JP2005077134A - Package for pressure detector - Google Patents

Package for pressure detector Download PDF

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JP2005077134A
JP2005077134A JP2003304790A JP2003304790A JP2005077134A JP 2005077134 A JP2005077134 A JP 2005077134A JP 2003304790 A JP2003304790 A JP 2003304790A JP 2003304790 A JP2003304790 A JP 2003304790A JP 2005077134 A JP2005077134 A JP 2005077134A
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electrode
insulating plate
metal layer
insulating
semiconductor element
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Koji Kinomura
浩司 木野村
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Kyocera Corp
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Kyocera Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a package for a pressure detector of a small size and high sensitivity capable of detecting accurately external pressure. <P>SOLUTION: This package for the pressure detector is provided with an insulation base 1 having a mounting part 1b for mounting a semiconductor element 4 on its one main face, a plurality of wiring conductors 6 arranged on a surface and in an inside of the insulation base 1, and connected electrically to respective electrodes of the semiconductor element 4, the first insulation plate 2 joined to the other main face of the insulation base 1, the second insulation plate 3 joined flexibly to an outer circumferential part of the first insulation plate 2 to form a sealed space with respect to the first insulation plate 2 therebetween, the first electrode 8 attached to the main face of the first insulation plate 2 inside the sealed space, and for forming an electrostatic capacity connected electrically to one 6a of the wiring conductors, and the second electrode 9 attached to the main face of the second insulation plate 3 inside the sealed space, and for forming an electrostatic capacity connected electrically to another one 6b of the wiring conductors. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、圧力を検出するための圧力検出装置に使用される圧力検出装置用パッケージに関する。   The present invention relates to a package for a pressure detection device used in a pressure detection device for detecting pressure.

従来、圧力を検出するための圧力検出装置として静電容量型の圧力検出装置が知られている。この静電容量型の圧力検出装置は、図4に断面図で示すように、セラミックス材料や樹脂材料から成る配線基板31上に、静電容量型の感圧素子32と、パッケージ38に収容された演算用の半導体素子39とを備えている。   Conventionally, a capacitance type pressure detection device is known as a pressure detection device for detecting pressure. As shown in a cross-sectional view in FIG. 4, this capacitance type pressure detection device is accommodated in a capacitance type pressure sensitive element 32 and a package 38 on a wiring board 31 made of a ceramic material or a resin material. And a semiconductor element 39 for calculation.

そして、感圧素子32は、例えばセラミックス材料等の電気絶縁材料から成り、上面中央部に静電容量形成用の一方の電極33が被着された凹部を有する絶縁基体34と、この絶縁基体34の上面に絶縁基体34との間に密閉空間を形成するようにして可撓な状態で接合され、下面に静電容量形成用の他方の電極35が被着された絶縁板36と、各静電容量形成用の電極33,35をそれぞれ外部に電気的に接続するための外部リード端子37とから構成されており、外部の圧力に応じて絶縁板36が撓むことにより各静電容量形成用の電極33,35間に形成される静電容量が変化する。そして、この静電容量の変化を演算用の半導体素子39により演算処理することにより外部の圧力を検出することができる。   The pressure sensitive element 32 is made of, for example, an electrically insulating material such as a ceramic material, and has an insulating base 34 having a concave portion in which one electrode 33 for forming a capacitance is attached at the center of the upper surface, and the insulating base 34. An insulating plate 36 which is joined in a flexible state so as to form a sealed space between the upper surface of the substrate and the insulating base 34 and the other electrode 35 for forming a capacitance is attached to the lower surface, and each static plate. Each of the capacitance forming electrodes 33 and 35 is composed of an external lead terminal 37 for electrically connecting to the outside, and each capacitance is formed by bending the insulating plate 36 according to the external pressure. The capacitance formed between the electrodes 33 and 35 for use changes. An external pressure can be detected by performing arithmetic processing on the change of the electrostatic capacitance by the semiconductor element 39 for arithmetic operation.

しかしながら、この従来の圧力検出装置によると、感圧素子32と半導体素子39とを配線基板31上に個別に実装していることから、圧力検出装置が大型化してしまうとともに圧力検出用の電極33,35と半導体素子39との間の配線が長いものとなり、この長い配線間に不要な静電容量が形成されるため感度が低いという問題点を有していた。   However, according to this conventional pressure detection device, since the pressure sensitive element 32 and the semiconductor element 39 are individually mounted on the wiring substrate 31, the pressure detection device is increased in size and the pressure detection electrode 33 is provided. , 35 and the semiconductor element 39 are long, and unnecessary capacitance is formed between the long wires, so that the sensitivity is low.

そこで、本願出願人は、特許文献1において、図3に断面図で示すような、一方の主面に半導体素子23が搭載される搭載部21bを有する絶縁基体21と、この絶縁基体21の表面および内部に配設され、半導体素子23の各電極が電気的に接続される複数の配線導体25と、絶縁基体21の他方の主面の中央部に被着され、配線導体25の一つに電気的に接続された静電容量形成用の第一電極27と、絶縁基体21の他方の主面に、この主面の中央部との間に密閉空間を形成するように可撓な状態で接合された絶縁板22と、この絶縁板22の内側主面に第一電極27と対向して被着され、配線導体25の他の一つに電気的に接続された静電容量形成用の第二電極29とを具備する圧力検出装置用パッケージを提案した。   In view of this, the applicant of the present application disclosed in Patent Document 1 an insulating base 21 having a mounting portion 21b on one main surface on which a semiconductor element 23 is mounted, as shown in a cross-sectional view in FIG. And a plurality of wiring conductors 25 disposed inside and electrically connected to each electrode of the semiconductor element 23, and attached to the central portion of the other main surface of the insulating base 21. In a flexible state so as to form a sealed space between the electrically connected first electrode 27 for forming capacitance and the other main surface of the insulating base 21 with the central portion of the main surface. A bonded insulating plate 22 and an inner main surface of the insulating plate 22 are attached to face the first electrode 27 and are electrically connected to the other one of the wiring conductors 25 for forming a capacitance. A package for a pressure detection device including the second electrode 29 was proposed.

この圧力検出装置用パッケージによれば、一方の主面に半導体素子23が搭載される搭載部21bを有する絶縁基体21の他方の主面に静電容量形成用の第一電極27を設けるとともに、この第一電極27に対向する静電容量形成用の第二電極29を内側面に有する絶縁板22を、絶縁基体21の他方の主面との間に密閉空間を形成するようにして可撓な状態で接合させたことから、半導体素子23を収容するパッケージに感圧素子が一体に形成され、その結果、圧力検出装置を小型とすることができるとともに圧力検出用の電極と半導体素子23とを接続する配線を短いものとして、これらの配線間に発生する不要な静電容量を小さなものとすることができるというものである。   According to this pressure detection device package, the first electrode 27 for forming a capacitance is provided on the other main surface of the insulating base 21 having the mounting portion 21b on which the semiconductor element 23 is mounted on one main surface, The insulating plate 22 having the second electrode 29 for forming a capacitance facing the first electrode 27 on the inner surface is flexible so as to form a sealed space between the other main surface of the insulating base 21. Since the pressure sensitive element is integrally formed in the package that accommodates the semiconductor element 23, the pressure detecting device can be reduced in size and the pressure detecting electrode, the semiconductor element 23, It is possible to reduce the unnecessary electrostatic capacitance generated between these wirings by shortening the wiring for connecting the wires.

従来、これらのパッケージの第一電極27は、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁基体21用のセラミックグリーンシート(以下、単にグリーンシートともいう)に印刷塗布し、これを絶縁基体21用の生セラミック成形体とともに焼成することによって絶縁基体21の上面中央部に所定のパターンに形成される。   Conventionally, the first electrode 27 of these packages is made of metal powder metallization such as tungsten, molybdenum, copper, and silver, and an appropriate organic binder, solvent, plasticizer, and dispersant are added to and mixed with metal powder such as tungsten. The obtained metallized paste is printed and applied to a ceramic green sheet for the insulating substrate 21 (hereinafter also simply referred to as a green sheet) using a conventionally known screen printing method, and this is fired together with the green ceramic molded body for the insulating substrate 21. As a result, a predetermined pattern is formed at the center of the upper surface of the insulating base 21.

また、第二電極29は、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁板22用のセラミックグリーンシート(以下、グリーンシートともいう)に印刷塗布し、これを絶縁板22用の生セラミック成形体とともに焼成することによって絶縁板22の所定のパターンに形成される。   The second electrode 29 is made of metal powder metallization such as tungsten, molybdenum, copper, silver, etc., and is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, and dispersant to metal powder such as tungsten. Is applied to a ceramic green sheet for the insulating plate 22 (hereinafter also referred to as a green sheet) by employing a well-known screen printing method, and this is fired together with a green ceramic molded body for the insulating plate 22. 22 predetermined patterns are formed.

また、第一電極27と第二電極29とを静電容量形成用とするためには、第一電極27と第二電極29との間に一定の領域を形成する必要があるため、絶縁基体21または絶縁板22の外周部に枠状の突起部22bを形成し、凹部22aを形成することで、絶縁基体21と絶縁板22との間に静電容量形成用の密閉空間を形成させていた。   Further, in order to use the first electrode 27 and the second electrode 29 for forming a capacitance, it is necessary to form a certain region between the first electrode 27 and the second electrode 29. 21 or the outer peripheral portion of the insulating plate 22 is formed with a frame-shaped projection 22b and a recess 22a is formed, thereby forming a sealed space for forming a capacitance between the insulating base 21 and the insulating plate 22. It was.

