JP2005305218A - Method and apparatus for leveling gas component concentration and gas component treatment apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for leveling a gas component concentration and a gas component treatment apparatus and more particularly to provide a method and an apparatus for leveling the concentration of a gas component contained in an gas stream and a treatment apparatus for treating a gas component contained in a gas stream with a treating agent and for easily leveling the gas component concentration of a gas stream. <P>SOLUTION: The apparatus 1 for leveling the gas component concentration comprises a vessel 2 having a gas stream inlet 3 and a gas stream exit 4, and an adsorbent layer 5 comprising an adsorbent capable of adsorbing the gas component and disposed in the vessel 2. The gas stream which enters the vessel 2 through the inlet 3 passes the adsorbent layer 5 and is then discharged from the exit 4. In the meanwhile, the gas component contained in the gas stream moves through the adsorbent layer 5 while it is repeatedly adsorbed and desorbed in the adsorbent layer 5. When the adsorbent layer 5 reaches the state in which a zone of the equilibrated adsorption of the gas component is formed, the gas concentration of the gas stream discharged from the exit 4 is leveled at a constant level regardless of the level of the gas component concentration of the gas stream entering the vessel 2 through the inlet 3. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a gas component concentration leveling method and leveling device, and a gas component processing device, and more particularly to a leveling method and leveling device for leveling the concentration of a gas component contained in an air stream and a gas contained in the air stream. The present invention relates to a processing apparatus for processing a component with a processing material.

  In a waste incineration facility, dioxins are generated during the incineration process of waste, and this may be contained in exhaust gas. For this reason, the exhaust gas from the incinerator is subjected to a dust removing process using a dust removing device such as a bag filter, for example, and then gaseous dioxins are decomposed using a catalyst. However, the exhaust gas discharged from the incinerator has a very high dioxin concentration at the start-up of the incinerator, and the dioxin concentration fluctuates greatly depending on the type and amount of waste. there's a possibility that. Therefore, in order to suppress the dioxin concentration in the exhaust gas released to the atmosphere below a certain regulation value, the maximum value of the dioxin concentration contained in the exhaust gas from the incinerator is predicted, and the maximum value is used as a standard. Thus, it is necessary to determine the catalyst amount. For example, since the decomposition reaction of dioxins by a catalyst is usually shown as a linear expression of the dioxins concentration, when the maximum value of the dioxins concentration is expected to be 100 times the average concentration, the required amount of catalyst is the average concentration. 3 times the amount of catalyst required for treating dioxins.

  In addition, in a catalyst activity evaluation test carried out in an experimental scale distribution system, a required gas component diluted with an inert gas is applied to a catalyst filled in a reaction vessel of a test apparatus at a constant supply rate and a constant concentration. It is necessary to supply. Here, gas from a gas cylinder whose gas component concentration is adjusted in advance, gas obtained by injecting a gas component into an inert gas with a metering pump such as a micro syringe pump, or gas in the inert gas using a bubbling device The gas obtained by generating the components is supplied to the catalyst in the reaction vessel, but the concentration of the gas components in the inert gas may fluctuate while pulsating (hunting). Hateful.

  Therefore, it is necessary to level the concentration of gas components contained in the airflow such as exhaust gas, and Patent Documents 1 and 2 describe examples of methods for that purpose. The method described in Patent Document 1 has a low-boiling-point solvent-containing gas (treated gas) whose concentration is discharged from a low-boiling-point solvent-containing gas generation source, and has an adsorbent once selected from granular activated carbon and granular zeolite. Adsorb to the adsorption dam mechanism. Then, the concentration of the gas to be processed after passing through the adsorption dam mechanism is detected by the gas concentration detection mechanism, and when the gas to be processed supplied to the adsorption dam mechanism is heated or cooled by feeding back the detection result to the temperature adjustment mechanism, The gas concentration in the gas to be processed can be leveled.

  On the other hand, the method described in Patent Document 2 relates to a denitration method for removing nitrogen oxides in exhaust gas. When the nitrogen oxide concentration of exhaust gas fluctuates in a short time, the nitrogen oxide concentration of exhaust gas is particularly high. In the case of large fluctuations alternately between high and low concentrations, the exhaust gas is brought into contact with the nitrogen oxide adsorbent to attempt to level the nitrogen oxide concentration and reduce the load on the denitration equipment. .

