JP2004067664A - New 4, 4'-(hexahydro-4, 7-methanoindan-5-ylidene)bis(substituted phenol)s - Google Patents

New 4, 4'-(hexahydro-4, 7-methanoindan-5-ylidene)bis(substituted phenol)s Download PDF

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JP2004067664A
JP2004067664A JP2003084545A JP2003084545A JP2004067664A JP 2004067664 A JP2004067664 A JP 2004067664A JP 2003084545 A JP2003084545 A JP 2003084545A JP 2003084545 A JP2003084545 A JP 2003084545A JP 2004067664 A JP2004067664 A JP 2004067664A
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methanoindan
hexahydro
ylidene
bis
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JP4336513B2 (en
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Yoshiyuki Morita
守田 如志
Teru Rachi
良知 照
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Honshu Chemical Industry Co Ltd
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Honshu Chemical Industry Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a new 4, 4'-(hexahydro-4, 7-methanoindan-5-ylidene)bis(substituted phenol) expected to improve heat resistance, lipophilicity, fine processability, etc., of a resin for an optical material or a photoresist on being used as a raw material of the resin for the optical material or the photoresist. <P>SOLUTION: This new 4, 4'-(hexahydro-4, 7-methanoindan-5-ylidene)bis(substituted phenol) expressed by general formula (I) [wherein, R<SB>1</SB>is phenyl or cyclohexyl; R<SB>2</SB>is H or a1-4C alkyl: and (n) is 1 or 2 integer] is provided. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、新規な4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(置換フェノール)に関し、詳しくは、フェノール核がフェニル基又はシクロヘキシル基にて置換されている新規な4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(置換フェノール)類に関する。
【0002】
このようなビス(置換フェノール)類は、例えば、透明性や屈折率の改良された芳香族ポリエステルやポリカーボネート樹脂等の光学系樹脂材料の原料として有用である。
【0003】
【従来の技術】
分子中に脂環式炭化水素骨格を有するビス(置換フェノール)類、即ち、脂環式ビスフェノール類は、従来、すぐれた光学特性、耐熱性、耐湿性等を有する光学材料用樹脂の原料して、また、半導体微細加工用の感光性レジスト原料等として有用であることが知られている。
【0004】
近年、光学材料用樹脂や感光性レジスト等の急速な発展を背景として、それらの原料である脂環式ビスフェノール類に対しても、要求性能が益々多様化しつつある。そのような脂環式ビスフェノール類の一つとして、従来、4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(置換フェノール)類が知られている。例えば、4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ジフェノール、4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ジ−o−クレゾール、4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(2,6−ジクロロフェノール)等や(特許文献1参照)、4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ジフェノール等が知られている(特許文献2及び3参照)。
【0005】