また、絶縁基体21と絶縁板22とは、その外周部または枠状の突起部22bに第一接合用メタライズ層28、第二接合用メタライズ層30を形成し、この第一接合用メタライズ層28と第二接合用メタライズ層30とをろう材等により接合していた。
特開2001−356064号公報
In addition, the insulating base 21 and the insulating plate 22 are formed with a first bonding metallized layer 28 and a second bonding metallized layer 30 on the outer peripheral portion or the frame-shaped protrusion 22b. And the second bonding metallization layer 30 were bonded by a brazing material or the like.
Japanese Patent Laid-Open No. 2001-356064

しかしながら、上記従来の圧力検出装置用パッケージにおいては、第一電極27および第二電極29は、スクリーン印刷法で形成されていることから、その表面の平坦度を高いものとし、第一電極27と第二電極29との間の距離を均一にしたものとするのが難しく、第一電極27と第二電極29の間に発生する静電容量がばらつき、感度が低下しやすくなるという問題点を有していた。   However, in the conventional package for a pressure detection device, since the first electrode 27 and the second electrode 29 are formed by a screen printing method, the surface has a high flatness, It is difficult to make the distance between the second electrode 29 uniform, the capacitance generated between the first electrode 27 and the second electrode 29 varies, and the sensitivity tends to decrease. Had.

また、絶縁基体21は、内部に多数の配線導体25が形成されているので、焼成する際に、セラミックグリーンシートと導体ペーストの収縮率の違い等により、絶縁基体21の一方の主面に凹凸や反り等が発生しやすく、このために、絶縁板22を絶縁基体21に接合する際に、絶縁基体21と絶縁板22とが傾いて接合され、外部の圧力が変動して絶縁板22が撓んだ際に、静電容量の変化にばらつきが発生し、外部の圧力を精度良く検出するのが困難になるという問題点を有していた。   In addition, since the insulating base 21 has a large number of wiring conductors 25 formed therein, when fired, the main surface of the insulating base 21 is uneven due to a difference in shrinkage between the ceramic green sheet and the conductive paste. Therefore, when the insulating plate 22 is joined to the insulating base 21, the insulating base 21 and the insulating plate 22 are inclined and joined, and the external pressure fluctuates to cause the insulating plate 22 to change. When it bends, the variation in capacitance occurs, which makes it difficult to accurately detect the external pressure.

そこで、絶縁基体21の他方の主面を研磨加工等を行い、平坦性を高めることが求められるが、絶縁基体21は、凹部21aや凸部等を有しているために加工に手間がかかるとともに、絶縁基体21の他方の主面に凹凸が発生しているため、絶縁基体21の一つ一つの研磨等に時間や感度にばらつきがでやすいという問題点を有していた。   Therefore, it is required to improve the flatness by polishing the other main surface of the insulating base 21. However, since the insulating base 21 has the concave portions 21a, the convex portions, etc., it takes time to process. At the same time, since the other main surface of the insulating base 21 is uneven, there is a problem that the time and sensitivity of the insulating base 21 are likely to vary in each polishing process.

従って、本発明はかかる従来の問題点に鑑み案出されたものであり、その目的は、小型で外部の圧力を検出する感度がよく、簡便に製作できる圧力検出装置用パッケージを提供することにある。   Accordingly, the present invention has been devised in view of such conventional problems, and an object of the present invention is to provide a package for a pressure detection device that is small in size, has high sensitivity for detecting external pressure, and can be easily manufactured. is there.

本発明の圧力検出装置用パッケージは、一方の主面に半導体素子が搭載される搭載部を有する絶縁基体と、該絶縁基体の表面および内部に配設され、前記半導体素子の各電極が電気的に接続される複数の配線導体と、前記絶縁基体の他方の主面に接合された第一絶縁板と、該第一絶縁板との間に密閉空間を形成するように、前記第一絶縁板の外周部に可撓な状態で接合された第二絶縁板と、前記密閉空間内の前記第一絶縁板の主面に被着され、前記配線導体の一つに電気的に接続された静電容量形成用の第一電極と、前記密閉空間内の前記第二絶縁板の主面に被着され、前記配線導体の他の一つに電気的に接続された静電容量形成用の第二電極とを具備していることを特徴とする。   The package for a pressure detection device according to the present invention includes an insulating base having a mounting portion on which a semiconductor element is mounted on one main surface, and a surface and an inside of the insulating base, and each electrode of the semiconductor element is electrically A plurality of wiring conductors connected to the first insulating plate, a first insulating plate joined to the other main surface of the insulating base, and the first insulating plate so as to form a sealed space between the first insulating plate and the first insulating plate. A second insulating plate joined in a flexible state to the outer periphery of the first insulating plate, and a static insulation member attached to the main surface of the first insulating plate in the sealed space and electrically connected to one of the wiring conductors. A first electrode for forming a capacitance and a first electrode for forming a capacitance that is attached to the main surface of the second insulating plate in the sealed space and is electrically connected to the other one of the wiring conductors. And two electrodes.

本発明の圧力検出装置用パッケージによれば、一方の主面に半導体素子が搭載される搭載部を有する絶縁基体と、この絶縁基体の表面および内部に配設され、半導体素子の各電極が電気的に接続される複数の配線導体と、絶縁基体の他方の主面に接合された第一絶縁板と、この第一絶縁板との間に密閉空間を形成するように、第一絶縁板の外周部に可撓な状態で接合された第二絶縁板と、密閉空間内の第一絶縁板の主面に被着され、配線導体の一つに電気的に接続された静電容量形成用の第一電極と、密閉空間内の第二絶縁板の主面に被着され、配線導体の他の一つに電気的に接続された静電容量形成用の第二電極とを具備していることから、第一絶縁板と第二絶縁板とは平板からなるので、表面の凹凸を小さく形成しやすいとともに、第一絶縁板と第二絶縁板の表面を研磨等の加工をしやすくなるので、第一絶縁板と第二絶縁板の表面をより簡便に平坦なものとしやすく、その結果、第一電極と第二電極とを第一絶縁板と第二絶縁板の上面にそれぞれ平坦に形成しやすいとともに、第一絶縁板と第二絶縁板とを平行に接合しやすくなり、第一電極と第二電極とを平行な状態として形成しやすくなるので、外部の圧力が変動した際に、第一電極と第二電極の中心に対して均一に変移させることとなり、第一電極と第二電極とに検出される静電容量のばらつきを小さくすることができ、外部の圧力を精度良く検出することができるものとなる。   According to the package for a pressure detection device of the present invention, an insulating base having a mounting portion on which a semiconductor element is mounted on one main surface, and the surface of and inside the insulating base, each electrode of the semiconductor element is electrically connected. A plurality of wiring conductors connected to each other, a first insulating plate joined to the other main surface of the insulating base, and a first insulating plate so as to form a sealed space between the first insulating plate and the first insulating plate. For forming a capacitance that is attached to the main surface of the second insulating plate that is flexibly joined to the outer periphery and the first insulating plate in the sealed space and is electrically connected to one of the wiring conductors. And a second electrode for forming a capacitance that is attached to the main surface of the second insulating plate in the sealed space and is electrically connected to the other one of the wiring conductors. Therefore, since the first insulating plate and the second insulating plate are made of flat plates, the surface unevenness can be easily reduced and the first Since the surface of the edge plate and the second insulating plate can be easily processed such as polishing, the surfaces of the first insulating plate and the second insulating plate can be easily and flattened. The electrodes are easily formed flat on the upper surfaces of the first insulating plate and the second insulating plate, respectively, and the first insulating plate and the second insulating plate are easily joined in parallel. Since it becomes easy to form in a parallel state, when the external pressure fluctuates, it will be uniformly shifted with respect to the center of the first electrode and the second electrode, and is detected by the first electrode and the second electrode. Variations in capacitance can be reduced, and external pressure can be detected with high accuracy.

また、第一絶縁板の表面および第二絶縁板の表面をともに平滑性に優れたものとすることができるため、非常に薄い金属薄膜や半田等を介することによって、これらの厚みに対応した非常に間隔の狭い密閉空間を第一絶縁板と第二絶縁板との間に精度良く形成することが可能となり、従来のように第一および第二電極を対向させて静電容量形成用の密閉空間を形成する際、厚みの比較的大きな枠状の突起部を形成する必要はなく、かつ所定の静電容量を得るための第一電極および第二電極を小さくすることができ、第一絶縁板および第二絶縁板を小さくして圧力検出装置用パッケージを小型なものとすることができるとともに、第二絶縁板や第二電極の質量を小さくすることができるため、遠心加速による第二絶縁板の撓み等の影響を小さいものとすることができ、外部の圧力を精度良く検出することができるものとなる。   In addition, since both the surface of the first insulating plate and the surface of the second insulating plate can be made excellent in smoothness, an extremely thin metal thin film, solder, etc. can be used to cope with these thicknesses. It is possible to form a sealed space with a small gap between the first insulating plate and the second insulating plate with high accuracy, and the first and second electrodes are opposed to each other as in the conventional case for sealing the capacitance. When forming the space, it is not necessary to form a relatively large frame-shaped projection, and the first and second electrodes for obtaining a predetermined capacitance can be made smaller, and the first insulation Since the plate for the pressure detection device can be made small by reducing the plate and the second insulating plate, and the mass of the second insulating plate and the second electrode can be reduced, the second insulation by centrifugal acceleration Minimizes the influence of bending of the plate The and it is possible to, it becomes the external pressure can be accurately detected.

また、絶縁基体の一方の主面に凹凸や反りが発生していても、絶縁基体の一方の主面に接合された第一絶縁板と第二絶縁板との間に形成される静電容量に影響しないので、外部の圧力を精度良く検出することができる。   In addition, even if unevenness or warpage occurs on one main surface of the insulating substrate, the capacitance formed between the first insulating plate and the second insulating plate bonded to one main surface of the insulating substrate Therefore, it is possible to accurately detect the external pressure.