  Since the method described in Patent Document 1 applies TSA (Thermal Swing Adsorption) technology that adsorbs a low-concentration gas at a low temperature and desorbs the adsorbed gas at a high temperature with respect to an adsorbent. Such a gas concentration detection mechanism and a temperature adjustment mechanism require complicated temperature management of the gas to be processed. For this reason, this method is complicated to implement and is not easy to implement.

  On the other hand, since the method described in Patent Document 2 merely makes the exhaust gas contact the nitrogen oxide adsorbent, the leveling effect is that the nitrogen oxide concentration of the exhaust gas is relatively high. In this case, the amount of nitrogen oxide adsorbed in the nitrogen oxide adsorbent increases, and when the concentration of nitrogen oxide in the exhaust gas is relatively low, the amount of nitrogen oxide adsorbed in the nitrogen oxide adsorbent decreases. Due to the phenomenon, the fluctuation range of the nitrogen oxide concentration can be suppressed. That is, in the case of a symmetrical cycle in which the exhaust gas nitrogen oxide concentration fluctuation pattern fluctuates between a high concentration and a low concentration at approximately equal time intervals, the exhaust gas nitrogen oxide concentration fluctuates with only a small fluctuation range. (See FIG. 2 and FIG. 3 of Patent Document 2), and it is difficult to say that this is a substantial leveling effect. Moreover, even if this method is applied in the case of an asymmetric cycle in which the nitrogen oxide concentration fluctuation form of the exhaust gas is greatly different from the time at the high concentration and the time at the low concentration, the fluctuation range of the nitrogen oxide concentration is suppressed. However, since it is expected that concentration fluctuations due to asymmetric and similar cycles will occur, substantial leveling is not achieved. Therefore, in the method of Patent Document 2, it is still necessary to design a denitration facility in consideration of the concentration fluctuation range of nitrogen oxides, particularly the maximum concentration of nitrogen oxides.

Japanese Patent Application Laid-Open No. 11-114364 JP 2000-93740 A

  An object of the present invention is to easily level the gas component concentration of the airflow.

  The leveling method of the gas component concentration according to the present invention is a method for leveling the concentration of the gas component contained in the airflow, so that an equilibrium adsorption band of the gas component is generated in the adsorbent layer capable of adsorbing the gas component. , Including a step of passing an air stream through the adsorbent layer. The adsorbent layer used in this method is made of, for example, a carbon-based adsorbent.

  When the present inventors pass an air stream whose gas component concentration fluctuates with respect to an adsorbent layer capable of adsorbing a gas component, adsorption and desorption of the gas component are repeated in the adsorbent layer, and a predetermined time has elapsed. Later, a phenomenon was found in which adsorption / desorption of gas components reached equilibrium at the outlet side of the adsorbent layer. Further, the present inventors also found a phenomenon in which the gas component concentration is leveled when the airflow passes through the adsorbent layer in which the adsorption and desorption of the gas component has reached equilibrium. Therefore, in the gas component concentration leveling method according to the present invention, when an air stream is passed through the adsorbent layer, the gas component contained in the air stream moves through the adsorbent layer while repeating adsorption and desorption in the adsorbent layer. Thus, adsorption / desorption is balanced at the outlet side of the adsorbent layer. That is, an equilibrium adsorption band of gas components is generated in the adsorbent layer. The gas component concentration of the airflow after passing through the adsorbent layer where the equilibrium adsorption band of the gas component has occurred is leveled to a constant level regardless of the gas component concentration of the airflow before passing through the adsorbent layer. It becomes.

  A gas component concentration leveling apparatus according to the present invention is for leveling the concentration of a gas component contained in an air stream, and is disposed in a container having an inflow part and an exhaust part of the air stream, and the container. And an adsorbent layer capable of adsorbing gas components. Here, the adsorbent layer is set in a state where an equilibrium adsorption band of gas components is generated.

