JP2005072156A - Package lid for high-frequency circuit and its manufacturing method, and high-frequency circuit package using the same - Google Patents

Package lid for high-frequency circuit and its manufacturing method, and high-frequency circuit package using the same Download PDF

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JP2005072156A
JP2005072156A JP2003298022A JP2003298022A JP2005072156A JP 2005072156 A JP2005072156 A JP 2005072156A JP 2003298022 A JP2003298022 A JP 2003298022A JP 2003298022 A JP2003298022 A JP 2003298022A JP 2005072156 A JP2005072156 A JP 2005072156A
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frequency circuit
package
wave absorber
radio wave
base
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JP4105998B2 (en
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Toshiaki Muto
利彰 武藤
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Kyocera Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19107Disposition of discrete passive components off-chip wires

Abstract

<P>PROBLEM TO BE SOLVED: To provide a package for a high-frequency circuit which excels in transmission characteristics and reliability by suppressing cavity resonance. <P>SOLUTION: A package lid 10 for a high-frequency circuit has such a structure that a metallic substrate 11 formed with a metal film 11b on the surface, and an electromagnetic wave absorber 12 which consists of a sintered body mainly made of Fe<SB>2</SB>O<SB>3</SB>and containing NiO in the remaining portion and which is formed with a metal film 12b on the surface, are bonded together by a brazing material 13. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、特に高速の情報通信および高周波計測用に使用される光素子パッケージ並びに高周波回路パッケージ等に使用される高周波回路用パッケージ蓋体に関するものである。   The present invention relates to an optical element package used for high-speed information communication and high-frequency measurement, and a high-frequency circuit package lid used for a high-frequency circuit package and the like.

光素子パッケージ並びに高周波回路パッケージでは、金属またはセラミックス等からなる蓋体を金属またはセラミックス等からなるパッケージベースに取り付けることにより気密封止を行って内部に実装される半導体素子や伝送線路等の保護を行う。従って、これらの高周波回路用パッケージ内には概直方体状の空洞が形成されることから、高周波回路用パッケージは方形空洞共振器と同様の性質を有する。   In optical element packages and high-frequency circuit packages, a lid made of metal or ceramics is attached to a package base made of metal or ceramics to provide hermetic sealing to protect the semiconductor elements and transmission lines mounted inside. Do. Accordingly, since a substantially rectangular parallelepiped cavity is formed in these high-frequency circuit packages, the high-frequency circuit package has the same properties as the rectangular cavity resonator.

そのため前記空洞の寸法によって定まる遮断周波数より高い周波数帯域で、空洞共振を生じ、高周波での伝送特性が劣化するので、前記周波数帯域で動作する光素子、高周波半導体素子あるいはその他の回路素子をパッケージに実装する場合には、前記空洞の寸法を小さくすることによって、遮断周波数を前記素子が動作する周波数帯域よりも十分に高くする必要がある。   Therefore, cavity resonance occurs in a frequency band higher than the cut-off frequency determined by the dimensions of the cavity, and transmission characteristics at high frequencies are deteriorated. Therefore, an optical element, a high-frequency semiconductor element or other circuit element operating in the frequency band is packaged. In the case of mounting, it is necessary to make the cutoff frequency sufficiently higher than the frequency band in which the element operates by reducing the size of the cavity.

しかしながら前記方法では、素子の動作周波数が高周波化するに伴い、前記素子が動作する周波数帯域より空洞共振が生じる周波数の方が低くなる為、素子の動作周波数近傍で空洞共振が生じてしまい、高周波特性が劣化するという問題がある。   However, in the above method, as the operating frequency of the element increases, the frequency at which the cavity resonance occurs is lower than the frequency band in which the element operates. Therefore, the cavity resonance occurs in the vicinity of the operating frequency of the element. There is a problem that characteristics deteriorate.

特に近年では、光通信、無線通信の高速化への要求が高まると共に、これらの素子の動作周波数もますます高速化しており、このような問題が避けられない状況にある。   In particular, in recent years, demands for higher speeds of optical communication and wireless communication have increased, and the operating frequency of these elements has been increased more and more, and such a problem is inevitable.

さらに、高周波回路用パッケージでは、空洞共振のみならず、高周波回路用パッケージ内に実装する増幅器の発振現象を引き起こすこともある。   Furthermore, the high frequency circuit package may cause not only cavity resonance but also an oscillation phenomenon of an amplifier mounted in the high frequency circuit package.

すなわち、高周波回路用パッケージ及び高周波半導体素子に形成された高周波伝送線路からの輻射電波が、蓋体によって反射されることにより、増幅器入出力線路間に不要信号の帰還が生じ、不要な発振が生じる。   That is, radiation waves from the high-frequency transmission line formed in the high-frequency circuit package and the high-frequency semiconductor element are reflected by the lid, thereby causing feedback of unnecessary signals between the amplifier input / output lines and generating unnecessary oscillation. .

従来の高周波回路用パッケージは、図3に示すように、端子電極35を有する金属製のパッケージベース31に、半導体素子33が実装され、伝送線路38を有した、セラミックス等からなる回路基板32を収納し、半導体素子33、端子電極35、伝送線路38のそれぞれの間をボンディングワイヤ36で接続後、金属製の蓋体34をシーム溶接等の方法にて接合し、密閉された構造となっている。   As shown in FIG. 3, a conventional high-frequency circuit package includes a circuit board 32 made of ceramics or the like having a transmission line 38 and a semiconductor element 33 mounted on a metal package base 31 having terminal electrodes 35. After housing and connecting the semiconductor element 33, the terminal electrode 35, and the transmission line 38 with bonding wires 36, a metal lid 34 is joined by a method such as seam welding to form a sealed structure. Yes.

しかしながら、このような構造の場合、半導体素子33の動作周波数が高周波化するに伴い、前記素子33が動作する周波数帯域が、空洞共振が生じる周波数より高くなった場合に空洞共振が発生し、周波数特性が劣化するという問題が生じていた。   However, in the case of such a structure, as the operating frequency of the semiconductor element 33 becomes higher, the cavity resonance occurs when the frequency band in which the element 33 operates becomes higher than the frequency at which the cavity resonance occurs. There was a problem that the characteristics deteriorated.

