JP2005311030A - Substrate processing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate processing device where a substrate is prevented from being contaminated, when it is transferred to a loader/unloader part when a pattern where no specific processing is performed to the substrate is produced. <P>SOLUTION: The substrate treatment device is provided with the loader/unloader for mounting a plurality of cassettes LC1 to LC4 housing the substrate W2; a plurality of treatment devices T1 to T8 for treating the substrate W2; a plurality of transferring means R1 to R4 for transferring the substrate W2; a plurality of carrying means C1 to C4 and C6 to C8, provided in the treatment devices for carrying the substrate W2; and a carrying device 3 provided between one side and the other side of each treatment devices arranged on both of the sides of it and moving on a prescribed carrying path. When no specific treatment to the substrate W2 is carried out, the carrying device 3 carries out the substrate W2 to the loader/unloader without via the plurality of transferring means R1 to R4 provided within the treatment devices. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

The present invention mainly relates to a substrate processing apparatus having transfer means and transfer means for transferring a substrate in the manufacture of semiconductors, liquid crystals and the like.

As a substrate processing apparatus such as a semiconductor manufacturing apparatus or a liquid crystal manufacturing apparatus, between various processing devices,
A substrate processing apparatus having a transfer means and a transfer means for transferring a substrate to be processed has been proposed.

1 and 2 are schematic plan views showing a conventional substrate processing apparatus 10. In the production line where the exposure process is performed by coating / development processing of semiconductors, liquid crystals, etc., when there is a pattern that does not perform development processing (no exposure process is required), there is no transport device that transports the substrate outside the processing equipment. In order to transport the substrate to the cassette of the loader / unloader unit, as shown in FIG. 2, the transport means provided in the development processing apparatus must be transported.

Even if a pattern other than the pattern that does not undergo development processing occurs, the substrate must be transported using transport means provided in the development processing apparatus. I could not respond.

Further, for example, Japanese Patent Application Laid-Open No. 2003-209154 discloses a substrate processing apparatus that can continue processing a substrate when a failure occurs in an inspection / measurement apparatus, but the substrate is transported to a cassette station. In order to do so, it had to be transported using a transport device in the station.
JP 2003-209154 A

When a pattern that does not undergo development processing occurs, the substrate is transported to the loader / unloader section using the transport means provided in the development processing apparatus, so the substrate that has been processed up to the previous step depending on the atmosphere in the development processing apparatus May be contaminated.

Further, for example, since the substrate processing apparatus described in Japanese Patent Application Laid-Open No. 2003-209154 has to transport the substrate to the cassette station by using the transport device in the station, There is a possibility that the substrate processed up to the previous step is contaminated by the atmosphere.

Therefore, the main object of the present invention is to prevent contamination of the substrate that may occur when the substrate is transported to the loader / unloader section even when a pattern that does not undergo development processing (no exposure process is required) occurs. There is to do.

In order to solve the above problems, according to the present invention, a loader / unloader unit for mounting a plurality of cassettes in which the substrate is stored, a plurality of processing apparatuses for performing processing on the substrate, and a transfer of the substrate. A plurality of transfer means to be mounted; a plurality of transfer means provided in the processing apparatus for transferring the substrate; and a predetermined transfer provided between one side and the other side of the plurality of processing apparatuses disposed on both sides A transfer device that moves on a road, and the transfer device removes the substrate without going through a plurality of transfer means provided in the processing device when a specific process is not performed on the substrate. There is provided a substrate processing apparatus which is transported to the loader / unloader section.

In addition, there is provided a substrate processing apparatus, wherein the transfer device that moves on the predetermined transfer path is a conveyor.

According to the present invention, even when a pattern that does not undergo development processing (no exposure process is required) occurs, the conveyance means provided in the development processing apparatus is not used, so that the substrate is conveyed to the loader / unloader section. In addition, it is possible to prevent the substrate from being contaminated which may be caused by the atmosphere in the developing device.

  Hereinafter, embodiments for carrying out the invention will be described with reference to the drawings.

FIG. 3 is a schematic plan view showing the substrate processing apparatus 1 according to the present invention. The substrate processing apparatus 1 includes a loader / unloader unit L, a plurality of processing apparatuses T1 to T8, a transfer means including a plurality of transfer robots R1 to R4 for transferring a substrate W, and a substrate provided in the processing apparatuses T1 to T8. Conveying means comprising a plurality of conveying conveyors C1 to C8 for conveying W, a conveying apparatus comprising a developing path conveyor 3 moving on a predetermined conveying path 2 provided between a plurality of processing apparatuses T1 to T8, and an exposure device E Have a summary.

First, a description will be given of substrate transport and processing including general development processing in a production line in which a semiconductor or liquid crystal coating or development process is performed up to an exposure process.