  In this gas component concentration leveling apparatus, the airflow flowing into the container from the inflow portion passes through the adsorbent layer disposed in the container and is discharged from the discharge portion. At this time, the gas component contained in the airflow passes through the adsorbent layer while repeating adsorption and desorption in the adsorbent layer. Here, since the adsorbent layer is set in a state where an equilibrium adsorption band of gas components is generated, the gas component concentration of the airflow discharged from the discharge portion is the gas component of the airflow flowing into the container from the inflow portion. It is leveled to a certain level regardless of the density.

  A gas component processing apparatus according to the present invention is for processing a gas component contained in an airflow with a processing material, and has a first inflow portion and a first discharge portion of the airflow, and has a gas component therein. A first container in which an adsorbent layer capable of adsorbing is disposed, a second inflow portion and a second exhaust portion of the airflow discharged from the first discharge portion, and filled with a treatment material therein And a second container. Here, the adsorbent layer is set in a state where an equilibrium adsorption band of gas components is generated. The treatment material used in this gas component treatment apparatus is, for example, a gas component decomposition catalyst or an adsorbent.

  In this gas component processing apparatus, the airflow flowing into the first container from the first inflow part passes through the adsorbent layer disposed in the first container and is discharged from the first discharge part. And the airflow discharged | emitted from the 1st discharge part flows in into a 2nd container from a 2nd inflow part, and passes through the processing material with which the 2nd container was filled, Then, it is discharged | emitted from a 2nd discharge part. At this time, the gas component contained in the airflow flowing into the first container from the first inflow portion passes through the adsorbent layer while repeating adsorption and desorption in the adsorbent layer. Here, since the adsorbent layer is set in a state where an equilibrium adsorption band of gas components is generated, the gas component concentration of the airflow discharged from the first discharge part to the second inflow part is from the first inflow part. Regardless of the gas component concentration of the airflow flowing into the first container, it is leveled to a certain level. Therefore, the air flow in which the gas component concentration is leveled flows into the second container from the second inflow portion. As a result, the gas component contained in the airflow flowing into the second container from the second inflow portion is stably processed without applying an excessive load to the processing material. For example, when a decomposition catalyst is used as the treatment material, the gas component is stably decomposed by the decomposition catalyst. Further, when an adsorbent is used as the treatment material, the gas component is easily adsorbed to the adsorbent. And the airflow by which the gas component was processed with the processing material is discharged | emitted from a 2nd discharge part.

  The gas component concentration leveling method according to the present invention includes a step of passing an air flow through the adsorbent layer so that an equilibrium adsorption band of the gas component is generated in the adsorbent layer. Even if the gas component is not forcedly adsorbed and desorbed from the material layer, the concentration of the gas component contained in the airflow can be easily leveled.

  The gas component concentration leveling apparatus according to the present invention is set in a state in which the adsorbent layer disposed in the container generates an equilibrium adsorption band of the gas component, so that the temperature of the airflow flowing into the container from the inflow portion is increased. Even if the gas component is not forcibly adsorbed and desorbed to the adsorbent layer by adjusting, the air flow in which the gas component concentration is leveled can be discharged from the discharge portion.

  In the gas component processing apparatus according to the present invention, the adsorbent layer disposed in the first container is set in a state where an equilibrium adsorption zone of the gas component is generated, and therefore flows into the first container from the first inflow portion. Even if the gas component is not adsorbed and desorbed from the adsorbent layer forcibly by adjusting the temperature of the air flow, the gas component concentration is supplied to the treatment material filled in the second container. And the gas component contained in the airflow can be stably treated with the treatment material.

  A gas component concentration leveling apparatus according to an embodiment of the present invention will be described with reference to FIG. In the figure, a leveling device 1 is for leveling a concentration of a predetermined adsorbed gas component (hereinafter simply referred to as a gas component) contained in an air stream, and mainly includes a container 2. The container 2 has an inflow portion 3 and a discharge portion 4 for airflow, and an adsorbent layer 5 is disposed inside.