この現象は、半導体素子33、ボンディングワイヤ36、周辺の伝送線路38およびそれらの接続部等から信号周波数帯域の電波が放射され、その放射電波が高周波回路パッケージ30の内部空間37の固有振動数と一致した周波数で共振現象が発生し、その結果として伝送特性が劣化するためと考えられる。   This phenomenon occurs when radio waves in the signal frequency band are radiated from the semiconductor element 33, the bonding wire 36, the peripheral transmission line 38, and their connection parts, and the radiated radio waves are This is probably because a resonance phenomenon occurs at the coincident frequency, and as a result, transmission characteristics deteriorate.

これらの問題点を解決するために、図4に示すように、フェライトなどの焼結体からなる電波吸収体46の片面にメタライズ層を形成し、高周波回路用パッケージの金属製蓋部44の内面にろう材45にてろう付けして、高周波回路パッケージ40内で生じるマイクロ波の反射共振を抑制する方法(特許文献1)が提案されている。   In order to solve these problems, as shown in FIG. 4, a metallized layer is formed on one surface of a radio wave absorber 46 made of a sintered body such as ferrite, and the inner surface of the metal lid portion 44 of the high frequency circuit package. A method of suppressing the reflection resonance of the microwave generated in the high frequency circuit package 40 by brazing with the brazing material 45 is proposed (Patent Document 1).

また、図5に示すように、高周波回路基板52等が実装されたパッケージベース51と、概パッケージベース51上の前記高周波回路基板52等を封止するように前記パッケージベース上に配設された誘電体を素材とする誘電体封止板56と、該誘電体封止板56の外側に配設された電波吸収体55と、該電波吸収体55をシールドするように該電波吸収体55を包囲して配設された金属製のキャップ54とを備える構造(特許文献2)が提案されている。
実公平2−23035号公報 特開2000−138495号公報
Further, as shown in FIG. 5, the package base 51 on which the high-frequency circuit board 52 and the like are mounted, and the high-frequency circuit board 52 and the like on the approximate package base 51 are disposed on the package base so as to be sealed. A dielectric sealing plate 56 made of a dielectric material, a radio wave absorber 55 disposed outside the dielectric sealing plate 56, and the radio wave absorber 55 so as to shield the radio wave absorber 55 There has been proposed a structure (Patent Document 2) including a metal cap 54 disposed in an enclosed manner.
Japanese Utility Model Publication No. 2-33035 JP 2000-138495 A

しかしながら、上記空洞共振が発生する周波数は一般に周波数が準ミリ波、ミリ波の領域であり、図4に示すような、従来のフェライト等焼結体からなる電波吸収体46は、これらの周波数で発生する空洞共振時の電界および磁界のエネルギーに対する吸収量が小さく、空洞共振の発生を押さえることができなかった。   However, the frequency at which the cavity resonance is generated is generally in the range of quasi-millimeter wave and millimeter wave, and the conventional wave absorber 46 made of a sintered body such as ferrite as shown in FIG. The amount of absorption of the electric field and magnetic field energy at the time of the generated cavity resonance is small, and the generation of the cavity resonance cannot be suppressed.

一方、準ミリ波、ミリ波の領域の周波数で発生する空洞共振時の電界および磁界エネルギーの吸収に適した電波吸収体としては、樹脂と軟磁性金属粉末の複合材料からなる電波吸収体が好適とされている。   On the other hand, a radio wave absorber made of a composite material of resin and soft magnetic metal powder is suitable as a radio wave absorber suitable for absorbing electric field and magnetic field energy at the time of cavity resonance generated at frequencies in the quasi-millimeter wave and millimeter wave regions. It is said that.

しかしながら、このような樹脂と軟磁性金属粉末の複合材料からなる電波吸収体では耐熱性が低いため、ろう付け時の温度上昇によって劣化したり、アウトガスが発生したりするため、高い信頼性が要求される前述の高周波回路パッケージ内部には使用することができなかった。   However, a radio wave absorber made of a composite material of such a resin and soft magnetic metal powder has low heat resistance, so that it deteriorates due to temperature rise during brazing or outgassing, so high reliability is required. The above-mentioned high-frequency circuit package cannot be used.

また、図5に示すような構造によって、電波吸収体55から発生するアウトガスの影響を防止する方法が提案されているが、高周波回路パッケージ50の構成が複雑となり、価格が高くなる上に、高周波回路パッケージ50の小型化、低背化が困難であるという問題点があった。   Further, although a method for preventing the influence of outgas generated from the radio wave absorber 55 by a structure as shown in FIG. 5 has been proposed, the configuration of the high-frequency circuit package 50 becomes complicated, the price increases, There is a problem that it is difficult to reduce the size and height of the circuit package 50.

上記課題に対して検討を重ねた結果、本発明は、高周波回路を収納するパッケージベースと組み合わせて気密封止パッケージを形成する高周波回路用パッケージ蓋体において、金属またはセラミックスからなる基体の表面の少なくとも一部に金属膜を形成するとともに、Feを主成分とし、その残部にNiOを含有する焼結体からなる電波吸収体の表面の少なくとも一部に金属膜を形成し、前記基体にろう材を用いて前記電波吸収体を止着したことを特徴とするものである。 As a result of repeated studies on the above problems, the present invention provides at least a surface of a substrate made of metal or ceramics in a package lid for a high frequency circuit that forms a hermetic sealed package in combination with a package base that houses a high frequency circuit. and forming a metal film on a part, the main component Fe 2 O 3, to form at least part of the metal film on the surface of the microwave absorber composed of a sintered body containing NiO in the remainder, to the substrate The electromagnetic wave absorber is fixed using a brazing material.

また、本発明の高周波回路用パッケージ蓋体は、前記電波吸収体が、Feの含有量が70〜95mol%であることを特徴とするものである。 In the high frequency circuit package lid of the present invention, the radio wave absorber is characterized in that the content of Fe 2 O 3 is 70 to 95 mol%.

さらに、本発明の高周波回路用パッケージ蓋体は、前記ろう材の融点が100℃〜400℃であることを特徴とするものである。   Furthermore, the high frequency circuit package lid of the present invention is characterized in that the brazing material has a melting point of 100 ° C to 400 ° C.

