JP2005183143A - Electrical contact structure body and its manufacturing method - Google Patents

Electrical contact structure body and its manufacturing method Download PDF

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Publication number
JP2005183143A
JP2005183143A JP2003421529A JP2003421529A JP2005183143A JP 2005183143 A JP2005183143 A JP 2005183143A JP 2003421529 A JP2003421529 A JP 2003421529A JP 2003421529 A JP2003421529 A JP 2003421529A JP 2005183143 A JP2005183143 A JP 2005183143A
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electrical contact
hole
holding body
spiral
contact structure
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JP4383843B2 (en
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Makoto Yoshida
信 吉田
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Alps Alpine Co Ltd
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Alps Electric Co Ltd
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Priority to JP2003421529A priority Critical patent/JP4383843B2/en
Priority to TW93135010A priority patent/TWI272044B/en
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  • Coupling Device And Connection With Printed Circuit (AREA)
  • Connecting Device With Holders (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
  • Multi-Conductor Connections (AREA)
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an electrical contact structure body capable of realizing smaller size and less number of parts especially as compared with the conventional one, and capable of being easily and surely electrically connected with among a connection part such as a printed-circuit board in a simple structure, and to provide its manufacturing method. <P>SOLUTION: The electrical contact structure body 24 is constituted of a spiral contactor 26, a holding body 25 holding the spiral contactor 26 and a conduction part 28 formed in a recessed part 27 leading from under the base part 26b of the spiral contactor 26 to a rear surface of the holding body. Thereby, the electrical contact structure body having small size, excellent conductivity and a simple structure as compared with the conventional one can be obtained with low production cost. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、被接触体に対して電気的に接触される電気的接触部を有する電気的接触構造体、具体的にはICソケットやコネクタなどの一部品として用いられる電気的接触構造体に係り、特に従来に比べて小型化や部品点数の低減を実現できるとともに、プリント配線基板などの被接続部との間で簡単な構造にて容易に且つ確実に導通接続させることが可能な電気的接触構造体及びその製造方法に関する。   The present invention relates to an electrical contact structure having an electrical contact portion that is electrically contacted with a contacted body, and more particularly to an electrical contact structure used as a component such as an IC socket or a connector. In particular, it is possible to reduce the number of parts and reduce the number of parts compared to the conventional case, and it is possible to easily and reliably conduct electrical connection with a connected part such as a printed wiring board with a simple structure. The present invention relates to a structure and a manufacturing method thereof.

電気的接触構造体が内臓されている装置の一例として、以下の半導体検査装置を挙げる。特許文献1に記載されている半導体検査装置は、半導体を外部の回路基板などに電気的に仮接続させるものである。半導体の背面側には格子状またはマトリックス状に配置された多数の球状接触子が設けられており、これに対向する絶縁基板上には多数の凹部が設けられ、この凹部内にスパイラル接触子が対向配置されている。   As an example of a device in which an electrical contact structure is incorporated, the following semiconductor inspection device is given. The semiconductor inspection apparatus described in Patent Document 1 electrically temporarily connects a semiconductor to an external circuit board or the like. A large number of spherical contacts arranged in a lattice shape or a matrix shape are provided on the back side of the semiconductor, and a large number of concave portions are provided on an insulating substrate opposite to the spherical contacts, and spiral contacts are provided in the concave portions. Opposed.

前記半導体の背面側を前記絶縁基板に向けて押圧すると、前記球状接触子の外表面に前記スパイラル接触子が螺旋状に巻き付くように接触するため、個々の球状接触子と個々のスパイラル接触子との間の電気的接続が確実に行われるようになっている。
特開2002−175859号公報
When the back side of the semiconductor is pressed toward the insulating substrate, the spiral contact contacts the outer surface of the spherical contact so that the spiral contact wraps spirally. The electrical connection between the two is ensured.
JP 2002-175859 A

前記絶縁基板及びスパイラル接触子を有して成る電気的接触構造体は、例えば図17に示す形状である。   The electrical contact structure including the insulating substrate and the spiral contact has a shape shown in FIG. 17, for example.

前記電気的接触構造体1は、複数のスパイラル接触子2が、絶縁基板(以下、基台という)3に取付けられた構造である。前記基台3にはその表面から裏面に貫通する複数の凹部(スルーホール)3aが設けられ、前記凹部3aの上面に、前記スパイラル接触子2が設けられている。   The electrical contact structure 1 has a structure in which a plurality of spiral contacts 2 are attached to an insulating substrate (hereinafter referred to as a base) 3. The base 3 is provided with a plurality of recesses (through holes) 3a penetrating from the front surface to the back surface, and the spiral contactor 2 is provided on the upper surface of the recess 3a.

図18は、図17に示すスパイラル接触子2のうち、一つのスパイラル接触子2を基台3の裏面側から見た部分拡大裏面である。   FIG. 18 is a partially enlarged back surface of the spiral contact 2 shown in FIG. 17 when one spiral contact 2 is viewed from the back surface side of the base 3.

図18に示すように、前記凹部3aの周囲には前記スパイラル接触子2と導通接続する導通部10が露出している。前記導通部10の裏面は前記基台3の裏面と同一平面を成している。   As shown in FIG. 18, a conductive portion 10 that is conductively connected to the spiral contact 2 is exposed around the recess 3a. The back surface of the conducting part 10 is flush with the back surface of the base 3.

前記電気的接触構造体1は、例えば図19に示す各工程を経て形成される。
図19A工程では、Cu基板4上に、露光現像によりスパイラル接触子2のパターン5aが形成されたレジスト層5を形成し、前記レジスト層5のパターン5a内にスパイラル接触子2を形成する。
The electrical contact structure 1 is formed through the steps shown in FIG. 19, for example.
In the step of FIG. 19A, a resist layer 5 in which the pattern 5 a of the spiral contact 2 is formed by exposure and development is formed on the Cu substrate 4, and the spiral contact 2 is formed in the pattern 5 a of the resist layer 5.

図19Bに示す工程では、前記レジスト層5を除去した後、樹脂等から成るガイドフレーム6を、前記ガイドフレーム6に設けられた穴部6aがちょうど各スパイラル接触子2と対面するように位置決めした後、前記ガイドフレーム6を各スパイラル接触子2の基部2a間に貼り付ける(図17も参照されたい)。   In the step shown in FIG. 19B, after removing the resist layer 5, the guide frame 6 made of resin or the like is positioned so that the hole 6a provided in the guide frame 6 just faces each spiral contactor 2. Thereafter, the guide frame 6 is pasted between the bases 2a of the spiral contacts 2 (see also FIG. 17).

次に図19Cの工程では、前記Cu基板4を例えばエッチングなどの方法を用いて除去する。各スパイラル接触子2は前記ガイドフレーム6によって繋げられている。   Next, in the step of FIG. 19C, the Cu substrate 4 is removed by using a method such as etching. Each spiral contact 2 is connected by the guide frame 6.

次に図19Dの工程では、ちょうどスパイラル接触子2と対面する位置に貫通孔3aが形成された基台3に、前記スパイラル接触子2を導電接着剤8等を用いて接着固定する。   Next, in the process of FIG. 19D, the spiral contact 2 is bonded and fixed to the base 3 in which the through hole 3a is formed just at the position facing the spiral contact 2 using a conductive adhesive 8 or the like.

前記基台3の貫通孔3aの内面7bには導電部10がスパッタ法等で形成されている。
そして図19E工程で、前記突出調整部材9を用いてスパイラル接触子2を立体フォーミングする。
A conductive portion 10 is formed on the inner surface 7b of the through hole 3a of the base 3 by sputtering or the like.
Then, in step 19E, the spiral contact 2 is three-dimensionally formed using the protrusion adjusting member 9.

図19F工程では、前記基台3の裏面側に導電接着剤14を介して接続端子11を設ける。   In the step of FIG. 19F, the connection terminal 11 is provided on the back side of the base 3 via the conductive adhesive 14.

さらに前記基台3の下方に複数の配線パターンやその他の回路部品を有するプリント基板12が設け、前記基台3を前記プリント基板12上に固定する。   Furthermore, a printed circuit board 12 having a plurality of wiring patterns and other circuit components is provided below the base 3, and the base 3 is fixed on the printed circuit board 12.

前記プリント基板12の表面には前記基台3の底面に設けられた接続端子11に対向する対向電極13が設けられており、前記各接続端子11と各対向電極13とを、導電性接着剤等を介して導通接続させる。   A counter electrode 13 is provided on the surface of the printed circuit board 12 so as to oppose the connection terminal 11 provided on the bottom surface of the base 3. The connection terminal 11 and the counter electrode 13 are connected to each other by a conductive adhesive. Conductive connection is made through such as.

ところで図19Aないし図19Fの工程を経て得られた電気的接触構造体1には次のような問題点があった。   Incidentally, the electrical contact structure 1 obtained through the steps of FIGS. 19A to 19F has the following problems.

まず第一に、前記電気的構造体1は、主にスパイラル接触子2、基台3、ガイドフレーム6、導通部10、及び接続端子11とを有して構成されるが、このように前記電気的構造体1を形成するのに部品点数が多く生産コストの増大を招いていた。特に基台3は、貫通孔3aの内面に導通部10がスパッタ法で形成された複雑な構造体であり、前記基台3のコストは高く、電気的構造体1の生産コストを増大させる大きな一因となっていた。   First of all, the electrical structure 1 mainly includes a spiral contact 2, a base 3, a guide frame 6, a conduction part 10, and a connection terminal 11. The formation of the electrical structure 1 has a large number of parts, leading to an increase in production cost. In particular, the base 3 is a complex structure in which the conductive portion 10 is formed on the inner surface of the through-hole 3a by a sputtering method. The cost of the base 3 is high, and the production cost of the electrical structure 1 is large. It was a factor.

第ニに、前記スパイラル接触子2や接続端子11を前記導通部10との間で導電性接着剤8,14を介して接着固定し、また前記接続端子11とプリント基板12の対向電極13間も導電性接着剤を介して接着固定していた。   Secondly, the spiral contact 2 and the connection terminal 11 are bonded and fixed to the conductive portion 10 via conductive adhesives 8 and 14, and between the connection terminal 11 and the counter electrode 13 of the printed circuit board 12. Was also bonded and fixed via a conductive adhesive.

しかし導電性接着剤を用いた接着固定方法では、その際に部材間を熱圧着させる必要があり、その熱圧着が部材間全体に均一でないと、両部材間の導通性が悪くなり、信頼性を低下させる結果となり、このため熱圧着を高精度に行う必要性からきめ細かい製造を余儀なくされた。   However, in the bonding and fixing method using a conductive adhesive, it is necessary to thermocompression between the members at that time. If the thermocompression bonding is not uniform between the entire members, the continuity between the two members is deteriorated and reliability is increased. As a result, it was necessary to perform fine manufacturing because of the need to perform thermocompression bonding with high accuracy.