このような脂環式ビスフェノール類において、フェノール核が更にフェニル基又はシクロヘキシル基で置換されているものは、従来より知られている上記脂環式ビスフェノール類に比べて、耐熱性、親油性、微細加工性の一層の向上が期待されるが、しかし、そのような脂環式ビスフェノール類は、従来、知られておらず、勿論、その製造方法も知られてない。
【0006】
【特許文献1】米国特許第3517071号公報
【特許文献2】特公昭42−19276号公報
【特許文献3】特開平11−44948号公報
【0007】
【発明が解決しようとする課題】
本発明は、脂環式ビスフェノール類における上述した事情に鑑みてなされたものであって、フェノール核が更にフェニル基又はシクロヘキシル基で置換されている4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(置換フェノール)類を提供することを目的とする。
【0008】
【課題を解決するための手段】
本発明によれば、一般式(I)
【0009】
【化2】

Figure 2004067664
【0010】
(式中、R はフェニル基又はシクロヘキシル基を示し、R は水素原子又は炭素原子数1〜4のアルキル基を示し、nは1又は2の整数を表す。)
で表される4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(置換フェノール)類が提供される。
【0011】
【発明の実施の形態】
本発明による4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(置換フェノール)類は、一般式(I)
【0012】
【化3】
Figure 2004067664
【0013】
(式中、R はフェニル基又はシクロヘキシル基を示し、R2 は水素原子又は炭素原子数1〜4のアルキル基を示し、nは1又は2の整数を表す。)
で表される。
【0014】
上記一般式(I)で表される4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(置換フェノール)類において、R はフェニル基又はシクロヘキシル基を示し、R は水素原子又は炭素原子数1〜4のアルキル基を示し、nは1又は2の整数を表す。上記フェニル基とシクロヘキシル基は1〜3個のメチル基、エチル基、プロピル基又はブチル基を有していてもよい。
【0015】
従って、本発明による4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(置換フェノール)類の具体例として、例えば、
4,4’−(ヘキサヒドロー4,7−メタノインダンー5−イリデン)ビス(2―フェニルフェノール)、4,4’−(ヘキサヒドロー4,7−メタノインダンー5−イリデン)ビス(2,6―ジフェニルフェノール)、
4,4’−(ヘキサヒドロー4,7−メタノインダンー5−イリデン)ビス(2―フェニル−6−メチルフェノール)、
4,4’−(ヘキサヒドロー4,7−メタノインダンー5−イリデン)ビス(2―フェニル−5−メチルフェノール)、
4,4’−(ヘキサヒドロー4,7−メタノインダンー5−イリデン)ビス(2―シクロヘキシルフェノール)、
4,4’−(ヘキサヒドロー4,7−メタノインダンー5−イリデン)ビス(2、6―ジシクロヘキシルフェノール)、
4,4’−(ヘキサヒドロー4,7−メタノインダンー5−イリデン)ビス(2―シクロヘキシル−6メチルフェノール)、
4,4’−(ヘキサヒドロー4,7−メタノインダンー5−イリデン)ビス(2―シクロヘキシル−5メチルフェノール)
等を挙げることができる。
【0016】
このような本発明による4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(置換フェノール)類は、式(II)
【0017】
【化4】
Figure 2004067664
【0018】
で表されるヘキサヒドロー4,7−メタノインダン−5−オンと一般式(III)
【0019】
【化5】
Figure 2004067664
【0020】
(式中、R 、R 及びnは前記と同じである。)
で表される置換フェノール類を酸触媒の存在下に反応させることにより得ることができる。
【0021】
一般式(III)で表される置換フェノール類において、R、R2 及びnは前記と同じであり、従って、そのような置換フェノール類の具体例として、例えば、2−フェニルフェノール、2,6−ジフェニルフェノール、2−フェニル−6−メチルフェノール、2−フェニル−5−メチルフェノール、2−フェニル−6−エチルフェノール、2−フェニル−6−イソプロピルフェノール、2−シクロへキシルフェノール、2,6−ジシクロヘキシルフェノール、2−シクロヘキシルー6−メチルフェノール、2−シクロヘキシル−5−メチルフェノール等を挙げることができる。
【0022】
上記置換フェノール類と上記ヘキサヒドロ−4,7−メタノインダン−5−オンとの反応において、置換フェノール類は、ヘキサヒドロ−4,7−メタノインダン−4−オン1モル部に対して、通常、4〜20モル部の範囲で用いられる。
【0023】
上記置換フェノール類と上記ヘキサヒドロ−4,7−メタノインダン−5−オンとの反応において、反応溶媒は用いてもよく、また、用いなくてもよいが、反応溶媒を用いる場合、例えば、脂肪族アルコール、芳香族炭化水素又はこれらの混合溶媒が好ましく用いられる。アルコール溶媒としては、用いる反応原料、得られる生成物の溶解度、反応条件、反応の経済性等を考慮して、メタノール、エタノール、イソプロピルアルコール、n−プロピルアルコール、t−ブチルアルコール、イソブチルアルコール等を挙げることができる。芳香族炭化水素溶媒としては、例えば、トルエン、キシレン、クメン等を挙げることができる。このような溶媒は、通常、用いるヘキサヒドロ−4,7−メタノインダン−5−オン100重量部に対して、100〜500重量部の範囲で用いられる。
