JP2005285904A - Semiconductor wafer and manufacturing method therefor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a semiconductor wafer in which a difference in level between a scribe line formed on a semiconductor substrate and an integrated circuit is reduced, and thereby to enable reducing uneven resist coating on the integrated circuit. <P>SOLUTION: A silicon wafer is formed with an IC 51, a sealing part 52, and a scribe line 53 on a p-Si substrate 21. A wiring layer 24c is formed on the flat surface of the uppermost insulating layer 25b, a metal layer 54c comprising the same material as that of the wiring layer 24c on the uppermost layer is formed on the sealing part 52. A flattened insulating layer 55 with flattened surface is formed on the entire surface of the IC 51, sealing part 52, and scribe line 53 to cover the wiring layer 24c and metal layer 54c. A passivation film 56 is formed on the flatted insulation layer 55, and GMR devices 6-9 are formed on the passivation film 56. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a semiconductor wafer and a method for manufacturing the same, and more particularly, by reducing a step between a scribe line formed on a semiconductor substrate and an integrated circuit portion, resist application unevenness is reduced, and the integrated circuit portion. The present invention relates to a technique capable of improving the dimensional accuracy of a thin film element formed thereon and, as a result, improving the characteristics of the thin film element.

Conventionally, semiconductor devices such as ICs and LSIs form a plurality of integrated circuit (IC) parts on a semiconductor wafer such as a silicon wafer by using a thin film growth technique, a lithography technique, an etching technique, and the like, and the semiconductor wafer is diced. The integrated circuit (IC) parts are separated from each other by cutting along a scribe line using a saw or the like to form a semiconductor chip, the semiconductor chip is bonded to a lead frame, and then resin molded.
2. Description of the Related Art In recent years, with the increase in functionality, size, and thickness of various electronic devices, composite semiconductor devices in which functions such as a magnetic sensor, a temperature sensor, and a pressure sensor are added to a semiconductor device have been proposed and put into practical use.
One type of composite semiconductor device is a semiconductor device with a magnetic sensor in which a giant magnetoresistive effect (GMR) element is added to an integrated circuit (IC) (see, for example, Patent Document 1).

FIG. 5 is a plan view showing an example of a silicon wafer (semiconductor wafer) on which a plurality of conventional semiconductor chips with a magnetic sensor (semiconductor device) are formed, and FIG. 6 is an enlarged view showing the semiconductor chip with a magnetic sensor and its peripheral part. FIG. 7 is a plan view taken along line AA in FIG.
In the figure, reference numeral 1 denotes a silicon wafer, and a plurality of integrated circuit formation regions are formed in a matrix by forming scribe lines 3 on a silicon substrate (semiconductor substrate) 2 in a lattice shape. An integrated circuit (IC) portion 4 is formed in each region.

The IC unit 4 has a laminated structure in which wiring layers including electric circuits and insulating layers are alternately laminated, and an integrated circuit including an analog / digital converter (ADC), a memory (M), an analog circuit (AnC), and the like. (IC) 5 and giant magnetoresistive (GMR) elements 6 to 9 provided adjacent to the outside of each side (four sides in FIG. 6) of the IC 5 and electrically connected to the IC 5 These GMR elements 6 to 9 constitute a magnetic sensor.
A seal ring portion 11 is formed around the IC portion 4, and a scribing that is a band-like region having a predetermined width formed between adjacent IC formation regions is formed outside the seal ring portion 11. Line 3 is formed.
In the scribe line 3, a semiconductor chip separating groove 13 is formed along the center line.

  As shown in FIG. 7, the cross-sectional structure of the IC portion 4, the seal ring portion 11, and the scribe line 3 is an analog-digital converter (ADC), memory (on a p-type silicon substrate (p-Si substrate) 21) M), an IC (not shown) having an analog circuit (AnC) and the like and an insulating layer 22 made of silicon oxide are formed, and covers the IC and the insulating layer 22, and one end portion extends to the seal ring portion 11. An insulating layer 23 is formed, and on this insulating layer 23, a wiring layer 24a having a predetermined wiring pattern, an insulating layer 25a, a wiring layer 24b having a predetermined wiring pattern, and an insulating layer 25b are sequentially stacked. These insulating layers 23, 25a, and 25b are laminated in the seal ring portion 11 so as to be inclined so that the upper insulating layer 25a covers the lower insulating layer 23 and the upper insulating layer b covers the lower insulating layer 16a. Yes.

