JP2004127853A5 - - Google Patents

Download PDF

Info

Publication number
JP2004127853A5
JP2004127853A5 JP2002294127A JP2002294127A JP2004127853A5 JP 2004127853 A5 JP2004127853 A5 JP 2004127853A5 JP 2002294127 A JP2002294127 A JP 2002294127A JP 2002294127 A JP2002294127 A JP 2002294127A JP 2004127853 A5 JP2004127853 A5 JP 2004127853A5
Authority
JP
Japan
Prior art keywords
electrode
dielectric
plasma
treatment apparatus
surface treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002294127A
Other languages
English (en)
Japanese (ja)
Other versions
JP3723794B2 (ja
JP2004127853A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002294127A priority Critical patent/JP3723794B2/ja
Priority claimed from JP2002294127A external-priority patent/JP3723794B2/ja
Publication of JP2004127853A publication Critical patent/JP2004127853A/ja
Publication of JP2004127853A5 publication Critical patent/JP2004127853A5/ja
Application granted granted Critical
Publication of JP3723794B2 publication Critical patent/JP3723794B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2002294127A 2002-10-07 2002-10-07 プラズマ表面処理装置の電極構造 Expired - Fee Related JP3723794B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002294127A JP3723794B2 (ja) 2002-10-07 2002-10-07 プラズマ表面処理装置の電極構造

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002294127A JP3723794B2 (ja) 2002-10-07 2002-10-07 プラズマ表面処理装置の電極構造

Publications (3)

Publication Number Publication Date
JP2004127853A JP2004127853A (ja) 2004-04-22
JP2004127853A5 true JP2004127853A5 (https=) 2005-08-11
JP3723794B2 JP3723794B2 (ja) 2005-12-07

Family

ID=32284818

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002294127A Expired - Fee Related JP3723794B2 (ja) 2002-10-07 2002-10-07 プラズマ表面処理装置の電極構造

Country Status (1)

Country Link
JP (1) JP3723794B2 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4398330B2 (ja) * 2004-09-02 2010-01-13 株式会社イー・スクエア プラズマ表面処理装置
US20060054279A1 (en) * 2004-09-10 2006-03-16 Yunsang Kim Apparatus for the optimization of atmospheric plasma in a processing system
JP4968883B2 (ja) * 2006-03-30 2012-07-04 日本碍子株式会社 リモート式プラズマ処理装置
JP2008277774A (ja) * 2007-04-03 2008-11-13 Sekisui Chem Co Ltd プラズマ処理装置
KR101534130B1 (ko) * 2008-09-05 2015-07-07 주성엔지니어링(주) 금속 산화물 증착 장치
JP5121652B2 (ja) * 2008-09-29 2013-01-16 積水化学工業株式会社 表面処理用ノズル装置
JP4540731B2 (ja) * 2008-09-29 2010-09-08 積水化学工業株式会社 表面処理用ノズル装置
JP2011134871A (ja) * 2009-12-24 2011-07-07 Shin Etsu Handotai Co Ltd エピタキシャル成長装置及びエピタキシャル成長装置の製造方法
JP5771372B2 (ja) * 2010-08-02 2015-08-26 株式会社アルバック プラズマ処理装置及び前処理方法
JP5413421B2 (ja) * 2011-08-10 2014-02-12 パナソニック株式会社 誘導結合型プラズマ処理装置及び方法
EP2960358A1 (en) * 2014-06-25 2015-12-30 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Plasma source and surface treatment method
US10665460B2 (en) 2016-09-05 2020-05-26 Shin-Etsu Handotai Co., Ltd. Vapor phase growth apparatus, method of manufacturing epitaxial wafer, and attachment for vapor phase growth apparatus
JP6421962B1 (ja) * 2017-08-09 2018-11-14 春日電機株式会社 表面改質装置
NL2032061B1 (en) * 2022-06-02 2023-12-14 Sparknano B V Plasma source and apparatus for atomic layer deposition

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6319571U (https=) * 1986-07-23 1988-02-09
JP2537304B2 (ja) * 1989-12-07 1996-09-25 新技術事業団 大気圧プラズマ反応方法とその装置
JP2595744Y2 (ja) * 1992-05-12 1999-06-02 宮城沖電気株式会社 半導体製造装置
JP3147137B2 (ja) * 1993-05-14 2001-03-19 セイコーエプソン株式会社 表面処理方法及びその装置、半導体装置の製造方法及びその装置、並びに液晶ディスプレイの製造方法
JPH0762546A (ja) * 1993-08-25 1995-03-07 Shinko Electric Co Ltd 大気圧プラズマ表面処理装置
JP3653824B2 (ja) * 1995-09-22 2005-06-02 セイコーエプソン株式会社 表面処理装置
US6502530B1 (en) * 2000-04-26 2003-01-07 Unaxis Balzers Aktiengesellschaft Design of gas injection for the electrode in a capacitively coupled RF plasma reactor
JP2002176050A (ja) * 2000-12-05 2002-06-21 Sekisui Chem Co Ltd 酸化珪素膜の形成方法及びその装置

Similar Documents

Publication Publication Date Title
JP2004127853A5 (https=)
JP2002289583A5 (https=)
JP2005509260A5 (https=)
DE60305890D1 (de) Tangentialschneideinsatz und schneideinsatzhalter
EA200401343A1 (ru) Плазменный агрегат, работающий при атмосферном давлении
EP2261393A3 (en) Plasma uniformity control by gas diffuser hole design
ES2190072T3 (es) Procedimiento de fabricacion de una estructura alveolar de material termofusible, y dispositivo para la realizacion de este procedimiento.
WO2007115309A3 (en) Apparatus and method for treating a workpiece with ionizing gas plasma
DE602008005243D1 (de) Abgasbehandlungsvorrichtung
DE69107705D1 (de) Elektrode zum Gebrauch im Plasmalichtbogenbrenner.
BRPI0515321A (pt) peneira e elemento de peneira
JP3723794B2 (ja) プラズマ表面処理装置の電極構造
JP2003264169A5 (https=)
JP2016066517A5 (https=)
MY141848A (en) Static eliminator and a static eliminating method for an insulating sheet, a method for producing an insulating sheet, and an insulating sheet
JP2009070707A5 (https=)
TWI670304B (zh) 表面改質裝置
TW200518231A (en) Rapid thermal processing system
Preisser et al. Vacuum carburizing with high pressure gas quenching--the process
ATE371516T1 (de) Unterpulver-schweissverfahren
TWM499992U (zh) 吸附工作台
CA3297999A1 (en) Active material particles, processes thereof, and apparatuses useful in the manufacture thereof
Kostadinov Peculiarities in Forming in Combined Processing Through Plastic Surface Deformation
JP2008159593A5 (https=)
TW200620374A (en) Plasma electrode structure, plasma source and plasma processing apparatus using it and manufacturing method for plasma electrode, manufacturing method for plasma source, and method for controlling at the same