JP2005133206A - Srzの形成に対して安定化された被覆超合金の製造方法 - Google Patents
Srzの形成に対して安定化された被覆超合金の製造方法 Download PDFInfo
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- JP2005133206A JP2005133206A JP2004293835A JP2004293835A JP2005133206A JP 2005133206 A JP2005133206 A JP 2005133206A JP 2004293835 A JP2004293835 A JP 2004293835A JP 2004293835 A JP2004293835 A JP 2004293835A JP 2005133206 A JP2005133206 A JP 2005133206A
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
- C23C28/3215—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer at least one MCrAlX layer
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/325—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with layers graded in composition or in physical properties
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/341—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one carbide layer
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
- C23C28/3455—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer with a refractory ceramic layer, e.g. refractory metal oxide, ZrO2, rare earth oxides or a thermal barrier system comprising at least one refractory oxide layer
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- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Turbine Rotor Nozzle Sealing (AREA)
- Physical Vapour Deposition (AREA)
Abstract
【解決手段】 SRZ(二次反応帯(46))の形成を起こし易いニッケル基超合金基体(34)の表面に保護被膜構造物(32)を設置することで被覆超合金物品(18)が製造される。被膜の設置は、ニッケル基超合金基体(34)を蒸着装置内に配置し、次いでニッケル基超合金基体(34)の表面上に接触して位置する炭素含有層(32)を蒸着し、次いで炭素含有層(32)上に接触して位置するアルミニウム含有層(36)を蒸着することで実施される。アルミニウム含有層(36)を蒸着する段階は、ニッケル基超合金基体(34)を周囲大気条件に暴露することなく、炭素含有層(32)を蒸着する段階と同じ蒸着装置(好ましくはEB−PVD装置のような真空蒸着装置)内で実施される。物品(18)には断熱被膜を設置することができ、熱処理することができる。
【選択図】 図3
Description
32 保護被膜構造物
34 ニッケル基超合金基体
36 アルミニウム含有層
42 酸化アルミニウム保護スケール
44 セラミック層
46 二次反応帯
80 炭素含有層
82 相互拡散帯
Claims (10)
- 被覆超合金物品(18)の製造方法であって、前記方法が、
アルミニウムと相互拡散したときに二次反応帯(46)を形成する組成をもったニッケル基超合金基体(34)を用意する段階、
次いでニッケル基超合金基体(34)の表面に保護被膜構造物(32)を設置する段階
を含んでなり、保護被膜構造物(32)を設置する段階が、
ニッケル基超合金基体(34)の表面上に接触して位置する炭素含有層(32)を蒸着する段階、
次いで炭素含有層(32)上に接触して位置するアルミニウム含有層(36)を蒸着する段階
を含んでおり、アルミニウム含有層(36)を蒸着する段階が、ニッケル基超合金基体(34)を周囲大気条件に暴露することなく、炭素含有層(32)を蒸着する段階と同じ蒸着装置内で実施される、方法。 - 保護被膜構造物(32)を設置する段階が、ニッケル基超合金基体(34)を蒸着装置内に配置する段階を含む、請求項1記載の方法。
- ニッケル基超合金基体(34)を用意する段階が、重量パーセントで表して、約16.5%のコバルト、約2%のクロム、約5.55%のアルミニウム、約8.25%のタンタル、約6%のタングステン、約5.95%のレニウム、約3%のルテニウム、約2%のモリブデン、約0.03%の炭素、約0.15%のハフニウム、約0.004%のホウ素、約0.01%のイットリウム、並びに残部のニッケル及び微量元素からなる公称組成を有する基体(34)を用意する段階を含む、請求項1記載の方法。
- ニッケル基超合金基体(34)を用意する段階が、約4重量%以上のレニウムを有する基体(34)を用意する段階を含む、請求項1記載の方法。
- ニッケル基超合金基体(34)を蒸着装置内に配置する段階が、蒸着装置として電子ビーム物理蒸着装置を用意する段階を含む、請求項1記載の方法。
- ニッケル基超合金基体(34)を蒸着装置内に配置する段階が、蒸着装置として真空蒸着装置を用意する段階を含む、請求項1記載の方法。
- 炭素含有層(32)を蒸着する段階が、実質的に純粋な炭素として炭素含有層(32)を蒸着する段階を含む、請求項1記載の方法。
- 炭素含有層(32)を蒸着する段階が、他の元素と化学反応していない形態の炭素を蒸着する段階を含む、請求項1記載の方法。
- 炭素含有層(32)を蒸着する段階が、炭素含有層(32)を約5〜約15マイクロメートルの厚さに蒸着する段階を含む、請求項1記載の方法。
- アルミニウム含有層(36)を蒸着する段階が、ニッケルアルミナイドオーバーレイ被膜及びMCrAlXオーバーレイ被膜からなる群から選択される、請求項1記載の方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US68069703A | 2003-10-07 | 2003-10-07 |
Publications (1)
Publication Number | Publication Date |
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JP2005133206A true JP2005133206A (ja) | 2005-05-26 |
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Application Number | Title | Priority Date | Filing Date |