The GMR elements 6 to 9 and the wiring layer 24c are formed on the flat surface of the uppermost insulating layer 25b, and the uppermost wiring layer 24c and the uppermost wiring layer 24c are formed on the inclined surface extending to the seal ring portion 11. A metal layer 26 made of the same layer is formed so that the lower end thereof is in contact with the p-Si substrate 21, and a passivation film made of silicon nitride (covering the GMR elements 6 to 9, the wiring layer 24 c and the metal layer 26 ( A protective insulating layer) 28 is formed. The wiring layers 24a to 24c are electrically connected to each other by a metal filled in the via hole.
The lower end portion of the passivation film 28 is patterned so as to be accommodated in the seal ring portion 11, and a region on the p-Si substrate 21 that is exposed without being covered with the passivation film 28 is a scribe line 3.

FIG. 8 is a cross-sectional view showing another example of a conventional silicon wafer. This integrated circuit (IC) portion 31 is flat so as to cover the upper ends of the GMR elements 6 to 9, the wiring layer 24 c and the metal layer 26. A passivation insulating layer 32 is formed, and a passivation film 33 is formed so as to cover the planarizing insulating layer 32 and the metal layer 26.
FIG. 9 is a cross-sectional view showing still another example of a conventional silicon wafer. This seal ring portion 41 includes a metal layer 42a, an insulating layer 25a, and a wiring made of the same layer as the insulating layer 23 and the wiring layer 24a. A metal layer 42b made of the same layer as the layer 24b, an insulating layer 25b, and a metal layer 42c made of the same layer as the wiring layer 24c are laminated, and these metal layers 42a to 42c are electrically connected to each other by the metal filled in the via holes. A planarization insulating layer 32 is formed so as to cover the GMR elements 6 to 9, the wiring layer 24 c, and one end of the metal layer 42 c, and an upper portion of the planarization insulation layer 32 and the metal layer 42 c, and the insulating layer 23, A passivation film 33 is formed so as to cover the end portions of 25a and 25b, and the lower end portion of the passivation film 33 is patterned so as to be within the seal ring portion 41. A.
Since these semiconductor chips with a magnetic sensor have a structure in which a magnetoresistive effect element is incorporated in an IC, they can cope with high functionality, downsizing, and thinning of various electronic devices.
Japanese Patent Laid-Open No. 5-121793

By the way, in a so-called chip region of a conventional semiconductor chip with a thin film element, the IC portions 4 and 31 have a multilayer structure in which a wiring layer including an electric circuit and an insulating layer are stacked. Since a thin film element such as a magnetic sensor is generally formed with a thin film thickness so as not to deteriorate the characteristics thereof, the thin film element is formed on the multilayer structure by flattening with a protective layer.
However, since the surface of the p-Si substrate 21 is exposed in the scribe line 3 that partitions these chip regions, the level difference is large, and a thin film element is formed on the IC portions 4 and 31. In the resist formation region, resist application unevenness (striation) occurs, and as a result, the shape and dimensions of the thin film element may become unstable. Further, there is a possibility that the exposed Si is affected by contaminants originating from the thin film element.

  The present invention has been made in view of the above circumstances, and by reducing the step between the scribe line formed on the semiconductor substrate and the integrated circuit portion, uneven application of the resist in the integrated circuit portion is achieved. To provide a semiconductor wafer that can be reduced, and as a result, can improve the dimensional accuracy of a thin film element formed on the integrated circuit portion, and can improve the characteristics of the thin film element, and a method for manufacturing the same. With the goal.

In order to solve the above-mentioned problems, the present invention provides the following semiconductor wafer and method for manufacturing the same.
That is, the semiconductor wafer of the present invention has a plurality of integrated circuit formation regions partitioned by a scribe region on a semiconductor substrate, and an integrated circuit portion having a multilayer structure is formed in these integrated circuit formation regions. A semiconductor wafer in which a seal ring part is formed around a part, wherein a metal layer corresponding to the uppermost wiring layer of the integrated circuit part is formed on the seal ring part, and the metal layer and the integrated circuit formation are formed A planarization insulating layer whose surface is planarized so as to cover the region and the scribe region is formed, and a protective insulating layer is formed over the planarization insulating layer.

  In this semiconductor wafer, a metal layer corresponding to the uppermost wiring layer of the integrated circuit portion is formed on the seal ring portion, and the surface is flattened so as to cover the metal layer, the integrated circuit formation region, and the scribe region. And forming the protective insulating layer on the planarization insulating layer, the integrated circuit formation region, the seal ring portion, and the entire scribe region are planarized, and the integrated circuit formation region and the scribe region are formed. The step between is lost. As a result, resist application unevenness in the integrated circuit portion is reduced, the dimensional accuracy of the thin film element formed on the integrated circuit portion is increased, and the characteristics of the thin film element are improved.

