JP2004003902A - テラヘルツ光を用いた平面基板の電気特性測定方法 - Google Patents

テラヘルツ光を用いた平面基板の電気特性測定方法 Download PDF

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Publication number
JP2004003902A
JP2004003902A JP2002161085A JP2002161085A JP2004003902A JP 2004003902 A JP2004003902 A JP 2004003902A JP 2002161085 A JP2002161085 A JP 2002161085A JP 2002161085 A JP2002161085 A JP 2002161085A JP 2004003902 A JP2004003902 A JP 2004003902A
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JP
Japan
Prior art keywords
time
light
substrate
series waveform
terahertz
Prior art date
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Pending
Application number
JP2002161085A
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English (en)
Japanese (ja)
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JP2004003902A5 (enExample
Inventor
Ryoichi Fukazawa
深澤　亮一
Toshiyuki Iwamoto
岩本　敏志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tochigi Nikon Corp
Nikon Corp
Original Assignee
Tochigi Nikon Corp
Nikon Corp
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Publication date
Application filed by Tochigi Nikon Corp, Nikon Corp filed Critical Tochigi Nikon Corp
Priority to JP2002161085A priority Critical patent/JP2004003902A/ja
Priority to AU2003241695A priority patent/AU2003241695A1/en
Priority to PCT/JP2003/006887 priority patent/WO2003102557A1/ja
Publication of JP2004003902A publication Critical patent/JP2004003902A/ja
Publication of JP2004003902A5 publication Critical patent/JP2004003902A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Toxicology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2002161085A 2002-06-03 2002-06-03 テラヘルツ光を用いた平面基板の電気特性測定方法 Pending JP2004003902A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002161085A JP2004003902A (ja) 2002-06-03 2002-06-03 テラヘルツ光を用いた平面基板の電気特性測定方法
AU2003241695A AU2003241695A1 (en) 2002-06-03 2003-05-30 Method of measuring electric characteristics of flat substrate using terahertz light
PCT/JP2003/006887 WO2003102557A1 (en) 2002-06-03 2003-05-30 Method of measuring electric characteristics of flat substrate using terahertz light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002161085A JP2004003902A (ja) 2002-06-03 2002-06-03 テラヘルツ光を用いた平面基板の電気特性測定方法

Publications (2)

Publication Number Publication Date
JP2004003902A true JP2004003902A (ja) 2004-01-08
JP2004003902A5 JP2004003902A5 (enExample) 2005-10-06

Family

ID=29706568

Family Applications (1)

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JP2002161085A Pending JP2004003902A (ja) 2002-06-03 2002-06-03 テラヘルツ光を用いた平面基板の電気特性測定方法

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JP (1) JP2004003902A (enExample)
AU (1) AU2003241695A1 (enExample)
WO (1) WO2003102557A1 (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009075069A (ja) * 2007-08-31 2009-04-09 Canon Inc テラヘルツ波に関する情報を取得するための装置及び方法
WO2009078149A1 (ja) * 2007-12-14 2009-06-25 Riken キャリア濃度測定装置およびキャリア濃度測定方法
EP2031374A3 (en) * 2007-08-31 2010-03-03 Canon Kabushiki Kaisha Apparatus and method for obtaining information related to terahertz waves
WO2010084765A1 (en) 2009-01-23 2010-07-29 Canon Kabushiki Kaisha Analyzing apparatus using terahertz wave radiation
JP2018132327A (ja) * 2017-02-13 2018-08-23 シャープ株式会社 スペクトル解析装置およびスペクトル解析方法
CN111220904A (zh) * 2018-11-23 2020-06-02 三星电子株式会社 测试互连基板的方法和用于执行该方法的装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005069840A (ja) * 2003-08-22 2005-03-17 Japan Science & Technology Agency 時系列変換パルス分光計測装置の時系列信号取得のための光路差補償機構

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL122273A (en) * 1997-11-21 2001-07-24 Sela Semiconductor Eng Laboratories Remote resistivity measurement
JP4476462B2 (ja) * 2000-03-27 2010-06-09 株式会社栃木ニコン 半導体の電気特性評価装置

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009075069A (ja) * 2007-08-31 2009-04-09 Canon Inc テラヘルツ波に関する情報を取得するための装置及び方法
EP2031374A3 (en) * 2007-08-31 2010-03-03 Canon Kabushiki Kaisha Apparatus and method for obtaining information related to terahertz waves
US7852466B2 (en) 2007-08-31 2010-12-14 Canon Kabushiki Kaisha Apparatus and method for obtaining information related to terahertz waves
WO2009078149A1 (ja) * 2007-12-14 2009-06-25 Riken キャリア濃度測定装置およびキャリア濃度測定方法
JP2009145223A (ja) * 2007-12-14 2009-07-02 Institute Of Physical & Chemical Research キャリア濃度測定装置およびキャリア濃度測定方法
US8446576B2 (en) 2007-12-14 2013-05-21 Riken Carrier concentration measuring device and carrier concentration measuring method
WO2010084765A1 (en) 2009-01-23 2010-07-29 Canon Kabushiki Kaisha Analyzing apparatus using terahertz wave radiation
JP2010190887A (ja) * 2009-01-23 2010-09-02 Canon Inc 分析装置
US8232526B2 (en) 2009-01-23 2012-07-31 Canon Kabushiki Kaisha Analyzing apparatus
JP2018132327A (ja) * 2017-02-13 2018-08-23 シャープ株式会社 スペクトル解析装置およびスペクトル解析方法
CN111220904A (zh) * 2018-11-23 2020-06-02 三星电子株式会社 测试互连基板的方法和用于执行该方法的装置
CN111220904B (zh) * 2018-11-23 2024-04-19 三星电子株式会社 测试互连基板的方法和用于执行该方法的装置

Also Published As

Publication number Publication date
AU2003241695A8 (en) 2003-12-19
AU2003241695A1 (en) 2003-12-19
WO2003102557A1 (en) 2003-12-11

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