JP2004535288A5 - - Google Patents

Download PDF

Info

Publication number
JP2004535288A5
JP2004535288A5 JP2003502839A JP2003502839A JP2004535288A5 JP 2004535288 A5 JP2004535288 A5 JP 2004535288A5 JP 2003502839 A JP2003502839 A JP 2003502839A JP 2003502839 A JP2003502839 A JP 2003502839A JP 2004535288 A5 JP2004535288 A5 JP 2004535288A5
Authority
JP
Japan
Prior art keywords
dissolution medium
irradiated target
radioisotope
solid material
sonication
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003502839A
Other languages
English (en)
Japanese (ja)
Other versions
JP4231779B2 (ja
JP2004535288A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2002/017678 external-priority patent/WO2002099816A2/en
Publication of JP2004535288A publication Critical patent/JP2004535288A/ja
Publication of JP2004535288A5 publication Critical patent/JP2004535288A5/ja
Application granted granted Critical
Publication of JP4231779B2 publication Critical patent/JP4231779B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003502839A 2001-06-05 2002-06-04 ターゲット処理 Expired - Fee Related JP4231779B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29598001P 2001-06-05 2001-06-05
PCT/US2002/017678 WO2002099816A2 (en) 2001-06-05 2002-06-04 Process for the recovery of a radioisotope from an irradiated target

Publications (3)

Publication Number Publication Date
JP2004535288A JP2004535288A (ja) 2004-11-25
JP2004535288A5 true JP2004535288A5 (https=) 2006-01-05
JP4231779B2 JP4231779B2 (ja) 2009-03-04

Family

ID=23140059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003502839A Expired - Fee Related JP4231779B2 (ja) 2001-06-05 2002-06-04 ターゲット処理

Country Status (5)

Country Link
JP (1) JP4231779B2 (https=)
KR (1) KR100858265B1 (https=)
CN (1) CN1264170C (https=)
AU (1) AU2002310305B2 (https=)
WO (1) WO2002099816A2 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4571109B2 (ja) * 2006-09-12 2010-10-27 行政院原子能委員会核能研究所 放射性同位元素タリウム−201の製造工程
JP4674727B2 (ja) * 2006-10-27 2011-04-20 行政院原子能委員会核能研究所 放射性同位元素タリウム−201の分離装置
EP2131369A1 (en) * 2008-06-06 2009-12-09 Technische Universiteit Delft A process for the production of no-carrier added 99Mo
CN105308687B (zh) * 2013-06-27 2019-04-05 马林克罗特有限公司 生成锗的工艺
WO2017183697A1 (ja) 2016-04-21 2017-10-26 株式会社カネカ 放射性同位元素製造用の支持基板、放射性同位元素製造用ターゲット板、及び支持基板の製造方法
US11177116B2 (en) 2016-04-28 2021-11-16 Kaneka Corporation Beam intensity converting film, and method of manufacturing beam intensity converting film
EP3637437B1 (en) * 2017-06-09 2022-11-16 Kaneka Corporation Target for proton-beam or neutron-beam irradiation and method for generating radioactive substance using same
KR20200044005A (ko) * 2017-07-31 2020-04-28 스테판 제이슬러 고체 타겟을 사용하여 입자 가속기 상에서 갈륨 방사성 동위 원소를 생산하기 위한 시스템, 장치 및 방법과, 이에 의해 생산된 ga-68 조성물
IT201700102990A1 (it) * 2017-09-14 2019-03-14 Istituto Naz Fisica Nucleare Metodo per l’ottenimento di un target solido per la produzione di radiofarmaci
JP6554753B1 (ja) * 2019-03-11 2019-08-07 株式会社京都メディカルテクノロジー テクネチウム99m単離システム及びテクネチウム99m単離方法
CN113574613B (zh) * 2019-03-28 2024-11-29 住友重机械工业株式会社 靶照射系统及来自固体靶的放射性同位素的回收方法
US20210225546A1 (en) * 2020-01-17 2021-07-22 BWXT ITG Canada, Inc. System and method for germanium-68 isotope production
MX2023002608A (es) * 2020-09-03 2023-07-07 Curium Us Llc Proceso de purificacion para la preparacion de cobre-64 agregado no portador.
US12315649B2 (en) 2020-09-03 2025-05-27 Curium Us Llc Purification process for the preparation of non-carrier added copper-64

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL103068C (https=) * 1956-10-04
JPS54111100A (en) * 1978-02-20 1979-08-31 Nihon Mediphysics Co Ltd Method of making thallium target for irradiation in cyclotron
BE904936A (nl) * 1986-06-17 1986-10-16 Lemmens Godfried Werkwijze voor de decontaminatie van radioaktief besmette materialen.
JPH02206800A (ja) * 1989-02-07 1990-08-16 Power Reactor & Nuclear Fuel Dev Corp 塔槽類の除染方法

Similar Documents

Publication Publication Date Title
JP2004535288A5 (https=)
Tian et al. Penetrating the oxide barrier in situ and separating freestanding porous anodic alumina films in one step
Zhao et al. Oxygen evolution reaction on 2D ferromagnetic Fe3GeTe2: boosting the reactivity by the self‐reduction of surface hydroxyl
Tsujino et al. Helical nanoholes bored in silicon by wet chemical etching using platinum nanoparticles as catalyst
JP6029764B2 (ja) 金属充填微細構造体の製造方法
Martín-González et al. Electrodeposition of Bi1-x Sb x Films and 200-nm wire arrays from a nonaqueous solvent
CN102701138A (zh) 一种金属辅助硅纳米线阵列大面积分层刻蚀和转移方法
CN105789042B (zh) 一种硅微米线阵列的制备工艺
US20130327636A1 (en) Pattern Transfer With Self-assembled Nanoparticle Assemblies
JP6798003B2 (ja) 金属充填微細構造体の製造方法
Chan et al. Magic Structures of H-Passivated〈 110∟ Silicon Nanowires
WO2016006660A1 (ja) 異方導電性部材および多層配線基板
US20190311916A1 (en) Systems and methods for semiconductor packages using photoimageable layers
JP6055552B2 (ja) 多層構造体、インターポーザ、および、インターポーザの製造方法
JPH11195628A5 (ja) 半導体装置の製造方法
JP4231779B2 (ja) ターゲット処理
ATE460752T1 (de) Verbessertes verfahren zur herstellung von speicherzellen vom typ pmc
US12322635B2 (en) Delamination processes and fabrication of thin film devices thereby
JPWO2013145610A1 (ja) 撥水性表面および親水性裏面を有するチップを製造する方法
US20070182015A1 (en) Fabrication of Nanowires
Hung et al. Finite size effects in ordered macroporous electrodes fabricated by electrodeposition into colloidal crystal templates
JP2003224128A5 (https=)
JPS6063400A (ja) 金属表面除染法
WO2019200790A1 (zh) 基于金属阳离子修饰黑磷的突触器件及其制备方法
CN106645077A (zh) 一种基于新型高低温阶梯扩孔法的“热点”尺寸小于5nm的SERS活性基底的制备方法