The planarization insulating layer is selectively removed so that the depression of the metal layer is exposed, and the protective insulating layer is formed on the surfaces of the metal layer and the planarization insulating layer.
In this semiconductor wafer, the planarization insulating layer is selectively removed so that the depressions of the metal layer are exposed, and the protective insulating layer is formed on the surfaces of the metal layer and the planarization insulating layer, thereby removing moisture. The planarization insulating layer serving as an intrusion path is cut by the seal ring portion, and there is no possibility of moisture entering the integrated circuit portion.

The planarizing insulating layer is selectively removed so that a flat portion of the metal layer is exposed, and the protective insulating layer is formed on the surfaces of the metal layer and the planarizing insulating layer.
In this semiconductor wafer, the planarization insulating layer is selectively removed so that the flat portion of the metal layer is exposed, and the protective insulation layer is formed on the surface of the metal layer and the planarization insulation layer, thereby integrating the planarization insulation layer. A step between the circuit formation region and the scribe region and the seal ring portion is reduced.

The planarization insulating layer formed on the metal layer is entirely removed so that the surface of the metal layer and the surface of the planarization insulation layer are flush with each other, and the protective insulation layer is formed on these surfaces. It is characterized by that.
In this semiconductor wafer, the planarization insulating layer formed on the metal layer is entirely removed so that the surface of the metal layer and the surface of the planarization insulating layer are flush with each other, and the protective insulation layer is formed on these surfaces. Since the integrated circuit forming region, the seal ring portion, and the entire scribe region are flattened, there is no step between the integrated circuit forming region and the scribe region.
Further, since the planarization insulating layer on the metal layer is entirely removed, the planarization insulation layer serving as a moisture intrusion path is cut by the seal ring portion, and there is no possibility of moisture entering the integrated circuit portion.

A thin film element is formed on the planarization insulating layer or the protective insulating layer.
In this semiconductor wafer, since the thin film element is formed on the planarization insulating layer or the protective insulating layer, the integrated circuit portion and the thin film element are integrated, and the function as the integrated circuit and the function as the thin film element are obtained. It is possible to further increase the functionality, size, and thickness of devices that have both.

The thin film element is a magnetoresistive element.
In this semiconductor wafer, since the thin film element is a magnetoresistive effect element, the integrated circuit portion and the magnetoresistive effect element are integrated to further enhance the function of a device having both an integrated circuit function and a magnetic sensor function. Functionalization, downsizing, and thinning are possible.

  The method for producing a semiconductor wafer of the present invention has a plurality of integrated circuit formation regions partitioned by a scribe region on a semiconductor substrate, and forms an integrated circuit portion having a multilayer structure in these integrated circuit formation regions. A method of manufacturing a semiconductor wafer in which a seal ring part is formed around a circuit part, wherein a metal layer is formed on the seal ring part at the same time as forming an uppermost wiring layer of the integrated circuit part. A planarization insulating layer is formed so as to cover the integrated circuit formation region and the scribe region, and a thin film element is formed directly on the planarization insulation layer or on the planarization insulation layer via a protective insulation layer. It is characterized by that.

  In this method of manufacturing a semiconductor wafer, a metal layer is formed on the seal ring portion at the same time as forming the uppermost wiring layer of the integrated circuit portion so as to cover the metal layer, the integrated circuit forming region, and the scribe region. By forming the planarization insulating layer, the integrated circuit formation region, the seal ring portion, and the entire scribe region are planarized, so that a semiconductor wafer without a step between the integrated circuit formation region and the scribe region can be easily manufactured. Is done.

  Another method of manufacturing a semiconductor wafer according to the present invention includes a plurality of integrated circuit forming regions partitioned by a scribe region on a semiconductor substrate, and forming an integrated circuit portion having a multilayer structure in these integrated circuit forming regions. A semiconductor wafer manufacturing method in which a seal ring part is formed around an integrated circuit part of the above, wherein a metal layer is formed on the seal ring part at the same time as forming the uppermost wiring layer of the integrated circuit part. A planarization insulating layer is formed so as to cover the metal layer, the integrated circuit formation region, and the scribe region, and the planarization insulating layer on the metal layer is selectively removed, and directly on the remaining planarization insulating layer or A thin film element is formed over the planarization insulating layer with a protective insulating layer interposed therebetween.

  In this method of manufacturing a semiconductor wafer, a metal layer is formed on the seal ring portion at the same time as forming the uppermost wiring layer of the integrated circuit portion so as to cover the metal layer, the integrated circuit forming region, and the scribe region. By forming a planarization insulating layer and selectively removing the planarization insulating layer on the metal layer, the planarization insulation between the integrated circuit formation region and the scribe region is small and becomes a moisture infiltration path. The layer is cut at the seal ring portion, and a semiconductor wafer without the possibility of moisture entering the integrated circuit portion is easily manufactured.

