JP2005122132A5 - - Google Patents
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- Publication number
- JP2005122132A5 JP2005122132A5 JP2004261757A JP2004261757A JP2005122132A5 JP 2005122132 A5 JP2005122132 A5 JP 2005122132A5 JP 2004261757 A JP2004261757 A JP 2004261757A JP 2004261757 A JP2004261757 A JP 2004261757A JP 2005122132 A5 JP2005122132 A5 JP 2005122132A5
- Authority
- JP
- Japan
- Prior art keywords
- reflecting
- reflective
- reflecting surface
- optical system
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims 29
- 238000005286 illumination Methods 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004261757A JP4387902B2 (ja) | 2004-09-09 | 2004-09-09 | 反射型投影光学系、当該投影光学系を有する露光装置、並びに、デバイス製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004261757A JP4387902B2 (ja) | 2004-09-09 | 2004-09-09 | 反射型投影光学系、当該投影光学系を有する露光装置、並びに、デバイス製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003316940A Division JP4366151B2 (ja) | 2003-09-02 | 2003-09-09 | 投影光学系、露光装置及びデバイスの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005122132A JP2005122132A (ja) | 2005-05-12 |
| JP2005122132A5 true JP2005122132A5 (cg-RX-API-DMAC7.html) | 2006-11-09 |
| JP4387902B2 JP4387902B2 (ja) | 2009-12-24 |
Family
ID=34616979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004261757A Expired - Fee Related JP4387902B2 (ja) | 2004-09-09 | 2004-09-09 | 反射型投影光学系、当該投影光学系を有する露光装置、並びに、デバイス製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4387902B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7973908B2 (en) * | 2005-05-13 | 2011-07-05 | Carl Zeiss Smt Gmbh | Six-mirror EUV projection system with low incidence angles |
| KR100604942B1 (ko) * | 2005-06-18 | 2006-07-31 | 삼성전자주식회사 | 비축상(off-axis) 프로젝션 광학계 및 이를 적용한극자외선 리소그래피 장치 |
| US20090040493A1 (en) * | 2007-08-09 | 2009-02-12 | Hideki Komatsuda | Illumination optical system, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| WO2010052961A1 (ja) * | 2008-11-10 | 2010-05-14 | 株式会社ニコン | 結像光学系、露光装置、およびデバイス製造方法 |
| DE102009030501A1 (de) * | 2009-06-24 | 2011-01-05 | Carl Zeiss Smt Ag | Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Beleuchtungsoptik zur Ausleuchtung eines Objektfeldes |
| DE102016212578A1 (de) * | 2016-07-11 | 2018-01-11 | Carl Zeiss Smt Gmbh | Projektionsoptik für die EUV-Projektionslithographie |
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2004
- 2004-09-09 JP JP2004261757A patent/JP4387902B2/ja not_active Expired - Fee Related