JP2005277211A5 - - Google Patents

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Publication number
JP2005277211A5
JP2005277211A5 JP2004090080A JP2004090080A JP2005277211A5 JP 2005277211 A5 JP2005277211 A5 JP 2005277211A5 JP 2004090080 A JP2004090080 A JP 2004090080A JP 2004090080 A JP2004090080 A JP 2004090080A JP 2005277211 A5 JP2005277211 A5 JP 2005277211A5
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JP
Japan
Prior art keywords
treatment liquid
substrate
liquid discharge
holding mechanism
processing liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004090080A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005277211A (ja
JP4347734B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004090080A priority Critical patent/JP4347734B2/ja
Priority claimed from JP2004090080A external-priority patent/JP4347734B2/ja
Publication of JP2005277211A publication Critical patent/JP2005277211A/ja
Publication of JP2005277211A5 publication Critical patent/JP2005277211A5/ja
Application granted granted Critical
Publication of JP4347734B2 publication Critical patent/JP4347734B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004090080A 2004-03-25 2004-03-25 基板処理装置 Expired - Fee Related JP4347734B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004090080A JP4347734B2 (ja) 2004-03-25 2004-03-25 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004090080A JP4347734B2 (ja) 2004-03-25 2004-03-25 基板処理装置

Publications (3)

Publication Number Publication Date
JP2005277211A JP2005277211A (ja) 2005-10-06
JP2005277211A5 true JP2005277211A5 (cg-RX-API-DMAC10.html) 2007-05-17
JP4347734B2 JP4347734B2 (ja) 2009-10-21

Family

ID=35176516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004090080A Expired - Fee Related JP4347734B2 (ja) 2004-03-25 2004-03-25 基板処理装置

Country Status (1)

Country Link
JP (1) JP4347734B2 (cg-RX-API-DMAC10.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4731377B2 (ja) * 2006-03-30 2011-07-20 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP5317505B2 (ja) * 2008-03-24 2013-10-16 株式会社Ｓｏｋｕｄｏ 基板処理装置
JP5410040B2 (ja) * 2008-06-26 2014-02-05 大日本スクリーン製造株式会社 基板処理装置
JP4982453B2 (ja) * 2008-09-03 2012-07-25 東京エレクトロン株式会社 処理液供給機構および液処理装置ならびに処理液供給方法
JP6385864B2 (ja) * 2015-03-18 2018-09-05 株式会社東芝 ノズルおよび液体供給装置
JP6337854B2 (ja) * 2015-08-19 2018-06-06 東芝三菱電機産業システム株式会社 二流体噴霧装置及びその制御方法
JP6148363B2 (ja) * 2016-02-22 2017-06-14 株式会社Ｓｃｒｅｅｎホールディングス 処理液供給方法

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