JP2005511833A5 - - Google Patents
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- Publication number
- JP2005511833A5 JP2005511833A5 JP2003551180A JP2003551180A JP2005511833A5 JP 2005511833 A5 JP2005511833 A5 JP 2005511833A5 JP 2003551180 A JP2003551180 A JP 2003551180A JP 2003551180 A JP2003551180 A JP 2003551180A JP 2005511833 A5 JP2005511833 A5 JP 2005511833A5
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen
- integer
- branched
- polymer
- linear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000642 polymer Polymers 0.000 claims 9
- 229910052739 hydrogen Inorganic materials 0.000 claims 8
- 239000001257 hydrogen Substances 0.000 claims 8
- 150000002431 hydrogen Chemical class 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 3
- 125000000923 (C1-C30) alkyl group Chemical group 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 2
- 150000001336 alkenes Chemical class 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 125000003367 polycyclic group Chemical group 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 239000011593 sulfur Substances 0.000 claims 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 1
- 229910052794 bromium Inorganic materials 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34052601P | 2001-12-12 | 2001-12-12 | |
| PCT/IB2002/005795 WO2003050158A1 (en) | 2001-12-12 | 2002-12-12 | Polymeric compositions and uses therefor |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008088323A Division JP2008202055A (ja) | 2008-03-28 | 2008-03-28 | 高分子組成物およびその使用 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005511833A JP2005511833A (ja) | 2005-04-28 |
| JP2005511833A5 true JP2005511833A5 (cg-RX-API-DMAC7.html) | 2009-08-13 |
| JP4389158B2 JP4389158B2 (ja) | 2009-12-24 |
Family
ID=23333763
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003551180A Expired - Fee Related JP4389158B2 (ja) | 2001-12-12 | 2002-12-12 | 高分子組成物およびその使用 |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US6949609B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1461373B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP4389158B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR100880313B1 (cg-RX-API-DMAC7.html) |
| CN (2) | CN100413898C (cg-RX-API-DMAC7.html) |
| AT (1) | ATE354599T1 (cg-RX-API-DMAC7.html) |
| AU (1) | AU2002358247A1 (cg-RX-API-DMAC7.html) |
| DE (1) | DE60218342T2 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2003050158A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7442487B2 (en) * | 2003-12-30 | 2008-10-28 | Intel Corporation | Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresists |
| US7101654B2 (en) * | 2004-01-14 | 2006-09-05 | Promerus Llc | Norbornene-type monomers and polymers containing pendent lactone or sultone groups |
| US20050192409A1 (en) * | 2004-02-13 | 2005-09-01 | Rhodes Larry F. | Polymers of polycyclic olefins having a polyhedral oligosilsesquioxane pendant group and uses thereof |
| KR100971299B1 (ko) * | 2004-07-07 | 2010-07-20 | 프로메러스, 엘엘씨 | 감광성 유전체 수지 조성물 및 그 용도 |
| JP2006100563A (ja) * | 2004-09-29 | 2006-04-13 | Sumitomo Bakelite Co Ltd | 半導体装置 |
| JP5017793B2 (ja) * | 2005-04-06 | 2012-09-05 | Ｊｓｒ株式会社 | 環状オレフィン系付加重合体の製造方法 |
| JP2006321912A (ja) * | 2005-05-19 | 2006-11-30 | Jsr Corp | 環状オレフィン系付加重合体の製造方法 |
| JP2007002082A (ja) * | 2005-06-23 | 2007-01-11 | Jsr Corp | 環状オレフィン系付加重合体の製造方法 |
| JP2007009044A (ja) * | 2005-06-30 | 2007-01-18 | Jsr Corp | 環状オレフィン付加重合体の製造方法および環状オレフィン付加重合体 |
| JP4956956B2 (ja) * | 2005-10-12 | 2012-06-20 | Ｊｓｒ株式会社 | 水素化触媒および水素化重合体の製造方法 |
| JP4826242B2 (ja) * | 2005-12-12 | 2011-11-30 | Ｊｓｒ株式会社 | 環状オレフィン系付加重合体の製造方法 |
| EP2158233B1 (en) * | 2007-06-07 | 2018-10-31 | Albemarle Corporation | Adducts, adducts and oligomers, or adducts, oligomers and low molecular weight polymers, and their preparation |
| EP2072536A1 (en) * | 2007-12-17 | 2009-06-24 | Lanxess Inc. | Hydrogenation of diene-based polymers |
| JP2009256468A (ja) * | 2008-04-16 | 2009-11-05 | Asahi Glass Co Ltd | 含フッ素重合体の製造方法 |
| JP5051185B2 (ja) * | 2009-06-16 | 2012-10-17 | 住友ベークライト株式会社 | 半導体装置および樹脂組成物 |
| CN103874731B (zh) | 2011-09-07 | 2017-02-15 | 微量化学公司 | 用于在低表面能基底上制造浮雕图案的环氧制剂和方法 |
| US11635688B2 (en) * | 2012-03-08 | 2023-04-25 | Kayaku Advanced Materials, Inc. | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates |
| US8846295B2 (en) | 2012-04-27 | 2014-09-30 | International Business Machines Corporation | Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof |
| KR102373812B1 (ko) * | 2014-03-12 | 2022-03-11 | 메르크 파텐트 게엠베하 | 유기 전자 조성물 및 이의 장치 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| GB9120773D0 (en) * | 1991-10-01 | 1991-11-13 | Ici Plc | Modified olefin polymers |
| US5372912A (en) | 1992-12-31 | 1994-12-13 | International Business Machines Corporation | Radiation-sensitive resist composition and process for its use |
| US5468819A (en) | 1993-11-16 | 1995-11-21 | The B.F. Goodrich Company | Process for making polymers containing a norbornene repeating unit by addition polymerization using an organo (nickel or palladium) complex |
| US6294616B1 (en) | 1995-05-25 | 2001-09-25 | B. F. Goodrich Company | Blends and alloys of polycyclic polymers |
| JP3804138B2 (ja) * | 1996-02-09 | 2006-08-02 | Ｊｓｒ株式会社 | ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物 |
| US6136499A (en) * | 1996-03-07 | 2000-10-24 | The B. F. Goodrich Company | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| US6294615B1 (en) * | 1997-12-08 | 2001-09-25 | Tosch Corporation | Copolymer, cationic high molecular weight flocculating agent comprising the copolymer, and process for producing the copolymer |
-
2002
- 2002-12-12 AU AU2002358247A patent/AU2002358247A1/en not_active Abandoned
- 2002-12-12 AT AT02791946T patent/ATE354599T1/de not_active IP Right Cessation
- 2002-12-12 US US10/317,366 patent/US6949609B2/en not_active Expired - Fee Related
- 2002-12-12 WO PCT/IB2002/005795 patent/WO2003050158A1/en not_active Ceased
- 2002-12-12 DE DE60218342T patent/DE60218342T2/de not_active Expired - Lifetime
- 2002-12-12 CN CNB2005101269054A patent/CN100413898C/zh not_active Expired - Fee Related
- 2002-12-12 JP JP2003551180A patent/JP4389158B2/ja not_active Expired - Fee Related
- 2002-12-12 EP EP02791946A patent/EP1461373B1/en not_active Expired - Lifetime
- 2002-12-12 CN CNB028190815A patent/CN1253485C/zh not_active Expired - Fee Related
- 2002-12-12 KR KR1020047005844A patent/KR100880313B1/ko not_active Expired - Fee Related
-
2005
- 2005-09-07 US US11/220,814 patent/US7612146B2/en not_active Expired - Lifetime
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