JP2003532856A - 電子ビーム遮蔽装置及び電子ビームの遮蔽方法 - Google Patents

電子ビーム遮蔽装置及び電子ビームの遮蔽方法

Info

Publication number
JP2003532856A
JP2003532856A JP2001511709A JP2001511709A JP2003532856A JP 2003532856 A JP2003532856 A JP 2003532856A JP 2001511709 A JP2001511709 A JP 2001511709A JP 2001511709 A JP2001511709 A JP 2001511709A JP 2003532856 A JP2003532856 A JP 2003532856A
Authority
JP
Japan
Prior art keywords
electron beam
barrier
guns
beam guns
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001511709A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003532856A5 (cg-RX-API-DMAC7.html
Inventor
グロッセ，インゴ・エイ
ホール，マーク
ハインツ，レオナルド・シー・ザ・セカンド
Original Assignee
エイティーアイ・プロパティーズ・インコーポレーテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エイティーアイ・プロパティーズ・インコーポレーテッド filed Critical エイティーアイ・プロパティーズ・インコーポレーテッド
Publication of JP2003532856A publication Critical patent/JP2003532856A/ja
Publication of JP2003532856A5 publication Critical patent/JP2003532856A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Furnace Details (AREA)
JP2001511709A 1999-07-15 2000-07-14 電子ビーム遮蔽装置及び電子ビームの遮蔽方法 Pending JP2003532856A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/354,286 US6175585B1 (en) 1999-07-15 1999-07-15 Electron beam shielding apparatus and methods for shielding electron beams
US09/354,286 1999-07-16
PCT/US2000/019410 WO2001006537A1 (en) 1999-07-15 2000-07-14 Electron beam shielding apparatus and methods for shielding electron beams

Publications (2)

Publication Number Publication Date
JP2003532856A true JP2003532856A (ja) 2003-11-05
JP2003532856A5 JP2003532856A5 (cg-RX-API-DMAC7.html) 2007-05-10

Family

ID=23392634

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001511709A Pending JP2003532856A (ja) 1999-07-15 2000-07-14 電子ビーム遮蔽装置及び電子ビームの遮蔽方法

Country Status (6)

Country Link
US (1) US6175585B1 (cg-RX-API-DMAC7.html)
EP (1) EP1204984A4 (cg-RX-API-DMAC7.html)
JP (1) JP2003532856A (cg-RX-API-DMAC7.html)
AU (1) AU776095B2 (cg-RX-API-DMAC7.html)
CA (1) CA2379913A1 (cg-RX-API-DMAC7.html)
WO (1) WO2001006537A1 (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023507616A (ja) * 2019-12-17 2023-02-24 チタニウム メタルズ コーポレーション 溶融炉用モジュラーガンアセンブリ

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8891583B2 (en) 2000-11-15 2014-11-18 Ati Properties, Inc. Refining and casting apparatus and method
US6496529B1 (en) * 2000-11-15 2002-12-17 Ati Properties, Inc. Refining and casting apparatus and method
US7205329B2 (en) 2003-05-30 2007-04-17 Microbia, Inc. Modulators of CRTH2 activity
US8748773B2 (en) * 2007-03-30 2014-06-10 Ati Properties, Inc. Ion plasma electron emitters for a melting furnace
BRPI0809581A2 (pt) 2007-03-30 2019-03-12 Ati Properties Inc fornalha de fusão incluindo emissor de elétrons de plasma de íon descarregado por filamento

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5611551B2 (cg-RX-API-DMAC7.html) * 1973-04-05 1981-03-14
JPH03191290A (ja) * 1989-12-20 1991-08-21 Jeol Ltd 真空溶解装置
JPH06504325A (ja) * 1991-12-16 1994-05-19 アクセル　ジョンソン　メタルズ　インコーポレイテッド 粒状反応性金属の真空処理

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB915657A (en) * 1960-08-22 1963-01-16 Ass Elect Ind Improvements relating to electron beam furnaces
US3343828A (en) * 1962-03-30 1967-09-26 Air Reduction High vacuum furnace
DE1199097B (de) * 1962-09-25 1965-08-19 Heraeus Gmbh W C Vorrichtung zum Vakuumbedampfen breiter Baender, insbesondere mit Metallen, durch Erhitzen des Verdampfungsgutes mittels Elektronenstrahlen
US4027722A (en) 1963-02-01 1977-06-07 Airco, Inc. Electron beam furnace
US3857014A (en) 1971-08-25 1974-12-24 A Khotina Electron beam generator
US5263689A (en) 1983-06-23 1993-11-23 General Electric Company Apparatus for making alloy power
USRE32932E (en) 1987-03-06 1989-05-30 A Johnson Metals Corporation Cold hearth refining
US4932635A (en) 1988-07-11 1990-06-12 Axel Johnson Metals, Inc. Cold hearth refining apparatus
US5034590A (en) * 1989-08-02 1991-07-23 Anelva Corporation Electron gun arrangement for use in the electron beam evaporation process
US5100463A (en) * 1990-07-19 1992-03-31 Axel Johnson Metals, Inc. Method of operating an electron beam furnace
US5291940A (en) 1991-09-13 1994-03-08 Axel Johnson Metals, Inc. Static vacuum casting of ingots
US5216690A (en) 1992-03-11 1993-06-01 Hanks Charles W Electron beam gun with grounded shield to prevent arc down

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5611551B2 (cg-RX-API-DMAC7.html) * 1973-04-05 1981-03-14
JPH03191290A (ja) * 1989-12-20 1991-08-21 Jeol Ltd 真空溶解装置
JPH06504325A (ja) * 1991-12-16 1994-05-19 アクセル　ジョンソン　メタルズ　インコーポレイテッド 粒状反応性金属の真空処理

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023507616A (ja) * 2019-12-17 2023-02-24 チタニウム メタルズ コーポレーション 溶融炉用モジュラーガンアセンブリ
JP7697950B2 (ja) 2019-12-17 2025-06-24 チタニウム メタルズ コーポレーション 溶融炉用モジュラーガンアセンブリ

Also Published As

Publication number Publication date
AU776095B2 (en) 2004-08-26
EP1204984A1 (en) 2002-05-15
CA2379913A1 (en) 2001-01-25
WO2001006537A1 (en) 2001-01-25
AU6350000A (en) 2001-02-05
EP1204984A4 (en) 2002-10-23
US6175585B1 (en) 2001-01-16

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