第三に、従来の電気的接触構造体1では、小型化に不向きな構成であった。例えばスパイラル接触子1自体がより小型化されると、それに合わせて前記基台3に設けられる貫通孔3aも小さくしていかなければならないが、前記貫通孔3aをあまり小さくし過ぎると、前記貫通孔3a内に適切な膜厚で導通部10を形成できず、電気的特性の劣る電気的接触構造体1となってしまう。このため前記貫通孔3aをさほど小さくはできず、その結果、スパイラル接触子1自体を小さく形成できても前記基台3を小さく形成できず、また基台3の膜厚に関しても、あまり薄くしすぎると、基台3自体の強度が低下し、導電性接着剤を用いて熱圧着により前記基台3にスパイラル接触子2及び接続端子11を導通性良く接続できなくなってしまう。よって電気的接触構造体1の小型化をより促進させることができなかった。   Third, the conventional electrical contact structure 1 is unsuitable for downsizing. For example, if the spiral contact 1 itself is further reduced in size, the through hole 3a provided in the base 3 must be reduced accordingly. If the through hole 3a is too small, the through hole 3a is reduced. The conduction part 10 cannot be formed with an appropriate film thickness in the hole 3a, resulting in an electrical contact structure 1 having inferior electrical characteristics. For this reason, the through hole 3a cannot be made very small. As a result, even if the spiral contact 1 itself can be made small, the base 3 cannot be made small, and the film thickness of the base 3 is made too thin. If it is too high, the strength of the base 3 itself is lowered, and the spiral contact 2 and the connection terminal 11 cannot be connected to the base 3 with good electrical conductivity by thermocompression bonding using a conductive adhesive. Therefore, the size reduction of the electrical contact structure 1 could not be further promoted.

そこで本発明は上記従来の課題を解決するためのものであり、特に従来に比べて小型化や部品点数の低減を実現できるとともに、プリント配線基板などの被接続部との間で簡単な構造にて容易に且つ確実に導通接続させることが可能な電気的接触構造体及びその製造方法を提供することを目的としている。   Therefore, the present invention is for solving the above-described conventional problems, and in particular, it can realize a reduction in size and a reduction in the number of parts as compared with the conventional one, and a simple structure with a connected portion such as a printed wiring board. It is an object of the present invention to provide an electrical contact structure that can be easily and surely conductively connected and a method for manufacturing the same.

本発明は、被接触体に対して電気的に接触される電気的接触部と、前記電気的接触部を保持する保持体とを有して成る電気的接触構造体において、
前記電気的接触部は前記保持体の表面側にて保持され、前記保持体には、裏面にまで至る凹部が設けられ、前記凹部内には導通部が設けられ、
前記導通部は、前記電気的接触部と直接、導通接続されるとともに、前記保持体の裏面側で、被接続部と導通接続されることを特徴とするものである。
The present invention provides an electrical contact structure including an electrical contact portion that is electrically contacted with a contacted body, and a holding body that holds the electrical contact portion.
The electrical contact portion is held on the front surface side of the holding body, the holding body is provided with a recess reaching the back surface, and a conducting portion is provided in the recess,
The conductive portion is directly connected to the electrical contact portion and is conductively connected to the connected portion on the back side of the holding body.

本発明における電気的接触構造体は、電気的接触部と保持体と導電部とで構成されるものであり、従来に比べて部品点数を少なくでき、簡単な構造の電気的接触構造体を得ることができる。   The electrical contact structure according to the present invention is composed of an electrical contact portion, a holding body, and a conductive portion, and the number of parts can be reduced as compared with the prior art, thereby obtaining an electrical contact structure having a simple structure. be able to.

特に従来、必要であった基台が必要なくなり、それに代えて保持体が設けられる。
また前記導通部は、前記電気的接触部と直接、導通接続されており、従来のように導電性接着剤を必要とせず導電性に優れた構造を提供できる。
In particular, a base that has been necessary in the past is not necessary, and a holding body is provided instead.
In addition, the conductive portion is directly connected to the electrical contact portion and can provide a structure having excellent conductivity without requiring a conductive adhesive as in the prior art.

また本発明では、前記保持体は有機絶縁材料で形成されたものであることが好ましく、これにより前記保持体の成形・加工が容易になり、前記保持体を形成する過程で前記保持体を薄く形成することもでき、電気的接触構造体の薄型化を実現できる。   In the present invention, the holding body is preferably formed of an organic insulating material. This facilitates the molding and processing of the holding body, and the holding body is thinned in the process of forming the holding body. It can also be formed, and the electrical contact structure can be thinned.

なお本発明では、前記有機絶縁材料にはソルダーレジストが用いられることが好ましい。本発明ではこのソルダーレジストが最後まで保持体として残ることになる。本発明ではソルダーレジストで形成された保持体に対して上記の凹部形成や導通部の形成等を簡単な製造方法を用いて行うことができ、生産コストの低減を図ることが可能になる。   In the present invention, a solder resist is preferably used for the organic insulating material. In the present invention, this solder resist remains as a holder until the end. In the present invention, it is possible to perform the above-described concave portion formation and conductive portion formation on the holding body formed of the solder resist using a simple manufacturing method, and it is possible to reduce the production cost.

また本発明では、前記保持体には、表面から裏面にまで通じる貫通孔が設けられ、前記電気的接触部の端部は、前記保持体上の前記貫通孔の周辺部にて保持されるとともに、前記端部を除く前記電気的接触部の部分が前記貫通孔と膜厚方向で対向する位置にまで延出して設けられ、
前記凹部は、前記貫通孔よりも外側に離れた位置にて、前記保持体の裏面から前記端部にまで通じて形成されることが好ましい。
In the present invention, the holding body is provided with a through-hole that leads from the front surface to the back surface, and an end of the electrical contact portion is held at a peripheral portion of the through-hole on the holding body. The portion of the electrical contact portion excluding the end portion is provided to extend to a position facing the through hole in the film thickness direction,
It is preferable that the concave portion is formed from the back surface of the holding body to the end portion at a position away from the through hole.

上記により、貫通孔から前記電気的接触部に対し立体フォーミング等の所定の加工を行うことができる。また前記貫通孔の形成により被接触体との接触によって前記電気的接触部が前記貫通孔内に撓んで入り込むことができ、この結果、前記貫通孔内で前記電気的接触部は被接触体を包み込むように変形可能になり、前記電気的接触部と被接触体間の電気的接触性を良好なものに出来る。また前記凹部は、前記貫通孔から離れた位置にて設けられており、この結果、前記凹部内に形成された導通部は、前記貫通孔の形成過程に影響を受けることが無く、前記電気的接触部や被接触部との導通性を良好に保ち電気特性に優れた電気的接触構造体を得ることが出来る。   As described above, predetermined processing such as three-dimensional forming can be performed from the through hole to the electrical contact portion. In addition, due to the formation of the through hole, the electrical contact portion can be bent into the through hole by contact with the contacted body, and as a result, the electrical contact portion in the through hole can It can be deformed so as to be wrapped, and the electrical contact between the electrical contact portion and the contacted body can be improved. In addition, the recess is provided at a position away from the through hole, and as a result, the conduction portion formed in the recess is not affected by the formation process of the through hole, and the electrical It is possible to obtain an electrical contact structure excellent in electrical characteristics while maintaining good conductivity with the contact part and the contacted part.

また本発明では、前記電気的接触部はスパイラル形状で形成されたスパイラル接触部部と、前記スパイラル接触部と繋がり、前記前記スパイラル接触部の周囲を囲む基部とで構成され、前記基部が前記保持体上に保持されるとともに、前記スパイラル接触部が前記貫通孔と膜厚方向で対向する位置に設けられることが好ましい。   According to the present invention, the electrical contact portion includes a spiral contact portion formed in a spiral shape and a base connected to the spiral contact portion and surrounding the spiral contact portion, and the base is held by the holding portion. It is preferable that the spiral contact portion is provided at a position facing the through hole in the film thickness direction while being held on the body.

上記のように前記電気的接触部は一つの具体例としてスパイラル接触部を有する構造である。スパイラル接触部を有する電気的接触部は、被接触体と適切に電気的接触できる。   As described above, the electrical contact portion has a spiral contact portion as one specific example. The electrical contact portion having the spiral contact portion can appropriately make electrical contact with the contacted object.

また上記の構成の場合、前記凹部は、前記貫通孔より外側に離れた位置にて、前記貫通孔の周囲を囲むように、前記保持体の裏面から前記基部にまで通じて形成され、前記凹部内に形成される導通部が前記保持体の裏面にて前記貫通孔の周辺部を囲む形状にて露出することが好ましい。   Further, in the case of the above configuration, the recess is formed from the back surface of the holder to the base so as to surround the periphery of the through hole at a position away from the through hole. It is preferable that the conductive portion formed inside is exposed in a shape surrounding the peripheral portion of the through hole on the back surface of the holding body.

本発明では、前記導通部はメッキ形成されたものであることが好ましい。
また本発明では、前記導通部は前記保持体の裏面から前記被接触体部側に突出した突出部を有し、前記突出部は、前記凹部内に形成された導通部の幅寸法よりも広い幅寸法を有して形成されることが好ましい。これにより前記被接続部と前記導通部間の導通接続面積を大きくでき両者間を良好に導通接続させることができる。
In this invention, it is preferable that the said conduction | electrical_connection part is plated.
In the present invention, the conducting portion has a protruding portion protruding from the back surface of the holding body toward the contacted body portion, and the protruding portion is wider than the width dimension of the conducting portion formed in the recessed portion. It is preferably formed with a width dimension. Thereby, the conduction connection area between the to-be-connected part and the conduction part can be increased, and a good conduction connection between them can be achieved.

また本発明では、前記突出部の表面は凸型の湾曲面状であってもよく、前記導通部は前記被接続部と半田にて接続固定されることが好ましい。本発明では、前記導通部のうち、前記保持体の裏面から突出する突出部をバンプ部として、前記被接続部との間で半田にて接続固定することが可能になり、従来のように導電性接着剤等により熱圧着する場合に比べて両者間の導通性を良好なものに出来る。   In the present invention, the surface of the protruding portion may be a convex curved surface, and the conductive portion is preferably connected and fixed to the connected portion by solder. In the present invention, it becomes possible to connect and fix with solder to the connected portion by using the protruding portion protruding from the back surface of the holding body as a bump portion among the conductive portions. As compared with the case of thermocompression bonding with a conductive adhesive or the like, the electrical conductivity between the two can be improved.

また本発明では、前記被接続部はプリント基板上に形成されている形態に適用できる。
また本発明は、被接触体に対して電気的に接触される電気的接触部と、前記電気的接触部を保持する保持体とを有して成る電気的接触構造体の製造方法において、
(a) 基板上に電気的接触部をメッキ形成する工程と、
(b) 前記電気的接触部上及び前記基板上を保持体となる有機絶縁材料層によって覆う工程と、
(c) 前記有機絶縁材料層に前記有機材料層の表面側から、前記電気的接触部の所定の部位上にまで通じる凹部を形成する工程と、
(d) 前記凹部内に導通部をメッキ形成し、前記導通部を前記電気的接触部上に直接、導通接続させる工程と、
(e) 前記基板を除去する工程と、
を有することを特徴とするものである。
Moreover, in this invention, the said to-be-connected part is applicable to the form currently formed on the printed circuit board.
The present invention also relates to a method for manufacturing an electrical contact structure comprising an electrical contact portion that is electrically contacted with a contacted body, and a holding body that holds the electrical contact portion.
(A) plating an electrical contact portion on the substrate;
(B) a step of covering the electrical contact portion and the substrate with an organic insulating material layer serving as a holder;
(C) forming a recess in the organic insulating material layer from the surface side of the organic material layer to a predetermined portion of the electrical contact portion;
(D) plating a conductive part in the recess and electrically connecting the conductive part directly on the electrical contact part;
(E) removing the substrate;
It is characterized by having.

本発明では、上記の工程により、電気的接触部、保持体、及び導通部を有して成る電気的接触構造体を製造できる。従来に比べて製造工程数を減らすことが出来、また従来、電気的接触構造体の製造に必要であった基台が必要なく、それに代わるものとして有機絶縁材料層から成る保持体を設ける。前記(c)工程及び(d)工程に示すように、前記保持体に凹部の形成、導通部の形成を簡単に行うことができ、従来に比べて生産コストの低減を図ることができる。   In the present invention, an electrical contact structure having an electrical contact portion, a holding body, and a conduction portion can be manufactured by the above-described steps. The number of manufacturing steps can be reduced as compared with the prior art, and a base that has been conventionally required for manufacturing an electrical contact structure is not necessary, and a holder made of an organic insulating material layer is provided instead. As shown in the steps (c) and (d), the concave portion and the conductive portion can be easily formed in the holding body, and the production cost can be reduced as compared with the conventional case.

