JP2004039805A5 - - Google Patents

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Publication number
JP2004039805A5
JP2004039805A5 JP2002193624A JP2002193624A JP2004039805A5 JP 2004039805 A5 JP2004039805 A5 JP 2004039805A5 JP 2002193624 A JP2002193624 A JP 2002193624A JP 2002193624 A JP2002193624 A JP 2002193624A JP 2004039805 A5 JP2004039805 A5 JP 2004039805A5
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JP
Japan
Prior art keywords
processing
residual
detection data
principal component
analysis model
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2002193624A
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English (en)
Japanese (ja)
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JP4274348B2 (ja
JP2004039805A (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2002193624A external-priority patent/JP4274348B2/ja
Priority to JP2002193624A priority Critical patent/JP4274348B2/ja
Priority to AU2003235901A priority patent/AU2003235901A1/en
Priority to CN038103559A priority patent/CN1653598B/zh
Priority to PCT/JP2003/005782 priority patent/WO2003098677A1/ja
Priority to TW092112846A priority patent/TWI272462B/zh
Publication of JP2004039805A publication Critical patent/JP2004039805A/ja
Priority to US10/984,932 priority patent/US7689028B2/en
Publication of JP2004039805A5 publication Critical patent/JP2004039805A5/ja
Publication of JP4274348B2 publication Critical patent/JP4274348B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002193624A 2002-05-16 2002-07-02 プロセスの予測方法及び処理装置並びにプロセス予測プログラム Expired - Fee Related JP4274348B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2002193624A JP4274348B2 (ja) 2002-07-02 2002-07-02 プロセスの予測方法及び処理装置並びにプロセス予測プログラム
AU2003235901A AU2003235901A1 (en) 2002-05-16 2003-05-08 Method of predicting processing device condition or processed result
CN038103559A CN1653598B (zh) 2002-05-16 2003-05-08 处理装置状态或处理结果的预测方法
PCT/JP2003/005782 WO2003098677A1 (en) 2002-05-16 2003-05-08 Method of predicting processing device condition or processed result
TW092112846A TWI272462B (en) 2002-05-16 2003-05-12 Method of predicting processing device condition or processed result
US10/984,932 US7689028B2 (en) 2002-05-16 2004-11-10 Method and apparatus for evaluating processing apparatus status and predicting processing result

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002193624A JP4274348B2 (ja) 2002-07-02 2002-07-02 プロセスの予測方法及び処理装置並びにプロセス予測プログラム

Publications (3)

Publication Number Publication Date
JP2004039805A JP2004039805A (ja) 2004-02-05
JP2004039805A5 true JP2004039805A5 (https=) 2005-09-15
JP4274348B2 JP4274348B2 (ja) 2009-06-03

Family

ID=31702548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002193624A Expired - Fee Related JP4274348B2 (ja) 2002-05-16 2002-07-02 プロセスの予測方法及び処理装置並びにプロセス予測プログラム

Country Status (1)

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JP (1) JP4274348B2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006350698A (ja) * 2005-06-16 2006-12-28 Taiyo Nippon Sanso Corp 異常診断装置、異常診断方法、異常診断プログラム
US7625824B2 (en) * 2005-06-16 2009-12-01 Oerlikon Usa, Inc. Process change detection through the use of evolutionary algorithms
JP4643392B2 (ja) * 2005-08-24 2011-03-02 東京エレクトロン株式会社 プラズマ処理装置の運転状態判定方法、運転状態判定装置、プログラム及び記憶媒体
US8101906B2 (en) 2008-10-08 2012-01-24 Applied Materials, Inc. Method and apparatus for calibrating optical path degradation useful for decoupled plasma nitridation chambers
JP6643202B2 (ja) * 2016-07-21 2020-02-12 株式会社日立ハイテクノロジーズ プラズマ処理装置及びプラズマ処理データを解析する解析方法
WO2018038892A1 (en) * 2016-08-26 2018-03-01 Applied Materials, Inc. Self-healing semiconductor wafer processing
CN115828098B (zh) * 2022-11-30 2026-04-14 国网上海市电力公司 一种基线负荷预测方法、装置、电子设备和存储介质
CN118625862B (zh) * 2024-08-12 2024-11-08 深圳捷工科技股份有限公司 一种电子特气气体流量智能控制系统

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