次に、本発明の圧力検出装置用パッケージを添付の図面に基づいて詳細に説明する。図1は、本発明の圧力検出装置用パッケージの実施の形態の一例を示す断面図であり、図1において、1は絶縁基体、2は第一絶縁板、3は第二絶縁板、4は半導体素子、8は第一電極、9は第二電極である。   Next, the pressure detection device package of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing an example of an embodiment of a pressure detecting device package according to the present invention. In FIG. 1, 1 is an insulating substrate, 2 is a first insulating plate, 3 is a second insulating plate, A semiconductor element, 8 is a first electrode, and 9 is a second electrode.

絶縁基体1は、酸化アルミニウム質焼結体や窒化アルミニウム質焼結体,ムライト質焼結体,炭化珪素質焼結体,窒化珪素質焼結体,ガラス−セラミックス等の電気絶縁材料から成る積層体であり、例えば酸化アルミニウム質焼結体から成る場合であれば、酸化アルミニウム,酸化珪素,酸化マグネシウム,酸化カルシウム等のセラミック原料粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して泥漿状となすとともに、これを従来周知のドクターブレード法を採用してシート状に成形することにより複数枚のセラミックグリーンシートを得、しかる後、これらのセラミックグリーンシートに適当な打ち抜き加工,積層加工,切断加工を施すことにより絶縁基体1用の生セラミック成形体を得るとともにこの生セラミック成形体を約1600℃の温度で焼成することにより製作される。   The insulating substrate 1 is a laminate made of an electrically insulating material such as an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, a silicon carbide sintered body, a silicon nitride sintered body, or a glass-ceramic. For example, in the case of an aluminum oxide sintered body, an appropriate organic binder, solvent, plasticizer, and dispersant are added to and mixed with ceramic raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. As a result, a plurality of ceramic green sheets are obtained by forming this into a sheet shape by adopting a conventionally well-known doctor blade method, and then appropriately punching these ceramic green sheets. A green ceramic molded body for the insulating substrate 1 is obtained by laminating and cutting, and the green ceramic molded body is obtained. It is manufactured by firing at a temperature of about 1600 ° C..

絶縁基体1は、その一方の主面(図1では下面)に半導体素子4を収容するための凹部1aが形成されており、これにより半導体素子4を収容する容器として機能する。そして、この凹部1aの底面中央部が半導体素子4が搭載される搭載部1bとなっており、この搭載部1bに半導体素子4を搭載するとともに凹部1a内に例えばエポキシ樹脂等の樹脂製封止材5を充填し、半導体素子4を覆うことにより半導体素子4が封止される。   The insulating base 1 has a concave portion 1a for accommodating the semiconductor element 4 formed on one main surface (lower surface in FIG. 1), thereby functioning as a container for accommodating the semiconductor element 4. The central portion of the bottom surface of the recess 1a is a mounting portion 1b on which the semiconductor element 4 is mounted. The semiconductor element 4 is mounted on the mounting portion 1b and the resin sealing such as an epoxy resin is provided in the recess 1a. The semiconductor element 4 is sealed by filling the material 5 and covering the semiconductor element 4.

なお、この例では半導体素子4は樹脂製封止材5によって半導体素子4を覆うことにより封止されるが、半導体素子4は絶縁基体1の一方の主面に金属やセラミックスから成る蓋体を凹部1aを塞ぐように接合させることにより封止されてもよい。   In this example, the semiconductor element 4 is sealed by covering the semiconductor element 4 with a resin sealing material 5. The semiconductor element 4 has a lid made of metal or ceramics on one main surface of the insulating base 1. You may seal by making it join so that the recessed part 1a may be plugged up.

また、搭載部1bには半導体素子4の各電極と接続される複数の配線導体6が導出されており、この配線導体6と半導体素子4の各電極を半田バンプ等の導電性材料から成る導電性接合材7を介して接合することにより半導体素子4の各電極と各配線導体6とが電気的に接続されるとともに半導体素子4が搭載部1bに固定される。なお、この例では、半導体素子4の電極と配線導体6とは半田バンプを介して接続されるとしたが、半導体素子4の電極と配線導体6とはボンディングワイヤ等の他の電気的接続手段により接続されてもよい。   A plurality of wiring conductors 6 connected to the respective electrodes of the semiconductor element 4 are led out to the mounting portion 1b. The wiring conductor 6 and the respective electrodes of the semiconductor element 4 are electrically conductive made of a conductive material such as a solder bump. The electrodes of the semiconductor element 4 and the wiring conductors 6 are electrically connected to each other through the bonding material 7 and the semiconductor element 4 is fixed to the mounting portion 1b. In this example, the electrode of the semiconductor element 4 and the wiring conductor 6 are connected via solder bumps, but the electrode of the semiconductor element 4 and the wiring conductor 6 are connected to other electrical connection means such as bonding wires. May be connected.

配線導体6は、半導体素子4の各電極を外部電気回路および第一電極8,第二電極9に電気的に接続するための導電路として機能し、その一部は絶縁基体1の一方の主面外周部に導出され、別の一部は第一電極8,第二電極9に電気的に接続されている。そして、半導体素子4の各電極をこれらの配線導体6に半田バンプ等の導電性接合材7を介して電気的に接続するとともに半導体素子4を樹脂製封止材5で封止した後、配線導体6の絶縁基体1の一方の主面外周部に導出した部位を外部電気回路基板の配線導体(図示せず)に半田等の導電性接合材7を介して接合することにより、内部に収容する半導体素子4が外部電気回路に電気的に接続されることとなる。   The wiring conductor 6 functions as a conductive path for electrically connecting each electrode of the semiconductor element 4 to the external electric circuit and the first electrode 8 and the second electrode 9, and a part of the wiring conductor 6 is one main part of the insulating substrate 1. It is led out to the outer periphery of the surface, and another part is electrically connected to the first electrode 8 and the second electrode 9. Each electrode of the semiconductor element 4 is electrically connected to these wiring conductors 6 through a conductive bonding material 7 such as a solder bump, and the semiconductor element 4 is sealed with a resin sealing material 5. The portion led out to the outer peripheral portion of one main surface of the insulating base 1 of the conductor 6 is accommodated in the interior by joining a conductive conductor 7 such as solder to a wiring conductor (not shown) of the external electric circuit board. The semiconductor element 4 to be connected is electrically connected to the external electric circuit.

このような配線導体6は、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤等を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁基体1用のセラミックグリーンシートに所定のパターンに印刷塗布し、これを絶縁基体1用の生セラミック成形体とともに焼成することによって絶縁基体1の内部および表面に所定のパターンに形成される。なお、配線導体6の露出表面には、配線導体6が酸化腐食するのを防止するとともに配線導体6と半田等の導電性接合材7との接合を良好なものとするために、厚みが1〜10μm程度のニッケルメッキ層と厚みが0.1〜3μm程度の金メッキ層とが順次被着されていることが好ましい。   Such a wiring conductor 6 is made of metal powder metallization such as tungsten, molybdenum, copper, and silver, and is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, dispersant, etc. to metal powder such as tungsten. The paste is applied in a predetermined pattern to a ceramic green sheet for the insulating substrate 1 by using a conventionally known screen printing method, and this is fired together with a green ceramic molded body for the insulating substrate 1 to synthesize the inside of the insulating substrate 1. In addition, a predetermined pattern is formed on the surface. The exposed surface of the wiring conductor 6 has a thickness of 1 in order to prevent the wiring conductor 6 from being oxidatively corroded and to improve the bonding between the wiring conductor 6 and the conductive bonding material 7 such as solder. It is preferable that a nickel plating layer having a thickness of about ˜10 μm and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially deposited.

また、絶縁基体1の他方の主面(図1では上面)の中央部には、配線導体6の一つである配線導体6aに電気的に接続されるとともに、後述する第一絶縁板2との接合部および第一電極8への導電路と成る第一接合層10aが形成されており、第一接合層10aの周囲には、配線導体6の他の一つである配線導体6bに電気的に接続されるとともに、後述する第一絶縁板2との接合部および第二電極9への導電路と成る第二接合層10bが形成されている。   A central portion of the other main surface (upper surface in FIG. 1) of the insulating base 1 is electrically connected to a wiring conductor 6a which is one of the wiring conductors 6, and a first insulating plate 2 which will be described later. The first bonding layer 10a serving as a conductive path to the first electrode 8 and the bonding portion of the wiring conductor 6 is formed around the first bonding layer 10a. In addition, a second bonding layer 10b is formed which is connected to the first insulating plate 2 described later and serves as a conductive path to the second electrode 9.

このような第一接合層10aおよび第二接合層10bは、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤等を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して絶縁基体1用のセラミックグリーンシートに所定のパターンに印刷塗布し、これを絶縁基体1用の生セラミック成形体とともに焼成することによって絶縁基体1の他方の主面に所定のパターンに形成される。なお、第一接合層10aおよび第二接合層10bの露出表面には、第一接合層10aおよび第二接合層10bが酸化腐食するのを防止するとともに第一接合層10aおよび第二接合層10bと半田等の導電性接合材7との接合を良好なものとするために、厚みが1〜10μm程度のニッケルメッキ層が被着されていることが好ましい。   The first bonding layer 10a and the second bonding layer 10b are made of metal powder metallization such as tungsten, molybdenum, copper, silver, and the like, and organic binders, solvents, plasticizers, dispersants, and the like suitable for metal powders such as tungsten. The metallized paste obtained by adding and mixing is printed on a ceramic green sheet for the insulating substrate 1 in a predetermined pattern using a conventionally known screen printing method, and this is fired together with the green ceramic molded body for the insulating substrate 1. By doing so, a predetermined pattern is formed on the other main surface of the insulating substrate 1. The exposed surfaces of the first bonding layer 10a and the second bonding layer 10b prevent the first bonding layer 10a and the second bonding layer 10b from being oxidized and corroded, and the first bonding layer 10a and the second bonding layer 10b. It is preferable that a nickel plating layer having a thickness of about 1 to 10 μm is applied in order to achieve good bonding between the solder and the conductive bonding material 7 such as solder.