さらに、本発明の高周波回路用パッケージ蓋体の製造方法は、前記基体と前記電波吸収体を、箔片状に加工した前記ろう材を介して積層した後、酸素濃度1000ppm以下の窒素雰囲気中にて、前記ろう材の融点温度以上に加熱して止着する工程を含むことを特徴とするものである。   Further, in the method for manufacturing a package lid for a high frequency circuit of the present invention, the base and the radio wave absorber are laminated through the brazing material processed into a foil piece, and then in a nitrogen atmosphere having an oxygen concentration of 1000 ppm or less. In addition, the method includes a step of fixing by heating above the melting point temperature of the brazing material.

さらに、本発明の高周波回路パッケージは、前記高周波回路用パッケージ蓋体と、高周波回路を収納するパッケージベースとからなることを特徴とするものである。   Furthermore, the high-frequency circuit package of the present invention comprises the above-mentioned high-frequency circuit package lid and a package base that houses the high-frequency circuit.

本発明によれば、高周波回路を収納するパッケージベースと組み合わせて気密封止パッケージを形成する高周波回路用パッケージ蓋体において、Feを主成分とし、その残部にNiOを含有する焼結体からなる電波吸収体の表面の少なくとも一部に金属膜を形成し、該電波吸収体を前記基体にろう材を用いて止着することにより、共振、発振を生じず、高周波特性に優れ、かつ、信頼性に優れた高周波回路パッケージを得ることが可能となる。 According to the present invention, in a high frequency circuit package lid that forms a hermetic sealed package in combination with a package base that accommodates a high frequency circuit, a sintered body containing Fe 2 O 3 as a main component and NiO in the remaining portion. By forming a metal film on at least a part of the surface of the radio wave absorber made of, and fixing the radio wave absorber to the base using a brazing material, resonance and oscillation do not occur, and high frequency characteristics are excellent. Therefore, it is possible to obtain a high-frequency circuit package with excellent reliability.

以下に、本発明の実施形態として、高周波回路用パッケージ蓋体と高周波回路パッケージについて説明する。   Hereinafter, a high frequency circuit package lid and a high frequency circuit package will be described as embodiments of the present invention.

まず、図1に示すように、基体11と電波吸収体12、および両者を止着するろう材13よりなる蓋体10を構成する。   First, as shown in FIG. 1, a lid body 10 composed of a base body 11, a radio wave absorber 12, and a brazing material 13 for fixing both of them is configured.

そして、例えば図2に示すように、半導体素子23が実装された高周波回路基板22を実装したパッケージベース21の上部に上記蓋体10を取り付け、Au−Sn合金によるろう付け、またはシーム溶接等の方法で気密封止して高周波回路パッケージ20を構成する。   Then, for example, as shown in FIG. 2, the lid body 10 is attached to the upper part of the package base 21 on which the high frequency circuit board 22 on which the semiconductor element 23 is mounted, and brazing with an Au—Sn alloy, seam welding, or the like. The high frequency circuit package 20 is configured by hermetically sealing by a method.

基体11はFe−Ni−Co合金、Fe−Ni合金等の金属合金板からなり、その表面全体に下地層Ni、表面層Auの2層からなる金属膜11bが形成された構成となっている。また、電波吸収体12は、Feを主成分とし、その残部にNiOを含有する焼結体からなり、基体11と止着される面に金属膜12bを形成してある。 The substrate 11 is made of a metal alloy plate such as an Fe—Ni—Co alloy or Fe—Ni alloy, and has a structure in which a metal film 11b comprising two layers of a base layer Ni and a surface layer Au is formed on the entire surface. . The radio wave absorber 12 is made of a sintered body containing Fe 2 O 3 as a main component and NiO in the remaining portion, and a metal film 12b is formed on the surface to be fixed to the base 11.

ここで、蓋体10が、基体11にろう材13を介して電波吸収体12を止着した構成であることにより、空洞共振、帰還発振等による高周波特性の劣化を防止することができる。   Here, since the lid 10 has a configuration in which the radio wave absorber 12 is fixed to the base 11 via the brazing material 13, deterioration of high frequency characteristics due to cavity resonance, feedback oscillation, or the like can be prevented.

ここで、金属膜11b、12bは、ろう材13との濡れ性を考慮するとAu、Ag、Al、Sn、Zn、Pd、Cu、Ni、Fe等の金属、及びこれらを含む合金を使用することが好ましく、1層または2層以上の構成としても構わない。化学的安定性が高いことから表面層としてはAuが好ましいが、特に半田との濡れ性、封止接合の信頼性の高いことから表面層がAu、その下地層がNiとすることが好ましい。   Here, considering the wettability with the brazing material 13, the metal films 11b and 12b use metals such as Au, Ag, Al, Sn, Zn, Pd, Cu, Ni, and Fe, and alloys containing these metals. Is preferable, and it may have a structure of one layer or two or more layers. Au is preferable as the surface layer because of its high chemical stability. However, it is preferable that the surface layer is made of Au and its underlying layer is Ni because of its high wettability with solder and high reliability of sealing and bonding.

さらに電波吸収体12に形成される金属膜12bにおいては、化学的安定性が高いことから表面層としてはAuが好ましいが、特に半田との濡れ性、接合の信頼性の高いことから表面層がAu、その下地層がNiとすることが好ましく、さらにNi層と電波吸収体の密着性を向上させる目的で両者の間にCr層を設けることが好ましい。   Further, in the metal film 12b formed on the radio wave absorber 12, Au is preferable as the surface layer because of its high chemical stability, but the surface layer is particularly high because of its high wettability with solder and high reliability of bonding. Au and its underlayer are preferably Ni, and a Cr layer is preferably provided between them for the purpose of improving the adhesion between the Ni layer and the radio wave absorber.

また、基体11は、Fe−Ni−Co合金あるいはFe−Ni合金等の金属板の代わりに、アルミナ、ステアタイト、コージェライト等のセラミックスを使用しても良く、この場合、蓋体10とパッケージベース21の接合方法としては、あらかじめセラミックスの封止部分にMo−Mnメタライズ、その後Niメッキ、さらにAuメッキを施した金属膜を形成しておき、パッケージベースとAu−Sn合金によりろう付けする等の方法を使用すれば良い。   The substrate 11 may be made of ceramics such as alumina, steatite, cordierite, etc. instead of a metal plate such as Fe—Ni—Co alloy or Fe—Ni alloy. In this case, the lid 10 and the package are used. As a joining method of the base 21, a metal film is formed in advance by Mo-Mn metallization, then Ni plating, and further Au plating on a ceramic sealing portion, and brazed with a package base and an Au-Sn alloy. You can use this method.