また上記の工程では前記(b)工程で、まだ基板が存在する段階で有機絶縁材料層で形成された保持体を前記基板及び電気的接触部上に形成するので、従来のように基台単体と、基板から取り外した電気的接触部とを熱圧着等して取り付けることはなく、前記保持体を要望に合わせて容易に薄型化しやく、電気的接触構造体の小型化を実現できる。   Further, in the above process, since the holding body formed of the organic insulating material layer is formed on the substrate and the electrical contact portion in the step (b) when the substrate still exists, the base unit alone as in the prior art. And the electrical contact portion removed from the substrate is not attached by thermocompression bonding or the like, and the holding body can be easily reduced in thickness according to demand, and the electrical contact structure can be downsized.

さらに前記(d)工程で、直接、前記電気的接触部上に導通部を接続させることができるので、従来のように両者間を導通接着剤を用いて熱圧着しながら接続固定するといった煩雑な工程が必要なくなり、また前記電気的接触部と前記導通部間の導通性も従来に比べて良好なものにすることが出来る。   Further, in the step (d), since the conductive portion can be directly connected to the electrical contact portion, it is troublesome to fix the connection while thermocompression bonding between the two using a conductive adhesive as in the past. A process is not necessary, and electrical conductivity between the electrical contact portion and the conductive portion can be improved as compared with the prior art.

また本発明では、(d)工程と(e)工程の間に以下の工程を有することが好ましい。
(f) 前記導通部から離れた位置であって、少なくとも前記電気的接触部の一部と膜厚方向で対向する位置に、前記有機絶縁材料層の表面から裏面にかけて貫通孔を形成して、前記貫通孔内に前記電気的接触部の一部を露出させる工程。
Moreover, in this invention, it is preferable to have the following processes between (d) process and (e) process.
(F) A through hole is formed from the surface of the organic insulating material layer to the back surface at a position away from the conductive portion and facing at least a part of the electrical contact portion in the film thickness direction; Exposing a part of the electrical contact portion in the through hole;

さらに、前記(f)工程と前記(e)工程の間に次の工程を有することが好ましい。
(g) 前記貫通孔内に露出した電気的接触部を立体フォーミングする工程。
Furthermore, it is preferable to have the following process between the said (f) process and the said (e) process.
(G) A step of three-dimensionally forming the electrical contact portion exposed in the through hole.

また本発明では、前記(a)工程で、前記電気的接触部をスパイラル形状で形成されたスパイラル接触部と、前記スパイラル接触部と一体に成形され、前記前記スパイラル接触部の周囲を囲む基部とで形成し、
前記(c)工程で、前記有機絶縁材料層に前記有機材料層の表面側から、前記電気的接触部の基部上にまで通じる凹部を形成し、
前記(f)工程で、前記貫通孔の形成により、前記貫通孔内に、前記電気的接触部を構成するスパイラル接触部の部分を露出させることが好ましい。
In the present invention, in the step (a), a spiral contact portion in which the electrical contact portion is formed in a spiral shape, and a base portion that is integrally formed with the spiral contact portion and surrounds the spiral contact portion. Formed with
In the step (c), the organic insulating material layer is formed with a recess that leads from the surface side of the organic material layer to the base of the electrical contact portion,
In the step (f), it is preferable that a portion of the spiral contact portion constituting the electrical contact portion is exposed in the through hole by forming the through hole.

また本発明では、前記(b)工程で用いる有機絶縁材料層にソルダーレジストを用いることが好ましい。   Moreover, in this invention, it is preferable to use a soldering resist for the organic insulating material layer used at the said (b) process.

このとき、前記ソルダーレジストにはポジ型のレジストを用い、前記(c)工程でマスク層を用いて露光現像により、露光された部分のソルダーレジストを除去して凹部を形成することが好ましい。さらに前記(f)工程でマスク層を用いて露光現像により、露光された部分のソルダーレジストを除去して貫通孔を形成することが好ましい。   At this time, it is preferable that a positive resist is used as the solder resist, and the exposed portion of the solder resist is removed by exposure and development using the mask layer in the step (c) to form a recess. Further, it is preferable to form a through hole by removing the exposed portion of the solder resist by exposure and development using the mask layer in the step (f).

上記のように、ポジ型のソルダーレジストを用いることにより、前記保持体に容易且つ適切に凹部及び貫通孔を形成できる。本発明では前記ソルダーレジストで形成された有機絶縁材料層を最後まで残して保持体として機能させることができる。   As described above, by using a positive solder resist, it is possible to easily and appropriately form the recess and the through hole in the holding body. In the present invention, the organic insulating material layer formed of the solder resist can be left to the end to function as a holding body.

従来では、前記電気的接触部を取り付ける基台を別個用意する必要性があったが、本発明では、一連の製造過程で、基台となる保持体をも形成することができる点に一つの特徴点がある。従来のように基台を別個設ける場合には、生産コストが増大したり、製造工程が長くなるなどの不具合があったが、本発明では、一連の過程で連続して電気的接触部、及び保持体を製造でき、簡単な方法で電気的接触構造体を製造できるし、前記電気的接触構造体の構造も簡単なものにすることが出来る。   Conventionally, there has been a need to separately prepare a base on which the electrical contact portion is attached. However, in the present invention, in a series of manufacturing processes, a holding body serving as a base can also be formed. There is a feature point. In the case where a base is provided separately as in the prior art, there are problems such as an increase in production cost and a lengthening of the manufacturing process. The holding body can be manufactured, the electrical contact structure can be manufactured by a simple method, and the structure of the electrical contact structure can be simplified.

また本発明では、前記(d)工程で、前記導通部を前記有機絶縁材料層の表面から盛り上がるようにバンプ形成することが好ましい。これによりプリント基板に設けられた被接続部と前記導通部間の接続面積を大きくでき、また前記導通部は被接続部側に突出しているので、前記導通部と被接続部とを対向させたときに、前記保持体の裏面と前記被接続部間には空間が形成されやすく、この空間をはんだ付けのための空間部にでき、前記導通部と前記被接続部間を容易に半田付けにて接続固定することが出来る。   In the present invention, it is preferable that bumps are formed in the step (d) so that the conductive portion rises from the surface of the organic insulating material layer. As a result, the connection area between the connected portion provided on the printed circuit board and the conductive portion can be increased, and the conductive portion protrudes toward the connected portion, so that the conductive portion and the connected portion are opposed to each other. Sometimes, a space is easily formed between the back surface of the holding body and the connected part, and this space can be made a space part for soldering, and the conductive part and the connected part can be easily soldered. Can be fixed.

本発明における電気的接触構造体は、電気的接触部と保持体と導電部とで構成されるものであり、従来に比べて部品点数を少なくでき、簡単な構造の電気的接触構造体を得ることができる。特に従来、必要であった基台が必要なくなり、それに代えて保持体が設けられる。   The electrical contact structure according to the present invention is composed of an electrical contact portion, a holding body, and a conductive portion, and the number of parts can be reduced as compared with the prior art, thereby obtaining an electrical contact structure having a simple structure. be able to. In particular, a base that has been necessary in the past is not necessary, and a holding body is provided instead.

また前記導通部は、前記電気的接触部と直接、導通接続されており、従来のように導電性接着剤を必要とせず導電性に優れた構造を提供できる。   In addition, the conductive portion is directly connected to the electrical contact portion and can provide a structure having excellent conductivity without requiring a conductive adhesive as in the prior art.

また本発明の製造方法によれば、従来に比べて製造工程数を減らすことが出来、また従来、電気的接触構造体の製造に必要であった基台が必要なく、それに代わるものとして有機絶縁材料層から成る保持体を設ける。本発明では、前記保持体に凹部の形成、導通部の形成を簡単に行うことができ、従来に比べて生産コストの低減を図ることができる。   Further, according to the manufacturing method of the present invention, the number of manufacturing processes can be reduced as compared with the conventional method, and the base that has been conventionally required for manufacturing the electrical contact structure is not necessary, and an organic insulating material can be used instead. A holding body made of a material layer is provided. In the present invention, the concave portion and the conductive portion can be easily formed on the holding body, and the production cost can be reduced as compared with the conventional case.

また上記の工程では、まだ基板が存在する段階で有機絶縁材料層で形成された保持体を前記基板及び電気的接触部上に形成するので、従来のように基台単体と、基板から取り外した電気的接触部とを熱圧着等して取り付けることはなく、前記保持体を要望に合わせて容易に薄型化しやく、電気的接触構造体の小型化を実現できる。   In the above process, since the holding body formed of the organic insulating material layer is formed on the substrate and the electrical contact portion when the substrate still exists, it is removed from the base unit and the substrate as in the conventional case. The electrical contact portion is not attached by thermocompression bonding or the like, and the holding body can be easily reduced in thickness according to demand, and the electrical contact structure can be downsized.

さらに直接、前記電気的接触部上に導通部を接続させることができるので、従来のように両者間を導通接着剤を用いて熱圧着しながら接続固定するといった煩雑な工程が必要なくなり、また前記電気的接触部と前記導通部間の導通性も従来に比べて良好なものにすることが出来る。   Furthermore, since the conductive portion can be directly connected on the electrical contact portion, a complicated process such as connecting and fixing while thermocompression bonding using a conductive adhesive is not required as in the prior art. The electrical conductivity between the electrical contact portion and the conducting portion can also be made better than the conventional one.

図1は電子部品の動作を確認するための試験に用いられる検査装置を示す斜視図である。   FIG. 1 is a perspective view showing an inspection apparatus used in a test for confirming the operation of an electronic component.

図1に示すように、検査装置20は凹部形状の台21と、この台21の一方の縁部に設けられたひんじ部23を介して回動自在に支持された蓋体22とを有して構成されている。前記台21および蓋体22は絶縁性の樹脂材料などで形成されており、前記基台21の中心部には図示Z2方向に凹となる装填領域21Aが形成されている。そして、前記装填領域21A内には、次に説明する電気的接触構造体24が設けられ、前記電気的接触構造体24上に半導体などの電子部品25が装着できるようになっている。また台21の他方の縁部には、被ロック部24が形成されている。   As shown in FIG. 1, the inspection apparatus 20 includes a concave-shaped base 21 and a lid 22 that is rotatably supported via a hinge part 23 provided on one edge of the base 21. Configured. The base 21 and the lid body 22 are made of an insulating resin material or the like, and a loading area 21A that is concave in the Z2 direction is formed at the center of the base 21. An electrical contact structure 24 to be described below is provided in the loading region 21A, and an electronic component 25 such as a semiconductor can be mounted on the electrical contact structure 24. A locked portion 24 is formed on the other edge of the table 21.

図1に示すように、前記検査装置20の蓋体22の内面の中央の位置には、電子部品25を図示下方に押し付ける凸形状の押圧部22aが前記装填領域21Aに対向して設けられている。また前記ひんじ部23と逆側となる位置にはロック部26が形成されている。   As shown in FIG. 1, at the center position of the inner surface of the lid 22 of the inspection apparatus 20, a convex pressing portion 22a that presses the electronic component 25 downward in the figure is provided so as to face the loading area 21A. Yes. In addition, a lock portion 26 is formed at a position opposite to the hinge portion 23.

