JP2005033228A5 - - Google Patents

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Publication number
JP2005033228A5
JP2005033228A5 JP2004303161A JP2004303161A JP2005033228A5 JP 2005033228 A5 JP2005033228 A5 JP 2005033228A5 JP 2004303161 A JP2004303161 A JP 2004303161A JP 2004303161 A JP2004303161 A JP 2004303161A JP 2005033228 A5 JP2005033228 A5 JP 2005033228A5
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JP
Japan
Prior art keywords
processing
processing apparatus
recipe
model unit
result
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JP2004303161A
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English (en)
Japanese (ja)
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JP2005033228A (ja
JP4344674B2 (ja
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Priority claimed from JP2004303161A external-priority patent/JP4344674B2/ja
Publication of JP2005033228A publication Critical patent/JP2005033228A/ja
Publication of JP2005033228A5 publication Critical patent/JP2005033228A5/ja
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Publication of JP4344674B2 publication Critical patent/JP4344674B2/ja
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JP2004303161A 2004-10-18 2004-10-18 プラズマ処理装置 Expired - Lifetime JP4344674B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004303161A JP4344674B2 (ja) 2004-10-18 2004-10-18 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004303161A JP4344674B2 (ja) 2004-10-18 2004-10-18 プラズマ処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2001198830A Division JP3708031B2 (ja) 2001-06-29 2001-06-29 プラズマ処理装置および処理方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005323794A Division JP2006074067A (ja) 2005-11-08 2005-11-08 プラズマ処理装置および処理方法

Publications (3)

Publication Number Publication Date
JP2005033228A JP2005033228A (ja) 2005-02-03
JP2005033228A5 true JP2005033228A5 (cg-RX-API-DMAC10.html) 2005-12-22
JP4344674B2 JP4344674B2 (ja) 2009-10-14

Family

ID=34214527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004303161A Expired - Lifetime JP4344674B2 (ja) 2004-10-18 2004-10-18 プラズマ処理装置

Country Status (1)

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JP (1) JP4344674B2 (cg-RX-API-DMAC10.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4772401B2 (ja) * 2005-07-06 2011-09-14 株式会社東芝 最適化方法、最適化システム、及び、装置を製造する方法
JP2009290150A (ja) * 2008-06-02 2009-12-10 Renesas Technology Corp 半導体装置の製造システムおよび製造方法
JP5200687B2 (ja) * 2008-06-18 2013-06-05 富士通セミコンダクター株式会社 半導体装置の製造方法
US10269545B2 (en) * 2016-08-03 2019-04-23 Lam Research Corporation Methods for monitoring plasma processing systems for advanced process and tool control
JP7481460B2 (ja) 2020-08-18 2024-05-10 株式会社Fuji プラズマによる処理の処理条件決定方法および処理条件決定装置

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