JP2004101194A5 - - Google Patents

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Publication number
JP2004101194A5
JP2004101194A5 JP2002259166A JP2002259166A JP2004101194A5 JP 2004101194 A5 JP2004101194 A5 JP 2004101194A5 JP 2002259166 A JP2002259166 A JP 2002259166A JP 2002259166 A JP2002259166 A JP 2002259166A JP 2004101194 A5 JP2004101194 A5 JP 2004101194A5
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Japan
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light
subject
optical
transmitted
reflected
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JP2002259166A
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Japanese (ja)
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JP2004101194A (ja
JP3762952B2 (ja
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Publication of JP2004101194A5 publication Critical patent/JP2004101194A5/ja
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JP2002259166A 2002-09-04 2002-09-04 光学装置並びにそれを用いた画像測定装置及び検査装置 Expired - Fee Related JP3762952B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002259166A JP3762952B2 (ja) 2002-09-04 2002-09-04 光学装置並びにそれを用いた画像測定装置及び検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002259166A JP3762952B2 (ja) 2002-09-04 2002-09-04 光学装置並びにそれを用いた画像測定装置及び検査装置

Publications (3)

Publication Number Publication Date
JP2004101194A JP2004101194A (ja) 2004-04-02
JP2004101194A5 true JP2004101194A5 (https=) 2005-10-06
JP3762952B2 JP3762952B2 (ja) 2006-04-05

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JP2002259166A Expired - Fee Related JP3762952B2 (ja) 2002-09-04 2002-09-04 光学装置並びにそれを用いた画像測定装置及び検査装置

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JP (1) JP3762952B2 (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4487042B2 (ja) * 2003-12-16 2010-06-23 レーザーテック株式会社 光学装置、検査装置及び検査方法
US20060033909A1 (en) * 2004-07-23 2006-02-16 Bowers Gerald M Reticle particle calibration standards
FR2902877B1 (fr) * 2006-06-22 2008-09-12 Centre Nat Rech Scient Procede de caracterisation de l'anisotropie d'un milieu diffusant et dispositif pour la mise en oeuvre d'un tel procede
KR101114362B1 (ko) * 2009-03-09 2012-02-14 주식회사 쓰리비 시스템 결점검사를 위한 검사장치
KR101074101B1 (ko) 2009-05-27 2011-10-17 주식회사 고영테크놀러지 결상 광학 시스템
JP2011085569A (ja) 2009-09-15 2011-04-28 Toshiba Corp パターン検査装置およびパターン検査方法
TW201132963A (en) * 2010-02-08 2011-10-01 Sumitomo Chemical Co An inspection method for defect in a liquid crystal panel laminated with polarizing plates
JP5556212B2 (ja) * 2010-02-08 2014-07-23 住友化学株式会社 偏光板を貼合した液晶パネルの欠陥検査方法
KR101268300B1 (ko) 2011-04-11 2013-05-28 갤럭시아포토닉스 주식회사 광학 측정장치
JP2013073021A (ja) * 2011-09-28 2013-04-22 Fujifilm Corp 潜像を有する物品
JP2013142635A (ja) * 2012-01-11 2013-07-22 Sumitomo Chemical Co Ltd 検査装置及び光学部材貼合体の製造装置
KR20130125631A (ko) * 2012-05-09 2013-11-19 주식회사 탑 엔지니어링 액정 적하 상태 검사 장치, 및 이를 구비한 액정 디스펜서
WO2014174574A1 (ja) * 2013-04-22 2014-10-30 株式会社島津製作所 材料試験装置、並びに、それに用いられる試験片保持具及び検査方法
JP6056692B2 (ja) * 2013-07-16 2017-01-11 株式会社デンソー 検査装置
WO2016090311A1 (en) * 2014-12-05 2016-06-09 Kla-Tencor Corporation Apparatus, method and computer program product for defect detection in work pieces
KR101608942B1 (ko) * 2015-12-08 2016-04-20 홍예은 재귀반사시트를 이용한 광학 현미경 및 이의 동작 방법
KR102707189B1 (ko) * 2017-09-13 2024-09-13 스미또모 가가꾸 가부시키가이샤 결함 검사 장치, 결함 검사 방법, 원 편광판 또는 타원 편광판의 제조 방법 및 위상차판의 제조 방법
JP7105150B2 (ja) * 2018-04-12 2022-07-22 浜松ホトニクス株式会社 非接触分光測定装置および非接触分光測定方法
EP3803494A1 (de) * 2018-06-04 2021-04-14 JENOPTIK Optical Systems GmbH Mikroskop und verfahren zum aufnehmen eines mikroskopischen bildes und verwendung eines plattenförmigen reflektors
CN110285948B (zh) * 2019-06-10 2022-04-01 北京航天计量测试技术研究所 一种回归反光球光学球心瞄准装置及其瞄准方法
CN113391459B (zh) * 2021-04-28 2022-08-05 北京邮电大学 基于折返悬浮器件阵列的悬浮三维显示设备

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