JP2004146492A5 - - Google Patents

Download PDF

Info

Publication number
JP2004146492A5
JP2004146492A5 JP2002308058A JP2002308058A JP2004146492A5 JP 2004146492 A5 JP2004146492 A5 JP 2004146492A5 JP 2002308058 A JP2002308058 A JP 2002308058A JP 2002308058 A JP2002308058 A JP 2002308058A JP 2004146492 A5 JP2004146492 A5 JP 2004146492A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2002308058A
Other versions
JP2004146492A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002308058A priority Critical patent/JP2004146492A/ja
Priority claimed from JP2002308058A external-priority patent/JP2004146492A/ja
Priority to US10/674,359 priority patent/US20040080727A1/en
Publication of JP2004146492A publication Critical patent/JP2004146492A/ja
Priority to US11/138,567 priority patent/US7282821B2/en
Publication of JP2004146492A5 publication Critical patent/JP2004146492A5/ja
Withdrawn legal-status Critical Current

Links

JP2002308058A 2002-01-28 2002-10-23 Ｅｕｖ露光装置 Withdrawn JP2004146492A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002308058A JP2004146492A (ja) 2002-10-23 2002-10-23 Ｅｕｖ露光装置
US10/674,359 US20040080727A1 (en) 2002-10-23 2003-10-01 EUV exposure apparatus with cooling device to prevent overheat of electromagnetic motor in vacuum
US11/138,567 US7282821B2 (en) 2002-01-28 2005-05-27 Linear motor, stage apparatus, exposure apparatus, and device manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002308058A JP2004146492A (ja) 2002-10-23 2002-10-23 Ｅｕｖ露光装置

Publications (2)

Publication Number Publication Date
JP2004146492A JP2004146492A (ja) 2004-05-20
JP2004146492A5 true JP2004146492A5 (ja) 2006-11-09

Family

ID=32105228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002308058A Withdrawn JP2004146492A (ja) 2002-01-28 2002-10-23 Ｅｕｖ露光装置

Country Status (2)

Country Link
US (1) US20040080727A1 (ja)
JP (1) JP2004146492A (ja)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004228473A (ja) * 2003-01-27 2004-08-12 Canon Inc 移動ステージ装置
JP4266713B2 (ja) * 2003-06-03 2009-05-20 キヤノン株式会社 位置決め装置及び露光装置
JP3748559B2 (ja) * 2003-06-30 2006-02-22 キヤノン株式会社 ステージ装置、露光装置、荷電ビーム描画装置、デバイス製造方法、基板電位測定方法及び静電チャック
JP3894562B2 (ja) * 2003-10-01 2007-03-22 キヤノン株式会社 基板吸着装置、露光装置およびデバイス製造方法
JP3814598B2 (ja) * 2003-10-02 2006-08-30 キヤノン株式会社 温度調整装置、露光装置及びデバイス製造方法
JP4418699B2 (ja) * 2004-03-24 2010-02-17 キヤノン株式会社 露光装置
CN100444023C (zh) * 2004-10-14 2008-12-17 中国科学院电工研究所 极紫外光刻精密磁悬浮工件台
US7420299B2 (en) * 2006-08-25 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4531737B2 (ja) * 2006-11-07 2010-08-25 住友重機械工業株式会社 型締装置
JP5495547B2 (ja) * 2008-12-25 2014-05-21 キヤノン株式会社 処理装置、およびデバイス製造方法
JP5137218B1 (ja) * 2011-08-30 2013-02-06 株式会社ソディック 工作機械
CN104122759A (zh) * 2014-04-28 2014-10-29 清华大学 一种平面电动机驱动的磁悬浮粗微动一体掩模台
JP7271323B2 (ja) * 2018-06-12 2023-05-11 キヤノン株式会社 リニアモータ、搬送装置、及び生産装置
US10629403B1 (en) 2018-09-28 2020-04-21 Varex Imaging Corporation Magnetic assist bearing
US10636612B2 (en) 2018-09-28 2020-04-28 Varex Imaging Corporation Magnetic assist assembly having heat dissipation
US10672585B2 (en) 2018-09-28 2020-06-02 Varex Imaging Corporation Vacuum penetration for magnetic assist bearing
CN111948906A (zh) * 2019-05-16 2020-11-17 上海微电子装备（集团）股份有限公司 一种光刻机双工件台及其驱动方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6084319A (en) * 1996-10-16 2000-07-04 Canon Kabushiki Kaisha Linear motor, and stage device and exposure apparatus provided with the same
AU1053199A (en) * 1997-11-14 1999-06-07 Nikon Corporation Exposure apparatus and method of manufacturing the same, and exposure method
JPH11307430A (ja) * 1998-04-23 1999-11-05 Canon Inc 露光装置およびデバイス製造方法ならびに駆動装置
TWI233535B (en) * 1999-04-19 2005-06-01 Asml Netherlands Bv Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses
TWI264617B (en) * 1999-12-21 2006-10-21 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
JP3870002B2 (ja) * 2000-04-07 2007-01-17 キヤノン株式会社 露光装置
JP4383626B2 (ja) * 2000-04-13 2009-12-16 キヤノン株式会社 位置決め装置および露光装置
DE50114723D1 (de) * 2000-09-15 2009-04-09 Vistec Electron Beam Gmbh Sechsachsiges Positioniersystem mit magnetfeldfreiem Raum
US20020075467A1 (en) * 2000-12-20 2002-06-20 Nikon Corporation Exposure apparatus and method
JP4724297B2 (ja) * 2000-12-26 2011-07-13 キヤノン株式会社 露光装置、デバイス製造方法
EP1276016B1 (en) * 2001-07-09 2009-06-10 Canon Kabushiki Kaisha Exposure apparatus
JP4745556B2 (ja) * 2001-08-20 2011-08-10 キヤノン株式会社 位置決め装置、露光装置、及びデバイス製造方法
JP3809381B2 (ja) * 2002-01-28 2006-08-16 キヤノン株式会社 リニアモータ、ステージ装置、露光装置及びデバイス製造方法

Similar Documents

Publication Publication Date Title
BE2019C547I2 (ja)
BE2019C510I2 (ja)
BE2018C021I2 (ja)
BE2017C049I2 (ja)
BE2017C005I2 (ja)
BE2016C069I2 (ja)
BE2016C040I2 (ja)
BE2016C013I2 (ja)
BE2018C018I2 (ja)
BE2016C002I2 (ja)
BE2015C078I2 (ja)
BE2015C017I2 (ja)
BE2014C053I2 (ja)
BE2014C051I2 (ja)
BE2014C041I2 (ja)
BE2014C030I2 (ja)
BE2014C016I2 (ja)
BE2014C015I2 (ja)
BE2013C063I2 (ja)
BE2013C039I2 (ja)
BE2011C038I2 (ja)
BRPI0302144A2 (ja)
BRPI0215435A2 (ja)
BE2013C046I2 (ja)
JP2003114830A5 (ja)