JP2013003157A - Exposure unit and exposure method using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exposure unit that can more efficiently perform exposure of a plurality of substrates to shorten the tact time, and an exposure method using the unit.SOLUTION: An exposure unit 10 comprises an exposure device 11, first and second transportation devices 12 and 13, and a control unit 20. The exposure device 11 includes: a mask stage 21 for holding a mask M; a substrate stage 24 including first and second work chucks 22 and 23 for holding substrates W1 and W2, respectively; a stage movement mechanism 25 capable of moving the first and second work chucks 22 and 23 in synchronization so that the substrates W1 and W2 held by the first and second work chucks 22 and 23 face the mask M; and an illumination optical system for irradiating the substrates W1 and W2 with light through the mask M. The first and second transportation devices 12 and 13 hold the substrates W1 and W2, respectively and carry the substrates W1 and W2 in and out of the first and second work chucks 22 and 23. The control unit 20 controls the first and second transportation devices 12 and 13 so that the carrying operations of the substrates W1 and W2 are performed in synchronization.

Description

  The present invention relates to an exposure unit and an exposure method using the same.

  Proximity exposure, in which the exposure pattern of the mask is exposed and transferred onto the substrate, is held on a mask holding frame of a mask stage by holding a translucent substrate (material to be exposed) coated with a photosensitive agent on the surface by a work chuck. For example, it is performed by a photolithographic technique in which an exposure pattern drawn on the mask is transferred onto the substrate by irradiating the mask with light for pattern exposure toward the mask with a gap of several tens of μm to several hundreds of μm, for example. Yes.

  As an exposure apparatus using such a proximity method, two work stages that respectively move the exposure position and the load / unload position, and the work can be carried into and out of each load / unload position. Two robots have been devised in which a workpiece on one workpiece stage is being exposed and a workpiece is loaded / unloaded on the other workpiece stage (see, for example, Patent Document 1). Further, in this exposure apparatus, one surface of the substrate is exposed all at once using one mask, or one surface is divided into a plurality of shots for exposure.

  In addition, in the exposure apparatus described in Patent Document 2, a stage apparatus that can move two stages with a footprint comparable to that of a single stage type stage apparatus is disclosed, and during an exposure operation on one stage, It is described that at least one of wafer exchange and alignment is performed on the other stage.

JP 2008-158545 A JP 2003-17404 A

  By the way, in the exposure apparatuses described in Patent Documents 1 and 2, the throughput is improved by simultaneous parallel processing with the exposure operation. However, it is required to perform the exposure operation of a plurality of substrates more efficiently. ing.

  The present invention has been made in view of the above-described problems, and an object of the present invention is to provide an exposure unit capable of more efficiently performing exposure of a plurality of substrates and reducing tact time, and the use thereof. It is to provide an exposure method.

The above object of the present invention can be achieved by the following constitution.
(1) a mask stage for holding a plurality of masks;
First and second substrate stages each having a plurality of work chucks each holding a plurality of substrates as exposure materials;
An exposure position where the plurality of substrates of the first or second substrate stage oppose the plurality of masks held on the mask stage, and a first substrate stage that carries in and out the plurality of substrates. A first stage moving mechanism for moving the first substrate stage between one loading / unloading position;
A second stage moving mechanism for moving the second substrate stage between the exposure position and a second loading / unloading position where the second substrate stage loads and unloads the plurality of substrates;
An illumination optical system that irradiates the plurality of substrates with exposure light through the plurality of masks;
An exposure apparatus comprising:
A first and a second transfer unit each holding a plurality of transfer devices that hold the substrate and can carry the substrate into and out of the plurality of work chucks;
With
In the exposure apparatus, the illumination optical system applies the plurality of masks while the plurality of substrates held on the first or second substrate stage face the plurality of masks held on the mask stage. And exposing the plurality of substrates simultaneously by irradiating the plurality of substrates with exposure light.
(2) When the plurality of substrates held on the first substrate stage are exposed at the exposure position, the second substrate stage waits at the second loading / unloading position,
When the plurality of substrates held on the second substrate stage are exposed at the exposure position, the first substrate stage stands by at the first loading / unloading position ( The exposure unit according to 1).
(3) The exposure unit according to (1) or (2), wherein the exposure apparatus is a batch exposure system.
(4) First and second substrate stages each having a mask stage for holding a plurality of masks, a plurality of work chucks for holding a plurality of substrates as exposure materials, and the first or second substrate, respectively. An exposure position where the plurality of substrates of the stage are opposed to the plurality of masks held on the mask stage, and a first loading / unloading position where the first substrate stage loads and unloads the plurality of substrates. A first stage moving mechanism for moving the first substrate stage, an exposure position, and a second loading / unloading position at which the second substrate stage loads and unloads the plurality of substrates. An exposure apparatus comprising: a second stage moving mechanism for moving the second substrate stage in between, and an illumination optical system for irradiating the plurality of substrates with exposure light through the plurality of masks When,
A first and a second transfer unit each holding a plurality of transfer devices that hold the substrate and can carry the substrate into and out of the plurality of work chucks;
An exposure method using an exposure unit comprising:
In a state where the plurality of substrates held on the first or second substrate stage face the plurality of masks held on the mask stage, the illumination optical system passes through the plurality of masks. An exposure method comprising exposing the plurality of substrates simultaneously by irradiating the substrate with exposure light.
(5) When the plurality of substrates held on the first substrate stage are exposed at the exposure position, the second substrate stage waits at the second loading / unloading position,
When the plurality of substrates held on the second substrate stage are exposed at the exposure position, the first substrate stage stands by at the first loading / unloading position ( The exposure method according to 4).