  The adsorbent layer 5 is made of an adsorbent filled in the container 2 or a molded article (for example, a honeycomb-shaped article) of an adsorbent having air permeability disposed in the container 2. The adsorbent used here is not particularly limited as long as it can physically adsorb the gas component contained in the airflow, but for example, carbon-based adsorbent such as activated carbon and activated coke, zeolite Acid-treated clay, activated alumina, molecular sieve, bone char, clay, iron oxide, magnesia, silica gel and the like can be used. Two or more of these adsorbents may be used in combination. The shape of the adsorbent is not limited, and may be, for example, granular (for example, granular activated carbon), fibrous (for example, fibrous activated carbon), or a mixture thereof. As the adsorbent, it is preferable to use a carbon-based adsorbent having a large gas component adsorption / desorption capability, particularly activated carbon. Among them, it is preferable to use fibrous activated carbon having a large adsorption capacity of the gas component and a large adsorption rate. Particularly preferred.

  The adsorbent layer 5 is set in a state where an equilibrium adsorption band of gas components is generated. In the fixed bed adsorption operation, usually, when a fluid containing a certain concentration of adsorbate is supplied to the fixed layer of the adsorbent, the inlet concentration is increased in order from the inlet side to the outlet side in the length direction in the fixed layer of the adsorbent. An adsorption amount distribution consisting of a portion showing an equilibrium adsorption amount, an adsorption zone, and a non-adsorption zone occurs, and the adsorption zone moves to the outlet side as the gas passing time elapses and reaches breakthrough. On the other hand, as the present inventors found, when a fluid in which the adsorbate concentration periodically fluctuates between a high concentration and a low concentration is supplied to the fixed layer of the adsorbent, the high concentration time and the low concentration time are supplied. When a certain gas passage time has passed, including the case where the gas flow is not equal to each other, the amount of adsorption adsorbed at the time-averaged concentration of the gas component concentration at the inlet side is shown at the outlet side end of the adsorbent fixed layer. A part arises. In this portion, the adsorption amount or adsorption rate per hour of the adsorbate is substantially equal to the desorption amount or desorption rate. Therefore, the adsorption and desorption of the gas component are simultaneously performed at the same speed at the adsorbent layer 5, particularly at least the end portion on the discharge portion 4 side of the adsorbent layer 5 (that is, the end portion on the airflow discharge portion side of the adsorbent layer 5). The part which is progressing arises. Here, the state in which such a portion is generated is referred to as a state in which an equilibrium adsorption band is generated.

  Specifically, an air flow in which the gas component concentration periodically varies between a high concentration and a low concentration is continuously generated from the inflow portion 3 to the discharge portion 4 of the container 2 in which the adsorbent layer 5 is disposed. When it is allowed to pass, at the beginning of the passage of the air flow, as shown in FIG. 2A, the gas component is adsorbed on the inflow portion 3 side of the adsorbent layer 5 when the gas component concentration is high, and When the gas component concentration is low, the gas component is desorbed and adsorbed, but no adsorption or desorption of the gas component occurs on the discharge part 4 side of the adsorbent layer 5. Therefore, the gas component concentration of the airflow discharged from the discharge unit 4 is substantially zero. When time elapses in this state, as shown in FIG. 2B, when the gas component concentration is high from the inflow portion 3 side to the discharge portion 4 side of the adsorbent layer 5, the gas component is adsorbent layer. 5 in the order of adsorption, equilibrium (that is, a state where the adsorption amount or adsorption rate is substantially equal to the desorption amount or desorption rate), and adsorption, but if the gas component concentration is low, the gas component The adsorbent layer 5 behaves in the order of desorption, equilibrium, and adsorption. As a result, the gas component concentration of the airflow discharged from the discharge portion 4 starts to gradually increase from the substantially zero state described above regardless of the gas component concentration of the airflow flowing from the inflow portion 3. Then, when the time further elapses, as shown in FIG. 2C, the gas component is adsorbed or desorbed from the adsorbent layer 5 toward the discharge portion 4 side or adsorbed or desorbed from the adsorbent layer 5. It will behave in the order of these repetitions and equilibrium. In this way, the gas component concentration starts to pass through from the inflow portion 3 to the discharge portion 4 of the container 2 in which the adsorbent layer 5 is arranged, and starts to pass through the airflow periodically changing between a high concentration and a low concentration. When time elapses, the gas component in the airflow is in an equilibrium state regardless of whether the concentration is high or low with respect to the adsorbent layer 5 on the discharge portion 4 side of the adsorbent layer 5. That is, the adsorbent layer 5 is in a state in which an equilibrium adsorption band having an adsorption amount balanced with a concentration obtained by time-averaged the gas component concentration of the airflow flowing from the inflow portion 3 is generated at the end portion on the discharge portion 4 side.