【0024】
また、上記置換フェノール類と上記ヘキサヒドロ−4,7−メタノインダン−5−オンとの反応において、酸触媒としては、乾燥塩化水素ガスが好ましく用いられるが、しかし、これに限定されるものではなく、例えば、塩酸、硫酸、無水硫酸、p−トルエンスルホン酸、メタスルホン酸、トリフルオロメタンスルホン酸、シュウ酸、ギ酸、リン酸、トリクロロ酢酸。トリフルオル酢酸等も用いられる。このような酸触媒は、例えば、乾燥塩化水素ガスの場合は、好ましくは、反応系内を飽和させる量にて用いられる。更に、反応を促進するために、例えば、オクチルメルカプタン、ドデシルメルカプタン等の助触媒を用いることができる。反応は、通常、20〜80℃、好ましくは、20〜50℃にて、反応容器中の反応混合物に乾燥塩化水素ガスを吹き込みながら、攪拌下、2〜48時間程度、通常、6〜24時間程度行えばよい。
【0025】
反応終了後、反応生成物は、必要に応じて、精製される。精製方法としては、例えば、反応終了後、得られた反応混合物に水酸化ナトリウム水溶液のようなアルカリを加えて、酸触媒を中和した後、水層を分離除去し、得られた有機層を常圧又は減圧下に蒸留した後、これに適宣の晶析溶剤を加えて、粗結晶を析出させる。得られた粗結晶は、そのまま製品としてもよいが、更に必要に応じて高純度品に精製してもよい。そのような高純度品を得るには、例えば、粗結晶に適宣の晶析溶媒と水を加え、水層を分離除去し、これを必要に応じて複数回行った後、得られた油層から得られた結晶を晶析分離すればよい。
【0026】
上記晶析溶剤は、具体的には、晶析条件、精製効果、経済性等を考慮して、適宣に選ばれるが、芳香族炭化水素としては、例えば、トルエン、キシレン、クメン等を挙げることができ、また、脂肪族アルコールとしては、メタノール、エタノール等、脂肪族ケトンとしては、例えば、アセトン、イソプロピルケトン、メチルエチルケトン、メチルイソブチルケトン、ジイソプロピルケトン等、環状エーテルとしては、テトラヒドロフラン、ジオキサン等を挙げることができる。
【0027】
【実施例】
以下に実施例を挙げて本発明を説明するが、本発明はこれら実施例により何ら限定されるものではない。
【0028】
実施例1
(4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(2−フェニルフェノール)の合成)
温度計、滴下漏斗、還流冷却管及び攪拌機を備えた1L容量の四つ口フラスコにo−フェニルフェノール119g(0.7モル)、メタノール35.7g及びドデシルメルカプタン26.3gを仕込み、反応容器内温を40℃に加温した。次いで、反応容器内の塩酸ガス濃度が97.5%になるまで塩化水素ガスを容器内に吹き込んだ。
【0029】
その後、温度40℃に維持したまま、これにo−フェニルフェノール119g(0.7モル)とヘキサヒドロ−4,7−メタノインダン−5−オン104g(0.69モル)をメタノール75.7gに溶解させてなる溶液を攪拌下に2時間かけて滴下した。滴下終了後、更に同温度を保ったまま、約10時間反応を行った。
【0030】
反応終了後、攪拌下、温度60℃で反応混合物に16%水酸化ナトリウム水溶液280gを加え、pH4〜6に中和した。中和後の反応混合物を温度200℃で減圧蒸留し、得られた蒸留残液に攪拌下、トルエン約500gを加え、晶析、濾過して、粗結晶168.9gを得た。
【0031】
次いで、これにメチルイソブチルケンと水を加え、温度70℃に加温し、溶解させた後、水層を分液分離して、目的物を含む油層を得た。これを3回繰り返した後、得られた油層からを減圧蒸留にてメチルイソブチルケンを除き、かくして、蒸留残液を得た。この蒸留残液にトルエンを加えた後、冷却し、晶析し、得られた結晶を乾燥して、目的物である4,4’−(テトラヒドロ−4,7−メタノインダン−5−イリデン)ビス(2−フェニルフェノール)155.1gを白色結晶として得た。純度99.2%(液体クロマトグラフィー分析法)、原料ヘキサヒドロ−4,7−メタノインダン−5−オンに対する収率は47.4%であった。
【0032】
融点(示差熱分析法):201.7℃
分子量(質量分析法):472(M
プロトンNMR分析(溶媒DMSO、400MHz):
【0033】
【化6】
Figure 2004067664
【0034】
【表1】
Figure 2004067664
【0035】
実施例2
(4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(2−シクロヘキシルフェノール)の合成)
温度計、滴下漏斗、還流冷却管及び攪拌機を備えた1L容量の四つ口フラスコにO−シクロヘキシルフェノール211.2g(1.2モル)とメタノール42.2gを仕込み、反応容器内温を40℃に加温した。次いで、反応容器内の塩化水素ガス濃度が99.5%になるまで、塩化水素ガスを容器内に吹き込んだ。
【0036】
次いで、温度を40℃に維持したまま、これにヘキサヒドロ−4,7−メタノインダン−5−オン45g(0.3モル)を攪拌下に1時間かけて滴下した。滴下終了後、更に同じ温度を保ったまま、23時間攪拌下に反応を行った。
【0037】