また、絶縁基体1の他方の主面(図1では上面)には、第一絶縁板2が接合されている。第一絶縁板2は、酸化アルミニウム質焼結体や窒化アルミニウム質焼結体,ムライト質焼結体,ガラス−セラミックス等のセラミックス材料から成る平板状である。このような第一絶縁板2は、例えば、酸化アルミニウム質焼結体から成る場合であれば、酸化アルミニウム,酸化珪素,酸化マグネシウム,酸化カルシウム等のセラミック原料粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して泥漿状となすとともに、これを従来周知のドクターブレード法を採用してシート状に成形することにより複数枚のセラミックグリーンシートを得、しかる後、これらのセラミックグリーンシートに適当な打ち抜き加工,積層加工,切断加工を施すことにより第一絶縁板2用の生セラミック成形体を得るとともにこの生セラミック成形体を約1600℃の温度で焼成することにより製作される。   The first insulating plate 2 is bonded to the other main surface (the upper surface in FIG. 1) of the insulating base 1. The first insulating plate 2 has a flat plate shape made of a ceramic material such as an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, or glass-ceramics. For example, when the first insulating plate 2 is made of an aluminum oxide sintered body, an organic binder, a solvent, a plastic suitable for ceramic raw material powders such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide are used. Add and mix the agent and dispersant to make a slurry, and then form this into a sheet using the well-known doctor blade method to obtain a plurality of ceramic green sheets. The green ceramic molded body for the first insulating plate 2 is obtained by subjecting the sheet to appropriate punching, laminating, and cutting, and the green ceramic molded body is manufactured by firing at a temperature of about 1600 ° C.

また、第一絶縁板2の上面の中央部には、静電容量形成用の第一電極8が被着されている。この第一電極8は、後述する第二電極9とともに感圧素子用の静電容量を形成するためのものであり、例えば円形状のパターンに形成されている。   A first electrode 8 for forming a capacitance is attached to the center of the upper surface of the first insulating plate 2. The first electrode 8 is for forming a capacitance for a pressure sensitive element together with a second electrode 9 described later, and is formed in, for example, a circular pattern.

このような第一電極8は、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して第一絶縁板2用のセラミックグリーンシートに印刷塗布し、これを焼成することによって第一絶縁板2の上面に所定のパターンに形成される。第一電極8の表面には、第一電極8が酸化腐食するのを防止する厚みが1〜10μm程度のニッケルメッキ層と厚みが0.1〜3μm程度の金メッキ層とが順次被着されていることが好ましい。   The first electrode 8 is made of metal powder metallization such as tungsten, molybdenum, copper, or silver, and is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, and dispersant to metal powder such as tungsten. The paste is printed and applied to a ceramic green sheet for the first insulating plate 2 by employing a conventionally known screen printing method, and is fired to form a predetermined pattern on the upper surface of the first insulating plate 2. A nickel plating layer having a thickness of about 1 to 10 μm and a gold plating layer having a thickness of about 0.1 to 3 μm are sequentially deposited on the surface of the first electrode 8 to prevent the first electrode 8 from being oxidized and corroded. Preferably it is.

なお、第一絶縁板2の上面または第一電極8の表面は、平坦な状態であるのが好ましいので、第一電極8の表面は、研磨加工等により平坦化しても良く、例えば、タングステン等から成る第一電極8の表面を平坦化した後、ニッケルメッキ層や金メッキ層等のメッキ層を被着しているのが好ましい。   Since the upper surface of the first insulating plate 2 or the surface of the first electrode 8 is preferably flat, the surface of the first electrode 8 may be flattened by polishing or the like, for example, tungsten or the like. After the surface of the first electrode 8 made of is flattened, a plating layer such as a nickel plating layer or a gold plating layer is preferably applied.

また、第一電極8の周囲には、第一絶縁板2の上面に第二絶縁板3を接合するための接合部となるとともに、後述する第二電極9への導電路となる第一金属層11が形成されている。   Further, around the first electrode 8, a first metal that serves as a joint for joining the second insulating plate 3 to the upper surface of the first insulating plate 2 and serves as a conductive path to the second electrode 9 described later. Layer 11 is formed.

このような第一金属層11は、第一電極8と同様に形成されており、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して第一絶縁板2用のセラミックグリーンシートに印刷塗布し、これを焼成することによって第一絶縁板2の上面に枠状の所定のパターンに形成される。また、第一金属層11の表面には、第一金属層11が酸化腐食するのを防止するとともに、第二絶縁板3との接合を強固にするために厚みが1〜10μm程度のニッケルメッキ層と厚みが0.1〜3μm程度の金メッキ層とが順次被着されていることが好ましい。   Such a first metal layer 11 is formed in the same manner as the first electrode 8 and is made of metal powder metallization such as tungsten, molybdenum, copper, silver, etc., and an appropriate organic binder, solvent, A metallized paste obtained by adding and mixing a plasticizer and a dispersant is applied to a ceramic green sheet for the first insulating plate 2 by using a conventionally known screen printing method, and then fired. 2 is formed in a predetermined frame-like pattern on the upper surface. Further, the surface of the first metal layer 11 is nickel-plated with a thickness of about 1 to 10 μm to prevent the first metal layer 11 from being oxidatively corroded and to strengthen the bonding with the second insulating plate 3. It is preferable that the layer and the gold plating layer having a thickness of about 0.1 to 3 μm are sequentially deposited.

また、第一金属層11の表面は、第二絶縁板3を平行な状態で接合するために、第一電極8と同様に平坦な状態であるのが好ましいので、第一金属層11の表面は、研磨加工等により平坦化していても良く、例えば、タングステン等から成る第一金属層11の表面を平坦化した後、ニッケルメッキ層や金メッキ層等のメッキ層を被着しているのが好ましい。   In addition, since the surface of the first metal layer 11 is preferably in a flat state like the first electrode 8 in order to join the second insulating plate 3 in a parallel state, the surface of the first metal layer 11 May be flattened by polishing or the like. For example, after the surface of the first metal layer 11 made of tungsten or the like is flattened, a plating layer such as a nickel plating layer or a gold plating layer is applied. preferable.

そして、第一絶縁板2の下面には、それぞれ、第一電極8および第一金属層11にそれぞれ電気的に接続された第三接合層10cおよび第四接続層10dが被着形成されており、第一接続層10aと第三接合層10cとを半田等の接合材12を介して接合することで、第一電極8には配線導体6aが接続されることとなり、この配線導体6aに半導体素子4の電極を半田バンプ等の導電性接合材7を介して接続すると半導体素子4の電極と第一電極8とが電気的に接続されるようになっている。   A third bonding layer 10c and a fourth connection layer 10d that are electrically connected to the first electrode 8 and the first metal layer 11, respectively, are deposited on the lower surface of the first insulating plate 2. By connecting the first connection layer 10a and the third bonding layer 10c via the bonding material 12 such as solder, the wiring conductor 6a is connected to the first electrode 8, and the wiring conductor 6a is connected to the semiconductor. When the electrode of the element 4 is connected via a conductive bonding material 7 such as a solder bump, the electrode of the semiconductor element 4 and the first electrode 8 are electrically connected.

また、第二接続層10bと第四接続層10dとを半田等の接合材12を介して接合することで、第一金属層11には配線導体6bが接続されることとなり、この配線導体6bに半導体素子4の電極を半田バンプ等の導電性接合材7を介して接続すると半導体素子4の電極と第一金属層11とが電気的に接続されるようになっている。   Further, by joining the second connection layer 10b and the fourth connection layer 10d via the bonding material 12 such as solder, the wiring conductor 6b is connected to the first metal layer 11, and this wiring conductor 6b. When the electrode of the semiconductor element 4 is connected via the conductive bonding material 7 such as a solder bump, the electrode of the semiconductor element 4 and the first metal layer 11 are electrically connected.

また、絶縁基体1と第一絶縁板2との接合を精度良く接合するために、第三接合層10cおよび第四接続層10dは、第一接続層10aおよび第二接続層10bよりも幅を小さく形成することが好ましい。   Further, in order to join the insulating base 1 and the first insulating plate 2 with high accuracy, the third bonding layer 10c and the fourth connection layer 10d are wider than the first connection layer 10a and the second connection layer 10b. It is preferable to form it small.

また、第一絶縁板2は、平板状のものであるので、平坦な状態のものとして、形成しやすいとともに、第一絶縁板2に反り等が発生しても、研磨加工等の加工が行ないやすく、第一絶縁板2の表面や第一電極8の表面を簡便に平坦な状態にすることができる。   Further, since the first insulating plate 2 is a flat plate, it can be easily formed as a flat one, and even if warping or the like occurs in the first insulating plate 2, processing such as polishing is performed. The surface of the first insulating plate 2 and the surface of the first electrode 8 can be easily made flat.