前記蓋体22の内面と押圧部22aとの間には前記押圧部22aを蓋体22の内面から遠ざかる方向に付勢するコイルスプリングなどからなる付勢部材が設けられている(図示せず)。従って、電子部品25を前記装着領域21A内に装着して蓋体22を閉じてロックすると、電子部品25を装填領域21Aの表面に接近する方向(Z2方向)に弾性的に押し付けることが可能となっている。   Between the inner surface of the lid body 22 and the pressing portion 22a, a biasing member made of a coil spring or the like that biases the pressing portion 22a away from the inner surface of the lid body 22 is provided (not shown). . Therefore, when the electronic component 25 is mounted in the mounting region 21A and the lid 22 is closed and locked, the electronic component 25 can be elastically pressed in the direction approaching the surface of the mounting region 21A (Z2 direction). It has become.

図2は電気的接触構造体24の平面図、図3は図2に示すAの領域を拡大した部分拡大平面図、図3は、A領域を前記電気的接触構造体24の裏面側から見た部分拡大裏面図、図5は、図2に示すA領域を膜厚方向から切断したときの、前記電気的接触構造体24の部分拡大断面図と、前記電気的接触構造体24の上側から当接する電子部品25、及び前記電気的接触構造体24の下側に接続固定されるプリント基板30の部分拡大断面図である。   2 is a plan view of the electrical contact structure 24, FIG. 3 is a partially enlarged plan view in which the area A shown in FIG. 2 is enlarged, and FIG. 3 is a view of the A area from the back side of the electrical contact structure 24. 5 is a partially enlarged rear view, FIG. 5 is a partially enlarged sectional view of the electrical contact structure 24 when the region A shown in FIG. 2 is cut from the film thickness direction, and from the upper side of the electrical contact structure 24. FIG. 3 is a partial enlarged cross-sectional view of an electronic component 25 that abuts and a printed circuit board 30 that is connected and fixed to the lower side of the electrical contact structure 24;

図2に示す電気的接触構造体24は、保持体25と多数のスパイラル接触子(電気的接触部)26とを有して構成される。前記スパイラル接触子26は図2では、前記保持体25の表面の周辺を囲む2列の枠状形態を成すべく、規則的に配列されているが、前記スパイラル接触子26の配列のされ方は、前記電子部品25の裏面側に設けられた接触子35(被接触体)の形成位置によって変る。   The electrical contact structure 24 shown in FIG. 2 includes a holding body 25 and a large number of spiral contacts (electrical contact portions) 26. In FIG. 2, the spiral contacts 26 are regularly arranged so as to form a two-row frame shape surrounding the periphery of the surface of the holding body 25, but how the spiral contacts 26 are arranged is as follows. Depending on the position where the contact 35 (contacted body) provided on the back side of the electronic component 25 is formed.

図3及び図5に示すように、前記保持体25には、表面25bから裏面25cにかけて貫通する貫通孔25aが設けられている。図3では、前記貫通孔25aは、膜面方向(図示X−Y平面と平行な方向)への断面が略円形状である。前記貫通孔25aの形状は他の形態であってもよいが、前記貫通孔25a上に設けられる接触子26がスパイラル形状であるので、適切に前記貫通孔25a上に前記スパイラル接触子26を対向させ、前記スパイラル接触子26を電気部品25の接触子35との電気的接触時に、スムーズに前記貫通孔25a内に入り込ませるには、前記貫通孔25aの膜面方向と平行な断面は略円形状であることが好ましい。図3ではこの貫通孔25a上に位置するスパイラル接触子26を斜線で図示している。   As shown in FIGS. 3 and 5, the holding body 25 is provided with a through hole 25a penetrating from the front surface 25b to the back surface 25c. In FIG. 3, the through hole 25a has a substantially circular cross section in the film surface direction (direction parallel to the XY plane shown in the drawing). Although the shape of the through hole 25a may be other forms, the contact 26 provided on the through hole 25a has a spiral shape, so that the spiral contact 26 is appropriately opposed to the through hole 25a. In order for the spiral contactor 26 to smoothly enter the through hole 25a during electrical contact with the contact 35 of the electrical component 25, the cross section of the through hole 25a parallel to the film surface direction is substantially circular. The shape is preferred. In FIG. 3, the spiral contact 26 located on the through hole 25a is shown by hatching.

図3及び図5に示すように、前記スパイラル接触子26は、前記貫通孔25a上に露出し、スパイラル状に形成され前記電子部品25の接触子と電気的に接触する接触部26aと、前記接触部26aと一体となって形成されるとともに、前記接触部26aの周囲を囲む基部26bとで構成されている。図5に示すように前記接触部26aは上方に向けて螺旋状に突出するように立体成形されている。これにより前記電子部品25の裏面に設けられた接触子35との間で良好な電気的接続を得ることが出来る。   As shown in FIGS. 3 and 5, the spiral contact 26 is exposed on the through hole 25a, is formed in a spiral shape, and contacts the contact of the electronic component 25; The contact portion 26a is formed integrally with a base portion 26b surrounding the contact portion 26a. As shown in FIG. 5, the contact portion 26a is three-dimensionally shaped so as to protrude spirally upward. Thereby, good electrical connection can be obtained with the contact 35 provided on the back surface of the electronic component 25.

図5に示すように、前記基部26bは、前記保持体25の表面25bにて保持されている。前記保持体25の表面25bは、前記貫通孔25aが形成された周囲に低表面25b1が形成され、前記貫通孔25aから離れる方向にて低表面25b1の外縁部から一段高くなった高表面25b2が形成されている。前記高表面25b2と低表面25b1間の切欠部内に前記基部26bが形成され、前記基部26bの表面26b1と前記高表面25b2とは同一平面となっている。   As shown in FIG. 5, the base portion 26 b is held on the surface 25 b of the holding body 25. The surface 25b of the holding body 25 has a low surface 25b1 formed around the through hole 25a, and a high surface 25b2 that is one step higher from the outer edge of the low surface 25b1 in a direction away from the through hole 25a. Is formed. The base 26b is formed in a notch between the high surface 25b2 and the low surface 25b1, and the surface 26b1 of the base 26b and the high surface 25b2 are flush with each other.

前記基部26bと前記保持体25との間には導電性接着剤等の他部材は介在しておらず、前記基部26bと前記保持体25とは直接接合されている。後述する製造方法で説明するように、前記保持体25は、有機絶縁材料で形成され、最初、前記スパイラル接触子26上を覆うようにして塗布されたもので、前記スパイラル接触子26の基部26bと前記保持体25とは、アンカー効果等によって接続固定されている。   No other member such as a conductive adhesive is interposed between the base portion 26b and the holding body 25, and the base portion 26b and the holding body 25 are directly joined. As will be described later in the manufacturing method, the holding body 25 is formed of an organic insulating material, and is first applied so as to cover the spiral contact 26, and a base portion 26 b of the spiral contact 26. The holding body 25 is connected and fixed by an anchor effect or the like.

図5に示すように、前記基部26bの下面26b2からは、前記保持体25を裏面25cにまで至る凹部27が形成されている。前記凹部27内には、導通部28が例えばメッキなどによって形成されている。   As shown in FIG. 5, a concave portion 27 is formed from the lower surface 26b2 of the base portion 26b to reach the holding body 25 to the back surface 25c. A conducting portion 28 is formed in the recess 27 by, for example, plating.

前記凹部27は、前記保持体25に形成された貫通孔25aよりも外側に離れた位置にて、前記貫通孔25aの周囲を囲むように形成され、図4に示すように、前記凹部27内に形成される導通部28は、前記保持体25の裏面25cにて前記貫通孔25aの周辺部を囲む略円形の縁取り形状にて露出する。   The concave portion 27 is formed so as to surround the through hole 25a at a position farther outward than the through hole 25a formed in the holding body 25. As shown in FIG. The conductive portion 28 is exposed in a substantially circular border shape surrounding the peripheral portion of the through hole 25a on the back surface 25c of the holding body 25.

前記導通部28は前記保持体25内に形成され、前記保持体25の裏面25cから露出する以外、保持体25の他の部位から露出していない。すなわち前記貫通孔25a内にも前記導電部28は露出していない。前記導通部28は、前記貫通孔25a内に露出するように形成することも可能であるが、そのように形成すると、電気的特性の低下等を招く恐れがあるので、前記貫通孔25a内に前記導電部28を露出させるのは好ましくない。   The conducting portion 28 is formed in the holding body 25 and is not exposed from other parts of the holding body 25 except that it is exposed from the back surface 25c of the holding body 25. That is, the conductive portion 28 is not exposed in the through hole 25a. The conductive portion 28 can be formed so as to be exposed in the through hole 25a. However, since the conductive portion 28 may be deteriorated in electrical characteristics, the conductive portion 28 may be formed in the through hole 25a. It is not preferable to expose the conductive portion 28.

したがって本発明では前記導電部28を前記保持体25の内部に形成すべく、前記導電部28を形成すべき凹部27を前記貫通孔25aよりも外側に離れた位置に設けている。   Therefore, in the present invention, in order to form the conductive portion 28 in the holding body 25, the concave portion 27 in which the conductive portion 28 is to be formed is provided at a position away from the through hole 25a.

図5に示すように、前記凹部27は前記スパイラル接触子26の基部26bの下面26b2から前記保持体25の裏面25cにかけてストレート形状で形成されているが、ストレート形状以外の形状であってもよい。しかしストレート形状が最も作りやすく、また前記基部26bと前記導通部28との導通性も良好にできて好ましい。   As shown in FIG. 5, the concave portion 27 is formed in a straight shape from the lower surface 26b2 of the base portion 26b of the spiral contactor 26 to the back surface 25c of the holding body 25, but may have a shape other than the straight shape. . However, the straight shape is most preferable, and the continuity between the base portion 26b and the conductive portion 28 can be improved, which is preferable.

図5に示すように、前記導通部28は前記保持体25の裏面25cから突出した突出部28aを有し、前記突出部28aは、前記凹部27内に形成された前記導通部28の幅寸法よりも広い幅寸法を有して形成されている。   As shown in FIG. 5, the conductive portion 28 has a protruding portion 28 a protruding from the back surface 25 c of the holding body 25, and the protruding portion 28 a is a width dimension of the conductive portion 28 formed in the concave portion 27. It is formed with a wider width dimension.

前記突出部28aは導通部28のメッキ形成時にバンプ形成によって形成されたものであり、前記突出部28aの表面28a1は凸型の湾曲面状で形成されている。このようにバンプ形成による前記突出部28aの形成により、前記電気的接触構造体24の下側に設けられるプリント配線基板30上に位置する対向電極31(被接続部)との間の導通接触面積を大きくできること、さらには前記対向電極31と前記突出部28aとを付き合わせたときに、前記保持体25と前記対向電極31との間には、空間部32が形成されるので、この空間部32を前記対向電極31と前記突出部28aとの間を半田33によって接続する際の半田形成部として利用でき、適切に前記対向電極31と前記突出部28a間を半田付けでき、前記対向電極31と導通部28間の導通接続性を良好なものに保ち得る。また本発明では、前記対向電極31と前記突出部28a間を半田付けできるので、従来のように導電性接着剤を用いたときの熱圧着工程等が必要なくなり、簡単に且つ確実に前記対向電極31と前記突出部28a間を導通接続させることができる。   The protruding portion 28a is formed by bump formation when the conductive portion 28 is plated, and the surface 28a1 of the protruding portion 28a is formed in a convex curved surface shape. Thus, the formation of the protruding portion 28a by bump formation results in a conductive contact area with the counter electrode 31 (connected portion) located on the printed wiring board 30 provided on the lower side of the electrical contact structure 24. Further, when the counter electrode 31 and the protrusion 28a are brought together, a space portion 32 is formed between the holding body 25 and the counter electrode 31. 32 can be used as a solder forming portion when the counter electrode 31 and the protruding portion 28a are connected by the solder 33, and the counter electrode 31 and the protruding portion 28a can be appropriately soldered. And the conductive connection between the conductive portions 28 can be kept good. Further, in the present invention, since the counter electrode 31 and the protruding portion 28a can be soldered, there is no need for a thermocompression bonding process or the like when using a conductive adhesive as in the prior art, and the counter electrode can be easily and reliably provided. 31 and the protruding portion 28a can be electrically connected.

