JP2005140771A5 - - Google Patents
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- Publication number
- JP2005140771A5 JP2005140771A5 JP2004306239A JP2004306239A JP2005140771A5 JP 2005140771 A5 JP2005140771 A5 JP 2005140771A5 JP 2004306239 A JP2004306239 A JP 2004306239A JP 2004306239 A JP2004306239 A JP 2004306239A JP 2005140771 A5 JP2005140771 A5 JP 2005140771A5
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- signal
- reflected
- layer
- reflected signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005855 radiation Effects 0.000 claims 80
- 238000007689 inspection Methods 0.000 claims 55
- 238000000034 method Methods 0.000 claims 26
- 239000010409 thin film Substances 0.000 claims 10
- 238000001514 detection method Methods 0.000 claims 9
- 238000004519 manufacturing process Methods 0.000 claims 8
- 239000004065 semiconductor Substances 0.000 claims 8
- 230000008021 deposition Effects 0.000 claims 6
- 238000004377 microelectronic Methods 0.000 claims 5
- 238000000560 X-ray reflectometry Methods 0.000 claims 2
- 239000003989 dielectric material Substances 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 239000011159 matrix material Substances 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/689,314 US7062013B2 (en) | 2001-04-12 | 2003-10-20 | X-ray reflectometry of thin film layers with enhanced accuracy |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010204666A Division JP5302281B2 (ja) | 2003-10-20 | 2010-09-13 | サンプルの検査方法及び装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005140771A JP2005140771A (ja) | 2005-06-02 |
| JP2005140771A5 true JP2005140771A5 (OSRAM) | 2007-10-25 |
| JP4624758B2 JP4624758B2 (ja) | 2011-02-02 |
Family
ID=34700298
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004306239A Expired - Lifetime JP4624758B2 (ja) | 2003-10-20 | 2004-10-20 | サンプルの検査方法及び装置 |
| JP2010204666A Expired - Lifetime JP5302281B2 (ja) | 2003-10-20 | 2010-09-13 | サンプルの検査方法及び装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010204666A Expired - Lifetime JP5302281B2 (ja) | 2003-10-20 | 2010-09-13 | サンプルの検査方法及び装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JP4624758B2 (OSRAM) |
| KR (1) | KR101166013B1 (OSRAM) |
| TW (1) | TWI345055B (OSRAM) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7113566B1 (en) * | 2005-07-15 | 2006-09-26 | Jordan Valley Applied Radiation Ltd. | Enhancing resolution of X-ray measurements by sample motion |
| TWI452283B (zh) * | 2006-05-05 | 2014-09-11 | Jordan Valley Semiconductors | 校準一獲得反射率資料之系統的方法及校準一反射計之方法 |
| KR100814389B1 (ko) * | 2006-07-06 | 2008-03-18 | 학교법인 포항공과대학교 | Ⅹ선 투과 / 회절 영상 결합 촬영 시스템 |
| CN116068609B (zh) * | 2023-03-09 | 2023-05-30 | 中国科学院合肥物质科学研究院 | 一种真空环境下弯晶谱仪空间位置标定方法和装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5340988A (en) * | 1993-04-05 | 1994-08-23 | General Electric Company | High resolution radiation imaging system |
| JPH0798285A (ja) * | 1993-09-29 | 1995-04-11 | Ricoh Co Ltd | Ｘ線評価装置 |
| JP2984232B2 (ja) * | 1996-10-25 | 1999-11-29 | 株式会社テクノス研究所 | Ｘ線分析装置およびｘ線照射角設定方法 |
| JP2002118103A (ja) * | 2000-10-12 | 2002-04-19 | Matsushita Electric Ind Co Ltd | 薄膜製造装置と薄膜の製造方法並びに薄膜トランジスタの製造方法 |
| US6744850B2 (en) * | 2001-01-11 | 2004-06-01 | Therma-Wave, Inc. | X-ray reflectance measurement system with adjustable resolution |
| US6535575B2 (en) * | 2001-04-12 | 2003-03-18 | Jordan Valley Applied Radiation Ltd. | Pulsed X-ray reflectometer |
| US6507634B1 (en) * | 2001-09-19 | 2003-01-14 | Therma-Wave, Inc. | System and method for X-ray reflectometry measurement of low density films |
| JP2003149180A (ja) * | 2001-11-13 | 2003-05-21 | Japan Synchrotron Radiation Research Inst | １次元または２次元検出器を用いた粉末ｘ線回折データ測定方法 |
| JP2003282660A (ja) * | 2002-03-20 | 2003-10-03 | Fujitsu Ltd | 半導体製造装置及び成膜方法 |
-
2004
- 2004-10-20 JP JP2004306239A patent/JP4624758B2/ja not_active Expired - Lifetime
- 2004-10-20 KR KR1020040084157A patent/KR101166013B1/ko not_active Expired - Lifetime
- 2004-10-20 TW TW093131885A patent/TWI345055B/zh not_active IP Right Cessation
-
2010
- 2010-09-13 JP JP2010204666A patent/JP5302281B2/ja not_active Expired - Lifetime
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