  According to the exposure unit and the exposure method using the same according to the present invention, the exposure apparatus includes first and second substrate stage moving mechanisms that can move the first and second substrate stages to exposure positions, respectively. The illumination optical system irradiates the plurality of substrates with the exposure light through the plurality of masks while the plurality of substrates held on the first or second substrate stage face the plurality of masks held on the mask stage. Thus, a plurality of substrates can be exposed simultaneously. Thereby, the exposure of a plurality of substrates can be performed efficiently, and the tact time can be shortened.

  In addition, since the first and second transfer units respectively have a plurality of transfer devices capable of loading and unloading the substrate with respect to each of the plurality of work chucks, the first and second transfer devices transfer the substrate to the plurality of work chucks. The carrying-in operation and the carrying-out operation of the substrate from the plurality of work chucks can be performed in synchronization, and the tact time can be further shortened.

It is a schematic block diagram for demonstrating the exposure unit which concerns on 1st Embodiment of this invention. It is a side view of the exposure apparatus of FIG. It is a schematic block diagram for demonstrating the exposure unit which concerns on the modification of 1st Embodiment. It is a side view of the conveyance conveyor of FIG. It is a schematic block diagram for demonstrating the exposure unit which concerns on 2nd Embodiment of this invention.

Hereinafter, an exposure unit according to a first embodiment of the present invention will be described in detail with reference to the drawings.
An exposure unit 10 according to an embodiment shown in FIG. 1 includes a proximity exposure apparatus 11, first and second transport units 12 and 13, and first and second transport units 12 and 13, respectively. Pre-alignment apparatuses 14 and 15, first and second carry-in conveyors 16 and 17, first and second carry-out conveyors 18 and 19, and a control unit 20 that controls these apparatuses are provided.

  The proximity exposure apparatus 11 holds a plurality of masks M1 and M2, respectively, and a plurality of mask stages 21A and 21B that can drive each mask M1 and M2 on the horizontal plane in X, Y drive and θ rotation, and as an exposed material. Of the first and second substrate stages 24 and 25 respectively including the first and second work chucks 22 and 23 holding the plurality of substrates W1 and W2, respectively. A plurality of substrates W1 and W2 held by the first and second work chucks 22 and 23 are exposed to the masks M1 and M2 held by the mask stages 21A and 21B, and a plurality of first substrate stages 24 are provided. A first stage moving mechanism 26 for moving the first substrate stage 24 between the first loading / unloading position B1 for loading and unloading the substrates W1 and W2, and exposure. A second stage moving mechanism for moving the second substrate stage 25 between the apparatus A and a second loading / unloading position B2 where the second substrate stage 25 loads and unloads the plurality of substrates W1, W2. 27 and an illumination optical system 28 that irradiates the substrates W1 and W2 with exposure light through the mask M. The mask stages 21A and 21B are provided with a plurality of alignment cameras 29A and gap actuators 29B, respectively.

