JP2005166965A5 - - Google Patents
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- JP2005166965A5 JP2005166965A5 JP2003403975A JP2003403975A JP2005166965A5 JP 2005166965 A5 JP2005166965 A5 JP 2005166965A5 JP 2003403975 A JP2003403975 A JP 2003403975A JP 2003403975 A JP2003403975 A JP 2003403975A JP 2005166965 A5 JP2005166965 A5 JP 2005166965A5
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- thin film
- temperature
- gas
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003403975A JP4205565B2 (ja) | 2003-12-03 | 2003-12-03 | 薄膜製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003403975A JP4205565B2 (ja) | 2003-12-03 | 2003-12-03 | 薄膜製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005166965A JP2005166965A (ja) | 2005-06-23 |
| JP2005166965A5 true JP2005166965A5 (zh) | 2006-12-07 |
| JP4205565B2 JP4205565B2 (ja) | 2009-01-07 |
Family
ID=34727077
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003403975A Expired - Lifetime JP4205565B2 (ja) | 2003-12-03 | 2003-12-03 | 薄膜製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4205565B2 (zh) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070218200A1 (en) * | 2006-03-16 | 2007-09-20 | Kenji Suzuki | Method and apparatus for reducing particle formation in a vapor distribution system |
| JP5248025B2 (ja) * | 2007-03-01 | 2013-07-31 | 東京エレクトロン株式会社 | ＳｒＴｉＯ３膜の成膜方法およびコンピュータ読取可能な記憶媒体 |
| US20130023062A1 (en) * | 2009-12-11 | 2013-01-24 | Takeshi Masuda | Thin film manufacturing apparatus, thin film manufacturing method and method for manufacturing semiconductor device |
| KR102433290B1 (ko) * | 2018-02-08 | 2022-08-17 | 에스케이하이닉스 주식회사 | 강유전성 소자의 제조 방법 |
-
2003
- 2003-12-03 JP JP2003403975A patent/JP4205565B2/ja not_active Expired - Lifetime
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