反応終了後、攪拌下に温度60℃で反応混合物に75%リン酸水溶液6.8g及び16%水酸化ナトリウム水溶液135gを加えて、pH約5に中和した。中和後の反応混合物にメチルイソブチルケトンと水を加え、70℃に加温し、溶解させた後、水層を分液分離して、目的物を含む油層を得た。得られた油層から減圧蒸留にてメチルイソブチルケトンを除いて、蒸留残液を得た。この蒸留残液にシクロヘキサンを加えた後、冷却し、晶析して、得られた結晶を濾別し、これを乾燥して、目的物である4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(2−シクロヘキシルフェノール)67.6gを白色結晶として得た。純度97.9%(液体クロマトグラフィー分析法)、原料ヘキサヒドロ−4,7−メタノインダン−5−オンに対する収率は38.4%であった。
融点(示差熱分析法):187.8℃
分子量(質量分析法):484(M
プロトンNMR分析(溶媒DMSO、400MHz)
【0038】
【化7】
Figure 2004067664
【0039】
【表2】
Figure 2004067664
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a novel 4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (substituted phenol), and more particularly, to a novel phenol nucleus substituted with a phenyl group or a cyclohexyl group. The present invention relates to 4,4 '-(hexahydro-4,7-methanoindan-5-ylidene) bis (substituted phenols).
[0002]
Such bis (substituted phenols) are useful, for example, as raw materials for optical resin materials such as aromatic polyesters and polycarbonate resins having improved transparency and refractive index.
[0003]
[Prior art]
Bis (substituted phenols) having an alicyclic hydrocarbon skeleton in the molecule, that is, alicyclic bisphenols, have conventionally been used as a raw material for resins for optical materials having excellent optical properties, heat resistance, moisture resistance and the like. It is also known to be useful as a photosensitive resist raw material for semiconductor fine processing.
[0004]
In recent years, with the rapid development of resins for optical materials, photosensitive resists, and the like, performance requirements for alicyclic bisphenols, which are the raw materials thereof, are becoming increasingly diversified. As one of such alicyclic bisphenols, 4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (substituted phenol) is conventionally known. For example, 4,4 '-(hexahydro-4,7-methanoindan-5-ylidene) diphenol, 4,4'-(hexahydro-4,7-methanoindan-5-ylidene) di-o-cresol, 4,4 '-(Hexahydro-4,7-methanoindan-5-ylidene) bis (2,6-dichlorophenol) and the like (see Patent Document 1) and 4,4'-(hexahydro-4,7-methanoindan-5-ylidene) ) Diphenol and the like are known (see Patent Documents 2 and 3).
[0005]
In such alicyclic bisphenols, those in which the phenol nucleus is further substituted with a phenyl group or a cyclohexyl group are more heat-resistant, lipophilic, and finer than the alicyclic bisphenols conventionally known. Although further improvement in processability is expected, such alicyclic bisphenols have not been known so far, and, of course, their production methods have not been known.
