JP2004068159A5 - - Google Patents
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- Publication number
- JP2004068159A5 JP2004068159A5 JP2003288821A JP2003288821A JP2004068159A5 JP 2004068159 A5 JP2004068159 A5 JP 2004068159A5 JP 2003288821 A JP2003288821 A JP 2003288821A JP 2003288821 A JP2003288821 A JP 2003288821A JP 2004068159 A5 JP2004068159 A5 JP 2004068159A5
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- JP
- Japan
- Prior art keywords
- layer
- range
- organic
- deposition
- inorganic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 claims 36
- 239000010410 layer Substances 0.000 claims 35
- 238000000151 deposition Methods 0.000 claims 17
- 230000008021 deposition Effects 0.000 claims 12
- 230000004888 barrier function Effects 0.000 claims 10
- 239000002131 composite material Substances 0.000 claims 9
- 239000011248 coating agent Substances 0.000 claims 8
- 238000000576 coating method Methods 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 8
- 230000001737 promoting effect Effects 0.000 claims 7
- 239000012044 organic layer Substances 0.000 claims 5
- 239000007789 gas Substances 0.000 claims 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims 4
- 239000002243 precursor Substances 0.000 claims 4
- 230000007704 transition Effects 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 3
- 230000008569 process Effects 0.000 claims 3
- 230000009471 action Effects 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 230000006872 improvement Effects 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 230000008859 change Effects 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 239000011247 coating layer Substances 0.000 claims 1
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 claims 1
- 229910010272 inorganic material Inorganic materials 0.000 claims 1
- 239000011147 inorganic material Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 150000002894 organic compounds Chemical class 0.000 claims 1
- 239000011368 organic material Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2002/008853 WO2003014415A1 (de) | 2001-08-07 | 2002-08-07 | Verbundmaterial aus einem substratmaterial und einem barriereschichtmaterial |
| DE10258678A DE10258678B4 (de) | 2002-12-13 | 2002-12-13 | Schnelles Verfahren zur Herstellung von Multilayer-Barriereschichten |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004068159A JP2004068159A (ja) | 2004-03-04 |
| JP2004068159A5 true JP2004068159A5 (https=) | 2005-05-26 |
| JP4426790B2 JP4426790B2 (ja) | 2010-03-03 |
Family
ID=32031495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003288821A Expired - Lifetime JP4426790B2 (ja) | 2002-08-07 | 2003-08-07 | 多層バリヤ層を作製するための高速処理法 |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP1388593B1 (https=) |
| JP (1) | JP4426790B2 (https=) |
| CN (1) | CN100381606C (https=) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004017236B4 (de) * | 2004-04-05 | 2012-10-25 | Schott Ag | Verbundmaterial mit verbesserter chemischer Beständigkeit und Verfahren zu dessen Herstellung |
| DE102004028369B4 (de) * | 2004-06-11 | 2007-05-31 | Schott Ag | Verfahren und Vorrichtung zum Behandeln von Substraten in einer Rundläuferanlage |
| JP2006089073A (ja) * | 2004-09-22 | 2006-04-06 | Hokkai Can Co Ltd | 内面被覆プラスチック容器及びその製造方法 |
| DE102004061464B4 (de) * | 2004-12-17 | 2008-12-11 | Schott Ag | Substrat mit feinlaminarer Barriereschutzschicht und Verfahren zu dessen Herstellung |
| EP1852522B1 (en) * | 2005-02-22 | 2013-04-24 | Toyo Seikan Kaisha, Ltd. | Vapor deposited film by plasma cvd method |
| US20090130463A1 (en) * | 2005-10-05 | 2009-05-21 | John Dean Albaugh | Coated Substrates and Methods for their Preparation |
| JP5159422B2 (ja) * | 2008-05-15 | 2013-03-06 | 北海製罐株式会社 | ポリエステル樹脂製容器 |
| PT2251454E (pt) | 2009-05-13 | 2014-10-01 | Sio2 Medical Products Inc | Revestimento e inspeção de vaso |
| EP2539475B1 (en) * | 2010-02-24 | 2019-09-11 | Belenos Clean Power Holding AG | Self-monitoring composite vessel for high pressure media |