また、前記電波吸収体12は、Feを主成分とし、残部にNiOを含有する焼結体とすることが重要である。 It is important that the radio wave absorber 12 is a sintered body containing Fe 2 O 3 as a main component and NiO in the balance.

前記電波吸収体12を、Feを主成分とし、残部にNiOを含有する焼結体とすることで、準ミリ波、ミリ波領域の電磁波に対する電波吸収特性に優れ、また焼結体であるため耐熱性に優れたものとなり、熱処理によって各部品を接合する際、変質、変形及び強度劣化が少なく、脱ガスの発生を無くすことができる。 By making the radio wave absorber 12 a sintered body containing Fe 2 O 3 as a main component and NiO in the balance, the radio wave absorber 12 has excellent radio wave absorption characteristics with respect to electromagnetic waves in the quasi-millimeter wave and millimeter wave regions. Therefore, it becomes excellent in heat resistance, and when joining parts by heat treatment, there is little alteration, deformation and strength deterioration, and generation of degassing can be eliminated.

ここで、前記電波吸収体12は、Feの含有量が50mol%未満となると、準ミリ波帯、ミリ波帯での電波吸収特性が得られず、パッケージ内部で発生する輻射電磁波に起因する空洞共振現象やアンプの帰還発振現象を抑制することが出来ない。 Here, when the content of Fe 2 O 3 is less than 50 mol%, the radio wave absorber 12 cannot obtain radio wave absorption characteristics in the quasi-millimeter wave band and the millimeter wave band, and radiates electromagnetic waves generated inside the package. It cannot suppress the cavity resonance phenomenon and the feedback oscillation phenomenon of the amplifier.

また、前記電波吸収体12は、Feの含有量が70〜95mol%であることがより好ましい。 In addition, the wave absorber 12 is more preferable that the content of Fe 2 O 3 is 70~95mol%.

Feの含有量を70mol%以上とするのは、50mol%以上、70mol%未満では、準ミリ波帯、ミリ波帯における電波吸収特性は良好であるものの、Feの含有量の僅かなぶれにより電波吸収特性が大きく変化するため、高周波回路パッケージの設計を困難にするためである。 The content of Fe 2 O 3 is set to 70 mol% or more. When the content of Fe 2 O 3 is 50 mol% or more and less than 70 mol%, the radio wave absorption characteristics in the quasi-millimeter wave band and the millimeter wave band are good, but the content of Fe 2 O 3 This is because it is difficult to design a high-frequency circuit package because the radio wave absorption characteristics change greatly due to slight fluctuations.

一方、Feの含有量を95mol%以下とするのは、95mol%を超えると、整形時の圧力によっては焼結させることが困難になり、良好な電波吸収特性が得られなかったり、歩留まりが低下したりするからである。 On the other hand, if the content of Fe 2 O 3 is 95 mol% or less, if it exceeds 95 mol%, it becomes difficult to sinter depending on the pressure during shaping, and good radio wave absorption characteristics cannot be obtained, This is because the yield decreases.

また、その残部にNiOを含有させたのは、NiOを全く含まない場合は、電波吸収体の体積固有抵抗値が上昇し、良好な電波吸収特性が得られないとともに、低温で焼結させることが困難になるからである。   In addition, if NiO is not contained at all in the remainder, the volume resistivity of the radio wave absorber increases, and good radio wave absorption characteristics cannot be obtained, and sintering is performed at a low temperature. This is because it becomes difficult.

本発明の電波吸収体12は、以下の方法によって作製される。   The radio wave absorber 12 of the present invention is produced by the following method.

先ず、Fe50mol%以上の原料粉末及びNiOの原料粉末を、水とともにボールミルまたはビーズビルに投入調合した後、6〜10時間湿式混合を行うことで、所定の粘性を有するスラリーを得る。 First, the raw material powder of Fe 2 O 3 50mol% or more of the raw material powder and NiO, after turning formulated into a ball mill or bead building with water, by performing 6-10 hours wet mixed to obtain a slurry having a predetermined viscosity .

ここで、Fe原料粉末やNiO原料粉末をボールミルまたはビーズビルに投入調合する際、本発明の範囲内において公知の硬化剤、硬化助剤、可塑剤、分散剤、離型剤、着色剤、増量剤(無機材)を少量添加しても何ら差し支えない。 Here, when Fe 2 O 3 raw material powder or NiO raw material powder is charged and prepared in a ball mill or bead building, known curing agents, curing aids, plasticizers, dispersants, mold release agents, coloring agents within the scope of the present invention. There is no problem even if a small amount of an agent or a bulking agent (inorganic material) is added.

また、焼結性確保のため、平均粒径1μm以下、好ましくは0.85μm以下のFe原料粉末やNiO原料粉末を用いることが好ましい。 In order to ensure sinterability, it is preferable to use Fe 2 O 3 raw material powder or NiO raw material powder having an average particle size of 1 μm or less, preferably 0.85 μm or less.

さらに、より低圧での成形を可能にするという観点から、ZnO,CuO,Biの少なくとも一種の原料粉末を添加することが好ましく、その添加量の合計が5〜10mol%であることが特に好適であり、このようにすることで、成形に用いる装置のコスト低減を計ることができ、複雑な形状の電磁波吸収体を作製することもできるようになる。 Furthermore, from the viewpoint of enabling molding at a lower pressure, it is preferable to add at least one raw material powder of ZnO, CuO, Bi 2 O 3 , and the total addition amount is 5 to 10 mol%. This is particularly suitable, and by doing so, it is possible to reduce the cost of an apparatus used for molding, and it is also possible to produce an electromagnetic wave absorber having a complicated shape.

次に、噴霧乾燥機を用い、上記スラリーを乾燥、造粒した後、得られた造粒粉を所望の成形手段、例えば、粉末加圧成形法により、任意形状の成形体を得る。   Next, after drying and granulating the slurry using a spray dryer, the obtained granulated powder is obtained into a desired shape by, for example, a powder pressure molding method.

