JP2004152902A - 位置決め装置 - Google Patents

位置決め装置 Download PDF

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Publication number
JP2004152902A
JP2004152902A JP2002314926A JP2002314926A JP2004152902A JP 2004152902 A JP2004152902 A JP 2004152902A JP 2002314926 A JP2002314926 A JP 2002314926A JP 2002314926 A JP2002314926 A JP 2002314926A JP 2004152902 A JP2004152902 A JP 2004152902A
Authority
JP
Japan
Prior art keywords
linear motor
gravity
reaction force
center
moving table
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002314926A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004152902A5 (cg-RX-API-DMAC7.html
Inventor
Tsuneo Takashima
常雄 高嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2002314926A priority Critical patent/JP2004152902A/ja
Priority to US10/694,083 priority patent/US6965426B2/en
Publication of JP2004152902A publication Critical patent/JP2004152902A/ja
Publication of JP2004152902A5 publication Critical patent/JP2004152902A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2002314926A 2002-10-29 2002-10-29 位置決め装置 Pending JP2004152902A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002314926A JP2004152902A (ja) 2002-10-29 2002-10-29 位置決め装置
US10/694,083 US6965426B2 (en) 2002-10-29 2003-10-28 Positioning system and exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002314926A JP2004152902A (ja) 2002-10-29 2002-10-29 位置決め装置

Publications (2)

Publication Number Publication Date
JP2004152902A true JP2004152902A (ja) 2004-05-27
JP2004152902A5 JP2004152902A5 (cg-RX-API-DMAC7.html) 2005-09-22

Family

ID=32459107

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002314926A Pending JP2004152902A (ja) 2002-10-29 2002-10-29 位置決め装置

Country Status (2)

Country Link
US (1) US6965426B2 (cg-RX-API-DMAC7.html)
JP (1) JP2004152902A (cg-RX-API-DMAC7.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7221433B2 (en) * 2004-01-28 2007-05-22 Nikon Corporation Stage assembly including a reaction assembly having a connector assembly
JP2005268268A (ja) * 2004-03-16 2005-09-29 Canon Inc 電子ビーム露光装置
JP4617119B2 (ja) * 2004-08-30 2011-01-19 キヤノン株式会社 駆動装置、露光装置及びデバイス製造方法
US7456935B2 (en) * 2005-04-05 2008-11-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table
US20070152391A1 (en) * 2005-12-29 2007-07-05 Chitayat Anwar K Error corrected positioning stage
CN110868007B (zh) * 2019-11-27 2020-12-01 大连佳峰自动化股份有限公司 一种直线电机的减振机构

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH066248B2 (ja) 1985-10-14 1994-01-26 オムロン株式会社 Ｘｙステ−ジ
US6151100A (en) * 1996-12-12 2000-11-21 Canon Kabushiki Kaisha Positioning system
JP3810039B2 (ja) * 1998-05-06 2006-08-16 キヤノン株式会社 ステージ装置
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
US6958808B2 (en) * 2000-11-16 2005-10-25 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly

Also Published As

Publication number Publication date
US6965426B2 (en) 2005-11-15
US20040145715A1 (en) 2004-07-29

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