  The proximity exposure apparatus 11 of this embodiment is a batch exposure method, in which the mask M and the substrates W1 and W2 are baked at 1: 1, and the exposure time of each of the substrates W1 and W2 is very short. The mask stage 21, the first and second stage moving mechanisms 26 and 27, the illumination optical system 28, and the like can be applied to known configurations. For example, the first and second stage moving mechanisms 26 and 27 may include a combination of a motor and a ball screw and a linear guide, or may include a linear motor and a linear guide. Further, the first and second stage moving mechanisms 26 and 27 may be integrated as in the present embodiment as long as the first and second work chucks 22 and 23 can move synchronously. Each of the first and second work chucks 22 and 23 may be a separate body.

  The first and second transport units 12 and 13 include first and second transport devices 32 and 33, respectively. The first transfer device 32 holds the substrate W1 and carries the substrate W1 in and out of the first work chuck 22 of the first or second substrate stage 24, 25, and also the first pre-feed device 32. The alignment device 14, the first carry-in conveyor 16, and the first carry-out conveyor 18 are arranged to be accessible. The second transport device 33 also holds the substrate W2, carries in and out the substrate W2 with respect to the second work chuck 23 of the first or second substrate stage 24, 25, and second The pre-alignment device 15, the second carry-in conveyor 17, and the second carry-out conveyor 19 are arranged to be accessible.

  In the present embodiment, the first and second transfer devices 32 and 33 of the transfer units 12 and 13 are arranged so as to be accessible to the work chucks 22 and 23 of the proximity exposure device 11 from different directions. Yes. In the present embodiment, as the first and second transfer devices 32 and 33, scalar type robots having robot arms 32a and 33a for holding the substrates W1 and W2 and driven in the horizontal direction and the vertical direction are applied. However, it may be a direct-acting robot or a belt conveyor. Moreover, each conveyance apparatus 32 and 33 may be comprised so that it may respectively have several robot arms 32a and 33a.

  The first and second pre-alignment apparatuses 14 and 15 pre-load the substrates W1 and W2 before loading the substrates W1 and W2 into the work chucks 22 and 23 of the first and second substrate stages 24 and 25, respectively. It is for alignment. Further, the first and second carry-in conveyors 16 and 17 carry the substrates W1 and W2 from the previous process, and the first and second carry-out conveyors 18 and 19 carry the substrates W1 and W2 to the subsequent process. . In addition, each pre-alignment apparatus 14 and 15, each carrying-in conveyor 16, 17 and each carrying-out conveyor 18 and 19 each apply | coats a well-known thing. Further, these pre-alignment devices 14 and 15 may be omitted, or pre-alignment may be performed using the first and second transport devices 12 and 13.

  The control unit 20 controls the proximity exposure device 11, the transport devices 32 and 33 of the transport units 12 and 13, the pre-alignment devices 14 and 15, the carry-in conveyors 16 and 17, and the carry-out conveyors 18 and 19. In addition, the control unit 20 performs the first and second transport apparatuses 12 so that the first and second transport apparatuses 12 and 13 perform the operations of loading and unloading the substrates W1 and W2 with respect to the proximity exposure apparatus 11 in synchronization. , 13 are controlled.

Hereinafter, an exposure method using the exposure unit 10 will be described.
First, when the substrates W1 and W2 are transported to the vicinity of the first and second pre-alignment devices 14 and 15 by the first and second carry-in conveyors 16 and 17 on the second transport unit 13 side, The robot arms 32a and 33a of the second transfer devices 32 and 33 hold the substrates W1 and W2, respectively, and drive the robot arms 32a and 33a synchronously to the first and second pre-alignment devices 14 and 15. Carry. Thereafter, the first and second transfer devices 32 and 33 place the substrates W1 and W2 on the first and second pre-alignment devices 14 and 15, respectively.

  After the first and second pre-alignment devices 14 and 15 pre-align the substrates W1 and W2, the robot arms 32a and 33a of the first and second transfer devices 32 and 33 hold the substrates W1 and W2. The robot arms 32a and 33a are synchronously driven to transport the substrates W1 and W2 onto the first and second work chucks 22 and 23 of the second substrate stage 25 located at the second loading / unloading position B2. To do.

