JP2005223321A5 - - Google Patents

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Publication number
JP2005223321A5
JP2005223321A5 JP2005019007A JP2005019007A JP2005223321A5 JP 2005223321 A5 JP2005223321 A5 JP 2005223321A5 JP 2005019007 A JP2005019007 A JP 2005019007A JP 2005019007 A JP2005019007 A JP 2005019007A JP 2005223321 A5 JP2005223321 A5 JP 2005223321A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2005019007A
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Japanese (ja)
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JP2005223321A (ja
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Publication date
Priority claimed from US10/765,218 external-priority patent/US7256873B2/en
Application filed filed Critical
Publication of JP2005223321A publication Critical patent/JP2005223321A/ja
Publication of JP2005223321A5 publication Critical patent/JP2005223321A5/ja
Pending legal-status Critical Current

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JP2005019007A 2004-01-28 2005-01-27 ２重露光による増強されたリソグラフィ分解能 Pending JP2005223321A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/765,218 US7256873B2 (en) 2004-01-28 2004-01-28 Enhanced lithographic resolution through double exposure

Publications (2)

Publication Number Publication Date
JP2005223321A JP2005223321A (ja) 2005-08-18
JP2005223321A5 true JP2005223321A5 (enExample) 2009-01-15

Family

ID=34795433

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005019007A Pending JP2005223321A (ja) 2004-01-28 2005-01-27 ２重露光による増強されたリソグラフィ分解能

Country Status (2)

Country Link
US (2) US7256873B2 (enExample)
JP (1) JP2005223321A (enExample)

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JP4954693B2 (ja) * 2006-12-21 2012-06-20 東京エレクトロン株式会社 基板の処理方法、基板の処理システム及びプログラムを記録したコンピュータ読み取り可能な記録媒体
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US8293460B2 (en) * 2008-06-16 2012-10-23 Applied Materials, Inc. Double exposure patterning with carbonaceous hardmask
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US8473874B1 (en) 2011-08-22 2013-06-25 Cadence Design Systems, Inc. Method and apparatus for automatically fixing double patterning loop violations
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