JP2004502535A5 - - Google Patents

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Publication number
JP2004502535A5
JP2004502535A5 JP2002508580A JP2002508580A JP2004502535A5 JP 2004502535 A5 JP2004502535 A5 JP 2004502535A5 JP 2002508580 A JP2002508580 A JP 2002508580A JP 2002508580 A JP2002508580 A JP 2002508580A JP 2004502535 A5 JP2004502535 A5 JP 2004502535A5
Authority
JP
Japan
Prior art keywords
substrate
composition
dielectric
cured
precursor material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002508580A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004502535A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2001/021927 external-priority patent/WO2002004134A1/en
Publication of JP2004502535A publication Critical patent/JP2004502535A/ja
Publication of JP2004502535A5 publication Critical patent/JP2004502535A5/ja
Pending legal-status Critical Current

Links

JP2002508580A 2000-07-12 2001-07-11 マイクロエレクトロニックデバイスへの組込みに好適な低誘電率誘電体膜を形成する熱処理システムおよび方法 Pending JP2004502535A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US61474600A 2000-07-12 2000-07-12
PCT/US2001/021927 WO2002004134A1 (en) 2000-07-12 2001-07-11 Thermal processing system and methods for forming low-k dielectric films suitable for incorporation into microelectronic devices

Publications (2)

Publication Number Publication Date
JP2004502535A JP2004502535A (ja) 2004-01-29
JP2004502535A5 true JP2004502535A5 (https=) 2005-02-03

Family

ID=24462539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002508580A Pending JP2004502535A (ja) 2000-07-12 2001-07-11 マイクロエレクトロニックデバイスへの組込みに好適な低誘電率誘電体膜を形成する熱処理システムおよび方法

Country Status (2)

Country Link
JP (1) JP2004502535A (https=)
AU (1) AU2001270314A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130083940A (ko) * 2008-05-09 2013-07-23 티이엘 에프에스아이, 인코포레이티드 개방 동작 모드와 폐쇄 동작 모드사이를 용이하게 변경하는 처리실 설계를 이용하여 마이크로일렉트로닉 워크피이스를 처리하는 공구 및 방법
KR102721924B1 (ko) * 2021-07-12 2024-10-24 시바우라 메카트로닉스 가부시끼가이샤 유기막 형성 장치 및 유기막의 제조 방법

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