各部材の材質等について説明する。前記スパイラル接触子26はメッキや銅箔等によって形成されるが、メッキ形成されることが前記スパイラル接触子26を微細加工することができて好ましい。メッキ形成によるスパイラル接触子26は積層メッキ構造であることが好ましく、一例をあげると下からAu/Ni/Auの順で積層された構成である。   The material of each member will be described. The spiral contact 26 is formed by plating, copper foil, or the like, but it is preferable that the spiral contact 26 is finely processed because the spiral contact 26 can be finely processed. The spiral contact 26 formed by plating preferably has a laminated plating structure. For example, the spiral contact 26 has a structure in which Au / Ni / Au are laminated in this order from the bottom.

前記保持体25は、有機絶縁材料で形成されることが好ましい。前記保持体25を有機絶縁材料で形成することで、前記スパイラル接触子26に損傷を与えることなく前記保持体25に凹部27や貫通孔25aの形成を適切且つ容易にでき高精度に前記凹部27や貫通孔25aを形成することができる。   The holding body 25 is preferably formed of an organic insulating material. By forming the holding body 25 from an organic insulating material, it is possible to appropriately and easily form the concave portion 27 and the through hole 25a in the holding body 25 without damaging the spiral contact 26, and the concave portion 27 can be formed with high accuracy. Or the through hole 25a can be formed.

特に前記保持体25はソルダーレジストを用いて形成されることが好ましい。後述の製造方法で説明するように、ソルダーレジストで形成された保持体25に対し露光現像によって凹部27や貫通孔25aの形成を容易に且つ精度良く形成することが出来る。   In particular, the holding body 25 is preferably formed using a solder resist. As will be described later in the manufacturing method, the concave portions 27 and the through holes 25a can be easily and accurately formed by exposure and development on the holding body 25 formed of a solder resist.

前記導通部28はメッキ形成されることが好ましい。前記導電部28にはCu、Au、白金族系元素等の導電性に優れた金属材料を用いることが好ましい。本発明では、前記導通部28をメッキ形成することで同じく金属製のスパイラル接触子26の基部26b下に前記導通部28をメッキ成長させることができ、前記導通部28と前記基部26b間に導電性接着剤等を用いることなく、両者を適切且つ確実に導通接続させることが出来る。
前記半田33には例えばクリーム半田を用いる。
The conductive portion 28 is preferably formed by plating. The conductive portion 28 is preferably made of a metal material having excellent conductivity such as Cu, Au, or a platinum group element. In the present invention, the conductive portion 28 can be plated and grown under the base portion 26b of the metal spiral contact 26 by plating the conductive portion 28, and the conductive portion 28 and the base portion 26b are electrically conductive. Both can be connected appropriately and reliably without using a conductive adhesive or the like.
For example, cream solder is used for the solder 33.

以上のようにして形成された電気的接触構造体24上に電子部品25を図5に示す矢印方向からセットし、図1に示す蓋体22のロック部26を台21の被ロック部24にロックすると、電子部品25が前記押圧部22aによって図示下方に押し付けられるため、前記電子部品25の裏面に設けられた接触子35が各スパイラル接触子26を前記保持体25に形成された貫通孔25aの内部方向(図示下方)に押し下げる。同時に、スパイラル接触子26の外形は押し広げられるように変形し、前記接触子35の外表面を抱き込むように巻き付き、各接触子35と各スパイラル接触子26とが良好に電気的に接続される。   The electronic component 25 is set on the electrical contact structure 24 formed as described above from the direction of the arrow shown in FIG. 5, and the lock portion 26 of the lid 22 shown in FIG. When locked, the electronic component 25 is pressed downward in the figure by the pressing portion 22a, so that the contact 35 provided on the back surface of the electronic component 25 has each spiral contact 26 formed in the through hole 25a formed in the holding body 25. Is pushed down in the internal direction (downward in the figure). At the same time, the outer shape of the spiral contactor 26 is deformed so as to be spread and wound so as to embrace the outer surface of the contactor 35 so that each contactor 35 and each spiral contactor 26 are electrically connected well. The

図6は、本発明における電気的接触構造体41を有するコネクタ45の分解斜視図である。   FIG. 6 is an exploded perspective view of the connector 45 having the electrical contact structure 41 according to the present invention.

前記電気的接触構造体41は、図6に示すように多数のスパイラル接触子43と保持体44とを有して構成されており、具体的な内部構造等の構成は、図2ないし図5で説明した通りである。   As shown in FIG. 6, the electrical contact structure 41 has a large number of spiral contacts 43 and a holding body 44. The specific internal structure and the like are shown in FIGS. As explained in.

前記電気的接触構造体41は、土台40に形成された切り欠き部40a内に収納され、この切欠部40aの表面に設けられている接続端子(図示しない)との間で、前記電気的接触構造体41の導通部(図5に示す導通部28と同じ構成)は半田付けにて接続固定されている。   The electrical contact structure 41 is accommodated in a notch 40a formed in the base 40, and the electrical contact with a connection terminal (not shown) provided on the surface of the notch 40a. The conducting portion of the structure 41 (the same configuration as the conducting portion 28 shown in FIG. 5) is connected and fixed by soldering.

符号46はプリント配線基板46であり、前記プリント配線基板46の裏面には多数の電極部(図示しない)が設けられている。前記プリント配線基板46上には樹脂等で形成された蓋体42が設けられ、前記蓋体42は前記土台40の切欠部40a内に嵌るようになっている。前記蓋体42を前記土台40の切欠部40a内に嵌めると、前記電気的接触構造体41のスパイラル接触子43が前記プリント配線基板46の電極部と導通接続される。
図6に示すコネクタ45は携帯電話等の電子機器内に搭載して用いることが出来る。
Reference numeral 46 denotes a printed wiring board 46, and a large number of electrode parts (not shown) are provided on the back surface of the printed wiring board 46. A lid 42 made of resin or the like is provided on the printed wiring board 46, and the lid 42 is fitted in the notch 40 a of the base 40. When the lid 42 is fitted into the notch 40 a of the base 40, the spiral contact 43 of the electrical contact structure 41 is conductively connected to the electrode portion of the printed wiring board 46.
The connector 45 shown in FIG. 6 can be mounted and used in an electronic device such as a mobile phone.

本発明における電気的接触構造体24の特徴的部分について以下に説明する。
本発明では、前記電気的接触構造体24は、電気的接触部であるスパイラル接触子26、保持体25、及び導通部28を有してなり、基本的にこれらの部材のみで構成できる。したがって従来の電気的接触構造体に比べて部品点数を少なくでき、簡単な構造の電気的接触構造体24を製造することができる。
The characteristic part of the electrical contact structure 24 in the present invention will be described below.
In the present invention, the electrical contact structure 24 includes a spiral contact 26 that is an electrical contact part, a holding body 25, and a conduction part 28, and can basically be constituted by only these members. Therefore, the number of parts can be reduced as compared with the conventional electrical contact structure, and the electrical contact structure 24 having a simple structure can be manufactured.

本発明では、前記保持体25にスパイラル接触子26を直接的に取り付けることができ、また前記保持体25に設けられた凹部27に前記導通部28をメッキ等で形成でき、前記スパイラル接触子26に前記導通部28を直接的に導通接続させることができる。従来では、別購入品であった基台にスパイラル接触子26を導電性接着剤を用いて取付け、前記基台に設けられた導通部に導通接続させていたが、かかる場合には熱圧着が必要であり、取付精度によって良好な導通性を得られない場合があったが、本発明では、導電性接着剤を用いる事無く、直接的にスパイラル接触子26を保持体25に取付け、前記導通部28に導通接続させることができ、取付けが簡単で且つ良好な導通性を得ることが出来る。   In the present invention, the spiral contact 26 can be directly attached to the holding body 25, and the conducting portion 28 can be formed by plating or the like in the recess 27 provided in the holding body 25. The conductive portion 28 can be directly conductively connected. In the past, the spiral contactor 26 was attached to a base that was purchased separately using a conductive adhesive, and was electrically connected to a conductive portion provided on the base. However, in the present invention, the spiral contact 26 is directly attached to the holding body 25 without using a conductive adhesive, and the conduction is not achieved. The portion 28 can be conductively connected, and can be easily attached and can have good conductivity.

また特に本発明では、前記保持体25は有機絶縁材料等で形成され、前記スパイラル接触子26に損傷を与える事無く、前記保持体25に凹部27や貫通孔25aの形成を簡単且つ精度良く行うことができる。本発明では、前記凹部27内にメッキ等で導通部28を形成するが、前記貫通孔25aと凹部27は別々に形成され、従来の基台のように基台に設けられた貫通孔の内面に導通部をスパッタ法で形成するなどはしない。従来の基台の内部構造では、前記導通部の膜厚を所定寸法確保するなどの必要性から前記基台の貫通孔をさほど小さくできず、電気的接触構造体全体の小型化を適切に促進できない構造であったが、本発明では、導通部28の形成のための凹部27形成とは別に貫通孔25aを形成し、特に前記保持体25を有機絶縁材料など精密加工しやすい材質で形成することから、スパイラル接触子26の大きさに合わせて、前記保持体25に微細な貫通孔25aの形成を行うことができ、前記電気的接触構造体25の小型化を従来に比べて促進できる構造となっている。   In particular, in the present invention, the holding body 25 is formed of an organic insulating material or the like, and the recess 27 and the through hole 25a are easily and accurately formed in the holding body 25 without damaging the spiral contactor 26. be able to. In the present invention, the conductive portion 28 is formed in the concave portion 27 by plating or the like, but the through hole 25a and the concave portion 27 are formed separately, and the inner surface of the through hole provided in the base like a conventional base. The conductive part is not formed by sputtering. In the conventional internal structure of the base, the through hole of the base cannot be made very small due to the necessity of ensuring the film thickness of the conductive portion, and the size of the entire electrical contact structure is appropriately promoted. In the present invention, the through hole 25a is formed separately from the formation of the recess 27 for forming the conducting portion 28, and in particular, the holding body 25 is formed of a material that can be easily processed precisely such as an organic insulating material. Therefore, a fine through hole 25a can be formed in the holding body 25 in accordance with the size of the spiral contact 26, and the size of the electrical contact structure 25 can be promoted as compared with the conventional structure. It has become.

また、本発明では、前記導通部28を前記保持体25の裏面25cから突出させたバンプ形状で形成でき、前記導通部28とプリント基板30上の対向電極33との間で、半田33による接続固定が可能になり、前記電気的接触構造体24とプリント基板30間の固定を簡単且つ確実に行うことが出来る。   In the present invention, the conductive portion 28 can be formed in a bump shape protruding from the back surface 25 c of the holding body 25, and the connection by the solder 33 between the conductive portion 28 and the counter electrode 33 on the printed circuit board 30. Fixing is possible, and the electrical contact structure 24 and the printed circuit board 30 can be fixed easily and reliably.

図7ないし図16は本発明における電気的接触構造体24の製造方法を示す一工程図である。各工程図は製造工程中における電気的接触構造体24を膜厚方向から切断した部分断面図である。   7 to 16 are process diagrams showing a method of manufacturing the electrical contact structure 24 according to the present invention. Each process drawing is a partial cross-sectional view of the electrical contact structure 24 cut from the film thickness direction during the manufacturing process.