  Next, the second stage moving mechanism 27 moves the second substrate stage 25 on which the substrates W1 and W2 are placed on the first and second work chucks 22 and 23 to the exposure position A. Then, after aligning the substrates W1 and W2 on the first and second work chucks 22 and 23 with respect to the masks M1 and M2, the substrates W1 and W2 are exposed.

  Note that while the second substrate stage 25 is standing by at the second loading / unloading position B2, the first substrate stage 24 is positioned at the exposure position A, and the first substrate stage 24 has the first position. The substrates W1 and W2 placed on the second work chucks 22 and 23 are exposed. When the second stage moving mechanism 27 moves to the exposure position A, the first stage moving mechanism 26 also moves from the exposure position A to the first loading / unloading position B1 in synchronization. Then, the first substrate stage 24 stands by at the first loading / unloading position B1 while the second substrate stage 25 is exposed at the exposure position A (see FIG. 1).

  Then, in the first and second work chucks 22 and 23 of the first substrate stage 24 located at the second loading / unloading position B1, the exposed substrates W1 and W2 are the first and second transport devices. The robot arms 32a and 33a are gripped by the robot arms 32a and 33a, and the robot arms 32a and 33a are synchronously driven to be transported to the first and second carry-out conveyors 18 and 19, respectively. The first and second work chucks 22 and 23 of the first substrate stage 24 are pre-aligned by synchronously driving the robot arms 32a and 33a of the first and second transfer devices 32 and 33. New substrates W1 and W2 are placed.

  The loading and unloading of the substrates W1 and W2 by the plurality of transfer devices 32 and 33 of the first transfer unit 12 with respect to the waiting first substrate stage 24 is performed by the plurality of substrates W1 held by the second substrate stage 25, By performing W2 at the same time as exposure at the exposure position A, the throughput of the exposure unit 10 may be improved, and by performing at different timings, vibrations generated by loading and unloading. May prevent the exposure operation from being affected and good exposure accuracy may be obtained. Further, loading and unloading of the substrates W1 and W2 by the plurality of transfer devices 32 and 33 of the second transfer unit 13 with respect to the waiting second substrate stage 25 is also performed by the plurality of substrates W1 held by the first substrate stage 24, W2 may be performed at the same time as the exposure at exposure position A, or may be performed at a different timing.

  Thereafter, by repeating the same operation, the plurality of substrates W1, W2 held on the first or second substrate stage 24, 25 face the plurality of masks M1, M2 held on the mask stages 21A, 21B. In this state, the illumination optical system 28 irradiates the plurality of substrates W1 and W2 with the exposure light through the plurality of masks M1 and M2, thereby simultaneously exposing the plurality of substrates W1 and W2.

  As described above, according to the exposure unit 10 and the exposure method of the present embodiment, the exposure apparatus 10 can move the first and second substrate stages W1 and W2 to the exposure position A, respectively. In a state where the stage moving mechanisms 26 and 27 are provided and the plurality of substrates W1 and W2 held by the first or second substrate stage 24 and 25 are opposed to the plurality of masks M1 and M2 held by the mask stage 21, The illumination optical system 28 irradiates the plurality of substrates W1 and W2 with exposure light through the plurality of masks M1 and M2, so that the plurality of substrates W1 and W2 can be exposed simultaneously. Thereby, the exposure of the plurality of substrates W1 and W2 can be performed efficiently, and the tact time can be shortened.

  The first and second transport units 12 and 13 have a plurality of transport devices 32 and 33 that can carry in and out the substrates W1 and W2 with respect to the plurality of work chucks 22 and 23, respectively. The second transfer devices 32 and 33 can perform the operation of loading the substrates W1 and W2 into the plurality of work chucks 22 and 23 and the operation of unloading the substrates W1 and W2 from the plurality of work chucks 22 and 23 in synchronization. The tact time can be further shortened.

  3 and 4 show a modification of the exposure unit 10 of the first embodiment. In this modification, the first and second carry-in and carry-out conveyors 30 and 31 are arranged in two upper and lower stages, and the exposure unit 10 can be designed in a compact manner. For this reason, the first and second transfer devices 32 and 33 can access the upper and lower carry-in and carry-out conveyors 30 and 31 by moving the robot arms 32a and 33a up and down.