In these semiconductor wafer manufacturing methods, a second protective insulating layer is formed so as to cover at least the thin film element.
In this semiconductor wafer manufacturing method, the second protective insulating layer is formed so as to cover at least the thin film element, so that the thin film element is protected from the external environment by the second protective insulating layer.

These semiconductor wafer manufacturing methods are characterized in that the surface of the planarization insulating layer is planarized by chemical mechanical polishing (CMP).
In this method of manufacturing a semiconductor wafer, a planarized insulating layer having an optical flatness of nanometer order can be easily obtained by planarizing the surface of the planarized insulating layer by chemical mechanical polishing.

  According to the semiconductor wafer of the present invention, a metal layer corresponding to the uppermost wiring layer of the integrated circuit portion is formed on the seal ring portion, and the surface is flattened so as to cover the metal layer, the integrated circuit formation region, and the scribe region. And forming a protective insulating layer on the planarizing insulating layer, the step between the integrated circuit forming region and the scribe region can be eliminated. Unevenness of application of the resist can be reduced, the dimensional accuracy of the thin film element formed on the integrated circuit portion can be increased, and the characteristics of the thin film element can be improved.

  If the planarization insulating layer is selectively removed so that the depression of the metal layer is exposed, and the protective insulation layer is formed on the surfaces of the metal layer and the planarization insulation layer, the planarization that becomes a moisture intrusion path The insulating layer can be cut at the seal ring portion, and moisture can be prevented from entering the integrated circuit portion.

  If the planarizing insulating layer is selectively removed so that the flat portion of the metal layer is exposed, and the protective insulating layer is formed on the surfaces of the metal layer and the planarizing insulating layer, an integrated circuit forming region and a scribe region are formed. And the seal ring portion can be reduced, and therefore, resist application unevenness in the integrated circuit portion can be reduced, and the dimensional accuracy of the thin film element formed on the integrated circuit portion can be increased. And the characteristics of the thin film element can be improved.

If the planarization insulating layer formed on the metal layer is entirely removed so that the surface of the metal layer and the surface of the planarization insulating layer are flush with each other, and the protective insulating layer is formed on these surfaces, The integrated circuit formation region, the seal ring portion, and the entire scribe region can be flattened, and a step between the integrated circuit formation region and the scribe region can be eliminated.
In addition, since the planarization insulating layer on the metal layer is entirely removed, the planarization insulation layer serving as a moisture intrusion path can be cut by the seal ring portion, and moisture intrusion to the integrated circuit portion is prevented. be able to.

  If a thin film element is formed on the planarization insulating layer or the protective insulating layer, the integrated circuit portion and the thin film element can be integrated, and the function as an integrated circuit and the function as a thin film element are combined. The device can be further enhanced in function, size, and thickness.

  If the thin film element is a magnetoresistive effect element, the integrated circuit portion and the magnetoresistive effect element can be integrated, and further enhancement of the function of the device having the function as an integrated circuit and the function as a magnetic sensor, A reduction in size and thickness can be achieved.

  According to the method for manufacturing a semiconductor wafer of the present invention, the uppermost wiring layer of the integrated circuit portion is formed and at the same time a metal layer is formed on the seal ring portion so as to cover the metal layer, the integrated circuit formation region and the scribe region. Since the planarization insulating layer is formed, a semiconductor wafer having no step between the integrated circuit formation region and the scribe region can be easily manufactured.

  According to another semiconductor wafer manufacturing method of the present invention, the uppermost wiring layer of the integrated circuit portion is formed, and at the same time, a metal layer is formed on the seal ring portion, covering the metal layer, the integrated circuit forming region, and the scribe region. Since the planarization insulating layer is formed and the planarization insulation layer on the metal layer is selectively removed, there is a small step between the integrated circuit formation region and the scribe region and there is a risk of moisture intrusion into the integrated circuit portion. It is possible to easily produce a semiconductor wafer that does not exist.

When the second protective insulating layer is formed so as to cover at least the thin film element, the thin film element can be protected from the external environment by the second protective insulating layer.
If the surface of the planarization insulating layer is planarized by chemical mechanical polishing (CMP), a planarization insulating layer having an optical flatness of nanometer order can be easily obtained. Therefore, a semiconductor wafer having no step between the integrated circuit formation region and the scribe region can be easily manufactured.

Embodiments of a semiconductor wafer and a manufacturing method thereof according to the present invention will be described with reference to the drawings.
“First Embodiment”
FIG. 1 is a cross-sectional view showing the main part of a silicon wafer (semiconductor wafer) on which a plurality of semiconductor chips with a magnetic sensor (semiconductor device) according to the first embodiment of the present invention are formed. In FIG. Constituent elements that are the same as those in FIG.