  The state in which the adsorbent layer 5 has formed an equilibrium adsorption band of the gas component is that the mass transfer coefficient between the gas component and the adsorbent forming the adsorbent layer 5 and the length of the adsorbent layer 5 (from the end on the inflow portion 3 side). When the air flow containing the gas component is allowed to pass through the adsorbent layer 5 while adjusting the flow rate from the inflow portion 3 toward the discharge portion 4 in consideration of the length of the discharge portion 4 side end) Can be achieved later. Incidentally, when the state where the equilibrium adsorption zone is generated cannot be achieved, the state can be surely achieved by reducing the flow velocity of the air flow or increasing the amount of the adsorbent in the adsorbent layer 5.

  In the gas component concentration leveling method using the leveling device 1 described above, an air flow containing a gas component is introduced into the container 2 from the inflow portion 3. The gas component contained in the airflow is not particularly limited, and may be an organic gas component such as dioxins, precursors thereof, and other organic chlorine compounds, or oxygen, carbon dioxide, nitrogen oxides, and the like. It may be an inorganic gas component.

  Note that the airflow introduced into the container 2 does not require temperature adjustment by heating or cooling for forcibly adsorbing and desorbing the gas component on the adsorbent layer 5.

  The airflow introduced from the inflow part 3 into the container 2 passes through the adsorbent layer 5 and is discharged from the discharge part 4 to the outside of the container 2. At this time, the gas component contained in the air stream moves through the adsorbent layer 5 while repeating adsorption and desorption in the adsorbent layer 5, and as shown in FIG. An equilibrium adsorption band is produced at the end. As a result, the gas component concentration of the airflow after passing through the adsorbent layer 5, that is, the gas component concentration of the airflow discharged from the discharge portion 4, is the time of the gas component concentration of the airflow flowing into the container 2 from the inflow portion 3. The averaged density (hereinafter referred to as time average density) is leveled. Specifically, when the gas component concentration of the airflow flowing in from the inflow portion 3 is larger than the time average concentration, the gas component concentration of the airflow discharged from the discharge portion 4 is reduced to the time average concentration. On the contrary, when the gas component concentration of the airflow flowing in from the inflow portion 3 is smaller than the time average concentration, the gas component concentration of the airflow discharged from the discharge portion 4 rises to the time average concentration. More specifically, as shown in FIG. 3, even if the gas component concentration of the airflow flowing in from the inflow portion 3 pulsates in a short cycle as shown by the broken line in the figure, the airflow discharged from the discharge portion 4 The gas component concentration is leveled to the time average concentration as shown by the solid line in the figure. Further, as shown in FIG. 4, even if the gas component concentration of the airflow flowing in from the inflow portion 3 fluctuates over a long period as shown by the broken line in the figure, the gas of the airflow discharged from the discharge portion 4 The component concentration is leveled to the time average concentration as shown by the solid line in the figure.

  In the above-described leveling method, the airflow is preferably introduced from the inflow portion 3 to the adsorbent layer 5 at a flow rate at which an equilibrium adsorption band is maintained in the adsorbent layer 5. When the flow rate of the air flow exceeds the flow rate, the gas component concentration leveling effect may be difficult to obtain in the air flow discharged from the discharge unit 4.

  The leveling device 1 can be used, for example, in a catalyst activity evaluation test. For example, when a required gas component diluted with an inert gas is supplied to a catalyst filled in a reaction vessel and the catalytic activity is evaluated, the concentration of the gas component in the inert gas may fluctuate while pulsating (hunting). However, if this leveling device 1 is used, the gas component concentration in the inert gas supplied to the catalyst in the reaction vessel can be leveled, so that the catalyst activity can be accurately evaluated.

