JP2004068159A5 - - Google Patents
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- Publication number
- JP2004068159A5 JP2004068159A5 JP2003288821A JP2003288821A JP2004068159A5 JP 2004068159 A5 JP2004068159 A5 JP 2004068159A5 JP 2003288821 A JP2003288821 A JP 2003288821A JP 2003288821 A JP2003288821 A JP 2003288821A JP 2004068159 A5 JP2004068159 A5 JP 2004068159A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- range
- organic
- deposition
- inorganic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 36
- 239000010410 layer Substances 0.000 claims 35
- 238000000151 deposition Methods 0.000 claims 17
- 230000008021 deposition Effects 0.000 claims 12
- 230000004888 barrier function Effects 0.000 claims 10
- 239000002131 composite material Substances 0.000 claims 9
- 239000011248 coating agent Substances 0.000 claims 8
- 238000000576 coating method Methods 0.000 claims 8
- 239000000758 substrate Substances 0.000 claims 8
- 230000001737 promoting effect Effects 0.000 claims 7
- 239000012044 organic layer Substances 0.000 claims 5
- 239000007789 gas Substances 0.000 claims 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims 4
- 239000002243 precursor Substances 0.000 claims 4
- 230000007704 transition Effects 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 3
- 230000008569 process Effects 0.000 claims 3
- 230000009471 action Effects 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 230000006872 improvement Effects 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 230000008859 change Effects 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 239000011247 coating layer Substances 0.000 claims 1
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000009792 diffusion process Methods 0.000 claims 1
- 229910010272 inorganic material Inorganic materials 0.000 claims 1
- 239000011147 inorganic material Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 150000002894 organic compounds Chemical class 0.000 claims 1
- 239000011368 organic material Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2002/008853 WO2003014415A1 (de) | 2001-08-07 | 2002-08-07 | Verbundmaterial aus einem substratmaterial und einem barriereschichtmaterial |
| DE10258678A DE10258678B4 (de) | 2002-12-13 | 2002-12-13 | Schnelles Verfahren zur Herstellung von Multilayer-Barriereschichten |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004068159A JP2004068159A (ja) | 2004-03-04 |
| JP2004068159A5 true JP2004068159A5 (https=) | 2005-05-26 |
| JP4426790B2 JP4426790B2 (ja) | 2010-03-03 |
Family
ID=32031495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003288821A Expired - Lifetime JP4426790B2 (ja) | 2002-08-07 | 2003-08-07 | 多層バリヤ層を作製するための高速処理法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4426790B2 (https=) |
| CN (1) | CN100381606C (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004017236B4 (de) * | 2004-04-05 | 2012-10-25 | Schott Ag | Verbundmaterial mit verbesserter chemischer Beständigkeit und Verfahren zu dessen Herstellung |
| JP2006089073A (ja) * | 2004-09-22 | 2006-04-06 | Hokkai Can Co Ltd | 内面被覆プラスチック容器及びその製造方法 |
| JP5159422B2 (ja) * | 2008-05-15 | 2013-03-06 | 北海製罐株式会社 | ポリエステル樹脂製容器 |
| CN102770574B (zh) * | 2010-02-24 | 2016-03-09 | 贝伦诺斯清洁电力控股有限公司 | 用于高压介质的自监测复合容器 |
| DE102010048960A1 (de) * | 2010-10-18 | 2012-04-19 | Khs Corpoplast Gmbh | Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken |
| CN104752633A (zh) * | 2013-12-31 | 2015-07-01 | 中国科学院微电子研究所 | 一种薄膜封装方法 |
| CN110195218A (zh) * | 2019-05-20 | 2019-09-03 | 何金宁 | 一种微波cvd纳米防水复合工艺 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4239234A1 (de) * | 1992-11-21 | 1994-06-09 | Krupp Widia Gmbh | Werkzeug und Verfahren zur Beschichtung eines Werkzeuggrundkörpers |
| FR2730990B1 (fr) * | 1995-02-23 | 1997-04-04 | Saint Gobain Vitrage | Substrat transparent a revetement anti-reflets |
| CN1298963A (zh) * | 1999-12-09 | 2001-06-13 | 中国科学技术大学 | 金属氧化物或合金薄膜的化学气相淀积方法及装置 |
-
2003
- 2003-08-07 CN CNB031275567A patent/CN100381606C/zh not_active Expired - Lifetime
- 2003-08-07 JP JP2003288821A patent/JP4426790B2/ja not_active Expired - Lifetime
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