In FIG. 1, reference numeral 51 denotes an integrated circuit (IC) portion formed in an integrated circuit formation region on the p-Si substrate 21, 52 denotes a seal ring portion formed around the IC portion 51, and 53 denotes a seal ring portion 52. These are scribe lines (scribe regions) formed between the integrated circuit forming regions adjacent to the outside of the semiconductor device.
An insulating layer 23 made of silicon oxide (SiO ₂ ) is formed so as to cover the IC portion 51 and the scribe line 53 on the p-Si substrate 21, and the insulating layer 23 has a predetermined wiring pattern and is made of gold (Au ), A wiring layer 24a made of a metal such as aluminum (Al) is formed, and a metal layer 54a made of the same material as the wiring layer 24a is formed so as to cover the central portion of the seal ring portion 52. An insulating layer 25a made of SiO ₂ is formed on the insulating layer 23 including 24a so as to cover both ends of the metal layer 54a.

  A wiring layer 24b having a predetermined wiring pattern and made of a metal such as Au or Al is formed on the insulating layer 25a, and a metal layer 54b made of the same material as the wiring layer 24b is formed at the bottom. An insulating layer 25b is formed so as to be in contact with the metal layer 54a and covers both ends of the wiring layer 24b, the insulating layer 25a, and the metal layer 54b. On the flat surface of the uppermost insulating layer 25b, The GMR elements 6 to 9 and the wiring layer 24c are formed, and the metal layer 54c made of the same material as the uppermost wiring layer 24c covers the central portion of the seal ring portion 52, and the bottom thereof is in contact with the metal layer 54b. It is formed like this.

A flattened insulating layer 55 made of SiO ₂ whose surface is flattened is formed so as to cover the wiring layer 24c and the metal layer 54c, and the flattened insulating layer 55 is made of silicon nitride (Si ₃ N ₄ ). A passivation film (protective insulating layer) 56 is formed, and GMR elements 6 to 9 are formed on the passivation film 56.

  As described above, the planarization insulating layer 55 covers the entire IC portion 51, the seal ring portion 52, and the scribe line 53, and the surface thereof is a flat surface, so that the space between the IC portion 51 and the scribe line 53 is provided. There is no step. As a result, even when a resist is applied on the IC portion 51 to form a thin film element, uneven coating does not occur, and the dimensional accuracy of the thin film element formed on the IC portion 51 is eliminated. Will also increase.

Next, a method for manufacturing this silicon wafer will be described.
Using a normal thin film technique, on the p-Si substrate 21, an insulating layer 23, a wiring layer 24a, a metal layer 54a, an insulating layer 25a, a wiring layer 24b, a metal layer 54b, an insulating layer 25b, GMR elements 6 to 9, A wiring layer 24c and a metal layer 54c are formed.

Next, a coating solution mainly composed of perhydropolysilazane is applied by SOG (Spin On Glass) method so as to cover the wiring layer 24c and the metal layer 54c, and then left for a predetermined time to perform leveling. A flat coating film is used. This coating film is baked at about 450 ° C. in the atmosphere to form a planarization insulating layer 55 made of high-purity SiO ₂ . The surface of the planarization insulating layer 55 has excellent flatness.

Next, a passivation film 56 made of Si ₃ N ₄ is formed so as to cover the planarization insulating layer 55 by CVD.
For example, in the case of a plasma CVD method, a film can be formed at a growth temperature of about 300 ° C. using SiH ₄ —NH ₃ (N ₂ ) or SiH ₄ —N ₂ O as a raw material.
Next, GMR elements 6 to 9 are formed on the passivation film 56.
Thereafter, a second protective insulating layer (not shown) is formed so as to cover the GMR elements 6-9.

In this manufacturing method, the step between the IC portion 51 and the scribe line 53 is eliminated by forming the planarization insulating layer 55 so as to cover the wiring layer 24c and the metal layer 54c. Thereby, a silicon wafer having no step between the IC portion 51 and the scribe line 53 can be easily obtained.
Further, a coating liquid mainly composed of perhydropolysilazane is applied so as to cover the wiring layer 24c and the metal layer 54c, and then baked in the atmosphere at about 450 ° C. to flatten the layer made of high-purity SiO ₂ . By using the insulating layer 55, the planarized insulating layer 55 having excellent surface flatness can be easily obtained.