  Next, with reference to FIG. 5, an example of the gas component processing apparatus that employs the leveling apparatus 1 described above will be described. In the figure, a gas component processing apparatus 10 is for processing a gas component contained in an air flow using a processing material, and mainly includes a concentration adjusting unit 11 and a processing unit 12. The density adjusting unit 11 is the leveling device 1 configured as described above. On the other hand, the processing unit 12 mainly includes a container 20. The container 20 includes an airflow inflow portion 21 (an example of a second inflow portion) and a discharge portion 22 (an example of a second discharge portion), and also includes a treatment material layer 23 therein. In the processing unit 12, the inflow unit 21 is connected to the discharge unit 4 (an example of the first discharge unit) of the concentration adjusting unit 11. As a result, in the gas component processing apparatus 10, a series of airflow channels are formed from the inflow portion 3 (an example of the first inflow portion) of the concentration adjusting unit 11 to the discharge unit 22 of the processing unit 12.

  The treatment material layer 23 is made of a treatment material filled in the container 20. The treatment materials used here are various materials that can treat the gas components contained in the airflow according to the purpose. For example, various metal-based decomposition catalysts for decomposing the gas components and gas components are adsorbed. It is an adsorbent for When the adsorbent is used, the type thereof may be the same as that of the adsorbent used in the concentration controller 11 (that is, the leveling device 1), or may be a different type. However, the treatment material layer 23 made of this adsorbent is different from the adsorbent layer 5 used in the concentration adjusting unit 11 and does not equalize the gas component concentration to the time average concentration.

  In this gas component processing apparatus 10, the airflow that has flowed into the container 2 from the inflow portion 3 of the concentration adjusting section 11 is discharged from the discharge section 4 after passing through the adsorbent layer 5, and subsequently supplied to the processing section 12. . Here, the airflow discharged from the discharge part 4 flows into the container 20 from the inflow part 21, passes through the treatment material layer 23, and is then discharged from the discharge part 22 to the outside of the container 20. At this time, the gas component contained in the airflow is processed according to the function of the processing material by the processing material of the processing material layer 23. For example, when a decomposition catalyst is used as the treatment material, the gas component is decomposed by the action of the decomposition catalyst. When an adsorbent is used as the treatment material, the gas component is adsorbed on the adsorbent and removed from the airflow. Therefore, in these cases, the airflow discharged from the discharge unit 22 of the processing unit 12 does not substantially contain a gas component, or the gas component concentration is greatly reduced.

  Here, when the gas component concentration of the airflow supplied to the inflow portion 3 of the concentration adjusting unit 11 fluctuates, the concentration of the gas component contained in the airflow is caused by the action described above in the concentration adjusting unit 11. Leveled. Therefore, the gas component concentration of the airflow supplied from the concentration adjusting unit 11 to the processing unit 12 is leveled. For this reason, in the processing unit 12, if the processing material layer 23 is formed with an amount of processing material that is set in the concentration adjusting unit 11 and that can sufficiently process the gas component having a uniform level at a certain level, Regardless of the gas component concentration of the airflow supplied to the inflow portion 3 of the concentration adjusting unit 11, the gas component contained in the airflow can be stably processed. In other words, in the processing unit 12, it is not necessary to set the processing material amount of the processing material layer 23 on the assumption that the gas component concentration of the air flow is significantly significantly increased, and the minimum necessary amount of processing material is used. The gas component contained in the airflow can be stably processed.

  The gas component processing apparatus 10 described above can be incorporated into an exhaust passage extending from an incinerator in a waste incineration facility such as industrial waste or general household waste. Here, normally, the exhaust flow path is connected to the inflow portion 3 on the concentration adjustment unit 11 side of the gas component processing apparatus 10, and the exhaust gas is sent to the atmosphere at the discharge unit 22 on the processing unit 12 side of the gas component processing apparatus 10. Connect the chimney for discharge. In this case, the exhaust gas containing dioxins in a gas state discharged from the incinerator is leveled at a constant level in the concentration control unit 11. Then, the exhaust gas containing dioxins whose concentration is leveled to a certain level is processed according to the type of the processing material in the processing unit 12, and is released from the chimney to the atmosphere with the dioxins substantially removed. The Here, the exhaust gas from the incinerator may temporarily increase the concentration of dioxins depending on the type and amount of waste during start-up of the incinerator or during the incineration process. Because the dioxin concentration is leveled to a certain level in the concentration adjusting device 11 (that is, the dioxin concentration of the exhaust gas is lowered to a certain level), the processing material layer 23 of the processing unit 12 has a processing capability. It can be stably processed by the processing material layer 23 without applying an excessive load.

