JP2004508559A - 回折シグニチャー分析による焦点の中心の決定 - Google Patents

回折シグニチャー分析による焦点の中心の決定 Download PDF

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Publication number
JP2004508559A
JP2004508559A JP2002525446A JP2002525446A JP2004508559A JP 2004508559 A JP2004508559 A JP 2004508559A JP 2002525446 A JP2002525446 A JP 2002525446A JP 2002525446 A JP2002525446 A JP 2002525446A JP 2004508559 A JP2004508559 A JP 2004508559A
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Prior art keywords
diffraction
focus
gratings
difference
measuring
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JP2002525446A
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Japanese (ja)
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JP2004508559A5 (enExample
Inventor
リッタウ，マイケル，ユージン
レイモンド，クリストファー，ジェイ．
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アクセント　オプティカル　テクノロジーズ，インク．
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Application filed by アクセント　オプティカル　テクノロジーズ，インク． filed Critical アクセント　オプティカル　テクノロジーズ，インク．
Publication of JP2004508559A publication Critical patent/JP2004508559A/ja
Publication of JP2004508559A5 publication Critical patent/JP2004508559A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
JP2002525446A 2000-09-06 2001-09-05 回折シグニチャー分析による焦点の中心の決定 Pending JP2004508559A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US23049100P 2000-09-06 2000-09-06
US09/946,104 US6429930B1 (en) 2000-09-06 2001-09-04 Determination of center of focus by diffraction signature analysis
PCT/US2001/027657 WO2002021075A1 (en) 2000-09-06 2001-09-05 Determination of center of focus by diffraction signature analysis

Publications (2)

Publication Number Publication Date
JP2004508559A true JP2004508559A (ja) 2004-03-18
JP2004508559A5 JP2004508559A5 (enExample) 2005-04-07

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JP2002525446A Pending JP2004508559A (ja) 2000-09-06 2001-09-05 回折シグニチャー分析による焦点の中心の決定

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US (2) US6429930B1 (enExample)
EP (1) EP1332330A4 (enExample)
JP (1) JP2004508559A (enExample)
KR (1) KR20030040446A (enExample)
AU (1) AU2002212958A1 (enExample)
IL (2) IL154763A0 (enExample)
WO (1) WO2002021075A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006515958A (ja) * 2003-01-17 2006-06-08 ケーエルエー−テンカー テクノロジィース コーポレイション ２以上の計測された散乱計測信号間の比較によるプロセス最適化および制御の方法
JP2006523039A (ja) * 2003-04-10 2006-10-05 アクセント オプティカル テクノロジーズ，インク． パラメータ変動性分析による焦点の中心の決定

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JP2006523039A (ja) * 2003-04-10 2006-10-05 アクセント オプティカル テクノロジーズ，インク． パラメータ変動性分析による焦点の中心の決定

Also Published As

Publication number Publication date
US6429930B1 (en) 2002-08-06
WO2002021075A1 (en) 2002-03-14
US6606152B2 (en) 2003-08-12
EP1332330A1 (en) 2003-08-06
KR20030040446A (ko) 2003-05-22
US20030002031A1 (en) 2003-01-02
EP1332330A4 (en) 2006-05-10
US20020041373A1 (en) 2002-04-11
IL154763A0 (en) 2003-10-31
AU2002212958A1 (en) 2002-03-22
IL154763A (en) 2006-12-10

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