JP2003510676A - コンベヤ式熱プロセッサ内の部品の温度レスポンスを制御する方法及び装置 - Google Patents

コンベヤ式熱プロセッサ内の部品の温度レスポンスを制御する方法及び装置

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Publication number
JP2003510676A
JP2003510676A JP2001525492A JP2001525492A JP2003510676A JP 2003510676 A JP2003510676 A JP 2003510676A JP 2001525492 A JP2001525492 A JP 2001525492A JP 2001525492 A JP2001525492 A JP 2001525492A JP 2003510676 A JP2003510676 A JP 2003510676A
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JP
Japan
Prior art keywords
process window
window index
processor
control
data processor
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Pending
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JP2001525492A
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English (en)
Japanese (ja)
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JP2003510676A5 (enExample
Inventor
フィリップ シー カズミーロウィッツ
エリック ドランスフェルト
スタンレー ディ シュルツ
Original Assignee
ケイアイシー サーマル プロファイリング インコーポレイテッド
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Application filed by ケイアイシー サーマル プロファイリング インコーポレイテッド filed Critical ケイアイシー サーマル プロファイリング インコーポレイテッド
Publication of JP2003510676A publication Critical patent/JP2003510676A/ja
Publication of JP2003510676A5 publication Critical patent/JP2003510676A5/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/0205Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric not using a model or a simulator of the controlled system
    • G05B13/024Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric not using a model or a simulator of the controlled system in which a parameter or coefficient is automatically adjusted to optimise the performance
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00Control of temperature
    • G05D23/19Control of temperature characterised by the use of electric means
    • G05D23/1927Control of temperature characterised by the use of electric means using a plurality of sensors
    • G05D23/193Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces
    • G05D23/1931Control of temperature characterised by the use of electric means using a plurality of sensors sensing the temperaure in different places in thermal relationship with one or more spaces to control the temperature of one space

Landscapes

  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Artificial Intelligence (AREA)
  • Health & Medical Sciences (AREA)
  • Remote Sensing (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Evolutionary Computation (AREA)
  • Medical Informatics (AREA)
  • Software Systems (AREA)
  • Feedback Control In General (AREA)
  • Control Of Heat Treatment Processes (AREA)
  • Control Of Temperature (AREA)
JP2001525492A 1999-09-23 2000-09-18 コンベヤ式熱プロセッサ内の部品の温度レスポンスを制御する方法及び装置 Pending JP2003510676A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/401,749 1999-09-23
US09/401,749 US6453219B1 (en) 1999-09-23 1999-09-23 Method and apparatus for controlling temperature response of a part in a conveyorized thermal processor
PCT/US2000/025625 WO2001022188A1 (en) 1999-09-23 2000-09-18 Method and apparatus for controlling temperature response of a part in a conveyorized thermal processor

Publications (2)

Publication Number Publication Date
JP2003510676A true JP2003510676A (ja) 2003-03-18
JP2003510676A5 JP2003510676A5 (enExample) 2007-11-08

Family

ID=23589076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001525492A Pending JP2003510676A (ja) 1999-09-23 2000-09-18 コンベヤ式熱プロセッサ内の部品の温度レスポンスを制御する方法及び装置

Country Status (6)

Country Link
US (1) US6453219B1 (enExample)
EP (1) EP1218812B1 (enExample)
JP (1) JP2003510676A (enExample)
CN (1) CN100371842C (enExample)
DE (1) DE60002354T2 (enExample)
WO (1) WO2001022188A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110678823A (zh) * 2017-05-29 2020-01-10 理化工业株式会社 控制系统设计装置以及控制系统
US11525736B2 (en) * 2020-01-15 2022-12-13 International Business Machines Corporation Temperature monitoring for printed circuit board assemblies during mass soldering