  As described above, according to the silicon wafer of this embodiment, the planarization insulating layer 55 is formed so as to cover the entire IC portion 51, seal ring portion 52, and scribe line 53, and the surface thereof is flat. Therefore, the step between the IC part 51 and the scribe line 53 can be eliminated. Therefore, even when a resist is applied on the IC portion 51 to form a thin film element, the coating unevenness can be reduced, and the dimensional accuracy of the thin film element formed on the IC portion 51 can be reduced. Can be increased.

According to the silicon wafer manufacturing method of the present embodiment, the planarization insulating layer 55 is formed so as to cover the entire IC part 51, seal ring part 52, and scribe line 53. A silicon wafer without a step can be produced.
Further, a coating solution containing perhydropolysilazane as a main component is applied so as to cover the IC portion 51, the seal ring portion 52, and the scribe line 53, and then baked in the atmosphere at about 450 ° C. Since the planarization insulating layer 55 made of SiO _{2 is used} , the planarization insulation layer 55 having excellent surface flatness can be easily obtained.

“Second Embodiment”
A method for manufacturing a silicon wafer (semiconductor wafer) according to the second embodiment of the present invention will be described.
Since the silicon wafer manufacturing method according to the present embodiment is a method for manufacturing the silicon wafer according to the first embodiment described above, it will be described with reference to FIG.

Using a normal thin film technique, an insulating layer 23, a wiring layer 24a, a metal layer 54a, an insulating layer 25a, a wiring layer 24b, a metal layer 54b, an insulating layer 25b, a wiring layer 24c, and a metal layer are formed on the p-Si substrate 21. 54c is formed.
Next, a planarizing insulating layer 55 made of SiO ₂ is formed using SiH ₄ —O ₂ as a raw material by a chemical vapor deposition (CVD) method so as to cover the wiring layer 24 c and the metal layer 54 c.

On the surface of the planarization insulating layer 55, irregularities having shapes similar to the surface shapes of the insulating layer 25b, the wiring layer 24c, and the metal layer 54c, which are base layers, are formed. Therefore, the entire surface of the planarization insulating layer 55 is polished by CMP to planarize the surface.
In this CMP, a silicon wafer to be polished is mounted on a polishing head, and fine particles such as SiO ₂ and cerium oxide (CeO ₂ ) are placed in an alkaline aqueous solution such as potassium hydroxide (KOH) and aqueous ammonia (NH ₄ OH). The dispersed slurry is dropped on a polishing pad mounted on a surface plate, and the above silicon wafer is rotated at a predetermined angular velocity under a predetermined pressure while simultaneously revolving on a surface plate rotating at different angular speeds. Is done.
As a result, the planarized insulating layer 55 whose surface is polished and has an optical flatness of nanometer order can be obtained.

Next, a passivation film 56 made of Si ₃ N ₄ is formed so as to cover the planarization insulating layer 55 by CVD.
For example, in the case of a plasma CVD method, a film can be formed at a growth temperature of about 300 ° C. using SiH ₄ —NH ₃ (N ₂ ) or SiH ₄ —N ₂ O as a raw material.
As described above, a silicon wafer having no step between the IC portion 51 and the scribe line 53 can be obtained.

According to this manufacturing method, the planarization insulating layer 55 is formed so as to cover the entire IC portion 51, seal ring portion 52, and scribe line 53, and the surface of the planarization insulation layer 55 is planarized. A silicon wafer having no step between 51 and the scribe line 53 can be easily manufactured.
Further, since the entire surface of the planarization insulating layer 55 is polished by CMP and the surface is planarized, the planarization insulating layer 55 having an optical flatness of the order of nanometers can be easily obtained. Therefore, a silicon wafer having no step between the IC portion 51 and the scribe line 53 can be easily manufactured.

Instead of polishing and planarizing the surface of the planarization insulating layer 55 by CMP, the surface of the passivation film 56 may be polished and planarized by CMP.
Even in such a case, a silicon wafer having no step between the IC portion 51 and the scribe line 53 can be easily manufactured.

“Third Embodiment”
FIG. 2 is a cross-sectional view showing the main part of a silicon wafer (semiconductor wafer) on which a plurality of semiconductor chips with a magnetic sensor (semiconductor device) according to the third embodiment of the present invention are formed. The difference from the silicon wafer of the first embodiment described above is that in the silicon wafer of the first embodiment, a planarization insulating layer 55 is formed so as to cover the entire surface of the metal layer 54c. Whereas the passivation film 56 is formed on the entire surface, the silicon wafer of this embodiment forms a window 57 by selectively removing the planarization insulating layer 55 on the metal layer 54c by dry etching or the like. A passivation film is formed so as to expose a recess corresponding to the scribe region of the metal layer 54c and to cover the remaining planarization insulating layer 55 and the exposed metal layer 54c. 6 is a point that was formed.

