JP2004012510A5 - - Google Patents
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- JP2004012510A5 JP2004012510A5 JP2002161617A JP2002161617A JP2004012510A5 JP 2004012510 A5 JP2004012510 A5 JP 2004012510A5 JP 2002161617 A JP2002161617 A JP 2002161617A JP 2002161617 A JP2002161617 A JP 2002161617A JP 2004012510 A5 JP2004012510 A5 JP 2004012510A5
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- JP
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- Prior art keywords
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- Prior art date
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Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002161617A JP4073255B2 (ja) | 2002-06-03 | 2002-06-03 | ポジ型レジスト組成物 |
KR1020030034881A KR100955454B1 (ko) | 2002-05-31 | 2003-05-30 | 포지티브 레지스트 조성물 |
US10/448,041 US6939662B2 (en) | 2002-05-31 | 2003-05-30 | Positive-working resist composition |
EP10188668A EP2278400A3 (fr) | 2002-05-31 | 2003-06-02 | Composition pour réserve de type positif |
EP10188665A EP2278397A3 (fr) | 2002-05-31 | 2003-06-02 | Composition pour réserve de type positif |
AT03012142T ATE525676T1 (de) | 2002-05-31 | 2003-06-02 | Positiv arbeitende resistzusammensetzung |
EP10188667.9A EP2278399B1 (fr) | 2002-05-31 | 2003-06-02 | Composition pour réserve de type positif |
EP03012142A EP1367440B1 (fr) | 2002-05-31 | 2003-06-02 | Composition pour réserve de type positif |
EP10188666A EP2278398A3 (fr) | 2002-05-31 | 2003-06-02 | Composition pour réserve de type positif |
KR1020090108795A KR100947853B1 (ko) | 2002-05-31 | 2009-11-11 | 포지티브 레지스트 조성물 및 이를 이용한 패턴형성방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002161617A JP4073255B2 (ja) | 2002-06-03 | 2002-06-03 | ポジ型レジスト組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004012510A JP2004012510A (ja) | 2004-01-15 |
JP2004012510A5 true JP2004012510A5 (fr) | 2005-09-22 |
JP4073255B2 JP4073255B2 (ja) | 2008-04-09 |
Family
ID=30430639
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002161617A Expired - Fee Related JP4073255B2 (ja) | 2002-05-31 | 2002-06-03 | ポジ型レジスト組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4073255B2 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101729792B1 (ko) * | 2009-02-23 | 2017-04-24 | 제이에스알 가부시끼가이샤 | 화합물, 불소 원자 함유 중합체, 및 감방사선성 수지 조성물 |
JP5617810B2 (ja) * | 2011-10-04 | 2014-11-05 | 信越化学工業株式会社 | レジスト保護膜材料及びパターン形成方法 |
JP5825248B2 (ja) | 2012-12-12 | 2015-12-02 | 信越化学工業株式会社 | ポジ型レジスト材料並びにこれを用いたパターン形成方法 |
JP5825252B2 (ja) * | 2012-12-26 | 2015-12-02 | 信越化学工業株式会社 | レジスト材料及びこれを用いたパターン形成方法 |
JP5821862B2 (ja) * | 2013-01-29 | 2015-11-24 | 信越化学工業株式会社 | ネガ型レジスト材料並びにこれを用いたパターン形成方法 |
JP6065942B2 (ja) * | 2015-06-12 | 2017-01-25 | 信越化学工業株式会社 | 高分子化合物 |
JP7459636B2 (ja) | 2019-06-14 | 2024-04-02 | Jsr株式会社 | 感放射線性樹脂組成物及びレジストパターン形成方法 |
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2002
- 2002-06-03 JP JP2002161617A patent/JP4073255B2/ja not_active Expired - Fee Related