JP2005300250A - 光干渉測定装置、光干渉測定方法、光学素子、及び露光装置 - Google Patents

光干渉測定装置、光干渉測定方法、光学素子、及び露光装置 Download PDF

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Publication number
JP2005300250A
JP2005300250A JP2004113974A JP2004113974A JP2005300250A JP 2005300250 A JP2005300250 A JP 2005300250A JP 2004113974 A JP2004113974 A JP 2004113974A JP 2004113974 A JP2004113974 A JP 2004113974A JP 2005300250 A JP2005300250 A JP 2005300250A
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JP
Japan
Prior art keywords
light
measurement
optical path
path length
optical
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Pending
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JP2004113974A
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English (en)
Japanese (ja)
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JP2005300250A5 (enExample
Inventor
Eiji Aoki
栄二 青木
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004113974A priority Critical patent/JP2005300250A/ja
Publication of JP2005300250A publication Critical patent/JP2005300250A/ja
Publication of JP2005300250A5 publication Critical patent/JP2005300250A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004113974A 2004-04-08 2004-04-08 光干渉測定装置、光干渉測定方法、光学素子、及び露光装置 Pending JP2005300250A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004113974A JP2005300250A (ja) 2004-04-08 2004-04-08 光干渉測定装置、光干渉測定方法、光学素子、及び露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004113974A JP2005300250A (ja) 2004-04-08 2004-04-08 光干渉測定装置、光干渉測定方法、光学素子、及び露光装置

Publications (2)

Publication Number Publication Date
JP2005300250A true JP2005300250A (ja) 2005-10-27
JP2005300250A5 JP2005300250A5 (enExample) 2007-06-07

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JP2004113974A Pending JP2005300250A (ja) 2004-04-08 2004-04-08 光干渉測定装置、光干渉測定方法、光学素子、及び露光装置

Country Status (1)

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JP (1) JP2005300250A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011099756A (ja) * 2009-11-05 2011-05-19 Canon Inc 計測装置
US8373866B2 (en) 2008-03-07 2013-02-12 Canon Kabushiki Kaisha Wavefront aberration measuring apparatus, wavefront aberration measuring method, exposure apparatus, and device manufacturing method
US10088522B2 (en) 2015-09-16 2018-10-02 Toshiba Memory Corporation Apparatus and method for detecting faults in multilayer semiconductors
US10359468B2 (en) 2016-03-16 2019-07-23 Toshiba Memory Corporation Thermal laser stimulation apparatus, method of thermally stimulating, and non-transitory computer readable medium
CN114414073A (zh) * 2022-03-15 2022-04-29 中国工程物理研究院激光聚变研究中心 一种超短脉冲激光系统中光谱相位的测量方法
US20240264035A1 (en) * 2023-02-03 2024-08-08 Onto Innovation Inc. Interferometer with auxiliary lens for measurement of a transparent test object

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8373866B2 (en) 2008-03-07 2013-02-12 Canon Kabushiki Kaisha Wavefront aberration measuring apparatus, wavefront aberration measuring method, exposure apparatus, and device manufacturing method
JP2011099756A (ja) * 2009-11-05 2011-05-19 Canon Inc 計測装置
US10088522B2 (en) 2015-09-16 2018-10-02 Toshiba Memory Corporation Apparatus and method for detecting faults in multilayer semiconductors
US10359468B2 (en) 2016-03-16 2019-07-23 Toshiba Memory Corporation Thermal laser stimulation apparatus, method of thermally stimulating, and non-transitory computer readable medium
CN114414073A (zh) * 2022-03-15 2022-04-29 中国工程物理研究院激光聚变研究中心 一种超短脉冲激光系统中光谱相位的测量方法
CN114414073B (zh) * 2022-03-15 2023-06-02 中国工程物理研究院激光聚变研究中心 一种超短脉冲激光系统中光谱相位的测量方法
US20240264035A1 (en) * 2023-02-03 2024-08-08 Onto Innovation Inc. Interferometer with auxiliary lens for measurement of a transparent test object
US12442717B2 (en) * 2023-02-03 2025-10-14 Onto Innovation Inc. Interferometer with auxiliary lens for measurement of a transparent test object

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