あるいは、上記スラリーを乾燥したものを700〜900℃程度で仮焼合成を行い、ボールミルやビーズミル等で粉砕し、噴霧乾燥機で再度乾燥させた後、所望の成形手段、例えば、粉末加圧成形法により、任意形状の成形体を作製してもよい。   Alternatively, the dried slurry is subjected to calcining synthesis at about 700 to 900 ° C., pulverized with a ball mill or bead mill, and dried again with a spray dryer, and then desired molding means, for example, powder pressure molding You may produce the molded object of arbitrary shapes by the method.

ここで、粉末加圧成形法を用いる場合、その成形圧は、例えば100〜300MPaとすればよい。   Here, when using the powder pressure molding method, the molding pressure may be, for example, 100 to 300 MPa.

そして、上記成形体を1000〜1400℃、保持時間0〜2時間で焼成した後、300〜500℃/時間で降温することで本発明の電波吸収体12が得られる。   And after baking the said molded object at 1000-1400 degreeC and holding time 0-2 hours, the electromagnetic wave absorber 12 of this invention is obtained by temperature-falling at 300-500 degreeC / hour.

また、ろう材13は、Sn、Zn、Au、Bi、Cu、Pb、In、Ag等の金属のうち2種以上の金属の合金を用いれば良いが、前記金属膜11b、12bとの濡れ性および融点温度を考慮し、Au−Sn、Sn−Pb、Sn−Ag−Cu、Sn−Bi−Ag、In−Sn等の合金を使用するのがよい。   Further, the brazing material 13 may be an alloy of two or more kinds of metals such as Sn, Zn, Au, Bi, Cu, Pb, In, and Ag, but wettability with the metal films 11b and 12b. In consideration of the melting point temperature, an alloy such as Au—Sn, Sn—Pb, Sn—Ag—Cu, Sn—Bi—Ag, or In—Sn is preferably used.

こうすることにより、基体11と電波吸収体12の止着が強固な物となり、パッケージベース21へ蓋体10を接合する際の工程や、使用条件下における温度上昇の際にも、蓋体10から電波吸収体12が脱落せず、さらに有機系の接着剤等を用いないことから、アウトガスが発生せず、内部に封入される半導体素子等の特性劣化が防止できる。   By doing so, the base body 11 and the radio wave absorber 12 are firmly fixed, and the lid body 10 can be used even when the lid body 10 is joined to the package base 21 or when the temperature rises under use conditions. Thus, the radio wave absorber 12 does not fall off and no organic adhesive or the like is used, so that no outgas is generated and the deterioration of the characteristics of the semiconductor element or the like enclosed therein can be prevented.

前記接合時には、通常シーム溶接法が用いられ、蓋体10は100℃近くまで温度が上昇することから、前記ろう材13の融点は100℃以上であることが好ましく、接合条件によって適切に選択することが出来る。   At the time of joining, a seam welding method is usually used, and the temperature of the lid 10 rises to near 100 ° C. Therefore, the melting point of the brazing material 13 is preferably 100 ° C or more, and is appropriately selected according to joining conditions. I can do it.

また、前記ろう材13の融点が高すぎると、基体11表面の金属膜11bおよび電波吸収体12表面の金属膜12bが部分的に剥離したり、止着強度が低下するため、前記ろう材13の融点は400℃以下とすることが好ましい。   If the melting point of the brazing material 13 is too high, the metal film 11b on the surface of the base 11 and the metal film 12b on the surface of the radio wave absorber 12 are partially peeled off or the fastening strength is lowered. The melting point of is preferably 400 ° C. or lower.

次に、前記高周波回路パッケージの製造方法について説明する。   Next, a method for manufacturing the high frequency circuit package will be described.

本発明の高周波回路用パッケージ蓋体10は、前記基体11と前記電波吸収体12とを、あらかじめ箔片状に加工した前記ろう材13を介して積層し、酸素濃度が1000ppm以下にコントロールされた窒素雰囲気下で、前記ろう材13の融点温度以上で加熱することにより、前記ろう材13を介して前記基体11と前記電波吸収体12を止着することによって得られる。   In the high frequency circuit package lid 10 of the present invention, the base body 11 and the radio wave absorber 12 are laminated through the brazing material 13 previously processed into foil pieces, and the oxygen concentration is controlled to 1000 ppm or less. It is obtained by fixing the base body 11 and the radio wave absorber 12 through the brazing material 13 by heating at a temperature equal to or higher than the melting point temperature of the brazing material 13 in a nitrogen atmosphere.

次に本発明の高周波回路用パッケージ蓋体10を使用した高周波回路パッケージ20を説明する。図1および図2に断面図で示すように、高周波回路パッケージ20は、半導体素子23が実装された回路基板22を収納したパッケージベース21に、本発明の蓋体10をAu−Sn合金によるろう付けあるいはシーム溶接等の方法で、内部空間27を気密封止するように接合する。蓋体10の内部空間側には、電波吸収体12が金属層12bとろう材13を介して止着されており、半導体素子23は回路基板22上の伝送線路24にボンディングワイヤ26等で接続され、さらに回路基板22上の伝送線路24と端子電極25がボンディングワイヤ26等で接続されている。   Next, a high frequency circuit package 20 using the high frequency circuit package lid 10 of the present invention will be described. As shown in cross-sectional views in FIGS. 1 and 2, the high-frequency circuit package 20 is made of a package base 21 containing a circuit board 22 on which a semiconductor element 23 is mounted, and the lid 10 of the present invention is made of Au—Sn alloy. The inner space 27 is joined so as to be hermetically sealed by attaching or seam welding. A radio wave absorber 12 is fixed to the inner space side of the lid 10 via a metal layer 12b and a brazing material 13, and the semiconductor element 23 is connected to a transmission line 24 on the circuit board 22 by a bonding wire 26 or the like. Further, the transmission line 24 and the terminal electrode 25 on the circuit board 22 are connected by a bonding wire 26 or the like.

