JP2005310942A - 露光装置、露光方法、及びそれを用いたデバイス製造方法 - Google Patents

露光装置、露光方法、及びそれを用いたデバイス製造方法 Download PDF

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Publication number
JP2005310942A
JP2005310942A JP2004123870A JP2004123870A JP2005310942A JP 2005310942 A JP2005310942 A JP 2005310942A JP 2004123870 A JP2004123870 A JP 2004123870A JP 2004123870 A JP2004123870 A JP 2004123870A JP 2005310942 A JP2005310942 A JP 2005310942A
Authority
JP
Japan
Prior art keywords
exposure apparatus
optical system
projection exposure
projection
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2004123870A
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English (en)
Japanese (ja)
Other versions
JP2005310942A5 (enExample
Inventor
Kenichiro Shinoda
健一郎 篠田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004123870A priority Critical patent/JP2005310942A/ja
Priority to US11/110,350 priority patent/US7242457B2/en
Priority to EP05252428A priority patent/EP1589378A3/en
Publication of JP2005310942A publication Critical patent/JP2005310942A/ja
Publication of JP2005310942A5 publication Critical patent/JP2005310942A5/ja
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004123870A 2004-04-20 2004-04-20 露光装置、露光方法、及びそれを用いたデバイス製造方法 Abandoned JP2005310942A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004123870A JP2005310942A (ja) 2004-04-20 2004-04-20 露光装置、露光方法、及びそれを用いたデバイス製造方法
US11/110,350 US7242457B2 (en) 2004-04-20 2005-04-19 Exposure apparatus and exposure method, and device manufacturing method using the same
EP05252428A EP1589378A3 (en) 2004-04-20 2005-04-19 Exposure apparatus and exposure method and device manufacturing method using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004123870A JP2005310942A (ja) 2004-04-20 2004-04-20 露光装置、露光方法、及びそれを用いたデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2005310942A true JP2005310942A (ja) 2005-11-04
JP2005310942A5 JP2005310942A5 (enExample) 2007-05-31

Family

ID=34940903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004123870A Abandoned JP2005310942A (ja) 2004-04-20 2004-04-20 露光装置、露光方法、及びそれを用いたデバイス製造方法

Country Status (3)

Country Link
US (1) US7242457B2 (enExample)
EP (1) EP1589378A3 (enExample)
JP (1) JP2005310942A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009236819A (ja) * 2008-03-28 2009-10-15 Topcon Corp 光学装置、フォトマスク検査装置および露光装置
WO2013051147A1 (ja) * 2011-10-07 2013-04-11 キヤノン株式会社 画像取得装置の調整方法、画像取得装置および画像取得装置の製造方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1716458B1 (en) * 2004-02-17 2011-06-01 Carl Zeiss SMT GmbH Illumination system for a microlithographic projection exposure apparatus
US20080225257A1 (en) * 2007-03-13 2008-09-18 Nikon Corporation Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
JP4261591B2 (ja) * 2007-03-30 2009-04-30 アドバンスド・マスク・インスペクション・テクノロジー株式会社 照明光学装置および試料検査装置
KR101300733B1 (ko) * 2012-01-12 2013-08-27 연세대학교 산학협력단 다중 병렬 공초점 시스템

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6404482B1 (en) * 1992-10-01 2002-06-11 Nikon Corporation Projection exposure method and apparatus
US5724122A (en) 1995-05-24 1998-03-03 Svg Lithography Systems, Inc. Illumination system having spatially separate vertical and horizontal image planes for use in photolithography
US5684566A (en) 1995-05-24 1997-11-04 Svg Lithography Systems, Inc. Illumination system and method employing a deformable mirror and diffractive optical elements
JP3641767B2 (ja) 1996-07-02 2005-04-27 信越石英株式会社 集積回路製造用露光装置
JP3976083B2 (ja) 1997-03-25 2007-09-12 信越石英株式会社 回路パターン露光用光学系
IL132432A0 (en) * 1997-04-18 2001-03-19 Nikon Corp An exposure apparatus exposure method using the same and method of manufacture of circuit device
DE19855106A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Beleuchtungssystem für die VUV-Mikrolithographie
US6583937B1 (en) * 1998-11-30 2003-06-24 Carl-Zeiss Stiftung Illuminating system of a microlithographic projection exposure arrangement
DE10062579A1 (de) 1999-12-15 2001-06-21 Nikon Corp Optischer Integrierer,optische Beleuchtungseinrichtung, Photolithographie-Belichtungseinrichtung,und Beobachtungseinrichtung
US6788389B2 (en) * 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
JP3634782B2 (ja) * 2001-09-14 2005-03-30 キヤノン株式会社 照明装置、それを用いた露光装置及びデバイス製造方法
JP4324957B2 (ja) * 2002-05-27 2009-09-02 株式会社ニコン 照明光学装置、露光装置および露光方法
JP2004259786A (ja) * 2003-02-24 2004-09-16 Canon Inc 露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009236819A (ja) * 2008-03-28 2009-10-15 Topcon Corp 光学装置、フォトマスク検査装置および露光装置
WO2013051147A1 (ja) * 2011-10-07 2013-04-11 キヤノン株式会社 画像取得装置の調整方法、画像取得装置および画像取得装置の製造方法

Also Published As

Publication number Publication date
EP1589378A3 (en) 2007-05-23
EP1589378A2 (en) 2005-10-26
US7242457B2 (en) 2007-07-10
US20050231702A1 (en) 2005-10-20

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