また、第一絶縁板2は、絶縁基体1との接合時に導電性接合材等12の影響により、第一絶縁板2に反り等の変形が発生しない程度の厚みを有しているのが好ましい。これにより、第一電極8と第一金属層11とを平坦な状態とすることができ、後述する第二絶縁板3を平坦な状態として接合しやすくすることができる。   Further, it is preferable that the first insulating plate 2 has such a thickness that the first insulating plate 2 is not warped or deformed by the influence of the conductive bonding material 12 or the like when bonded to the insulating substrate 1. . Thereby, the 1st electrode 8 and the 1st metal layer 11 can be made into a flat state, and it can make it easy to join the 2nd insulating board 3 mentioned later to a flat state.

そして、第一絶縁板2の上面には、第一絶縁板2との間に密閉空間を形成するように第二絶縁板3が接合されている。この第二絶縁板3は、セラミックスや樹脂から成り、セラミックスから成る場合は、酸化アルミニウム質焼結体や窒化アルミニウム質焼結体,ムライト質焼結体,窒化珪素質焼結体,炭化珪素質焼結体,ガラスセラミックス等の電気絶縁材料から成る厚みが0.01〜5mmの平板状のものであり、外部の圧力に応じて第一絶縁板2側に撓むいわゆる圧力検出用のダイアフラムとして機能する。   The second insulating plate 3 is joined to the upper surface of the first insulating plate 2 so as to form a sealed space with the first insulating plate 2. The second insulating plate 3 is made of ceramics or resin, and in the case of ceramics, the aluminum oxide sintered body, aluminum nitride sintered body, mullite sintered body, silicon nitride sintered body, silicon carbide As a so-called pressure detecting diaphragm which is a flat plate having a thickness of 0.01 to 5 mm made of an electrically insulating material such as a sintered body or glass ceramic, and bends toward the first insulating plate 2 in response to an external pressure. Function.

なお、第二絶縁板3は、その厚みが0.01mm未満では、その機械的強度が小さいものとなるため、これに例えば80kPa程度の大きな外部圧力が加わった場合に破壊されやすくなる。また、5mmを超えると、例えば2000kPa程度の圧力では撓みにくくなり、圧力検出用のダイアフラムとしては検出精度の低いものとなりやすい。したがって、第二絶縁板3の厚みは0.01〜5mmの範囲が好ましい。   In addition, since the mechanical strength of the second insulating plate 3 is small when the thickness is less than 0.01 mm, the second insulating plate 3 is easily broken when a large external pressure of, for example, about 80 kPa is applied thereto. On the other hand, if it exceeds 5 mm, it becomes difficult to bend at a pressure of, for example, about 2000 kPa, and the pressure detection diaphragm tends to have low detection accuracy. Therefore, the thickness of the second insulating plate 3 is preferably in the range of 0.01 to 5 mm.

このような第二絶縁板3は、例えば酸化アルミニウム質焼結体から成る場合であれば、酸化アルミニウム,酸化珪素,酸化マグネシウム,酸化カルシウム等のセラミック原料粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して泥漿状となすとともに、これを従来周知のドクターブレード法を採用してシート状に成形することによりセラミックグリーンシートを得、しかる後、このセラミックグリーンシートに適当な打ち抜き加工や切断加工を施すことにより第二絶縁板3用の生セラミック成形体を得るとともにこの生セラミック成形体を約1600℃の温度で焼成することにより製作される。   If such a second insulating plate 3 is made of, for example, an aluminum oxide sintered body, an organic binder, solvent, plasticizer suitable for ceramic raw material powders such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. , Dispersant is added and mixed to make a slurry, and this is formed into a sheet by using a conventionally known doctor blade method to obtain a ceramic green sheet. After that, the ceramic green sheet is appropriately punched. The green ceramic molded body for the second insulating plate 3 is obtained by processing and cutting, and the green ceramic molded body is manufactured by firing at a temperature of about 1600 ° C.

また、第二絶縁板3の密閉空間の内側となる主面(図1では下面)中央部には、静電容量形成用の円形状の第二電極9が被着されている。この第二電極9は、前述の第一電極8とともに感圧素子用の静電容量を形成するための電極として機能する。   In addition, a circular second electrode 9 for forming a capacitance is attached to the central portion of the main surface (the lower surface in FIG. 1) that is the inside of the sealed space of the second insulating plate 3. The second electrode 9 functions as an electrode for forming a capacitance for the pressure sensitive element together with the first electrode 8 described above.

このような第二電極9は、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して第二絶縁板3用のセラミックグリーンシートに印刷塗布し、これを第二絶縁板3用の生セラミック成形体とともに焼成することによって第二絶縁板3の下面の中央部に所定のパターンに形成される。なお、第二絶縁板3の下面または第二電極9の表面は、平坦な状態であるのが好ましいので、第二電極9の表面は、研磨加工等で平坦化しているのが好ましい。いても良く、例えば、タングステン等から成る第二電極9の表面を平坦化した後、ニッケルメッキ層や金メッキ層等のメッキ層を被着しているのが好ましい
また、第二絶縁板3の下面の第二電極9の外周部には、第一絶縁板2と第二絶縁板3との間に密閉空間を形成するとともに、第二電極9と電気的に接続されている第二金属層13が被着形成されている。第二金属層13は、前述の第一金属層11と接合することにより、配線導体6bが接続されることとなり、配線導体6bに半導体素子4の電極を半田バンプ等の導電性接合材7を介して接続すると半導体素子4の電極と第二電極9とが電気的に接続されるようになる。
The second electrode 9 is made of metal powder metallization such as tungsten, molybdenum, copper, and silver, and is obtained by adding and mixing an appropriate organic binder, solvent, plasticizer, and dispersant to metal powder such as tungsten. The paste is applied to a ceramic green sheet for the second insulating plate 3 by using a conventionally known screen printing method, and is fired together with a green ceramic molded body for the second insulating plate 3 to thereby produce the second insulating plate 3. It is formed in a predetermined pattern at the center of the lower surface. Since the lower surface of the second insulating plate 3 or the surface of the second electrode 9 is preferably flat, the surface of the second electrode 9 is preferably flattened by polishing or the like. For example, it is preferable to apply a plating layer such as a nickel plating layer or a gold plating layer after the surface of the second electrode 9 made of tungsten or the like is flattened. On the outer periphery of the second electrode 9, a second metal layer 13 is formed which forms a sealed space between the first insulating plate 2 and the second insulating plate 3 and is electrically connected to the second electrode 9. Is deposited. When the second metal layer 13 is joined to the first metal layer 11 described above, the wiring conductor 6b is connected, and the electrode of the semiconductor element 4 is connected to the wiring conductor 6b with a conductive bonding material 7 such as a solder bump. When the connection is made, the electrode of the semiconductor element 4 and the second electrode 9 are electrically connected.

このような第二金属層13は、第二電極9と同様に形成されており、タングステンやモリブデン,銅,銀等の金属粉末メタライズから成り、タングステン等の金属粉末に適当な有機バインダ,溶剤,可塑剤,分散剤を添加混合して得たメタライズペーストを従来周知のスクリーン印刷法を採用して第二絶縁板3用のセラミックグリーンシートに印刷塗布し、これを焼成することによって第二絶縁板3の上面に枠状の所定のパターンに形成される。また、第二金属層13の表面には、第二金属層13が酸化腐食するのを防止するとともに、第一絶縁板2との接合を強固にするために厚みが1〜10μm程度のニッケルメッキ層と厚みが0.1〜3μm程度の金メッキ層とが順次被着されていることが好ましい。   Such a second metal layer 13 is formed in the same manner as the second electrode 9 and is made of metal powder metallization such as tungsten, molybdenum, copper, silver, etc., and an appropriate organic binder, solvent, A metallized paste obtained by adding and mixing a plasticizer and a dispersing agent is printed and applied to a ceramic green sheet for the second insulating plate 3 using a conventionally known screen printing method, and then fired. 3 is formed into a predetermined frame-like pattern on the upper surface. The surface of the second metal layer 13 is nickel-plated with a thickness of about 1 to 10 μm to prevent the second metal layer 13 from being oxidatively corroded and to strengthen the bonding with the first insulating plate 2. It is preferable that the layer and the gold plating layer having a thickness of about 0.1 to 3 μm are sequentially deposited.

また、第二金属層13の表面は、第一絶縁板2上に平行な状態で接合するために、第二電極9と同様に平坦な状態であるのが好ましいので、第二金属層13の表面は、研磨加工等により平坦化していても良く、例えば、タングステン等から成る第二金属層13の表面を平坦化した後、ニッケルメッキ層や金メッキ層等のメッキ層を被着しているのが好ましい。   In addition, since the surface of the second metal layer 13 is preferably flat in the same manner as the second electrode 9 in order to be joined in parallel with the first insulating plate 2, The surface may be flattened by polishing or the like. For example, after the surface of the second metal layer 13 made of tungsten or the like is flattened, a plating layer such as a nickel plating layer or a gold plating layer is applied. Is preferred.

好ましくは、第二電極9の面積は、第一電極8の面積よりも大きくなっているのがよい。これにより、第二絶縁基板3を第一絶縁基板2に接合する際のわずかなずれによって第二電極9と第一電極8との対向面積がばらつくのを有効に防止できる。   Preferably, the area of the second electrode 9 is larger than the area of the first electrode 8. Thereby, it can prevent effectively that the opposing area of the 2nd electrode 9 and the 1st electrode 8 varies by the slight shift | offset | difference at the time of joining the 2nd insulated substrate 3 to the 1st insulated substrate 2. FIG.