  Next, an exposure unit according to the second embodiment of the present invention will be described with reference to FIG. In addition, the same code | symbol is attached | subjected about the same or equivalent part as 1st Embodiment, and description is abbreviate | omitted or simplified.

In the exposure unit 10a of the present embodiment, the first and second transport apparatuses 32 and 33 are arranged in parallel in close proximity to each other in parallel with the first and second substrate stages 24 and 25 of the proximity exposure apparatus 11. For this reason, the first and second pre-alignment devices 14 and 15 are also arranged almost symmetrically on the outside thereof, and the carry-in and carry-out conveyors 30 and 31 are also arranged in parallel.
About another structure, it is the same as that of 1st Embodiment, There exists an effect similar to 1st Embodiment.

Note that the present invention is not limited to the above-described embodiments and modifications, and modifications, improvements, and the like can be made as appropriate.
The exposure apparatus of the present invention is not limited to the proximity exposure apparatus of the present embodiment, and may be a contact type exposure apparatus.

10 Exposure Unit 11 Proximity Exposure Device (Exposure Device)
12 1st conveyance apparatus 13 2nd conveyance apparatus 14 1st pre-alignment apparatus 15 2nd pre-alignment apparatus 16 1st carrying-in conveyor 17 2nd carrying-in conveyor 18 1st carrying-out conveyor 19 2nd carrying-out conveyor 20 Control unit 21A, 21B Mask stage 22 First work chuck 23 Second work chuck M1, M2 Mask W1, W2 Substrate

Claims (5)

A mask stage for holding a plurality of masks;
First and second substrate stages each having a plurality of work chucks each holding a plurality of substrates as exposure materials;
An exposure position where the plurality of substrates of the first or second substrate stage oppose the plurality of masks held on the mask stage, and a first substrate stage that carries in and out the plurality of substrates. A first stage moving mechanism for moving the first substrate stage between one loading / unloading position;
A second stage moving mechanism for moving the second substrate stage between the exposure position and a second loading / unloading position where the second substrate stage loads and unloads the plurality of substrates;
An illumination optical system that irradiates the plurality of substrates with exposure light through the plurality of masks;
An exposure apparatus comprising:
A first and a second transfer unit each holding a plurality of transfer devices that hold the substrate and can carry the substrate into and out of the plurality of work chucks;
With
In the exposure apparatus, the illumination optical system applies the plurality of masks while the plurality of substrates held on the first or second substrate stage face the plurality of masks held on the mask stage. And exposing the plurality of substrates simultaneously by irradiating the plurality of substrates with exposure light. When the plurality of substrates held on the first substrate stage are exposed at the exposure position, the second substrate stage waits at the second loading / unloading position,
2. The first substrate stage stands by at the first loading / unloading position when the plurality of substrates held on the second substrate stage are exposed at the exposure position. The exposure unit described in 1.   The exposure unit according to claim 1, wherein the exposure apparatus is a batch exposure system. First and second substrate stages each having a mask stage for holding a plurality of masks, a plurality of work chucks for holding a plurality of substrates as exposure materials, and the first or second substrate stage. Between an exposure position facing the plurality of masks held by the plurality of substrates on the mask stage, and a first loading / unloading position where the first substrate stage loads and unloads the plurality of substrates, Between a first stage moving mechanism that moves the first substrate stage, the exposure position, and a second loading / unloading position where the second substrate stage loads and unloads the plurality of substrates, An exposure apparatus comprising: a second stage moving mechanism that moves the second substrate stage; and an illumination optical system that irradiates the plurality of substrates with exposure light through the plurality of masks;
A first and a second transfer unit each holding a plurality of transfer devices that hold the substrate and can carry the substrate into and out of the plurality of work chucks;
An exposure method using an exposure unit comprising:
In a state where the plurality of substrates held on the first or second substrate stage face the plurality of masks held on the mask stage, the illumination optical system passes through the plurality of masks. An exposure method comprising exposing the plurality of substrates simultaneously by irradiating the substrate with exposure light. When the plurality of substrates held on the first substrate stage are exposed at the exposure position, the second substrate stage waits at the second loading / unloading position,
5. The first substrate stage stands by at the first loading / unloading position when the plurality of substrates held on the second substrate stage are exposed at the exposure position. An exposure method according to 1.

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