図7に示す符号50は例えばCu基板である。前記Cu基板50上にドライフィルムレジストを貼り付けたり、あるいは液体レジストをスピンコート法などによって塗布形成したりして形成されたレジスト層51に前記スパイラル接触子26と同形状の抜きパターン51aを露光現像により形成する。   Reference numeral 50 shown in FIG. 7 is, for example, a Cu substrate. An exposed pattern 51a having the same shape as the spiral contact 26 is exposed on a resist layer 51 formed by pasting a dry film resist on the Cu substrate 50 or applying and forming a liquid resist by a spin coat method or the like. Formed by development.

次に図8に示す工程では、前記抜きパターン51a内にスパイラル接触子26をメッキ形成し、図9に示すように前記レジスト層51をアルカリ水溶液等を用いて溶解し除去する。図9では、前記Cu基板50上にメッキ形成されたスパイラル接触子26のみが残される。   Next, in the step shown in FIG. 8, the spiral contact 26 is formed by plating in the extraction pattern 51a, and the resist layer 51 is dissolved and removed using an alkaline aqueous solution or the like as shown in FIG. In FIG. 9, only the spiral contact 26 plated on the Cu substrate 50 is left.

図10工程では、前記Cu基板50上、及びスパイラル接触子26上を有機絶縁材料によって覆い、前記Cu基板50上及びスパイラル接触子26上に有機絶縁材料層52を形成する。   10, the Cu substrate 50 and the spiral contact 26 are covered with an organic insulating material, and an organic insulating material layer 52 is formed on the Cu substrate 50 and the spiral contact 26.

前記有機絶縁材料にはソルダーレジストを用いることが好ましい。前記ソルダーレジストを用いることで、後工程の凹部54形成や貫通孔61形成を容易に且つ高精度に行うことが可能である。また前記ソルダーレジストはポジ型であることが好ましい。すなわち光照射部分が可溶化するレジストを用いる。これは前記凹部54形成と貫通孔61形成の2つの形成を露光現像処理を用いて行うが、ポジ型のソルダーレジストを用いることでこの2つの形成工程を適切に行うことが可能になる。なお前記有機絶縁材料層52は保持体25として最後まで残される層である。   It is preferable to use a solder resist as the organic insulating material. By using the solder resist, it is possible to easily and accurately form the recesses 54 and the through holes 61 in the subsequent process. The solder resist is preferably a positive type. That is, a resist that solubilizes the light irradiated portion is used. In this process, the formation of the concave portion 54 and the formation of the through hole 61 are performed by exposure and development processing. However, by using a positive solder resist, the two formation steps can be appropriately performed. The organic insulating material layer 52 is a layer left as the holding body 25 until the end.

次に図11に示す工程では、前記有機絶縁材料層52の上方にマスク層53を配置する。前記マスク層53には抜きパターン53aが形成されている。   Next, in a step shown in FIG. 11, a mask layer 53 is disposed above the organic insulating material layer 52. A blanking pattern 53 a is formed on the mask layer 53.

この抜きパターン53aは、ちょうど前記スパイラル接触子26の基部26bの上方に位置する。例えば前記基部26bは、前記スパイラル接触子26のうち、スパイラル形状の接触部26aの周囲を囲むように円形の縁取り形状にて形成されているため(図3を参照)、前記抜きパターン53aも前記基部26b上に沿う円形の縁取り形状の形態であることが好ましい。   The punching pattern 53a is located just above the base portion 26b of the spiral contactor 26. For example, since the base portion 26b is formed in a circular rim shape so as to surround the spiral contact portion 26a of the spiral contactor 26 (see FIG. 3), the punch pattern 53a is also the above-mentioned It is preferably in the form of a circular edging shape along the base 26b.

この抜きパターン53aから光を照射し、前記抜きパターン53aと膜厚方向で対向する位置にある有機絶縁材料層52を露光現像し、前記有機絶縁材料層52に前記有機絶縁材料層52の表面52aから前記スパイラル接触子26の基部26b上にまで通じる凹部54を形成する。前記凹部54は、前記有機絶縁材料層52の表面52aから前記スパイラル接触子26の基部26b上に垂直に形成され、また真上から見ると前記凹部26bは前記基部26b上に沿った略円形の縁取り形状の形態にて現れる。   The organic insulating material layer 52 is exposed and developed by irradiating light from the punched pattern 53a and facing the punched pattern 53a in the film thickness direction, and the surface 52a of the organic insulating material layer 52 is formed on the organic insulating material layer 52. To the base 26b of the spiral contact 26 is formed. The concave portion 54 is vertically formed on the base portion 26b of the spiral contactor 26 from the surface 52a of the organic insulating material layer 52, and when viewed from directly above, the concave portion 26b is substantially circular along the base portion 26b. Appears in the form of a border.

前記凹部54の形成位置は、任意に決めることができるが、前記スパイラル接触子26などの電気的接触部の端部上に形成することが好ましい。前記端部以外の電気的接触部は、後工程で形成された貫通孔61内に露出し、電子部品25の接触子35との電気的接続の際に押されて前記貫通孔61内に弾性変形して入り込む部分となる。したがって前記凹部54はできる限り前記電気的接触部の端に形成することが好ましい。スパイラル接触子26の場合、スパイラル形状の接触部26aの部分が貫通孔61内に露出し弾性変形可能な部分となっているから、前記凹部54を前記基部26b上に設ける。   The formation position of the recess 54 can be arbitrarily determined, but is preferably formed on the end of an electrical contact portion such as the spiral contactor 26. The electrical contact portion other than the end portion is exposed in a through hole 61 formed in a later process, and is pushed in the electrical connection with the contact 35 of the electronic component 25 to be elastic in the through hole 61. It becomes a part that transforms and enters. Therefore, it is preferable to form the concave portion 54 at the end of the electrical contact portion as much as possible. In the case of the spiral contactor 26, since the part of the spiral contact part 26a is exposed in the through hole 61 and is a part that can be elastically deformed, the concave part 54 is provided on the base part 26b.

図12に示す工程では、前記凹部54内に、導通部55をメッキ形成する。前記凹部54内には前記基部26bが露出しており、金属で形成された前記基部26bは電解メッキの際の電極として機能するから、適切に前記導通部55は前記基部26b上にメッキ成長する。   In the step shown in FIG. 12, the conductive portion 55 is formed in the recess 54 by plating. The base portion 26b is exposed in the recess 54, and the base portion 26b formed of metal functions as an electrode for electrolytic plating. Therefore, the conductive portion 55 is appropriately grown on the base portion 26b. .

本発明では図12のように、前記凹部54内のみに前記導通部55を形成するのではなく、さらに前記有機絶縁材料層52の表面52から盛り上がる突出部55aを凹部54内に形成された前記導通部55と連続的にメッキ形成する(いわゆるバンプ形成)。前記突出部55aは、前記凹部54上のみならず,前記有機絶縁材料層52の表面52a上にも延出して形成される。ただし前記有機絶縁材料層52の表面52a上に延出する部分では、下地が絶縁性の層であるためメッキ成長が鈍化し、図13に示すように前記突出部55aの表面は凸型の湾曲面として形成される。このように、前記導通部55に前記有機絶縁材料層52の表面52aから突出したバンプ形状の突出部55aを形成することで、前記突出部55aを、プリント配線基板上に設けられた対向電極との取付面として効果的に機能させることができる。   In the present invention, as shown in FIG. 12, the conductive portion 55 is not formed only in the concave portion 54, but the protruding portion 55 a rising from the surface 52 of the organic insulating material layer 52 is further formed in the concave portion 54. The conductive part 55 is continuously plated (so-called bump formation). The protrusion 55 a is formed not only on the recess 54 but also on the surface 52 a of the organic insulating material layer 52. However, in the portion extending on the surface 52a of the organic insulating material layer 52, the base is an insulating layer, so that the plating growth is slowed down, and as shown in FIG. 13, the surface of the protruding portion 55a has a convex curve. Formed as a surface. Thus, by forming the bump-shaped protruding portion 55a protruding from the surface 52a of the organic insulating material layer 52 in the conductive portion 55, the protruding portion 55a is connected to the counter electrode provided on the printed wiring board. Can effectively function as a mounting surface.

図14の工程では、前記有機絶縁材料層52の上方にマスク層60を対向させる。前記マスク層60には抜きパターン60aが形成され、前記抜きパターン60aの平面形状は、例えば図3に示す保持体25に形成された貫通孔25aと同じ円形状である。ここで前記抜きパターン60aを、前記スパイラル接触子26のうちスパイラル形状の接触部26a部分と膜厚方向で対向する位置に形成する。換言すれば、前記抜きパターン60aを、前記有機絶縁材料層52に形成された凹部54よりも内側に位置させ、前記凹部54に前記抜きパターン60aが膜厚方向で対向しないようにする。前記抜きパターン60aと対向する位置にある有機絶縁材料層52は次工程で露光現像によって除去されるが、前記抜きパターン60aと膜厚方向で対向する位置に前記凹部54が存在していると次工程で形成される貫通孔内に前記凹部54内にメッキ形成された導通部55が露出してしまう。したがって、前記抜きパターン60aを、前記有機絶縁材料層52に形成された凹部54よりも内側に位置させる。   In the process of FIG. 14, the mask layer 60 is opposed to the organic insulating material layer 52. A blank pattern 60a is formed in the mask layer 60, and the planar shape of the blank pattern 60a is, for example, the same circular shape as the through hole 25a formed in the holding body 25 shown in FIG. Here, the punch pattern 60a is formed at a position facing the spiral contact portion 26a of the spiral contact 26 in the film thickness direction. In other words, the blank pattern 60a is positioned inside the concave portion 54 formed in the organic insulating material layer 52 so that the blank pattern 60a does not face the concave portion 54 in the film thickness direction. The organic insulating material layer 52 at the position facing the extraction pattern 60a is removed by exposure and development in the next step. If the concave portion 54 exists at the position facing the extraction pattern 60a in the film thickness direction, the next step is performed. The conductive portion 55 plated in the concave portion 54 is exposed in the through hole formed in the process. Therefore, the blank pattern 60 a is positioned inside the recess 54 formed in the organic insulating material layer 52.

図14工程で、前記抜きパターン60aから前記有機絶縁材料層52に向けて光照射する。すでに説明したように前記有機絶縁材料層52はポジ型のソルダーレジストで形成される。図11工程では、前記有機絶縁材料層52に凹部54を形成すべく前記マスク層53を用いて凹部54が形成されるべき位置の前記有機絶縁材料層52のみに光照射を行った。したがって図14工程の時点で残っている有機絶縁材料層52には光照射は行われていない状態である。   In the step of FIG. 14, light is irradiated from the punched pattern 60 a toward the organic insulating material layer 52. As already described, the organic insulating material layer 52 is formed of a positive solder resist. In the step of FIG. 11, only the organic insulating material layer 52 at a position where the concave portion 54 should be formed is irradiated using the mask layer 53 in order to form the concave portion 54 in the organic insulating material layer 52. Therefore, light irradiation is not performed on the organic insulating material layer 52 remaining at the time of the step of FIG.