より好ましくは、第二電極9を第二絶縁板3の下面のほぼ全面に被着し、第二電極9の外周部を第一絶縁板2との接合部となる第二金属層13とするのがよい。これにより、第二電極9の電気的な接続信頼性が向上するとともに、第一電極8と第二電極9との容量安定性も向上する。また、絶縁板3の下面のほぼ全面に金属層があることにより、絶縁基板3が歪むのを有効に抑制することができる。即ち、絶縁基板3の下面に金属層のある部位とない部位とが存在する場合、金属層のある部位と無い部位とで熱膨張差が生じ、絶縁基板3が歪みやすくなるのに対し、絶縁基板3の下面全面に金属層があることで熱膨張の差が生じ難くなって歪みが発生し難くなる。その結果、第一電極8と第二電極9とをより平行に維持することが可能となる。   More preferably, the second electrode 9 is deposited on almost the entire lower surface of the second insulating plate 3, and the outer peripheral portion of the second electrode 9 is a second metal layer 13 that serves as a joint with the first insulating plate 2. It is good. Thereby, the electrical connection reliability of the second electrode 9 is improved, and the capacity stability between the first electrode 8 and the second electrode 9 is also improved. In addition, since the metal layer is provided on almost the entire lower surface of the insulating plate 3, the insulating substrate 3 can be effectively prevented from being distorted. That is, when there are a portion with and without a metal layer on the lower surface of the insulating substrate 3, a difference in thermal expansion occurs between the portion with and without the metal layer, and the insulating substrate 3 is easily distorted. The presence of the metal layer on the entire lower surface of the substrate 3 makes it difficult for the difference in thermal expansion to occur and distortion to occur. As a result, the first electrode 8 and the second electrode 9 can be kept more parallel.

また、第二絶縁板3も、第一絶縁板2と同様に平板状のものであるので、平坦な状態のものとして、形成しやすいとともに、反り等が発生しても、研磨加工等が行いやすく、第二絶縁板3の表面や第二電極9の表面を簡便に平坦な状態にすることができる。   Further, since the second insulating plate 3 is also a flat plate like the first insulating plate 2, it is easy to form as a flat one, and even if warpage or the like occurs, polishing processing or the like is performed. The surface of the second insulating plate 3 and the surface of the second electrode 9 can be easily made flat.

そして、第一電極8と第二電極9との間に空間を形成するように第一絶縁板2の第一金属層11と第二絶縁板3の第二金属層13とを接合することで、第一電極8や第二電極9の面積および第一電極8および第二電極9との間隔に応じて所定の静電容量が形成される。そして、第二絶縁板3の上面に外部の圧力が加わると、その圧力に応じて第二絶縁板3が第一絶縁板2側に撓んで第一電極8と第二電極9との間隔が変わり、それにより第一電極8と第二電極9との間の静電容量が変化するので、外部の圧力の変化を静電容量の変化として感知する感圧素子として機能する。そして、この静電容量の変化を凹部1a内に収容した半導体素子4に配線導体6a,6bを介して伝達し、これを半導体素子4で演算処理することによって外部の圧力の大きさを知ることができる。   Then, the first metal layer 11 of the first insulating plate 2 and the second metal layer 13 of the second insulating plate 3 are joined so as to form a space between the first electrode 8 and the second electrode 9. A predetermined capacitance is formed according to the area of the first electrode 8 and the second electrode 9 and the distance between the first electrode 8 and the second electrode 9. When an external pressure is applied to the upper surface of the second insulating plate 3, the second insulating plate 3 bends toward the first insulating plate 2 in accordance with the pressure, and the distance between the first electrode 8 and the second electrode 9 is increased. As a result, the capacitance between the first electrode 8 and the second electrode 9 changes, thereby functioning as a pressure-sensitive element that senses a change in external pressure as a change in capacitance. Then, the change in the electrostatic capacity is transmitted to the semiconductor element 4 accommodated in the recess 1a through the wiring conductors 6a and 6b, and this is processed by the semiconductor element 4 to know the magnitude of the external pressure. Can do.

従って、本発明の圧力検出装置用パッケージによれば、一方の主面に半導体素子4が搭載される搭載部1bを有する絶縁基体1と、絶縁基体1の表面および内部に配設され、半導体素子4の各電極が電気的に接続される複数の配線導体6と、絶縁基体1の他方の主面に接合された第一絶縁板2と、第一絶縁板2との間に密閉空間を形成するように、第一絶縁板2の外周部に可撓な状態で接合された第二絶縁板3と、密閉空間内の第一絶縁板2の主面に被着され、配線導体6の一つに電気的に接続された静電容量形成用の第一電極8と、密閉空間内の第二絶縁板3の主面に被着され、配線導体6の他の一つに電気的に接続された静電容量形成用の第二電極9とを具備していることから、第一絶縁板2と第二絶縁板3とは平板からなるので、表面の凹凸を小さく形成しやすいとともに、第一絶縁板2と第二絶縁板3の表面を研磨等の加工をしやすくなるので、第一絶縁板2と第二絶縁板3の表面をより簡便に平坦なものとしやすく、その結果、第一電極8と第二電極9とを第一絶縁板2と第二絶縁板3の上面にそれぞれ平坦に形成しやすいとともに、第一絶縁板2と第二絶縁板3とを平行に接合しやすくなり、第一電極8と第二電極9とを平行な状態として形成しやすくなるので、外部の圧力が変動した際に、第一電極8と第二電極9の中心に対して均一に変移させることとなり、第一電極8と第二電極9とに検出される静電容量のばらつきを小さくすることができ、外部の圧力を精度良く検出することができるものとなる。   Therefore, according to the package for the pressure detection device of the present invention, the insulating base 1 having the mounting portion 1b on which the semiconductor element 4 is mounted on one main surface, and the surface and inside of the insulating base 1 are disposed. 4 is formed between the plurality of wiring conductors 6 to which the respective electrodes 4 are electrically connected, the first insulating plate 2 joined to the other main surface of the insulating base 1, and the first insulating plate 2. The second insulating plate 3 is joined to the outer peripheral portion of the first insulating plate 2 in a flexible state, and is attached to the main surface of the first insulating plate 2 in the sealed space. The first electrode 8 for forming capacitance that is electrically connected to the first electrode and the main surface of the second insulating plate 3 in the sealed space and electrically connected to the other one of the wiring conductors 6 Since the first insulating plate 2 and the second insulating plate 3 are made of flat plates, the second electrode 9 for forming electrostatic capacitance is provided. The surface of the first insulating plate 2 and the second insulating plate 3 can be easily processed such as polishing, and the surfaces of the first insulating plate 2 and the second insulating plate 3 can be flattened more easily. As a result, the first electrode 8 and the second electrode 9 can be easily formed flat on the upper surfaces of the first insulating plate 2 and the second insulating plate 3, respectively. Since it becomes easy to join the plate 3 in parallel and to form the first electrode 8 and the second electrode 9 in a parallel state, when the external pressure fluctuates, the first electrode 8 and the second electrode 9 It is possible to make uniform displacement with respect to the center of the electrode, to reduce variation in capacitance detected by the first electrode 8 and the second electrode 9, and to accurately detect external pressure. It becomes.

また、第一絶縁板2の表面および第二絶縁板3の表面をともに平滑性に優れたものとすることができるため、非常に薄い金属薄膜や半田等を介することによって、これらの厚みに対応した非常に間隔の狭い密閉空間を第一絶縁板2と第二絶縁板3との間に精度良く形成することが可能となり、従来のように第一および第二電極27,29を対向させて静電容量形成用の密閉空間を形成する際、厚みの比較的大きな枠状の突起部22bを形成する必要はなく、かつ所定の静電容量を得るための第一電極8および第二電極9を小さくすることができ、第一絶縁板2および第二絶縁板3を小さくして圧力検出装置用パッケージを小型なものとすることができるとともに、第二絶縁板3や第二電極9の質量を小さくすることができるため、遠心加速による第二絶縁板2の撓み等の影響を小さいものとすることができ、外部の圧力を精度良く検出することができるものとなる。   Moreover, since both the surface of the 1st insulating board 2 and the surface of the 2nd insulating board 3 can be made excellent in smoothness, it respond | corresponds to these thickness through a very thin metal thin film, solder, etc. Thus, it is possible to form a sealed space with a very narrow interval between the first insulating plate 2 and the second insulating plate 3 with high accuracy, and the first and second electrodes 27 and 29 are made to face each other as in the past. When forming the sealed space for forming the capacitance, it is not necessary to form the frame-shaped protrusion 22b having a relatively large thickness, and the first electrode 8 and the second electrode 9 for obtaining a predetermined capacitance. The first insulating plate 2 and the second insulating plate 3 can be made smaller to make the package for the pressure detection device small, and the mass of the second insulating plate 3 and the second electrode 9 can be reduced. Can be made small, so centrifugal acceleration That the second can be made small deflection influence of the insulating plate 2, and that the external pressure can be accurately detected.

また、絶縁基体1の一方の主面に凹凸や反りが発生していても、絶縁基体1の一方の主面に接合された第一絶縁板2と第二絶縁板3との間に形成される静電容量に影響しないので、外部の圧力を精度良く検出することができるものとなる。   Further, even if the main surface of the insulating substrate 1 is uneven or warped, it is formed between the first insulating plate 2 and the second insulating plate 3 bonded to the one main surface of the insulating substrate 1. Therefore, the external pressure can be accurately detected.