こうすることにより、高周波回路パッケージ20は、半導体素子23、伝送線路24、ボンディングワイヤ25、およびそれぞれの接続部分等からの輻射電波が、電波吸収体12により吸収減衰されるため、蓋体10による内部反射が抑制された結果、空洞共振や発振現象が抑制され、高周波での周波数特性に優れたものとすることが可能となるのである。   As a result, the radio frequency circuit package 20 is configured so that the radio wave from the semiconductor element 23, the transmission line 24, the bonding wire 25, and the connection portions thereof is absorbed and attenuated by the radio wave absorber 12. As a result of suppressing internal reflection, cavity resonance and oscillation phenomenon are suppressed, and it becomes possible to achieve excellent frequency characteristics at high frequencies.

図1および図2に示すように、半導体素子23が実装された回路基板22を実装したパッケージベース21に、金属製の基体11と電波吸収体12をろう材13により止着した蓋体10をシーム溶接にて気密封止し、高周波回路用パッケージ20を作製した。ここで、高周波パッケージ20の端子電極25と、回路基板22上に形成された伝送線路24とはボンディングワイヤ26で接続されている。   As shown in FIGS. 1 and 2, a lid 10 in which a metal base 11 and a radio wave absorber 12 are fixed to a package base 21 mounted with a circuit board 22 on which a semiconductor element 23 is mounted by a brazing material 13. A high frequency circuit package 20 was produced by hermetic sealing by seam welding. Here, the terminal electrode 25 of the high frequency package 20 and the transmission line 24 formed on the circuit board 22 are connected by a bonding wire 26.

電波吸収体12は、以下の方法によって作製した。   The radio wave absorber 12 was produced by the following method.

まず、FeおよびNiOの原料粉末が表1に示す比率になるように秤量したものを出発原料とした。この出発原料を水とともにボールミルに投入、調合した後、8時間湿式混合を行うことで、所定の粘度を有するスラリーを得た。 First, what was weighed so that the raw material powders of Fe 2 O 3 and NiO were in the ratio shown in Table 1 was used as the starting material. This starting material was put into a ball mill together with water and prepared, and then wet mixing was performed for 8 hours to obtain a slurry having a predetermined viscosity.

次に、噴霧乾燥機(スプレードライヤー)を用い、上記スラリーを乾燥、造粒した後、得られた造粒粉を粉末加圧成形法により、成形圧力100MPaで成形することで成形体を得た。そして、上記成形体を空気中1300℃の雰囲気で焼成することにより、電波吸収体12を得た。   Next, after drying and granulating the slurry using a spray dryer (spray dryer), the resulting granulated powder was molded at a molding pressure of 100 MPa by a powder pressure molding method to obtain a molded body. . And the electromagnetic wave absorber 12 was obtained by baking the said molded object in 1300 degreeC atmosphere in the air.

さらに、得られた電波吸収体12の一方の主面に薄膜法により下地Ni、表面層Auの金属膜を形成し、別途、Fe−Ni−Co合金からなる基体11の表面にNi、さらにAuの金属膜を電解メッキ法にて形成後、電波吸収体12が内部空間27側となるようにろう材を用いて接合し、蓋体10を得た。   Further, a metal film of a base Ni and a surface layer Au is formed on one main surface of the obtained radio wave absorber 12 by a thin film method, and separately Ni and Au are further formed on the surface of the base 11 made of an Fe—Ni—Co alloy. After the metal film was formed by the electrolytic plating method, it was joined using a brazing material so that the radio wave absorber 12 was on the inner space 27 side, and the lid body 10 was obtained.

なお、高周波回路パッケージ20は、内部に10mm×10mm、高さ5mmの概直方体の空洞27を有している。   Note that the high-frequency circuit package 20 has a substantially rectangular parallelepiped cavity 27 having a size of 10 mm × 10 mm and a height of 5 mm.

まず、電波吸収体12のFeおよびNiOの含有量の最適範囲を検証するために、それぞれの含有量を変化させた電波吸収体12を用いて蓋体を作製し、減衰量および空洞共振を抑制する効果の有無を検証した。 First, in order to verify the optimum range of the content of Fe 2 O 3 and NiO of the radio wave absorber 12, a lid body was produced using the radio wave absorber 12 with each content changed, and the attenuation amount and the cavity The presence or absence of the effect of suppressing resonance was verified.

減衰量は、あらかじめ測定範囲の高周波信号を透過できるよう設計された伝送線路の両端に、ネットワークアナライザのポート1、ポート2を、同軸ケーブルおよびプローブを介して接続し、伝送線路を覆うように電波吸収体12を載置した時の10GHzにおける電力透過係数S21の変化量を測定し、減衰量とした。   Attenuation is achieved by connecting the port 1 and port 2 of the network analyzer to both ends of a transmission line designed to transmit a high-frequency signal in the measurement range in advance via a coaxial cable and a probe, and covering the transmission line. The amount of change in the power transmission coefficient S21 at 10 GHz when the absorber 12 was placed was measured and used as the attenuation.

空洞共振を抑制する効果の測定は、ネットワークアナライザを使用し、ポート1、ポート2にそれぞれ高周波回路パッケージ20の高周波入力側、出力側の端子電極25を接続し、試料1〜7の電波吸収体を接合した蓋体を高周波回路パッケージ20に封止接合した状態で、10MHz〜70GHzまでの伝送特性を測定し、空洞共振抑制効果の有無を確認した。   The effect of suppressing the cavity resonance is measured by using a network analyzer, connecting the terminal electrodes 25 on the high frequency input side and output side of the high frequency circuit package 20 to the ports 1 and 2, respectively, In a state where the lid body joined with the sealant was sealed and joined to the high-frequency circuit package 20, the transmission characteristics up to 10 MHz to 70 GHz were measured, and the presence or absence of the cavity resonance suppression effect was confirmed.

その結果、本発明実施例であるNo.2〜No.6の電磁波吸収体では、準ミリ波、ミリ波帯域における空洞共振を抑制する効果を有するのに対し、比較例であるFeを主成分としないNo.1、NiOを含有しないNo.7では、電波吸収特性に劣り、準ミリ波、ミリ波帯域の空洞共振を抑制することができず、本発明の電波吸収体12として使用することは困難であった。 As a result, no. 2-No. 6 has the effect of suppressing cavity resonance in the quasi-millimeter wave and millimeter-wave bands, whereas the comparative example does not contain Fe 2 O 3 as a main component. 1. No. containing no NiO 7 was inferior in radio wave absorption characteristics and could not suppress cavity resonance in the quasi-millimeter wave and millimeter wave bands, and was difficult to use as the radio wave absorber 12 of the present invention.