  The leveling device 1 described in the above embodiment was manufactured. Here, as the adsorbent layer 5, a honeycomb-shaped molded product of fibrous activated carbon (trade name “CH59”, Osaka Gas Chemical Co., Ltd.), which is an adsorbent, was used. In addition, the fibrous activated carbon used the state in which the equilibrium adsorption zone has not arisen. Further, the length of the adsorbent layer 5 (the length of passage of airflow) was set to 40 mm.

  Air in which the chlorobenzene concentration fluctuated was supplied to the inflow portion 3 of the leveling device 1. This air is a cycle in which the supply of chlorobenzene-containing air for 2 minutes and the supply of chlorobenzene-free air (clean air) for 20 minutes are made one cycle, and the chlorobenzene concentration is changed by repeating this cycle. The chlorobenzene concentration in the chlorobenzene-containing air is 2,550 ppm. The linear velocity of air in the adsorbent layer 5 was adjusted to 5 cm / second.

  The result of continuously measuring the chlorobenzene concentration of the air discharged from the discharge unit 4 of the leveling device 1 is shown in FIG. The chlorobenzene concentration in the air discharged from the discharge unit 4 was measured with a total hydrocarbon meter.

  According to FIG. 6, the adsorbent layer 5 has reached an equilibrium adsorption zone when about 20 hours have passed since the start of supplying air to the inflow portion 3, but is then discharged from the discharge port 4. The chlorobenzene concentration in the air is leveled to approximately 232 ppm and is stable. The concentration after leveling corresponds to the time average per cycle (2,550 ppm × 2 minutes / 22 minutes = 232 ppm) of the amount of chlorobenzene contained in the total amount of air per cycle supplied to the inlet 3. Yes.

1 is a schematic diagram of an embodiment of a gas component concentration leveling apparatus according to the present invention. The schematic diagram which shows the adsorption / desorption behavior of the gas component in the said adsorbent layer until the adsorbent layer used in the said embodiment reaches the state in which the equilibrium adsorption zone was produced. The conceptual diagram which shows an example of the relationship between the gas component density | concentration of the airflow before applying the leveling method of the gas concentration by the said embodiment, and the gas component concentration of the airflow after application. The conceptual diagram which shows the other example of the relationship between the gas component density | concentration of the airflow before applying the gas concentration leveling method by the said embodiment, and the gas component concentration of the airflow after application. The schematic of one Embodiment of the gas component processing apparatus which concerns on this invention. The figure which shows the result of an Example.

Explanation of symbols

1 Gas component concentration leveling device 2, 20 Container 3, 21 Inflow portion 4, 22 Discharge portion 5 Adsorbent layer 23 Treatment material layer

Claims (6)

A method for leveling the concentration of gas components contained in an air stream,
Including passing the air stream through the adsorbent layer so that an equilibrium adsorption band of the gas component is generated in the adsorbent layer capable of adsorbing the gas component.
A method for leveling gas component concentrations.   The gas component concentration leveling method according to claim 1, wherein the adsorbent layer is made of a carbon-based adsorbent. An apparatus for leveling the concentration of gas components contained in an air stream,
A container having an inflow portion and a discharge portion for the airflow;
An adsorbent layer disposed in the container and capable of adsorbing the gas component;
The adsorbent layer is set in a state where an equilibrium adsorption band of the gas component has occurred,
Gas component concentration leveling device. A processing device for processing a gas component contained in an air stream with a processing material,
A first container having a first inflow portion and a first discharge portion of the air flow, and an adsorbent layer capable of adsorbing the gas component disposed therein;
A second inflow portion and a second discharge portion of the airflow discharged from the first discharge portion, and a second container filled with the processing material therein,
The adsorbent layer is set in a state where an equilibrium adsorption band of the gas component has occurred,
Gas component processing equipment.   The gas component processing apparatus according to claim 4, wherein the treatment material is a decomposition catalyst for the gas component.   The gas component processing apparatus according to claim 4, wherein the processing material is an adsorbent for the gas component.

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