[0006]
[Patent Document 1] U.S. Pat. No. 3,517,071 [Patent Document 2] JP-B-42-19276 [Patent Document 3] JP-A-11-44948 [0007]
[Problems to be solved by the invention]
The present invention has been made in view of the above-mentioned circumstances in alicyclic bisphenols, and is directed to a 4,4 ′-(hexahydro-4,7-methanoindane in which a phenol nucleus is further substituted with a phenyl group or a cyclohexyl group. -5-ylidene) bis (substituted phenols).
[0008]
[Means for Solving the Problems]
According to the present invention, general formula (I)
[0009]
Embedded image
Figure 2004067664
[0010]
(In the formula, R 1 represents a phenyl group or a cyclohexyl group, R 2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and n represents an integer of 1 or 2.)
4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (substituted phenol) represented by the formula:
[0011]
BEST MODE FOR CARRYING OUT THE INVENTION
The 4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (substituted phenol) s according to the present invention have the general formula (I)
[0012]
Embedded image
Figure 2004067664
[0013]
(In the formula, R 1 represents a phenyl group or a cyclohexyl group, R 2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and n represents an integer of 1 or 2.)
Is represented by
[0014]
In the 4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (substituted phenol) s represented by the general formula (I), R 1 represents a phenyl group or a cyclohexyl group, and R 2 represents It represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and n represents an integer of 1 or 2. The phenyl group and cyclohexyl group may have 1 to 3 methyl, ethyl, propyl or butyl groups.
[0015]
Accordingly, specific examples of 4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (substituted phenols) according to the present invention include, for example,
4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (2-phenylphenol), 4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (2,6-diphenylphenol),
4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (2-phenyl-6-methylphenol),
4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (2-phenyl-5-methylphenol),
4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (2-cyclohexylphenol),
4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (2,6-dicyclohexylphenol),
4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (2-cyclohexyl-6-methylphenol),
4,4 '-(hexahydro-4,7-methanoindan-5-ylidene) bis (2-cyclohexyl-5-methylphenol)
And the like.
[0016]
Such 4,4 '-(hexahydro-4,7-methanoindan-5-ylidene) bis (substituted phenols) according to the present invention have the formula (II)
[0017]
Embedded image
Figure 2004067664
[0018]
Hexahydro-4,7-methanoindan-5-one represented by the general formula (III)
[0019]
Embedded image
Figure 2004067664
[0020]
(In the formula, R 1 , R 2 and n are the same as described above.)
Can be obtained by reacting a substituted phenol represented by the formula in the presence of an acid catalyst.
[0021]
In the substituted phenols represented by the general formula (III), R 1 , R 2 and n are the same as described above. Therefore, specific examples of such substituted phenols include, for example, 2-phenylphenol, 2, 6-diphenylphenol, 2-phenyl-6-methylphenol, 2-phenyl-5-methylphenol, 2-phenyl-6-ethylphenol, 2-phenyl-6-isopropylphenol, 2-cyclohexylphenol, 2, Examples thereof include 6-dicyclohexylphenol, 2-cyclohexyl-6-methylphenol, and 2-cyclohexyl-5-methylphenol.
[0022]
In the reaction of the above substituted phenols with the above hexahydro-4,7-methanoindan-5-one, the substituted phenols are usually added in an amount of 4 to 20 mol per 1 mol of hexahydro-4,7-methanoindan-4-one. It is used in the range of mole parts.
[0023]
In the reaction between the above substituted phenols and the above hexahydro-4,7-methanoindan-5-one, a reaction solvent may or may not be used. When a reaction solvent is used, for example, an aliphatic alcohol may be used. , Aromatic hydrocarbons or mixed solvents thereof are preferably used. As the alcohol solvent, methanol, ethanol, isopropyl alcohol, n-propyl alcohol, t-butyl alcohol, isobutyl alcohol, and the like are used in consideration of the reaction raw materials to be used, the solubility of the obtained product, the reaction conditions, the economics of the reaction, and the like. Can be mentioned. Examples of the aromatic hydrocarbon solvent include toluene, xylene, cumene and the like. Such a solvent is generally used in an amount of 100 to 500 parts by weight based on 100 parts by weight of hexahydro-4,7-methanoindan-5-one used.