また、第一金属層11および第二金属層13の少なくとも一方の表面に第三金属層14が形成されており、第一金属層11と第二金属層13とが第三金属層14を介して金−錫合金等の半田15によって接合されているのが好ましい。すなわち、第一金属層11と第二金属層13と第三金属層14と半田15との厚みが第一絶縁板2と第二絶縁板3との間隔となり、第一金属層11と第二金属層13と第三金属層14と半田15とは、従来の絶縁基体21または絶縁板22の外周部に形成される枠状の突起部22bよりも薄くかつ簡易に形成しやすく、静電容量を形成する第一電極8と第二電極9との間隔を小さいものとすることができ、感度の高いものとすることができる。   A third metal layer 14 is formed on at least one surface of the first metal layer 11 and the second metal layer 13, and the first metal layer 11 and the second metal layer 13 are interposed via the third metal layer 14. It is preferable to join them with solder 15 such as gold-tin alloy. That is, the thickness of the first metal layer 11, the second metal layer 13, the third metal layer 14, and the solder 15 becomes the distance between the first insulating plate 2 and the second insulating plate 3, The metal layer 13, the third metal layer 14, and the solder 15 are thinner and easier to form than the conventional frame-like protrusion 22 b formed on the outer peripheral portion of the insulating base 21 or the insulating plate 22, and have a capacitance. The distance between the first electrode 8 and the second electrode 9 forming the electrode can be made small, and the sensitivity can be made high.

また、第一金属層11と第二金属層13とが第三金属層14を介して半田15によって接合されているので、第一絶縁板2と第二絶縁板3とを気密性の高いものとして接合することができ、密閉空間内の圧力を一定に保持することができるので、外部の圧力を感度良く検出するものとすることができる。   Further, since the first metal layer 11 and the second metal layer 13 are joined by the solder 15 via the third metal layer 14, the first insulating plate 2 and the second insulating plate 3 are highly airtight. Since the pressure in the sealed space can be kept constant, the external pressure can be detected with high sensitivity.

また、第一電極8と第二電極9との間隔を小さくできることから、所要の静電容量を形成する第一電極8と第二電極9との対向する面積を小さくすることができるので、第一絶縁板2および第二絶縁板3を小さくすることができ、それに伴って、絶縁基体1も小さくでき、本発明の圧力検出装置用パッケージを小型化することができるとともに、第二絶縁板3および第二電極9の質量をさらに小さくできることなり、遠心力による影響を低減することができ、外部の圧力を精度良く形成することができる。   Moreover, since the space | interval of the 1st electrode 8 and the 2nd electrode 9 can be made small, since the area where the 1st electrode 8 and the 2nd electrode 9 which form required electrostatic capacitance can be made small, the 1st The one insulating plate 2 and the second insulating plate 3 can be made smaller, and accordingly, the insulating base 1 can also be made smaller, the pressure sensing device package of the present invention can be miniaturized, and the second insulating plate 3 Further, the mass of the second electrode 9 can be further reduced, the influence of centrifugal force can be reduced, and the external pressure can be formed with high accuracy.

また、半田15は、薄膜形成法等により薄く被着形成しておくと、第一電極8と第二電極9との間をより小さいものし、感度が高く小型なものとすることができる。   Further, if the solder 15 is thinly deposited by a thin film forming method or the like, the space between the first electrode 8 and the second electrode 9 can be made smaller, and the sensitivity can be made small.

第三金属層14は、例えば、0.3〜10μm程度の金等の金属を無電解メッキ法等により、第二金属層13の外周部に枠状に被着されることによって、第二電極9を囲繞するような枠部となるとともに、第一金属層11と第三金属層14とを半田15により接合させることによって、第一絶縁板2と第二絶縁板3との間に密閉空間を形成する。   The third metal layer 14 is formed by, for example, depositing a metal such as gold of about 0.3 to 10 μm in a frame shape on the outer periphery of the second metal layer 13 by an electroless plating method or the like. 9, and the first metal layer 11 and the third metal layer 14 are joined together by solder 15, so that a sealed space is formed between the first insulating plate 2 and the second insulating plate 3. Form.

なお、第三金属層14は、厚さ0.3〜10μm程度の金箔のような金属板を第二金属層13に枠状に被着させてもよい。また、第三金属層14は第二金属層13の表面に形成される例を示したが、第一金属層11の表面に形成され、この第三金属層14を第二絶縁板3の外周部の第二金属層13に半田15によって接合させてもよい。また、第三金属層14を第一金属層11および第二金属層13のそれぞれの表面に形成し、これら第三金属層14同士を半田15によって接合させてもよい。   The third metal layer 14 may be formed by attaching a metal plate such as a gold foil having a thickness of about 0.3 to 10 μm to the second metal layer 13 in a frame shape. Moreover, although the example in which the third metal layer 14 is formed on the surface of the second metal layer 13 has been shown, the third metal layer 14 is formed on the surface of the first metal layer 11, and the third metal layer 14 is formed on the outer periphery of the second insulating plate 3. The second metal layer 13 may be joined by solder 15. Alternatively, the third metal layer 14 may be formed on the respective surfaces of the first metal layer 11 and the second metal layer 13, and the third metal layers 14 may be joined together by the solder 15.

次に、本発明の圧力検出装置用パッケージの実施の形態の他の例について、図2の断面図をもとに以下に示す。図2に示すように、第一金属層11および第二金属層13の少なくとも一方の表面に第三金属層14を形成するとともに、第一絶縁板2に形成された第一金属層11と第二絶縁板3に形成された第二金属層13とが第三金属層14を介して熱圧着によって接合されていることが好ましい。すなわち、第一金属層11と第二金属層13と第三金属層14との厚みが第一絶縁板2と第二絶縁板3との間隔となり、第一金属層11と第二金属層13と第三金属層14とは、従来の絶縁基体21または絶縁板22の外周部に形成される枠状の突起部22bよりも薄くかつ簡易に形成しやすいので、静電容量を形成する第一電極8と第二電極9との間隔を小さいものとすることができる。   Next, another example of the embodiment of the pressure detection device package of the present invention will be described below based on the sectional view of FIG. As shown in FIG. 2, the third metal layer 14 is formed on at least one surface of the first metal layer 11 and the second metal layer 13, and the first metal layer 11 and the first metal layer 11 formed on the first insulating plate 2 are It is preferable that the second metal layer 13 formed on the two insulating plates 3 is joined by thermocompression bonding via the third metal layer 14. That is, the thicknesses of the first metal layer 11, the second metal layer 13, and the third metal layer 14 become the distance between the first insulating plate 2 and the second insulating plate 3, and the first metal layer 11 and the second metal layer 13. And the third metal layer 14 are thinner and easier to form than the conventional frame-like protrusion 22b formed on the outer periphery of the insulating base 21 or the insulating plate 22, so that the first forming the capacitance The distance between the electrode 8 and the second electrode 9 can be made small.

また、第三金属層14を介して第一絶縁板2と第二絶縁板3とが熱圧着されるので、第一絶縁板2と第二絶縁板3とをろう材等の接合材を使用せずに接合でき、接合時に接合材の厚みが偏って第一絶縁板2と第二絶縁板3とが傾くことがなく、より平行に第一絶縁板2と第二絶縁板3とを平行に接合することができ、外部の圧力を精度良く検出するものとすることができる。   Further, since the first insulating plate 2 and the second insulating plate 3 are thermocompression bonded via the third metal layer 14, a bonding material such as a brazing material is used for the first insulating plate 2 and the second insulating plate 3. The first insulating plate 2 and the second insulating plate 3 are not parallel to each other and the first insulating plate 2 and the second insulating plate 3 are more parallel to each other. The external pressure can be accurately detected.

また、第一電極8と第二電極9との間隔を小さくできることから、所要の静電容量を形成する第一電極8と第二電極9との対向する面積を小さくすることができるので、第一絶縁板2および第二絶縁板3を小さくすることができ、それに伴って絶縁基体1も小さくでき、本発明の圧力検出装置用パッケージを小型化することができるとともに、第二絶縁板3および第二電極9の質量をさらに小さくでき、遠心力による影響をさらに低減することができる。   Moreover, since the space | interval of the 1st electrode 8 and the 2nd electrode 9 can be made small, since the area where the 1st electrode 8 and the 2nd electrode 9 which form required electrostatic capacitance can be made small, the 1st The one insulating plate 2 and the second insulating plate 3 can be made smaller, and accordingly, the insulating base 1 can be made smaller, the pressure detecting device package of the present invention can be miniaturized, and the second insulating plate 3 and The mass of the second electrode 9 can be further reduced, and the influence of centrifugal force can be further reduced.

また、第一金属層11および第二金属層13を、第一電極8および第二電極9を形成する際に同時に形成し、ほぼ同じ厚みにすることで、第三金属層14の厚みが第一電極8と第二電極9との間に静電容量を形成するための間隔とすることができ、第一電極8と第二電極9との間隔との間隔を調整しやすくなる。   Further, the first metal layer 11 and the second metal layer 13 are formed at the same time when the first electrode 8 and the second electrode 9 are formed. It can be set as the space | interval for forming an electrostatic capacitance between the one electrode 8 and the 2nd electrode 9, and it becomes easy to adjust the space | interval with the space | interval of the 1st electrode 8 and the 2nd electrode 9. FIG.

第三金属層14は、例えば、0.3〜10μm程度の金等の金属を無電解メッキ法等により、第二金属層13の外周部に枠状に被着することによって、第二電極9を囲繞するような枠部となるとともに、第一金属層11と第三金属層14とを熱圧着させることによって、第一絶縁板2と第二絶縁板3との間に密閉空間を形成する。   The third metal layer 14 is formed by, for example, depositing a metal such as gold of about 0.3 to 10 μm on the outer peripheral portion of the second metal layer 13 in a frame shape by an electroless plating method or the like. The first metal layer 11 and the third metal layer 14 are thermocompression-bonded to form a sealed space between the first insulating plate 2 and the second insulating plate 3. .