よって図14工程で、マスク層60を用いて、貫通孔61を形成すべき位置の有機絶縁材料層52に部分的に光照射による露光現像を適切に行うことが可能になる。ネガ型のレジストであると、光照射がされていない箇所が抜けることになるが、ネガ型のレジストを用いて有機絶縁材料層52を形成した場合、図14の時点で残されている有機絶縁材料層52は全て光が照射された部分となる。したがって貫通孔61を適切に形成できないという問題が発生する。よって前記有機絶縁材料層52に凹部54と貫通孔61とを別々の工程を用いて形成するときは、前記有機絶縁材料層52にポジ型のソルダーレジストを用いることが好ましいことになる。   Accordingly, in the step of FIG. 14, it becomes possible to appropriately perform exposure and development by partial light irradiation on the organic insulating material layer 52 at the position where the through hole 61 is to be formed, using the mask layer 60. In the case of a negative resist, a portion that has not been irradiated with light is removed, but when the organic insulating material layer 52 is formed using a negative resist, the organic insulation remaining at the time of FIG. The material layer 52 is a portion irradiated with light. Therefore, the problem that the through-hole 61 cannot be formed appropriately occurs. Therefore, when the recesses 54 and the through holes 61 are formed in the organic insulating material layer 52 using different processes, it is preferable to use a positive solder resist for the organic insulating material layer 52.

図15に示すように、マスク層60を用い前記マスク層60の抜きパターン60aと膜厚方向で対向する位置にある有機絶縁材料層52を露光現像して図15に示す貫通孔61を形成する。図15に示すように前記貫通孔61は前記有機絶縁材料層52の表面52aから裏面52cにかけて形成され、前記貫通孔61から前記スパイラル接触子26のスパイラル形状の接触部26aが露出する。   As shown in FIG. 15, using the mask layer 60, the organic insulating material layer 52 located at a position facing the cut pattern 60a of the mask layer 60 in the film thickness direction is exposed and developed to form the through hole 61 shown in FIG. . As shown in FIG. 15, the through hole 61 is formed from the front surface 52 a to the back surface 52 c of the organic insulating material layer 52, and the spiral contact portion 26 a of the spiral contactor 26 is exposed from the through hole 61.

次に図16に示す工程では、図15の工程までで出来上がった電気的接触構造体の前記貫通孔61を利用し、前記貫通孔61の下側から突出調整部材62を突合せ、矢印方向に前記突出調整部材62を押し上げることで、前記貫通孔61に露出したスパイラル形状の接触部26aを上方に向けて螺旋状になるように立体フォーミングする。これにより図5に示すように前記接触部26aを立体成形することが出来る。   Next, in the step shown in FIG. 16, the through hole 61 of the electrical contact structure completed up to the step of FIG. By pushing up the protrusion adjusting member 62, the three-dimensional forming is performed so that the spiral contact portion 26a exposed in the through hole 61 is spiraled upward. Thereby, as shown in FIG. 5, the contact portion 26a can be three-dimensionally formed.

なお図16工程では図15工程での電気的接触構造体をひっくり返し、保持体52の上側に前記接触部26aを、下側に導通部55の突出部55aを位置させ、この状態で前記突出調整部材62を前記貫通孔61から上方に向けて押し上げているが、図15の状態のまま前記突出調整部材62を前記貫通孔61下に位置させ前記突出調整部材62を上方に押し上げて、前記貫通孔61内に前記接触部26aが立体成形されて入り込むような構成にすることも当然可能である。   In the process of FIG. 16, the electrical contact structure in the process of FIG. 15 is turned over, the contact part 26a is positioned on the upper side of the holding body 52, and the protrusion part 55a of the conduction part 55 is positioned on the lower side. Although the adjustment member 62 is pushed upward from the through hole 61, the protrusion adjustment member 62 is positioned below the through hole 61 and the protrusion adjustment member 62 is pushed upward while maintaining the state of FIG. Of course, the contact portion 26a can be three-dimensionally formed in the through hole 61.

図7ないし図16に示す各工程で成形された電気的接触構造体では、基本的にスパイラル接触子26、有機絶縁材料層52で構成された保持体、及び導通部55のみで構成できる。このように、一連の工程を用いて非常に簡単な構造の電気的接触構造体を成形できる。   The electrical contact structure formed in each step shown in FIGS. 7 to 16 can be basically composed of only the spiral contactor 26, the holding body constituted by the organic insulating material layer 52, and the conduction part 55. Thus, an electrical contact structure having a very simple structure can be formed using a series of steps.

特に従来では基台を別購入するなどしていたため、多数のスパイラル接触子がそれぞればらばらにならないように各スパイラル接触子間をガイドフレームを用いて繋げる工程(図19B)や、前記スパイラル接触子を前記基台に貼り付ける工程(図19D)が必要であったが、このような工程を必要としなくなり製造工程の簡素化を図れる。特に従来のように基台が必要なく、前記基台は複雑加工されたものであり高価であったが、本発明によれば非常に簡単な方法で多数のスパイラル接触子26を保持する有機絶縁材料層52を一連の製造過程の中で形成でき、また前記有機絶縁材料層52を最終的に保持体として残すことができるので、保持体成形の製造工程も容易で生産コストの低減を従来に比べて図ることが出来る。   In particular, in the past, since the base was separately purchased, a step of connecting the spiral contacts using a guide frame (FIG. 19B) so that a large number of spiral contacts are not separated from each other, Although the process of attaching to the base (FIG. 19D) was necessary, such a process is not necessary and the manufacturing process can be simplified. In particular, there is no need for a base as in the prior art, and the base is complicatedly processed and expensive. However, according to the present invention, an organic insulation that holds a large number of spiral contacts 26 in a very simple manner. The material layer 52 can be formed in a series of manufacturing processes, and the organic insulating material layer 52 can be finally left as a holding body, so that the manufacturing process for forming the holding body is easy and the production cost can be reduced conventionally. It can be compared.

特に前記保持体に凹部54形成や貫通孔61形成などを任意の位置に容易に且つ高精度に行うことができ、また、前記有機絶縁材料層52を前記スパイラル接触子26を形成する基板50上に形成できるため、従来のように基台とスパイラル接触子26とを別々の工程で形成し、後工程で両部材を張り合わせることはなく、その結果、前記保持体54にスパイラル接触子26の形状に合わせて微細な貫通孔61の形成や膜厚を従来より任意に薄く形成できるなど、電気的接触構造体の小型化を従来に比べてよりいっそう促進させることが可能である。   In particular, the concave portion 54 and the through hole 61 can be easily and accurately formed on the holding body at an arbitrary position, and the organic insulating material layer 52 is formed on the substrate 50 on which the spiral contactor 26 is formed. Therefore, the base and the spiral contact 26 are formed in separate steps as in the prior art, and the two members are not bonded together in the subsequent process. As a result, the spiral contact 26 is not attached to the holding body 54. The miniaturization of the electrical contact structure can be further promoted compared to the prior art, such as the formation of the fine through-holes 61 and the film thickness can be arbitrarily reduced as compared with the prior art.

また本発明では、前記保持体を構成する有機絶縁材料層52としてソルダーレジストなどを用い、前記ソルダーレジストの形成過程で、前記有機絶縁材料層52に直接、前記スパイラル接触子26を取り付けることができること、また前記前記有機絶縁材料層52に凹部54を形成し、その中に導通部55をメッキ形成することで前記スパイラル接触子26の基部26bと前記導通部55とを直接、導通接続させることができるなど、従来必要であった導電性接着剤による取付工程が必要なくなり、取付工程を簡単にできるとともに、導電性接着剤を用いた場合に必要であった熱圧着工程が必要なく、前記導通部55と前記スパイラル接触子26間の導通性を従来よりも良好にすることが可能である。   Further, in the present invention, a solder resist or the like is used as the organic insulating material layer 52 constituting the holder, and the spiral contact 26 can be directly attached to the organic insulating material layer 52 in the process of forming the solder resist. In addition, a concave portion 54 is formed in the organic insulating material layer 52, and a conductive portion 55 is plated therein, whereby the base portion 26b of the spiral contactor 26 and the conductive portion 55 can be directly conductively connected. It is possible to simplify the mounting process by using a conductive adhesive, which was necessary in the past, and the conductive part is not necessary in the case of using a conductive adhesive. It is possible to make the continuity between 55 and the spiral contact 26 better than before.

なお本発明では、前記有機絶縁材料層52としてソルダーレジストを一例に挙げたが、ポリイミドなどの樹脂で前記有機絶縁材料層52を形成してもよい。かかる場合、レーザ加工等で前記凹部54や貫通孔61形成を行うことが好ましい。   In the present invention, a solder resist is exemplified as the organic insulating material layer 52. However, the organic insulating material layer 52 may be formed of a resin such as polyimide. In such a case, it is preferable to form the concave portion 54 and the through hole 61 by laser processing or the like.

また本発明では、図16工程に示すように有機絶縁材料層52に形成された貫通孔61を用いて前記スパイラル接触子26の接触部26aを立体成形することができ、また図16に示す導通部55の突出部55aを、前記電気的接触構造体の下側に設けられるプリント基板の対向電極上に導通接続させる際に、図5で説明したように両部材間に空間部32が形成されるからこの空間部32を利用して前記突出部55aと前記対向電極31間を半田付けすることが可能になる。特に前記突出部55aはバンプ形成されたものであり、前記対向電極31との導通接続面積が大きいので、前記突出部55aと前記対向電極31間を簡単且つ確実に半田付けすることが可能となる。   Further, in the present invention, the contact portion 26a of the spiral contactor 26 can be three-dimensionally formed using the through hole 61 formed in the organic insulating material layer 52 as shown in the step of FIG. 16, and the conduction shown in FIG. When the protruding portion 55a of the portion 55 is electrically connected to the counter electrode of the printed circuit board provided on the lower side of the electrical contact structure, the space portion 32 is formed between both members as described with reference to FIG. Therefore, it is possible to solder between the protruding portion 55a and the counter electrode 31 using the space portion 32. In particular, the protrusion 55a is bump-formed and has a large conductive connection area with the counter electrode 31, so that the protrusion 55a and the counter electrode 31 can be easily and reliably soldered. .

なお図7ないし図16に示す各工程では、電気的接触部としてスパイラル接触子26を例示したが、前記電気的接触部がスパイラル形状以外の形態であってもよいことは言うまでもない。   In each step shown in FIGS. 7 to 16, the spiral contact 26 is exemplified as the electrical contact portion, but it goes without saying that the electrical contact portion may have a form other than the spiral shape.

電子部品の動作を確認するための試験に用いられる検査装置を示す斜視図、The perspective view which shows the test | inspection apparatus used for the test for confirming operation | movement of an electronic component, 本発明における電気的接触構造体の平面図、The top view of the electrical contact structure in the present invention, 図2のAの領域を拡大した電気的接触構造体の部分拡大平面図、FIG. 2 is a partially enlarged plan view of an electrical contact structure in which the region A in FIG. 2 is enlarged; 図3を裏側から見た電気的接触構造体の部分拡大裏面図、FIG. 3 is a partially enlarged back view of the electrical contact structure as seen from the back side; 図2のAの領域を拡大した電気的接触構造体の部分拡大断面図、及び前記電気的接触構造体の上方に対向する電子部品と、前記電気的接触構造体の下側に接続させるプリント基板との部分拡大断面図、2 is a partially enlarged cross-sectional view of the electrical contact structure in which the region A in FIG. 2 is enlarged, and an electronic component facing above the electrical contact structure, and a printed circuit board connected to the lower side of the electrical contact structure And a partial enlarged sectional view with 本発明の電気的接触構造体をコネクタの内部部品として用いた場合の、前記コネクタの分解斜視図、When the electrical contact structure of the present invention is used as an internal part of the connector, an exploded perspective view of the connector, 本発明における電気的接触構造体の製造方法を示す一工程図、1 process drawing which shows the manufacturing method of the electrical contact structure in the present invention, 図7の次に行われる一工程図、FIG. 7 is a process diagram to be performed next to 図8の次に行われる一工程図、FIG. 8 is a process diagram performed next to FIG. 図9の次に行われる一工程図、FIG. 9 is a process diagram performed next to FIG. 図10の次に行われる一工程図、FIG. 10 is a process diagram performed next to FIG. 図11の次に行われる一工程図、FIG. 11 is a process diagram to be performed next to FIG. 図12の次に行われる一工程図、FIG. 12 is a process diagram performed next to FIG. 図13の次に行われる一工程図、FIG. 13 is a process diagram performed next to FIG. 図14の次に行われる一工程図、FIG. 14 is a process diagram to be performed next to FIG. 図15の次に行われる一工程図、FIG. 15 is a process diagram that is performed next to FIG. 従来における電気的接触構造体の部分拡大斜視図、Partial enlarged perspective view of a conventional electrical contact structure, 図17に示す電気的接触構造体の一部をさらに拡大した部分拡大裏面図、The partially expanded back view which expanded further a part of electrical contact structure shown in FIG. 17, 従来における電気的接触構造体を製造するための製造工程を示す一工程図、1 process drawing which shows the manufacturing process for manufacturing the electrical contact structure in the past, 図19Aの次に行われる一工程図、FIG. 19A is a process diagram performed next to FIG. 図19Bの次に行われる一工程図、FIG. 19B is a process diagram performed next to FIG. 図19Cの次に行われる一工程図、FIG. 19C is a process diagram performed next to FIG. 図19Dの次に行われる一工程図、FIG. 19D is a process diagram performed next to FIG. 図19Eの次に行われる一工程図、FIG. 19E is a process diagram performed next to FIG.