| US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
| DE102010048960A1 (de) * | 2010-10-18 | 2012-04-19 | Khs Corpoplast Gmbh | Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken |
| US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
| DE102010063887B4 (de) * | 2010-12-22 | 2012-07-19 | BSH Bosch und Siemens Hausgeräte GmbH | Verfahren zum Herstellen eines pyrolysetauglichen Bauteils eines Gargeräts sowie pyrolysetaugliches Bauteil für ein Gargerät |
| DE102011005234A1 (de) | 2011-03-08 | 2012-09-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasbarriereschichtsystem |
| US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
| CA2855353C (en) | 2011-11-11 | 2021-01-19 | Sio2 Medical Products, Inc. | Passivation, ph protective or lubricity coating for pharmaceutical package, coating process and apparatus |
| US20140012115A1 (en) * | 2012-07-03 | 2014-01-09 | Medtronic Minimed, Inc. | Plasma deposited adhesion promoter layers for use with analyte sensors |
| US20150297800A1 (en) | 2012-07-03 | 2015-10-22 | Sio2 Medical Products, Inc. | SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS |
| US9664626B2 (en) | 2012-11-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Coating inspection method |
| WO2014078666A1 (en) | 2012-11-16 | 2014-05-22 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
| US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
| AU2013352436B2 (en) | 2012-11-30 | 2018-10-25 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like |
| US9662450B2 (en) | 2013-03-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
| US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
| CN105392916B (zh) | 2013-03-11 | 2019-03-08 | Sio2医药产品公司 | 涂布包装材料 |
| EP2971227B1 (en) | 2013-03-15 | 2017-11-15 | Si02 Medical Products, Inc. | Coating method. |
| CN104752633A (zh) * | 2013-12-31 | 2015-07-01 | 中国科学院微电子研究所 | 一种薄膜封装方法 |
| WO2015148471A1 (en) | 2014-03-28 | 2015-10-01 | Sio2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
| KR102786617B1 (ko) | 2015-08-18 | 2025-03-26 | 에스아이오2 메디컬 프로덕츠, 엘엘씨 | 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기 |
| CN110195218A (zh) * | 2019-05-20 | 2019-09-03 | 何金宁 | 一种微波cvd纳米防水复合工艺 |
| KR20220133815A (ko) * | 2021-03-25 | 2022-10-05 | 쇼오트 아게 | 코팅된 유리 부재 |
| CN117402392A (zh) * | 2022-07-08 | 2024-01-16 | 国家能源投资集团有限责任公司 | 一种适用于原子层沉积工艺的复合膜及其制备方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5009920A (en) * | 1990-03-30 | 1991-04-23 | Honeywell Inc. | Method for applying optical interference coating |
| DE4239234A1 (de) * | 1992-11-21 | 1994-06-09 | Krupp Widia Gmbh | Werkzeug und Verfahren zur Beschichtung eines Werkzeuggrundkörpers |
| FR2703073B1 (fr) * | 1993-03-26 | 1995-05-05 | Lorraine Laminage | Procédé et dispositif pour le revêtement en continu d'un matériau métallique en défilement par un dépôt de polymère à gradient de composition, et produit obtenu par ce procédé. |
| FR2730990B1 (fr) * | 1995-02-23 | 1997-04-04 | Saint Gobain Vitrage | Substrat transparent a revetement anti-reflets |
| DE69628441T2 (de) * | 1995-10-13 | 2004-04-29 | Dow Global Technologies, Inc., Midland | Verfahren zur herstellung von beschichteten kunststoffoberflächen |
| DE19634795C2 (de) * | 1996-08-29 | 1999-11-04 | Schott Glas | Plasma-CVD-Anlage mit einem Array von Mikrowellen-Plasmaelektroden und Plasma-CVD-Verfahren |
| CN1298963A (zh) * | 1999-12-09 | 2001-06-13 | 中国科学技术大学 | 金属氧化物或合金薄膜的化学气相淀积方法及装置 |
| CA2409282A1 (en) * | 2000-06-06 | 2001-12-13 | Ing-Feng Hu | Barrier layer for polymers and containers |
| FR2812666B1 (fr) * | 2000-08-01 | 2003-08-08 | Sidel Sa | Revetement barriere comportant une couche protectrice, procede d'obtention d'un tel revetement et recipient muni d'un tel revetement |
-
2003
- 2003-07-28 EP EP03017033.6A patent/EP1388593B1/de not_active Expired - Lifetime
- 2003-08-07 CN CNB031275567A patent/CN100381606C/zh not_active Expired - Lifetime
- 2003-08-07 JP JP2003288821A patent/JP4426790B2/ja not_active Expired - Lifetime
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