[0024]
In the reaction between the substituted phenols and hexahydro-4,7-methanoindan-5-one, dry hydrogen chloride gas is preferably used as an acid catalyst, but is not limited thereto. For example, hydrochloric acid, sulfuric acid, sulfuric anhydride, p-toluenesulfonic acid, metasulfonic acid, trifluoromethanesulfonic acid, oxalic acid, formic acid, phosphoric acid, and trichloroacetic acid. Trifluoroacetic acid and the like are also used. In the case of dry hydrogen chloride gas, for example, such an acid catalyst is preferably used in an amount that saturates the inside of the reaction system. Further, in order to promote the reaction, for example, a co-catalyst such as octyl mercaptan and dodecyl mercaptan can be used. The reaction is usually carried out at 20 to 80 ° C., preferably 20 to 50 ° C., while blowing dry hydrogen chloride gas into the reaction mixture in the reaction vessel, while stirring, for about 2 to 48 hours, usually 6 to 24 hours. Just do it.
[0025]
After completion of the reaction, the reaction product is purified, if necessary. As a purification method, for example, after the reaction is completed, an alkali such as an aqueous sodium hydroxide solution is added to the obtained reaction mixture to neutralize the acid catalyst, and then the aqueous layer is separated and removed. After distillation under normal pressure or reduced pressure, an appropriate crystallization solvent is added thereto to precipitate crude crystals. The obtained crude crystal may be used as a product as it is, or may be further purified to a high-purity product if necessary. In order to obtain such a high-purity product, for example, an appropriate crystallization solvent and water are added to the crude crystals, and the aqueous layer is separated and removed. May be separated by crystallization.
[0026]
The crystallization solvent is specifically selected appropriately in consideration of crystallization conditions, purification effects, economics, and the like. Examples of the aromatic hydrocarbon include toluene, xylene, cumene, and the like. Also, as the aliphatic alcohol, methanol, ethanol, etc., as the aliphatic ketone, for example, acetone, isopropyl ketone, methyl ethyl ketone, methyl isobutyl ketone, diisopropyl ketone, etc., as the cyclic ether, tetrahydrofuran, dioxane, etc. Can be mentioned.
[0027]
【Example】
Hereinafter, the present invention will be described with reference to examples, but the present invention is not limited to these examples.
[0028]
Example 1
(Synthesis of 4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (2-phenylphenol))
119 g (0.7 mol) of o-phenylphenol, 35.7 g of methanol and 26.3 g of dodecyl mercaptan were charged into a 1 L four-necked flask equipped with a thermometer, a dropping funnel, a reflux condenser, and a stirrer. The temperature was warmed to 40 ° C. Next, hydrogen chloride gas was blown into the reaction vessel until the hydrochloric acid gas concentration in the reaction vessel reached 97.5%.
[0029]
Thereafter, while maintaining the temperature at 40 ° C., 119 g (0.7 mol) of o-phenylphenol and 104 g (0.69 mol) of hexahydro-4,7-methanoindan-5-one were dissolved in 75.7 g of methanol. The resulting solution was added dropwise over 2 hours with stirring. After the completion of the dropwise addition, the reaction was carried out for about 10 hours while maintaining the same temperature.
[0030]
After completion of the reaction, 280 g of a 16% aqueous sodium hydroxide solution was added to the reaction mixture at a temperature of 60 ° C. with stirring to neutralize the mixture to pH 4 to 6. The reaction mixture after the neutralization was distilled under reduced pressure at a temperature of 200 ° C., and about 500 g of toluene was added to the obtained distillation residue with stirring, followed by crystallization and filtration to obtain 168.9 g of crude crystals.