For example, the transfer robot R1 of the loader / unloader unit L takes out the substrate W1 from the cassette LC1 and transfers it onto the transport conveyor C1 in the processing apparatus T1.
Thereafter, the substrate W1 is transferred from the transfer conveyor C1 to the transfer conveyor C2 in the processing apparatus T2 and processed.

Thereafter, the substrate W1 is sent from the transfer conveyor C2 to the processing device T4 via the transfer conveyor C3 in the processing device T3, the transfer robot R3, and the like, and is processed by the processing device T4.

The substrate W1 is passed through a plurality of processing apparatuses T5, T6, transfer robot R4, etc. in the same procedure,
It is sent to the exposure apparatus E.
The substrate W1 processed by the exposure apparatus E passes through a plurality of processing apparatuses T7 and T8 (development processing apparatus), a plurality of transfer robots R4 and R2, a plurality of transfer conveyors C6, 7, and C8 in the same procedure. Then, it is transferred to the transfer robot R1 of the loader / unloader part L and finally returned to the predetermined cassette LC2.

Next, substrate processing in the case where a pattern that does not undergo development processing (does not require an exposure process) occurs will be described with reference to FIG.

For example, the transfer robot R1 of the loader / unloader unit L takes out the substrate W2 from the cassette LC1 and transfers it onto the transfer conveyor C1 in the processing apparatus T1.
Thereafter, the substrate W2 is transferred from the transfer conveyor C1 to the transfer conveyor C2 in the processing apparatus T2 and processed.

Thereafter, the substrate W2 is sent from the transfer conveyor C2 to the processing apparatus T4 via the transfer conveyor C3 in the processing apparatus T3, the transfer robot R3, and the like, and is processed by the processing apparatus T4.

Thereafter, the substrate W2 in the processing apparatus T4 is sent to the processing apparatus T5 and processed by the transfer robot R4. Next, the substrate W2 in the processing apparatus T5 is transferred by the transfer robot R4.
It is sent to the processing device T6 for processing. (Up to here, it is the same as normal substrate processing)

The substrate W2 in the processing apparatus T6 that does not perform development processing is transferred onto the transport conveyor C4 by the transfer robot R4.

Thereafter, the substrate W2 on the transport conveyor C4 is transferred to the developing path conveyor 3 that moves on a predetermined transport path 2 provided between the plurality of processing apparatuses T1 to T8, and is transferred to the loader / unloader section L side. It is conveyed toward the robot R2.

The transported substrate W2 is transferred into the processing apparatus T1 by the transfer robot R2. The substrate W2 delivered to the processing apparatus T1 is transferred to the loader / unloader unit L by the transfer robot R.
1 is finally returned to, for example, the cassette LC3.

In the case of the pattern not subjected to the development processing in this way, the substrate W2 is not transported in the processing devices T7 and T8 (development processing devices) used in the development process, and is loaded by the development path conveyor 3 by the loader /
Returned to the unloader section L side. Accordingly, the substrate processing apparatus 1 according to the present invention includes processing apparatuses T7 and T8.
Since the transport means provided in the (development processing apparatus) is not used, in the conventional substrate processing apparatus 10, contamination of the substrate that may occur due to the atmosphere in the development processing apparatus when the substrate is transported to the loader / unloader unit. Can be prevented.

It is a schematic plan view which shows the conventional substrate processing apparatus. (When developing) It is a schematic plan view which shows the conventional substrate processing apparatus. (When not developing) It is a schematic plan view which shows the substrate processing apparatus of this invention. (When developing) It is a schematic plan view which shows the substrate processing apparatus of this invention. (When not developing)

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 2 Conveyance path 3 Development path conveyor L Loader / unloader part E Exposure apparatus W, W1, W2 Substrate LC1, LC2, LC3, LC4 Cassette T1, T2, T3, T4, T5, T6, T7, T8 Processing apparatus C1, C2, C3, C4, C6, C7, C8 Transfer conveyor R1, R2, R3, R4 Transfer robot

Claims (2)

A substrate processing apparatus for performing a plurality of processes on a substrate,
A loader / unloader unit for mounting a plurality of cassettes in which the substrates are stored;
A plurality of processing apparatuses for processing the substrate;
A plurality of transfer means for transferring the substrate;
A plurality of transfer means provided in the processing apparatus for transferring the substrate;
A transport device provided between one side and the other side of the plurality of processing devices disposed on both sides and moving on a predetermined transport path;
The transport device transports the substrate to the loader / unloader unit without going through a plurality of transport means provided in the processing device when a specific process is not performed on the substrate. A substrate processing apparatus. 2. The conveying device that moves on the predetermined conveying path is a conveyor.
2. The substrate processing apparatus according to 1.

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