A method for manufacturing this silicon wafer will be described.
Until the planarization insulating layer 55 is formed, the manufacturing method of the first embodiment is exactly the same.
Thereafter, the planarization insulating layer 55 on the metal layer 54c is etched (selectively removed) by dry etching or the like to expose a recess corresponding to the scribe region of the metal layer 54c.
Next, a passivation film 56 is formed by plasma CVD or the like so as to cover the surface of the planarization insulating layer 55 and the exposed metal layer 54c.
As described above, a silicon wafer having no step between the IC portion 51 and the scribe line 53 can be obtained.

Also in the silicon wafer of this embodiment, since the planarization insulating layer 55 covers the IC part 51 and the scribe line 53 as a whole, the step between the IC part 51 and the scribe line 53 can be eliminated.
Further, since the planarization insulating layer 55 on the metal layer 54c is selectively removed and the passivation film 56 is directly formed on the exposed surface of the metal layer 54c, the planarization insulating layer 55 serving as a moisture intrusion path is formed as a seal ring. It is cut | disconnected by the part 52, and the penetration | invasion of the water | moisture content to the IC part 51 can be prevented.

  According to the method for manufacturing a silicon wafer of the present embodiment, the planarization insulating layer 55 is etched to expose a recessed portion corresponding to the scribe region of the metal layer 54c, so as to cover the surface of the exposed metal layer 54c. Since the passivation film 56 is formed, it is possible to easily manufacture a silicon wafer that does not have a step between the IC unit 51 and the scribe line 53 and that does not cause moisture to enter the IC unit 51.

“Fourth Embodiment”
FIG. 3 is a cross-sectional view showing the main part of a silicon wafer (semiconductor wafer) on which a plurality of semiconductor chips with a magnetic sensor (semiconductor device) according to the fourth embodiment of the present invention are formed. The difference from the silicon wafer of the first embodiment described above is that in the silicon wafer of the first embodiment, a planarization insulating layer 55 is formed so as to cover the entire surface of the metal layer 54c. Whereas the passivation film 56 is formed on the entire surface, in the silicon wafer of this embodiment, the planarization insulating layer 55 formed on a relatively flat portion of the metal layer 54c is selectively removed by dry etching or the like to selectively remove the window 58. The window 58 exposes a relatively flat portion of the surface of the metal layer 54c, and covers the remaining planarization insulating layer 55 and the exposed metal layer 54c. The Shibeshon film 56 in that the film formation.
Here, the “relatively flat portion of the metal layer 54c” refers to a boundary portion between the scribe region of the metal layer 54c and the integrated circuit formation region, and here, the metal layer is in a flat state. .

Also in this silicon wafer, since the planarization insulating layer 55 covers the entire IC portion 51, most of the seal ring portion 52 and the entire scribe line 53, the step between the IC portion 51 and the seal ring portion 52. Can be very small.
In addition, the planarization insulating layer 55 formed on the relatively flat portion of the metal layer 54c is selectively removed, and the passivation film 56 is directly formed on the exposed surface of the metal layer 54c. The planarization insulating layer 55 is cut at the seal ring portion 52, and moisture can be prevented from entering the IC portion 51.

“Fifth Embodiment”
FIG. 4 is a cross-sectional view showing the main part of a silicon wafer (semiconductor wafer) on which a plurality of semiconductor chips with a magnetic sensor (semiconductor device) according to a fifth embodiment of the present invention are formed. The difference from the silicon wafer of the first embodiment described above is that in the silicon wafer of the first embodiment, a planarization insulating layer 55 is formed so as to cover the entire surface of the metal layer 54c. Whereas the passivation film 56 is formed on the entire surface, in the silicon wafer of this embodiment, the planarization insulating layer 55 is etched back to a predetermined depth by dry etching or the like until the surface of the metal layer 54c is exposed. The surface of the layer 54c and the surface of the planarization insulating layer 55 are flush with each other, and on the planar surface so as to cover the remaining planarization insulating layer 55 and the metal layer 54c. The Sshibeshon film 56 in that the film formation.

Also in this silicon wafer, since the planarization insulating layer 55 covers the IC part 51, the seal ring part 52 and the scribe line 53, a step between the IC part 51 and the seal ring part 52 can be eliminated. .
In addition, since the planarization insulating layer 55 is cut at the metal layer 54c, the planarization insulating layer 55 serving as a moisture intrusion path is cut by the seal ring portion 52 to prevent moisture from entering the IC portion 51. be able to.