さらに好ましくは、Feの含有量を70〜95%の範囲とすることで、電磁波の減衰量がFeの含有量の変化に対して安定した領域で製造することが可能となり、製造条件管理が容易になると共に、電波吸収体として安定した特性が得られるため、歩留まりが向上し、さらに高周波回路パッケージの設計が容易になるため好都合である。

Figure 2005072156
More preferably, by making the content of Fe 2 O 3 in the range of 70 to 95%, it becomes possible to manufacture in a region where the attenuation of electromagnetic waves is stable against changes in the content of Fe 2 O 3. This is advantageous because the manufacturing conditions can be easily managed and stable characteristics can be obtained as a radio wave absorber, which improves the yield and facilitates the design of the high-frequency circuit package.
Figure 2005072156

次に、従来の金属のみからなる蓋体を使用した場合と、従来の電波吸収体を止着した蓋体、および本発明の蓋体10を使用したときの共振抑制効果の有無を確認した。   Next, the presence or absence of a resonance suppression effect when using a conventional lid made of only metal, a lid secured to a conventional radio wave absorber, and the lid 10 of the present invention was confirmed.

さらに、パッケージ内部空間のガス成分を、MIL−STD 883Eに記載の方法で測定した。   Furthermore, the gas component in the package internal space was measured by the method described in MIL-STD 883E.

その結果、従来の金属製のみからなる蓋体を使用した場合(No.9)は、10GHz付近で空洞共振が発生して、高周波回路パッケージの周波数特性が劣化したのに対し、本発明の蓋体10を使用した場合(No.8)は、電波吸収体12の作用により空洞共振が抑制され、周波数特性に優れた高周波回路パッケージ20となることが確認された。   As a result, when the conventional lid made of only metal is used (No. 9), the cavity resonance occurs near 10 GHz and the frequency characteristics of the high-frequency circuit package deteriorate, whereas the lid of the present invention. When the body 10 was used (No. 8), it was confirmed that the cavity resonance was suppressed by the action of the radio wave absorber 12, and the high frequency circuit package 20 having excellent frequency characteristics was obtained.

また、パッケージ内部のガス成分測定結果においても腐食性ガスの発生は確認されず、半導体素子の信頼性に影響を与えないことが解った。   In addition, the generation of corrosive gas was not confirmed in the gas component measurement results inside the package, and it was found that the reliability of the semiconductor element was not affected.

次に、従来技術である、フェライト板の表面に金属膜を形成し、本発明と同様に金属合金の止着材で金属板からなる基体に止着した蓋体(No.10)を使用し、測定を行ったが、フェライトは、空洞共振が発生する周波数に対する吸収特性に劣るため、空洞共振を防止することができなかった。   Next, a conventional lid body (No. 10) is used, in which a metal film is formed on the surface of a ferrite plate, and is fixed to a base made of a metal plate with a metal alloy fixing material as in the present invention. As a result of the measurement, ferrite was inferior in the absorption characteristic with respect to the frequency at which the cavity resonance occurs, and therefore the cavity resonance could not be prevented.

さらに、ゴムを基材とし、磁性金属粉末を添加した従来の電波吸収体を、エポキシ系の接着剤で接合した蓋体を使用し、測定を行った結果(No.11)、空洞共振が抑制され、良好な周波数特性が得られたが、パッケージ内部空間のガス分析結果より、腐食性を有するアウトガスの発生が確認され、半導体素子の信頼性が低下することが予想されるため、高い信頼性が要求される高周波パッケージの封止用蓋体として適切ではない。

Figure 2005072156
Furthermore, the result of measurement using a lid made by bonding a conventional radio wave absorber made of rubber and added with magnetic metal powder with an epoxy adhesive (No. 11), suppression of cavity resonance Good frequency characteristics were obtained, but the gas analysis results in the internal space of the package confirmed the occurrence of corrosive outgas, and the reliability of the semiconductor device is expected to be reduced. Is not suitable as a lid for sealing a high-frequency package that is required.
Figure 2005072156

次に、基体11と電波吸収体12を、ろう材13にて止着する時の酸素濃度の最適範囲を確認するため、酸素濃度を様々に変化させて実験を行った(No.12〜No.16)。   Next, in order to confirm the optimum range of the oxygen concentration when the base member 11 and the radio wave absorber 12 are fixed by the brazing material 13, experiments were performed with various oxygen concentrations changed (No. 12 to No. .16).

接合状態の確認は、基体11が下側になるように固定した状態で電波吸収体12を上方に引っ張り、両者がはがれたときの応力を測定し、接合強度とした。   The bonding state was confirmed by pulling the radio wave absorber 12 upward in a state where the base 11 was fixed on the lower side, and measuring the stress when the both were peeled off to obtain the bonding strength.

その結果、酸素濃度1000ppmを超える範囲(No.12、No.13)では、ろう材13と金属膜11b、12bの濡れ性が悪く、全く接合出来ないか、出来ても接合強度が低かった。   As a result, in the range exceeding the oxygen concentration of 1000 ppm (No. 12, No. 13), the wettability between the brazing material 13 and the metal films 11b and 12b was poor, and the bonding strength was low even if it was not possible at all.

一方、酸素濃度1000ppm以下の範囲(No.14〜No.16)では、接合強度が十分高いものであった。   On the other hand, in the range of oxygen concentration of 1000 ppm or less (No. 14 to No. 16), the bonding strength was sufficiently high.

このため、止着時の酸素濃度は1000ppm以下であることが好ましく、止着後の強度を考慮すると、500ppm以下であることがさらに好ましいと言える。   For this reason, it is preferable that the oxygen concentration at the time of fixation is 1000 ppm or less, and considering the strength after the fixation, it can be said that the oxygen concentration is more preferably 500 ppm or less.

Figure 2005072156
Figure 2005072156

本発明は、特に高速の情報通信および高周波計測用に使用される光素子パッケージ並びに高周波回路パッケージ等に使用される高周波回路用パッケージ蓋体に利用でき、その結果、各種パッケージの特性を向上させることが可能となるものである。   INDUSTRIAL APPLICABILITY The present invention can be applied to an optical element package used for high-speed information communication and high-frequency measurement, and a high-frequency circuit package lid used for a high-frequency circuit package, and as a result, improves the characteristics of various packages. Is possible.