符号の説明Explanation of symbols

24、41 電気的接触構造体
25、44 保持体
25a、61 貫通孔
26、43 スパイラル接触子
27 凹部
28、55 導通部
28a、55a 突出部
30、46 プリント基板
45 コネクタ
50 Cu基板
51 レジスト層
52 有機絶縁材料層
53、60 マスク層
62 突出調整部材
24, 41 Electrical contact structure 25, 44 Holding body 25a, 61 Through hole 26, 43 Spiral contact 27 Recess 28, 55 Conducting portion 28a, 55a Protrusion 30, 46 Printed circuit board 45 Connector 50 Cu substrate 51 Resist layer 52 Organic insulating material layers 53, 60 Mask layer 62 Projection adjusting member

Claims (19)

被接触体に対して電気的に接触される電気的接触部と、前記電気的接触部を保持する保持体とを有して成る電気的接触構造体において、
前記電気的接触部は前記保持体の表面側にて保持され、前記保持体には、裏面にまで至る凹部が設けられ、前記凹部内には導通部が設けられ、
前記導通部は、前記電気的接触部と直接、導通接続されるとともに、前記保持体の裏面側で、被接続部と導通接続されることを特徴とする電気的接触構造体。
In an electrical contact structure comprising an electrical contact portion that is in electrical contact with a contacted body, and a holding body that holds the electrical contact portion,
The electrical contact portion is held on the front surface side of the holding body, the holding body is provided with a recess reaching the back surface, and a conducting portion is provided in the recess,
The electrical connection structure is characterized in that the conductive portion is directly conductively connected to the electrical contact portion and is electrically connected to the connected portion on the back side of the holding body.
前記保持体は有機絶縁材料で形成されたものである請求項1記載の電気的接触構造体。   The electrical contact structure according to claim 1, wherein the holding body is made of an organic insulating material. 前記有機絶縁材料にはソルダーレジストが用いられる請求項2記載の電気的接触構造体。   The electrical contact structure according to claim 2, wherein a solder resist is used as the organic insulating material. 前記保持体には、表面から裏面にまで通じる貫通孔が設けられ、前記電気的接触部の端部は、前記保持体上の前記貫通孔の周辺部にて保持されるとともに、前記端部を除く前記電気的接触部の部分が前記貫通孔と膜厚方向で対向する位置にまで延出して設けられ、
前記凹部は、前記貫通孔よりも外側に離れた位置にて、前記保持体の裏面から前記端部にまで通じて形成される請求項1ないし3のいずれかに記載の電気的接触構造体。
The holding body is provided with a through-hole that leads from the front surface to the back surface, and the end portion of the electrical contact portion is held at the peripheral portion of the through-hole on the holding body, and the end portion is Excluding the part of the electrical contact portion extending to a position facing the through hole in the film thickness direction,
The electrical contact structure according to any one of claims 1 to 3, wherein the concave portion is formed from the back surface of the holding body to the end portion at a position distant from the through hole.
前記電気的接触部はスパイラル形状で形成されたスパイラル接触部と、前記スパイラル接触部と繋がり、前記前記スパイラル接触部の周囲を囲む基部とで構成され、前記基部が前記保持体上に保持されるとともに、前記スパイラル接触部が前記貫通孔と膜厚方向で対向する位置に設けられる請求項4記載の電気的接触構造体。   The electrical contact portion includes a spiral contact portion formed in a spiral shape and a base portion connected to the spiral contact portion and surrounding the spiral contact portion, and the base portion is held on the holding body. The electrical contact structure according to claim 4, wherein the spiral contact portion is provided at a position facing the through hole in the film thickness direction. 前記凹部は、前記貫通孔より外側に離れた位置にて、前記貫通孔の周囲を囲むように、前記保持体の裏面から前記基部にまで通じて形成され、前記凹部内に形成される導通部が前記保持体の裏面にて前記貫通孔の周辺部を囲む形状にて露出する請求項5記載の電気的接触構造体。   The concave portion is formed from the back surface of the holding body to the base portion so as to surround the through hole at a position away from the through hole, and is formed in the concave portion. The electrical contact structure according to claim 5, wherein the back surface of the holding body is exposed in a shape surrounding the periphery of the through hole. 前記導通部はメッキ形成されたものである請求項1ないし6のいずれかに記載の電気的接触構造体。   The electrical contact structure according to any one of claims 1 to 6, wherein the conductive portion is formed by plating. 前記導通部は前記保持体の裏面から前記被接続部側に突出した突出部を有し、前記突出部は、前記凹部内に形成された導通部の幅寸法よりも広い幅寸法を有して形成される請求項1ないし7のいずれかに記載の電気的接触構造体。   The conducting portion has a protruding portion that protrudes from the back surface of the holding body toward the connected portion, and the protruding portion has a width that is wider than the width of the conducting portion formed in the recess. The electrical contact structure according to claim 1, which is formed. 前記突出部の表面は凸型の湾曲面状である請求項8記載の電気的接触構造体。   The electrical contact structure according to claim 8, wherein a surface of the protrusion is a convex curved surface. 前記導通部は前記被接続部と半田にて接続固定される請求項1ないし9のいずれかに記載の電気的接触構造体。   The electrical contact structure according to claim 1, wherein the conductive portion is connected and fixed to the connected portion with solder. 前記被接続部はプリント基板上に形成されている請求項1ないし10のいずれかに記載の電気的接触構造体。   The electrical contact structure according to claim 1, wherein the connected portion is formed on a printed circuit board. 被接触体に対して電気的に接触される電気的接触部と、前記電気的接触部を保持する保持体とを有して成る電気的接触構造体の製造方法において、
(a) 基板上に電気的接触部をメッキ形成する工程と、
(b) 前記電気的接触部上及び前記基板上を保持体となる有機絶縁材料層によって覆う工程と、
(c) 前記有機絶縁材料層に前記有機材料層の表面側から、前記電気的接触部の所定の部位上にまで通じる凹部を形成する工程と、
(d) 前記凹部内に導通部をメッキ形成し、前記導通部を前記電気的接触部上に直接、導通接続させる工程と、
(e) 前記基板を除去する工程と、
を有することを特徴とする電気的接触構造体の製造方法。
In the method of manufacturing an electrical contact structure comprising an electrical contact portion that is electrically contacted with a contacted body, and a holding body that holds the electrical contact portion,
(A) plating an electrical contact portion on the substrate;
(B) a step of covering the electrical contact portion and the substrate with an organic insulating material layer serving as a holder;
(C) forming a recess in the organic insulating material layer from the surface side of the organic material layer to a predetermined portion of the electrical contact portion;
(D) plating a conductive part in the recess and electrically connecting the conductive part directly on the electrical contact part;
(E) removing the substrate;
A method for producing an electrical contact structure characterized by comprising:
(d)工程と(e)工程の間に以下の工程を有する請求項12記載の電気的接触構造体の製造方法。
(f) 前記導通部から離れた位置であって、少なくとも前記電気的接触部の一部と膜厚方向で対向する位置に、前記有機絶縁材料層の表面から裏面にかけて貫通孔を形成して、前記貫通孔内に前記電気的接触部の一部を露出させる工程。
The method for manufacturing an electrical contact structure according to claim 12, comprising the following steps between step (d) and step (e).
(F) A through hole is formed from the surface of the organic insulating material layer to the back surface at a position away from the conductive portion and facing at least a part of the electrical contact portion in the film thickness direction; Exposing a part of the electrical contact portion in the through hole;
前記(f)工程と前記(e)工程の間に次の工程を有する請求項13記載の電気的接触構造体の製造方法。
(g) 前記貫通孔内に露出した電気的接触部を立体フォーミングする工程。
The method for manufacturing an electrical contact structure according to claim 13, comprising the following steps between the step (f) and the step (e).
(G) A step of three-dimensionally forming the electrical contact portion exposed in the through hole.
前記(a)工程で、前記電気的接触部をスパイラル形状で形成されたスパイラル接触部と、前記スパイラル接触部と一体に成形され、前記前記スパイラル接触部の周囲を囲む基部とで形成し、
前記(c)工程で、前記有機絶縁材料層に前記有機材料層の表面側から、前記電気的接触部の基部上にまで通じる凹部を形成し、
前記(f)工程で、前記貫通孔の形成により、前記貫通孔内に、前記電気的接触部を構成するスパイラル接触部の部分を露出させる請求項13または14に記載の電気的接触構造体の製造方法。
In the step (a), the electrical contact portion is formed by a spiral contact portion formed in a spiral shape, and a base portion that is integrally formed with the spiral contact portion and surrounds the periphery of the spiral contact portion,
In the step (c), the organic insulating material layer is formed with a recess that leads from the surface side of the organic material layer to the base of the electrical contact portion,
The electrical contact structure according to claim 13 or 14, wherein, in the step (f), by forming the through hole, a portion of a spiral contact portion constituting the electrical contact portion is exposed in the through hole. Production method.
前記(b)工程で用いる有機絶縁材料層にソルダーレジストを用いる請求項12ないし15のいずれかに記載の電気的接触構造体の製造方法。   The method for producing an electrical contact structure according to claim 12, wherein a solder resist is used for the organic insulating material layer used in the step (b). 前記ソルダーレジストにはポジ型のレジストを用い、前記(c)工程でマスク層を用いて露光現像により、露光された部分のソルダーレジストを除去して凹部を形成する請求項16記載の電気的接触構造体の製造方法。   The electrical contact according to claim 16, wherein a positive resist is used as the solder resist, and the exposed portion of the solder resist is removed by exposure and development using a mask layer in the step (c) to form a recess. Manufacturing method of structure. 前記(f)工程でマスク層を用いて露光現像により、露光された部分のソルダーレジストを除去して貫通孔を形成する請求項17記載の電気的接触構造体の製造方法。   18. The method of manufacturing an electrical contact structure according to claim 17, wherein the exposed portion of the solder resist is removed by exposure and development using a mask layer in the step (f) to form a through hole. 前記(d)工程で、前記導通部を前記有機絶縁材料層の表面から盛り上がるようにバンプ形成する請求項12ないし18のいずれかに記載の電気的接触構造体の製造方法。   The method of manufacturing an electrical contact structure according to claim 12, wherein in the step (d), bumps are formed so that the conductive portion rises from the surface of the organic insulating material layer.
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