JP2004535071A5 - - Google Patents

Download PDF

Info

Publication number
JP2004535071A5
JP2004535071A5 JP2003511982A JP2003511982A JP2004535071A5 JP 2004535071 A5 JP2004535071 A5 JP 2004535071A5 JP 2003511982 A JP2003511982 A JP 2003511982A JP 2003511982 A JP2003511982 A JP 2003511982A JP 2004535071 A5 JP2004535071 A5 JP 2004535071A5
Authority
JP
Japan
Prior art keywords
cleaning solution
water
spray
source
rotor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003511982A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004535071A (ja
Filing date
Publication date
Priority claimed from US10/108,278 external-priority patent/US6691718B2/en
Application filed filed Critical
Priority claimed from PCT/US2002/021997 external-priority patent/WO2003006183A2/en
Publication of JP2004535071A publication Critical patent/JP2004535071A/ja
Publication of JP2004535071A5 publication Critical patent/JP2004535071A5/ja
Pending legal-status Critical Current

Links

JP2003511982A 2001-07-12 2002-07-09 フラットメディアキャリアから汚染物質を除去する方法、フラットメディアキャリア洗浄装置、メディアキャリア洗浄装置、およびボックス洗浄システム Pending JP2004535071A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US90503001A 2001-07-12 2001-07-12
US10/108,278 US6691718B2 (en) 1999-07-28 2002-03-26 Wafer container cleaning system
PCT/US2002/021997 WO2003006183A2 (en) 2001-07-12 2002-07-09 Method and apparatus for cleaning semiconductor wafers and other flat media

Publications (2)

Publication Number Publication Date
JP2004535071A JP2004535071A (ja) 2004-11-18
JP2004535071A5 true JP2004535071A5 (enExample) 2006-01-05

Family

ID=26805734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003511982A Pending JP2004535071A (ja) 2001-07-12 2002-07-09 フラットメディアキャリアから汚染物質を除去する方法、フラットメディアキャリア洗浄装置、メディアキャリア洗浄装置、およびボックス洗浄システム

Country Status (4)

Country Link
EP (1) EP1404463A4 (enExample)
JP (1) JP2004535071A (enExample)
TW (1) TWI223345B (enExample)
WO (1) WO2003006183A2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101886414B1 (ko) * 2016-09-27 2018-08-09 주식회사 유닉 웨이퍼 용기 클리닝 장치 및 시스템
CN108565235B (zh) * 2018-05-31 2024-03-01 亚智系统科技(苏州)有限公司 用于扇出型晶圆级芯片的表面处理、封装系统及操作方法
WO2020010357A1 (en) * 2018-07-06 2020-01-09 Oem Group, Llc Systems and methods for a spray measurement apparatus
CN108940996A (zh) * 2018-07-27 2018-12-07 深圳市凯尔迪光电科技有限公司 高精密集成电路离心清洗设备
CN111081594B (zh) * 2019-09-25 2022-09-30 北京时代民芯科技有限公司 一种jlcc图像传感器电路封装前的清洗工装及方法
CN110808219B (zh) * 2019-11-01 2021-05-14 江苏亚电科技有限公司 一种晶圆存放盒清洗装置及清洗方法
CN112191588B (zh) * 2020-09-18 2021-12-21 程瑶 太阳能发电板生产过程配用清洁机及清洗方法
KR102587371B1 (ko) * 2020-12-21 2023-10-12 주식회사 뉴파워 프라즈마 리프팅 커버 도어를 포함하는 글라스 세정 챔버, 이를 포함하는 글라스 화학 강화 설비, 및 초박형 글라스의 화학 강화 방법
CN115338173B (zh) * 2022-08-31 2023-09-26 浙江中科智谷光电科技有限公司 一种液晶模组加工用清洗设备以及控制方法
CN116037592A (zh) * 2022-12-27 2023-05-02 无锡亚电智能装备有限公司 晶圆盒晶圆篮清洗设备
CN117206242B (zh) * 2023-10-03 2024-08-13 上海芯畀科技有限公司 半自动离心式晶圆传送盒清洗机
CN117644074A (zh) * 2024-01-30 2024-03-05 深圳市龙图光罩股份有限公司 掩模版清洗方法、装置、终端设备以及存储介质

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4437479A (en) * 1981-12-30 1984-03-20 Atcor Decontamination apparatus for semiconductor wafer handling equipment
US4736759A (en) * 1986-02-21 1988-04-12 Robert A. Coberly Apparatus for cleaning rinsing and drying substrates
US5238503A (en) * 1991-04-09 1993-08-24 International Business Machines Corporation Device for decontaminating a semiconductor wafer container
US5363867A (en) * 1992-01-21 1994-11-15 Shinko Electric Co., Ltd. Article storage house in a clean room
US5301700A (en) * 1992-03-05 1994-04-12 Tokyo Electron Limited Washing system
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US5520205A (en) * 1994-07-01 1996-05-28 Texas Instruments Incorporated Apparatus for wafer cleaning with rotation
US6096100A (en) * 1997-12-12 2000-08-01 Texas Instruments Incorporated Method for processing wafers and cleaning wafer-handling implements
DE19740352A1 (de) * 1997-09-13 1999-03-18 Zf Frledrichshafen Aktiengesel Verfahren zum Montieren eines Lenkventils mit einer Zentriereinheit
US6248177B1 (en) * 1998-01-09 2001-06-19 Fluoroware, Inc. Method of cleaning a wafer carrier
US6412502B1 (en) * 1999-07-28 2002-07-02 Semitool, Inc. Wafer container cleaning system

Similar Documents

Publication Publication Date Title
JP2004535071A5 (enExample)
ES2371962T3 (es) Lavavajillas con un sistema para la pulverización de líquido de lavar y procedimiento para su funcionamiento.
WO2006138448A3 (en) Liquid adhesive dispensing system
CN111790560B (zh) 一种雾化系统
KR101381634B1 (ko) 다상유체 분사장치
CN109433484A (zh) 一种建筑施工用涂料喷涂装置
US20100186775A1 (en) Rotating cleaning system
CN209812918U (zh) 一种便于清洁的epe发泡机
CN207430322U (zh) 浸渍喷淋设备
CN101046043A (zh) 一种欠饱和洗涤液叠加的衣物喷雾的洗涤方法
JPH03186369A (ja) 薬液噴霧ノズル
KR100404046B1 (ko) 정제 코팅장치
JP3235431U (ja) モルタル吹付装置
WO2019037799A1 (zh) 一种喷头移动装置及带有该喷头移动装置的自动涂覆设备
KR200250877Y1 (ko) 정제 코팅장치
RU2482927C2 (ru) Распылитель жидкости
JPS5843260A (ja) 塗装ガン洗浄装置
JP2003320280A (ja) 薬液供給システム
SU1739936A1 (ru) Устройство дл многопоточного распределени и дозировани жидкостей
RU2095636C1 (ru) Устройство для получения потоков распыляемых жидкостей
RU2826660C1 (ru) Устройство для нанесения покрытий на гранулы сферической формы
CN216409522U (zh) 一种植物产品真空处理设备
CN220759610U (zh) 一种带分压冲洗功能的喷雾装置
CN112588465B (zh) 一种水产养殖喷药设备及操作方法
CN211532469U (zh) 一种绿化工程喷雾保湿装置