[0031]
Next, methylisobutylken and water were added thereto, and the mixture was heated to a temperature of 70 ° C. and dissolved, and then the aqueous layer was subjected to liquid separation to obtain an oil layer containing the target substance. After repeating this three times, methylisobutylken was removed from the obtained oil layer by distillation under reduced pressure, and thus a distillation residue was obtained. After toluene was added to the distillation residue, the mixture was cooled and crystallized, and the obtained crystal was dried to obtain 4,4 ′-(tetrahydro-4,7-methanoindan-5-ylidene) bis which was the target substance. 155.1 g of (2-phenylphenol) were obtained as white crystals. The purity was 99.2% (liquid chromatography analysis), and the yield based on the starting material hexahydro-4,7-methanoindan-5-one was 47.4%.
[0032]
Melting point (differential thermal analysis): 201.7 ° C
Molecular weight (mass spectrometry): 472 (M + )
Proton NMR analysis (solvent DMSO, 400 MHz):
[0033]
Embedded image
Figure 2004067664
[0034]
[Table 1]
Figure 2004067664
[0035]
Example 2
(Synthesis of 4,4 ′-(hexahydro-4,7-methanoindan-5-ylidene) bis (2-cyclohexylphenol))
A 1 L four-necked flask equipped with a thermometer, a dropping funnel, a reflux condenser, and a stirrer was charged with 211.2 g (1.2 mol) of O-cyclohexylphenol and 42.2 g of methanol, and the internal temperature of the reaction vessel was set at 40 ° C. Heated. Next, hydrogen chloride gas was blown into the reaction vessel until the hydrogen chloride gas concentration in the reaction vessel reached 99.5%.
[0036]
Then, while maintaining the temperature at 40 ° C., 45 g (0.3 mol) of hexahydro-4,7-methanoindan-5-one was added dropwise thereto with stirring over 1 hour. After the completion of the dropwise addition, the reaction was further performed with stirring for 23 hours while maintaining the same temperature.
[0037]
After completion of the reaction, 6.8 g of a 75% aqueous phosphoric acid solution and 135 g of a 16% aqueous sodium hydroxide solution were added to the reaction mixture at a temperature of 60 ° C. with stirring to neutralize the mixture to a pH of about 5. Methyl isobutyl ketone and water were added to the neutralized reaction mixture, heated to 70 ° C. and dissolved, and then the aqueous layer was separated and separated to obtain an oil layer containing the desired product. The distillation residue was obtained by removing methyl isobutyl ketone from the obtained oil layer by distillation under reduced pressure. After cyclohexane was added to the distillation residue, the mixture was cooled and crystallized. The obtained crystals were separated by filtration and dried, and the target product, 4,4 '-(hexahydro-4,7- 67.6 g of methanoindan-5-ylidene) bis (2-cyclohexylphenol) were obtained as white crystals. The purity was 97.9% (liquid chromatography analysis), and the yield based on the starting material hexahydro-4,7-methanoindan-5-one was 38.4%.
Melting point (differential thermal analysis): 187.8 ° C
Molecular weight (mass spectrometry): 484 (M + )
Proton NMR analysis (solvent DMSO, 400 MHz)
[0038]
Embedded image
Figure 2004067664
[0039]
[Table 2]
Figure 2004067664

Claims (1)

一般式(I)
Figure 2004067664
(式中、R1 はフェニル基又はシクロヘキシル基を示し、R は水素原子又は炭素原子数1〜4のアルキル基を示し、nは1又は2の整数を表す。)
で表される4,4’−(ヘキサヒドロ−4,7−メタノインダン−5−イリデン)ビス(置換フェノール)類。
General formula (I)
Figure 2004067664
(In the formula, R 1 represents a phenyl group or a cyclohexyl group, R 2 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and n represents an integer of 1 or 2.)
4,4 '-(hexahydro-4,7-methanoindan-5-ylidene) bis (substituted phenols) represented by the formula:
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007116967A1 (en) * 2006-04-10 2007-10-18 Mitsubishi Gas Chemical Company, Inc. Bisphenol compound and method for producing same
JP5559036B2 (en) * 2008-04-04 2014-07-23 株式会社ダイセル Polyol compound for photoresist

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007116967A1 (en) * 2006-04-10 2007-10-18 Mitsubishi Gas Chemical Company, Inc. Bisphenol compound and method for producing same
JP5559036B2 (en) * 2008-04-04 2014-07-23 株式会社ダイセル Polyol compound for photoresist

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