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US6606537B1 (en) * 2001-04-19 2003-08-12 Kic Thermal Profiling Method for correcting process temperature profile in a multi-zone thermal processor
US20050044892A1 (en) * 2003-08-28 2005-03-03 George Stephan P. Method and apparatus for heating glass sheets
US7493242B1 (en) 2004-11-10 2009-02-17 The United States Of America As Represented By The Secretary Of The Navy Mathematical model for predicting the thermal behavior of an item
US20070088605A1 (en) * 2005-10-19 2007-04-19 Yahoo! Inc. System and method for achieving linear advertisement impression delivery under uneven, volatile traffic conditions
JP4685992B2 (ja) * 2007-01-23 2011-05-18 株式会社タムラ製作所 はんだ付け装置及びはんだ付け方法並びにはんだ付け用プログラム
US20080255936A1 (en) * 2007-04-13 2008-10-16 Yahoo! Inc. System and method for balancing goal guarantees and optimization of revenue in advertisement delivery under uneven, volatile traffic conditions
US7809459B2 (en) * 2007-12-31 2010-10-05 Hitachi Global Technologies Netherlands B.V. Advanced-process-control system utilizing a lambda tuner
CN101949652B (zh) * 2010-09-28 2012-11-07 中南大学 基于满意优化的热风温度与烧结终点温度协调控制方法
DE202012000084U1 (de) 2012-01-05 2012-04-02 Dirk Stiebert Sicherheitsgerichtete fehlertolerante Thermoprozesssteuerung
JP6112089B2 (ja) * 2014-09-17 2017-04-12 カシオ計算機株式会社 加熱装置、加熱方法、及び、立体形成システム
DE112021007422T5 (de) * 2021-03-30 2024-01-25 Mitsubishi Electric Corporation Arbeits-assistenzvorrichtung, arbeits-assistenzsystem und arbeits-assistenzverfahren

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JPH05293637A (ja) * 1992-03-31 1993-11-09 Matsushita Electric Ind Co Ltd リフロー装置
WO1995027235A1 (en) * 1994-03-31 1995-10-12 Omron Corporation Control system and method

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US3621213A (en) 1969-11-26 1971-11-16 Ibm Programmed digital-computer-controlled system for automatic growth of semiconductor crystals
US3793717A (en) 1971-04-01 1974-02-26 Rca Corp Method of controlling resistance values of thick-film resistors
FR2174748B1 (enExample) 1972-03-09 1975-03-07 Est Aciers Fins
US4176554A (en) 1977-11-09 1979-12-04 Kazmierowicz Casimir W Method and apparatus for obtaining the temperature profile of a kiln
US4242907A (en) 1979-02-12 1981-01-06 Kazmierowicz Casimir W Apparatus for monitoring and controlling a flat zone in a furnace
JPS5947324A (ja) 1982-09-08 1984-03-17 Mitsubishi Electric Corp 加熱炉の加熱制御方法
DE3400300C2 (de) 1983-06-24 1986-01-23 Gebrüder Bühler AG, Uzwil Verfahren zur Herstellung von langen Teigwaren und Vorrichtung zur Durchführung eines solchen Verfahrens
JPS61145606A (ja) 1984-12-19 1986-07-03 Ohkura Electric Co Ltd 干渉対応形パタ−ン切換式温度制御装置
JP2501334B2 (ja) 1987-06-19 1996-05-29 松下電工株式会社 リフロ−炉
US4982347A (en) 1989-06-22 1991-01-01 Unisys Corporation Process and apparatus for producing temperature profiles in a workpiece as it passes through a belt furnace
JPH0786783B2 (ja) 1989-11-04 1995-09-20 勝久 古田 調整入力による炉温制御装置
US5396416A (en) * 1992-08-19 1995-03-07 Continental Controls, Inc. Multivariable process control method and apparatus
US5439160A (en) 1993-03-31 1995-08-08 Siemens Corporate Research, Inc. Method and apparatus for obtaining reflow oven settings for soldering a PCB
US5457625A (en) * 1994-04-13 1995-10-10 The M. W. Kellogg Company Maximizing process production rates using permanent constraints
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US5971249A (en) * 1997-02-24 1999-10-26 Quad Systems Corporation Method and apparatus for controlling a time/temperature profile inside of a reflow oven
JP3274095B2 (ja) * 1997-07-18 2002-04-15 富士通株式会社 加熱炉内の被加熱物の熱解析装置及びそれを用いたリフロー炉の制御装置並びにそのプログラムを記録したコンピュータ読み取り可能な記録媒体

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05293637A (ja) * 1992-03-31 1993-11-09 Matsushita Electric Ind Co Ltd リフロー装置
WO1995027235A1 (en) * 1994-03-31 1995-10-12 Omron Corporation Control system and method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110678823A (zh) * 2017-05-29 2020-01-10 理化工业株式会社 控制系统设计装置以及控制系统
CN110678823B (zh) * 2017-05-29 2021-06-25 理化工业株式会社 控制系统设计装置以及控制系统
US11525736B2 (en) * 2020-01-15 2022-12-13 International Business Machines Corporation Temperature monitoring for printed circuit board assemblies during mass soldering

Also Published As

Publication number Publication date
WO2001022188A1 (en) 2001-03-29
EP1218812B1 (en) 2003-04-23
CN100371842C (zh) 2008-02-27
EP1218812A1 (en) 2002-07-03
US6453219B1 (en) 2002-09-17
DE60002354D1 (de) 2003-05-28
CN1391667A (zh) 2003-01-15
DE60002354T2 (de) 2003-12-04

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