JP2005175259A5 - - Google Patents

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Publication number
JP2005175259A5
JP2005175259A5 JP2003414647A JP2003414647A JP2005175259A5 JP 2005175259 A5 JP2005175259 A5 JP 2005175259A5 JP 2003414647 A JP2003414647 A JP 2003414647A JP 2003414647 A JP2003414647 A JP 2003414647A JP 2005175259 A5 JP2005175259 A5 JP 2005175259A5
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JP
Japan
Prior art keywords
pattern
ultraviolet light
forming
resist
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003414647A
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English (en)
Japanese (ja)
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JP4417090B2 (ja
JP2005175259A (ja
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Priority to JP2003414647A priority Critical patent/JP4417090B2/ja
Priority claimed from JP2003414647A external-priority patent/JP4417090B2/ja
Publication of JP2005175259A publication Critical patent/JP2005175259A/ja
Publication of JP2005175259A5 publication Critical patent/JP2005175259A5/ja
Application granted granted Critical
Publication of JP4417090B2 publication Critical patent/JP4417090B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003414647A 2003-12-12 2003-12-12 パターン形成方法、マスクおよび露光装置 Expired - Fee Related JP4417090B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003414647A JP4417090B2 (ja) 2003-12-12 2003-12-12 パターン形成方法、マスクおよび露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003414647A JP4417090B2 (ja) 2003-12-12 2003-12-12 パターン形成方法、マスクおよび露光装置

Publications (3)

Publication Number Publication Date
JP2005175259A JP2005175259A (ja) 2005-06-30
JP2005175259A5 true JP2005175259A5 (zh) 2007-01-25
JP4417090B2 JP4417090B2 (ja) 2010-02-17

Family

ID=34734379

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003414647A Expired - Fee Related JP4417090B2 (ja) 2003-12-12 2003-12-12 パターン形成方法、マスクおよび露光装置

Country Status (1)

Country Link
JP (1) JP4417090B2 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5137410B2 (ja) * 2006-06-09 2013-02-06 キヤノン株式会社 感光性化合物、感光性組成物、レジストパターンの形成方法及び基板の加工方法
KR101662702B1 (ko) * 2009-12-31 2016-10-06 삼성전자 주식회사 반도체 소자의 제조 방법
JP6895600B2 (ja) * 2014-02-25 2021-06-30 東京エレクトロン株式会社 現像可能な底部反射防止コーティングおよび着色インプラントレジストのための化学増幅方法および技術

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