雷射圖案化多晶氧化銦錫之方法 | |
JP2011530436A5 (ja) | ||
JP2011530436A (ja) | ポリマー材料に表面下マークを提供する方法 | |
WO2015084860A1 (en) | Method and apparatus for internally marking a substrate having a rough surface | |
Liu et al. | Direct writing of 150 nm gratings and squares on ZnO crystal in water by using 800 nm femtosecond laser | |
Wlodarczyk et al. | Direct CO 2 laser-based generation of holographic structures on the surface of glass | |
Said et al. | Manufacturing by laser direct-write of three-dimensional devices containing optical and microfluidic networks | |
JP2017173593A5 (ja) | ||
TWI656933B (zh) | 形成用於電容觸控感測器之電極結構之方法及執行該方法之設備 | |
WO2003051785A3 (en) | Refractive index modulation in glass using a femtosecond laser | |
Kam et al. | Laser ablation and waveguide fabrication using CR39 polymer | |
JP2003257025A5 (ja) | ||
JP2005210103A5 (ja) | ||
JP2015521368A5 (ja) | ||
JP2003242644A5 (ja) | ||
KR20220035332A (ko) | 복합재의 분단 방법 | |
JP2004202498A (ja) | レーザ加工方式及びこの方式によって形成されるエンコーダスリット及び像表示体 | |
Ihlemann | Ultraviolet laser ablation patterning of oxide films for optical applications | |
US20050025425A1 (en) | Method for manucfacturing an optical device having a cavity | |
Okoshi et al. | F 2-laser writing of silica optical waveguides in silicone rubber |