JP2005108709A5 - - Google Patents

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Publication number
JP2005108709A5
JP2005108709A5 JP2003342196A JP2003342196A JP2005108709A5 JP 2005108709 A5 JP2005108709 A5 JP 2005108709A5 JP 2003342196 A JP2003342196 A JP 2003342196A JP 2003342196 A JP2003342196 A JP 2003342196A JP 2005108709 A5 JP2005108709 A5 JP 2005108709A5
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JP
Japan
Prior art keywords
plasma
electrodes
processed
exposed
processing method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003342196A
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English (en)
Japanese (ja)
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JP2005108709A (ja
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Publication date
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Priority to JP2003342196A priority Critical patent/JP2005108709A/ja
Priority claimed from JP2003342196A external-priority patent/JP2005108709A/ja
Publication of JP2005108709A publication Critical patent/JP2005108709A/ja
Publication of JP2005108709A5 publication Critical patent/JP2005108709A5/ja
Pending legal-status Critical Current

Links

JP2003342196A 2003-09-30 2003-09-30 プラズマ処理方法及びプラズマ処理装置 Pending JP2005108709A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003342196A JP2005108709A (ja) 2003-09-30 2003-09-30 プラズマ処理方法及びプラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003342196A JP2005108709A (ja) 2003-09-30 2003-09-30 プラズマ処理方法及びプラズマ処理装置

Publications (2)

Publication Number Publication Date
JP2005108709A JP2005108709A (ja) 2005-04-21
JP2005108709A5 true JP2005108709A5 (cg-RX-API-DMAC7.html) 2005-07-14

Family

ID=34536561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003342196A Pending JP2005108709A (ja) 2003-09-30 2003-09-30 プラズマ処理方法及びプラズマ処理装置

Country Status (1)

Country Link
JP (1) JP2005108709A (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5103738B2 (ja) * 2006-01-12 2012-12-19 パナソニック株式会社 大気圧プラズマ処理方法及び装置
JP5143498B2 (ja) * 2006-10-06 2013-02-13 東京エレクトロン株式会社 基板処理方法、基板処理装置、プログラムならびに記録媒体
JP4733615B2 (ja) * 2006-10-31 2011-07-27 積水化学工業株式会社 プラズマ処理方法および処理装置
JP5870794B2 (ja) * 2012-03-21 2016-03-01 セイコーエプソン株式会社 画像記録装置、画像記録方法

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