JP2004119782A5 - - Google Patents

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Publication number
JP2004119782A5
JP2004119782A5 JP2002282596A JP2002282596A JP2004119782A5 JP 2004119782 A5 JP2004119782 A5 JP 2004119782A5 JP 2002282596 A JP2002282596 A JP 2002282596A JP 2002282596 A JP2002282596 A JP 2002282596A JP 2004119782 A5 JP2004119782 A5 JP 2004119782A5
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JP
Japan
Prior art keywords
semiconductor wafer
film
manufacturing
semiconductor device
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002282596A
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English (en)
Japanese (ja)
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JP2004119782A (ja
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Publication date
Application filed filed Critical
Priority to JP2002282596A priority Critical patent/JP2004119782A/ja
Priority claimed from JP2002282596A external-priority patent/JP2004119782A/ja
Publication of JP2004119782A publication Critical patent/JP2004119782A/ja
Publication of JP2004119782A5 publication Critical patent/JP2004119782A5/ja
Pending legal-status Critical Current

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JP2002282596A 2002-09-27 2002-09-27 半導体装置の製造方法 Pending JP2004119782A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002282596A JP2004119782A (ja) 2002-09-27 2002-09-27 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002282596A JP2004119782A (ja) 2002-09-27 2002-09-27 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2004119782A JP2004119782A (ja) 2004-04-15
JP2004119782A5 true JP2004119782A5 (enExample) 2005-07-21

Family

ID=32276705

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002282596A Pending JP2004119782A (ja) 2002-09-27 2002-09-27 半導体装置の製造方法

Country Status (1)

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JP (1) JP2004119782A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5904169B2 (ja) * 2013-07-23 2016-04-13 東京エレクトロン株式会社 基板洗浄装置、基板洗浄方法及び記憶媒体
CN105006424B (zh) * 2015-07-29 2018-01-26 上海集成电路研发中心有限公司 单片式湿法清洗方法
JP6562508B2 (ja) * 2015-09-28 2019-08-21 株式会社Ｓｃｒｅｅｎホールディングス 基板保持装置

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