本発明の高周波回路用パッケージ蓋体の断面図である。It is sectional drawing of the package cover body for high frequency circuits of this invention. 本発明の高周波回路パッケージの断面図である。It is sectional drawing of the high frequency circuit package of this invention. 従来の高周波回路パッケージの断面図である。It is sectional drawing of the conventional high frequency circuit package. 従来の電波吸収体を用いた高周波回路パッケージの断面図である。It is sectional drawing of the high frequency circuit package using the conventional electromagnetic wave absorber. 従来の電波吸収体を用いた高周波回路パッケージの断面図である。It is sectional drawing of the high frequency circuit package using the conventional electromagnetic wave absorber.

符号の説明Explanation of symbols

10・・・高周波回路用パッケージ蓋体
11・・・基体
11b・・・金属膜
12・・・電波吸収体
12b・・・金属膜
13・・・ろう材
20・・・高周波回路パッケージ
21・・・パッケージベース
22・・・回路基板
23・・・半導体素子
24・・・伝送線路
25・・・端子電極
26・・・ボンディングワイヤ
27・・・内部空間
30・・・高周波回路パッケージ
31・・・パッケージベース
32・・・回路基板
33・・・半導体素子
34・・・蓋体
35・・・端子電極
36・・・ボンディングワイヤ
37・・・内部空間
38・・・伝送線路
41・・・パッケージベース
42・・・回路基板
43・・・半導体素子
44・・・蓋体
45・・・ろう材
46・・・焼結電波吸収体
50・・・高周波回路パッケージ
51・・・パッケージベース
52・・・回路基板
53・・・半導体素子
54・・・蓋体
55・・・電波吸収体
56・・・誘電体封止板
DESCRIPTION OF SYMBOLS 10 ... High frequency circuit package cover 11 ... Base | substrate 11b ... Metal film 12 ... Radio wave absorber 12b ... Metal film 13 ... Brazing material 20 ... High frequency circuit package 21 ... Package base 22 ... Circuit board 23 ... Semiconductor element 24 ... Transmission line 25 ... Terminal electrode 26 ... Bonding wire 27 ... Internal space 30 ... High frequency circuit package 31 ... Package base 32 ... Circuit board 33 ... Semiconductor element 34 ... Cover 35 ... Terminal electrode 36 ... Bonding wire 37 ... Internal space 38 ... Transmission line 41 ... Package base 42 ... Circuit board 43 ... Semiconductor element 44 ... Lid 45 ... Brazing material 46 ... Sintered wave absorber 50 ... High frequency circuit package 51 ... Package base 52 · The circuit board 53 ... semiconductor device 54 ... lid body 55 ... radio wave absorber 56 ... dielectric sealing plate

Claims (5)

高周波回路を収納するパッケージベースと組み合わせて気密封止パッケージを形成する高周波回路用パッケージ蓋体において、金属またはセラミックスからなる基体の表面の少なくとも一部に金属膜を形成するとともに、Feを主成分とし、その残部にNiOを含有する焼結体からなる電波吸収体の表面の少なくとも一部に金属膜を形成し、前記基体にろう材を用いて前記電波吸収体を止着したことを特徴とする高周波回路用パッケージ蓋体。 In a package lid for a high-frequency circuit that forms a hermetic sealed package in combination with a package base that houses a high-frequency circuit, a metal film is formed on at least a part of the surface of a base made of metal or ceramic, and Fe 2 O 3 is A metal film is formed on at least a part of the surface of a radio wave absorber made of a sintered body containing NiO as a main component and the balance is fixed to the radio wave absorber using a brazing material on the base. A high-frequency circuit package lid. 前記電波吸収体は、Feの含有量が70〜95mol%であることを特徴とする請求項1記載の高周波回路用パッケージ蓋体。 2. The high frequency circuit package lid according to claim 1, wherein the electromagnetic wave absorber has a content of Fe 2 O 3 of 70 to 95 mol%. 前記ろう材は、融点が100℃〜400℃であることを特徴とする、請求項1記載の高周波回路用パッケージ蓋体。 The high frequency circuit package lid according to claim 1, wherein the brazing material has a melting point of 100C to 400C. 前記基体と前記電波吸収体を、箔片状に加工した前記ろう材を介して積層した後、酸素濃度1000ppm以下の窒素雰囲気下で、前記ろう材の融点温度以上に加熱して止着する工程を含む請求項1乃至3のいずれかに記載の高周波回路用パッケージ蓋体の製造方法。 A step of laminating the base body and the radio wave absorber through the brazing material processed into a foil piece, and then heating and fixing the base material and the brazing material in a nitrogen atmosphere with an oxygen concentration of 1000 ppm or less. The manufacturing method of the package cover body for high frequency circuits in any one of Claims 1 thru | or 3 containing these. 請求項1乃至3のいずれかに記載の高周波回路用パッケージ蓋体と、高周波回路を収納するパッケージベースとからなることを特徴とする高周波回路パッケージ。 A high frequency circuit package comprising: the high frequency circuit package lid according to any one of claims 1 to 3; and a package base that houses the high frequency circuit.
JP2003298022A 2003-08-21 2003-08-21 High frequency circuit package lid, manufacturing method thereof, and high frequency circuit package using the same Expired - Fee Related JP4105998B2 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007110000A (en) * 2005-10-17 2007-04-26 Fuji Electric Device Technology Co Ltd Power semiconductor module
JP2012119721A (en) * 2007-06-14 2012-06-21 Raytheon Co Microwave integrated circuit package and method of forming such package
CN103872024A (en) * 2014-02-18 2014-06-18 南京银茂微电子制造有限公司 High frequency anti-electromagnetic interference power module

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007110000A (en) * 2005-10-17 2007-04-26 Fuji Electric Device Technology Co Ltd Power semiconductor module
JP2012119721A (en) * 2007-06-14 2012-06-21 Raytheon Co Microwave integrated circuit package and method of forming such package
CN103872024A (en) * 2014-02-18 2014-06-18 南京银茂微电子制造有限公司 High frequency anti-electromagnetic interference power module

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