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JP2004293835A Ceased JP2005133206A (ja) | 2003-10-07 | 2004-10-06 | Srzの形成に対して安定化された被覆超合金の製造方法 |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1522607B1 (ja) |
JP (1) | JP2005133206A (ja) |
DE (1) | DE602004001193T2 (ja) |
SG (1) | SG111293A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1995350A1 (en) | 2007-04-18 | 2008-11-26 | Hitachi, Ltd. | High temperature component with thermal barrier coating |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7524382B2 (en) | 2005-02-26 | 2009-04-28 | General Electric Company | Method for substrate stabilization of diffusion aluminide coated nickel-based superalloys |
CN111041428B (zh) * | 2019-12-17 | 2021-02-26 | 北京航空航天大学 | 基于eb-pvd制备纳米碳化物增强基体稳定性的方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5357137A (en) * | 1976-11-04 | 1978-05-24 | Gen Electric | Method of improving ultraaalloy coating having oxidation resistance and corrosion resistance |
JPS62174377A (ja) * | 1986-01-24 | 1987-07-31 | Mitsubishi Heavy Ind Ltd | タ−ビン翼 |
JPH05247569A (ja) * | 1991-12-05 | 1993-09-24 | General Electric Co <Ge> | 拡散アルミナイド被覆をもつニッケル基超合金基体の安定化 |
JPH07247803A (ja) * | 1994-03-14 | 1995-09-26 | Toshiba Corp | タービンブレードの製造方法 |
JP2000109970A (ja) * | 1998-10-02 | 2000-04-18 | Soc Natl Etud Constr Mot Aviat <Snecma> | 熱伝導率が小さい断熱被膜、断熱被膜により保護される金属部品、および断熱被膜の堆積方法 |
JP2000119868A (ja) * | 1997-01-16 | 2000-04-25 | General Electric Co <Ge> | 断熱皮膜系およびその製法 |
JP2000511974A (ja) * | 1996-06-13 | 2000-09-12 | シーメンス アクチエンゲゼルシヤフト | 改良された固着層を有する保護皮膜系を備えた製品およびその製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6641929B2 (en) * | 2001-08-31 | 2003-11-04 | General Electric Co. | Article having a superalloy protective coating, and its fabrication |
-
2004
- 2004-10-06 DE DE602004001193T patent/DE602004001193T2/de active Active
- 2004-10-06 JP JP2004293835A patent/JP2005133206A/ja not_active Ceased
- 2004-10-06 EP EP04256177A patent/EP1522607B1/en not_active Expired - Fee Related
- 2004-10-07 SG SG200406484A patent/SG111293A1/en unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5357137A (en) * | 1976-11-04 | 1978-05-24 | Gen Electric | Method of improving ultraaalloy coating having oxidation resistance and corrosion resistance |
JPS62174377A (ja) * | 1986-01-24 | 1987-07-31 | Mitsubishi Heavy Ind Ltd | タ−ビン翼 |
JPH05247569A (ja) * | 1991-12-05 | 1993-09-24 | General Electric Co <Ge> | 拡散アルミナイド被覆をもつニッケル基超合金基体の安定化 |
JPH07247803A (ja) * | 1994-03-14 | 1995-09-26 | Toshiba Corp | タービンブレードの製造方法 |
JP2000511974A (ja) * | 1996-06-13 | 2000-09-12 | シーメンス アクチエンゲゼルシヤフト | 改良された固着層を有する保護皮膜系を備えた製品およびその製造方法 |
JP2000119868A (ja) * | 1997-01-16 | 2000-04-25 | General Electric Co <Ge> | 断熱皮膜系およびその製法 |
JP2000109970A (ja) * | 1998-10-02 | 2000-04-18 | Soc Natl Etud Constr Mot Aviat <Snecma> | 熱伝導率が小さい断熱被膜、断熱被膜により保護される金属部品、および断熱被膜の堆積方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1995350A1 (en) | 2007-04-18 | 2008-11-26 | Hitachi, Ltd. | High temperature component with thermal barrier coating |
Also Published As
Publication number | Publication date |
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DE602004001193D1 (de) | 2006-07-27 |
EP1522607B1 (en) | 2006-06-14 |
SG111293A1 (en) | 2005-05-30 |
DE602004001193T2 (de) | 2007-04-19 |
EP1522607A1 (en) | 2005-04-13 |
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