JP2004101819A5 - - Google Patents
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- Publication number
- JP2004101819A5 JP2004101819A5 JP2002262880A JP2002262880A JP2004101819A5 JP 2004101819 A5 JP2004101819 A5 JP 2004101819A5 JP 2002262880 A JP2002262880 A JP 2002262880A JP 2002262880 A JP2002262880 A JP 2002262880A JP 2004101819 A5 JP2004101819 A5 JP 2004101819A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- groups
- acid
- negative resist
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000002253 acid Substances 0.000 claims 9
- 125000000217 alkyl group Chemical group 0.000 claims 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 9
- 229920002120 photoresistant polymer Polymers 0.000 claims 8
- 125000003118 aryl group Chemical group 0.000 claims 7
- 125000003710 aryl alkyl group Chemical group 0.000 claims 6
- 150000001875 compounds Chemical class 0.000 claims 5
- 125000002947 alkylene group Chemical group 0.000 claims 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims 3
- 125000005843 halogen group Chemical group 0.000 claims 3
- 239000011347 resin Substances 0.000 claims 3
- 229920005989 resin Polymers 0.000 claims 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 125000002252 acyl group Chemical group 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 125000004450 alkenylene group Chemical group 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 150000001450 anions Chemical class 0.000 claims 2
- 125000000732 arylene group Chemical group 0.000 claims 2
- 239000003431 cross linking reagent Substances 0.000 claims 2
- 125000004093 cyano group Chemical group *C#N 0.000 claims 2
- 238000010894 electron beam technology Methods 0.000 claims 2
- 125000000623 heterocyclic group Chemical group 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 125000004423 acyloxy group Chemical group 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000004849 alkoxymethyl group Chemical group 0.000 claims 1
- 125000003368 amide group Chemical group 0.000 claims 1
- ILFFFKFZHRGICY-UHFFFAOYSA-N anthracene-1-sulfonic acid Chemical compound C1=CC=C2C=C3C(S(=O)(=O)O)=CC=CC3=CC2=C1 ILFFFKFZHRGICY-UHFFFAOYSA-N 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims 1
- 229940092714 benzenesulfonic acid Drugs 0.000 claims 1
- 125000001951 carbamoylamino group Chemical group C(N)(=O)N* 0.000 claims 1
- 125000002993 cycloalkylene group Chemical group 0.000 claims 1
- 125000004185 ester group Chemical group 0.000 claims 1
- 125000001033 ether group Chemical group 0.000 claims 1
- 125000001188 haloalkyl group Chemical group 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 125000005429 oxyalkyl group Chemical group 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 150000002989 phenols Chemical class 0.000 claims 1
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 claims 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 1
- -1 sulfonyloxy groups Chemical group 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002262880A JP4079729B2 (ja) | 2002-09-09 | 2002-09-09 | ネガ型レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002262880A JP4079729B2 (ja) | 2002-09-09 | 2002-09-09 | ネガ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004101819A JP2004101819A (ja) | 2004-04-02 |
| JP2004101819A5 true JP2004101819A5 (enExample) | 2005-09-22 |
| JP4079729B2 JP4079729B2 (ja) | 2008-04-23 |
Family
ID=32262803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002262880A Expired - Lifetime JP4079729B2 (ja) | 2002-09-09 | 2002-09-09 | ネガ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4079729B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010271686A (ja) * | 2009-04-24 | 2010-12-02 | Jsr Corp | 感放射線性樹脂組成物 |
| JP5472072B2 (ja) * | 2010-01-13 | 2014-04-16 | 信越化学工業株式会社 | ネガ型レジスト組成物及びパターン形成方法 |
| JP5453358B2 (ja) * | 2011-07-26 | 2014-03-26 | 富士フイルム株式会社 | 化学増幅型レジスト組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク |
| US9650357B2 (en) | 2013-06-24 | 2017-05-16 | Toyo Gosei Co., Ltd. | Reagent for enhancing generation of chemical species |
| WO2016121535A1 (ja) * | 2015-01-27 | 2016-08-04 | 富士フイルム株式会社 | 感放射線性又は感活性光線性組成物、並びに、それを用いた膜、マスクブランクス、レジストパターン形成方法、及び電子デバイスの製造方法 |
| TW201940967A (zh) * | 2018-01-31 | 2019-10-16 | 日商三菱瓦斯化學股份有限公司 | 組成物，以及阻劑圖型之形成方法及絕緣膜之形成方法 |
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2002
- 2002-09-09 JP JP2002262880A patent/JP4079729B2/ja not_active Expired - Lifetime