  In the present invention, a metal layer corresponding to the uppermost wiring layer of the integrated circuit portion is formed on the seal ring portion around the integrated circuit portion, and the surface is flattened so as to cover the metal layer, the integrated circuit portion, and the scribe region. Since the step between the integrated circuit portion and the scribe region can be reduced by forming the planarized insulating layer, a composite chip in which a plurality of types of device functions are integrated on one substrate, Alternatively, by applying these functions to a large-capacity composite chip in which these functions are further integrated, the effect becomes very large.

It is sectional drawing which shows the principal part of the silicon wafer of the 1st Embodiment of this invention. It is sectional drawing which shows the principal part of the silicon wafer of the 3rd Embodiment of this invention. It is sectional drawing which shows the principal part of the silicon wafer of the 4th Embodiment of this invention. It is sectional drawing which shows the principal part of the silicon wafer of the 5th Embodiment of this invention. It is a top view which shows an example of the conventional silicon wafer. It is an enlarged plan view which shows an example of the conventional semiconductor chip with a magnetic sensor, and its peripheral part. It is sectional drawing which follows the AA line of FIG. It is sectional drawing which shows another example of the conventional silicon wafer. It is sectional drawing which shows another example of the conventional silicon wafer.

Explanation of symbols

  6-9 ... GMR element, 21 ... p-Si substrate, 22, 23 ... insulating layer, 24a-24c ... wiring layer, 25a, 25b ... insulating layer, 51 ... IC part, 52 ... seal ring part, 53 ... scribe line 54a to 54c ... metal layer, 55 ... planarization insulating layer, 56 ... passivation film (protective insulating layer), 57, 58 ... window.

Claims (10)

The semiconductor substrate has a plurality of integrated circuit forming regions partitioned by a scribe region, and an integrated circuit portion having a multilayer structure is formed in these integrated circuit forming regions, and a seal ring portion is formed around these integrated circuit portions. A semiconductor wafer comprising:
A metal layer corresponding to the uppermost wiring layer of the integrated circuit portion is formed on the seal ring portion, and a planarized insulation whose surface is flattened so as to cover the metal layer, the integrated circuit forming region, and the scribe region. Forming a layer,
A semiconductor wafer comprising a protective insulating layer formed on the planarizing insulating layer.   2. The planarization insulating layer is selectively removed so that a depression of the metal layer is exposed, and the protective insulating layer is formed on surfaces of the metal layer and the planarization insulating layer. The semiconductor wafer as described.   The flattening insulating layer is selectively removed so that a flat portion of the metal layer is exposed, and the protective insulating layer is formed on surfaces of the metal layer and the flattening insulating layer. 1. The semiconductor wafer according to 1.   The planarization insulating layer formed on the metal layer is entirely removed so that the surface of the metal layer and the surface of the planarization insulation layer are flush with each other, and the protective insulation layer is formed on these surfaces. The semiconductor wafer according to claim 1.   5. The semiconductor wafer according to claim 1, wherein a thin film element is formed on the planarization insulating layer or the protective insulating layer.   6. The semiconductor wafer according to claim 5, wherein the thin film element is a magnetoresistive effect element. The semiconductor substrate has a plurality of integrated circuit forming regions partitioned by a scribe region, and an integrated circuit portion having a multilayer structure is formed in these integrated circuit forming regions, and a seal ring portion is formed around these integrated circuit portions. A method for manufacturing a semiconductor wafer comprising:
Forming the uppermost wiring layer of the integrated circuit portion and simultaneously forming a metal layer on the seal ring portion;
A planarization insulating layer is formed so as to cover these metal layers, the integrated circuit formation region and the scribe region,
A method of manufacturing a semiconductor wafer, comprising: forming a thin film element directly on the planarizing insulating layer or on the planarizing insulating layer via a protective insulating layer. The semiconductor substrate has a plurality of integrated circuit forming regions partitioned by a scribe region, and an integrated circuit portion having a multilayer structure is formed in these integrated circuit forming regions, and a seal ring portion is formed around these integrated circuit portions. A method for manufacturing a semiconductor wafer comprising:
Forming the uppermost wiring layer of the integrated circuit portion and simultaneously forming a metal layer on the seal ring portion;
A planarization insulating layer is formed so as to cover these metal layers, the integrated circuit formation region and the scribe region,
Selectively removing the planarization insulating layer on the metal layer;
A method of manufacturing a semiconductor wafer, comprising: forming a thin film element directly on a remaining planarization insulating layer or a protective insulating layer on the planarization insulation layer.   9. The method of manufacturing a semiconductor wafer according to claim 7, wherein a second protective insulating layer is formed so as to cover at least the thin film element.   10. The method for manufacturing a semiconductor wafer according to claim 7, wherein the surface of the planarization insulating layer is planarized by chemical mechanical polishing.

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