なお、第三金属層14は、厚さ0.3〜10μm程度の金箔のような金属板を第二絶縁板3の外周部に枠状に熱圧着等によって被着させてもよい。また、第三金属層14は第二金属層13の表面に被着される例を示したが、第一金属層11の表面に被着させ、この第三金属層14を絶第二絶縁板3の外周部の第二金属層13に熱圧着によって接合させても良い。また、第三金属層14を第一金属層11および第二金属層13のそれぞれの表面に形成し、これら第三金属層14同士を熱圧着によって接合させてもよい。   The third metal layer 14 may be formed by attaching a metal plate such as a gold foil having a thickness of about 0.3 to 10 μm to the outer peripheral portion of the second insulating plate 3 in a frame shape by thermocompression bonding or the like. Moreover, although the example in which the third metal layer 14 is deposited on the surface of the second metal layer 13 has been shown, the third metal layer 14 is deposited on the surface of the first metal layer 11, and the third metal layer 14 is separated from the second insulating plate. 3 may be bonded to the second metal layer 13 on the outer peripheral portion of the outer peripheral portion by thermocompression bonding. Moreover, the 3rd metal layer 14 may be formed in each surface of the 1st metal layer 11 and the 2nd metal layer 13, and these 3rd metal layers 14 may be joined by thermocompression bonding.

なお、第一電極8と第二電極9との短絡を防止するために、第一金属層11は第一電極8よりも例えば5μm程度厚くしても構わない。   In order to prevent a short circuit between the first electrode 8 and the second electrode 9, the first metal layer 11 may be thicker than the first electrode 8 by, for example, about 5 μm.

また、更に第三金属層14を介して接合されている第一金属層11と第二金属層13との接合部の外周部が金−錫合金等の半田16により覆われているのがよい。これにより、熱圧着により接合された第一絶縁板2と第二絶縁板3との間の密閉空間をより気密性の高いものとすることができる。また、気密性の高いものとできるので、密閉空間内の圧力を一定に保持することができ、外部の圧力を精度良く検出することができる小型の圧力検出装置用パッケージとすることができる。   Further, it is preferable that the outer peripheral portion of the joint portion between the first metal layer 11 and the second metal layer 13 joined through the third metal layer 14 is covered with a solder 16 such as a gold-tin alloy. . Thereby, the sealed space between the 1st insulating board 2 and the 2nd insulating board 3 joined by thermocompression bonding can be made more airtight. Moreover, since it can be made highly airtight, the pressure in the sealed space can be kept constant, and a compact package for a pressure detection device that can accurately detect external pressure can be obtained.

かくして、上述の圧力検出装置用パッケージによれば、搭載部1bに半導体素子4が搭載されるとともに封止され、半導体素子4の各電極が電気的に接続される複数の配線導体6とを備えることによって小型でかつ感度が高く、外部の圧力を正確に検出することが可能な圧力検出装置用パッケージとできる。   Thus, according to the above-described package for a pressure detection device, the semiconductor element 4 is mounted on the mounting portion 1b and sealed, and the plurality of wiring conductors 6 to which the respective electrodes of the semiconductor element 4 are electrically connected are provided. As a result, it is possible to provide a package for a pressure detection device that is small in size and has high sensitivity and can accurately detect external pressure.

なお、本発明は、上述の実施の形態の例に限定されるものではなく、本発明の要旨を逸脱しない範囲内であれば種々の変更は可能である。例えば、第三金属層14は、第一金属層11または第二金属層13の外周部まで形成していなくても良く、第三金属層14を介して第一絶縁板2と第二絶縁板3とを接合した後、半田16が第三金属層14の外側の側面を覆うとともに、第一金属層11または第二金属層13の外周部を覆うようにしても良い。また、第一電極8および第二電極9の少なくとも一方の表面に絶縁膜を被着させても良い。これにより、第二絶縁板3が撓んだ際に、第一電極8と第二電極9とが短絡するのを有効に防止することができる。   The present invention is not limited to the above-described embodiments, and various modifications can be made without departing from the gist of the present invention. For example, the third metal layer 14 may not be formed up to the outer periphery of the first metal layer 11 or the second metal layer 13, and the first insulating plate 2 and the second insulating plate are interposed via the third metal layer 14. 3, the solder 16 may cover the outer side surface of the third metal layer 14 and may cover the outer periphery of the first metal layer 11 or the second metal layer 13. Further, an insulating film may be deposited on at least one surface of the first electrode 8 and the second electrode 9. Thereby, when the 2nd insulating board 3 bends, it can prevent effectively that the 1st electrode 8 and the 2nd electrode 9 short-circuit.

また、第一電極8、第二電極9、第一金属層11、第二金属層13を、薄膜形成法で形成していても良く、例えば、第一絶縁板2および第二絶縁板3がセラミックス等から成る場合、第一絶縁板2または第二絶縁板3の表面を研磨加工等して平坦化した後、ニッケルクロム合金,チタン−タングステン合金,金,銀,銅,アルミニウム等の金属を蒸着法等の薄膜形成法を用いることにより、絶縁基体1の上面中央部に0.1〜1.0μm程度の厚みの所定のパターンに形成されているものであっても良い。また、この際、第一電極8、第二電極9、第一金属層11、第二金属層13の表面が酸化腐食するのを防止するとともに、第一金属層11と第二金属層13との接合を強固にするために、厚みが0.01〜2.0μm程度の金等の金属膜を被着しておいても良い。   The first electrode 8, the second electrode 9, the first metal layer 11, and the second metal layer 13 may be formed by a thin film forming method. For example, the first insulating plate 2 and the second insulating plate 3 When made of ceramics, etc., the surface of the first insulating plate 2 or the second insulating plate 3 is flattened by polishing or the like, and then a metal such as nickel chrome alloy, titanium-tungsten alloy, gold, silver, copper, or aluminum is used. By using a thin film forming method such as a vapor deposition method, a predetermined pattern having a thickness of about 0.1 to 1.0 μm may be formed in the central portion of the upper surface of the insulating substrate 1. At this time, the surfaces of the first electrode 8, the second electrode 9, the first metal layer 11, and the second metal layer 13 are prevented from being oxidatively corroded, and the first metal layer 11 and the second metal layer 13 In order to strengthen the bonding, a metal film such as gold having a thickness of about 0.01 to 2.0 μm may be applied.

(a)は、本発明の圧力検出装置用パッケージの実施の形態の一例を示す断面図であり、(b)は(a)の要部拡大図である。(A) is sectional drawing which shows an example of embodiment of the package for pressure detection apparatuses of this invention, (b) is a principal part enlarged view of (a). (a)は、本発明の圧力検出装置用パッケージの実施の形態の他の例を示す断面図であり、(b)は(a)の要部拡大図である。(A) is sectional drawing which shows the other example of embodiment of the package for pressure detection apparatuses of this invention, (b) is a principal part enlarged view of (a). 従来の圧力検出装置用パッケージを示す断面図である。It is sectional drawing which shows the package for the conventional pressure detection apparatus. 従来の圧力検出装置用パッケージを示す断面図である。It is sectional drawing which shows the package for the conventional pressure detection apparatus.

符号の説明Explanation of symbols

1・・・・・・・・・・・絶縁基体
1b・・・・・・・・・・搭載部
2・・・・・・・・・・・第一絶縁板
3・・・・・・・・・・・第二絶縁板
4・・・・・・・・・・・半導体素子
6、6a、6b・・・・・配線導体
8・・・・・・・・・・・第一電極
9・・・・・・・・・・・第二電極
11・・・・・・・・・・第一金属層
13・・・・・・・・・・第二金属層
14・・・・・・・・・・第三金属層
15,16・・・・・・・半田
1 ·········· Insulation base 1b ······ Mounting portion 2 ························ First insulation plate 3 2nd insulating plate 4 ... Semiconductor element 6, 6a, 6b Wiring conductor 8 ... First electrode 9 ················································································································ .... Third metal layer 15, 16, .... Solder

Claims (1)

一方の主面に半導体素子が搭載される搭載部を有する絶縁基体と、該絶縁基体の表面および内部に配設され、前記半導体素子の各電極が電気的に接続される複数の配線導体と、前記絶縁基体の他方の主面に接合された第一絶縁板と、該第一絶縁板との間に密閉空間を形成するように、前記第一絶縁板の外周部に可撓な状態で接合された第二絶縁板と、前記密閉空間内の前記第一絶縁板の主面に被着され、前記配線導体の一つに電気的に接続された静電容量形成用の第一電極と、前記密閉空間内の前記第二絶縁板の主面に被着され、前記配線導体の他の一つに電気的に接続された静電容量形成用の第二電極とを具備していることを特徴とする圧力検出装置用パッケージ。 An insulating base having a mounting portion on which a semiconductor element is mounted on one main surface; and a plurality of wiring conductors disposed on and inside the insulating base and electrically connected to the electrodes of the semiconductor element; Joined in a flexible state to the outer periphery of the first insulating plate so as to form a sealed space between the first insulating plate joined to the other main surface of the insulating base and the first insulating plate A second electrode formed on the main surface of the first insulating plate in the sealed space and electrically connected to one of the wiring conductors; A second electrode for forming a capacitance that is attached to the main surface of the second insulating plate in the sealed space and is electrically connected to the other one of the wiring conductors. A package for a pressure detection device.
JP2003304790A 2003-08-28 2003-08-28 Package for pressure detector Pending JP2005077134A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022019167A1 (en) * 2020-07-21 2022-01-27

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2022019167A1 (en) * 2020-07-21 2022-01-27
JP7485045B2 (en) 2020-07-21 2024-05-16 株式会社村田製作所 Pressure sensor structure, pressure sensor device, and method for manufacturing pressure sensor structure

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