JP2003344318A - Fluorescent x-ray analyzer - Google Patents

Fluorescent x-ray analyzer

Info

Publication number
JP2003344318A
JP2003344318A JP2002155674A JP2002155674A JP2003344318A JP 2003344318 A JP2003344318 A JP 2003344318A JP 2002155674 A JP2002155674 A JP 2002155674A JP 2002155674 A JP2002155674 A JP 2002155674A JP 2003344318 A JP2003344318 A JP 2003344318A
Authority
JP
Japan
Prior art keywords
sample
irradiation chamber
cover member
ray
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002155674A
Other languages
Japanese (ja)
Inventor
Kazu Morioka
和 森岡
Takao Marui
隆雄 丸井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP2002155674A priority Critical patent/JP2003344318A/en
Publication of JP2003344318A publication Critical patent/JP2003344318A/en
Pending legal-status Critical Current

Links

Abstract

<P>PROBLEM TO BE SOLVED: To simply and easily prevent an analytical mechanism such as an irradiation source, a detector or the like from colliding with a sample in a fluorescent X-ray analyzer. <P>SOLUTION: In the fluorescent X-ray analyzer, a contact sensor used to detect that the sample S has come close to an irradiation chamber before the sample S collides with the analytical mechanism is installed, so as to prevent the analytical mechanism and the irradiation chamber from colliding with the sample. The X-ray analyzer comprises the irradiation source (an X-ray source 2) used to generate fluorescent X-rays from the sample, the irradiation chamber (an X-ray irradiation chamber 7) having the detector 6 used to detect the fluorescent X-rays, and a sample stage 8 arranged so as to face the irradiation chamber (the irradiation chamber 7) by keeping an interval at its lower part. A cover member 9 used to cover a face on which at least the irradiation chamber (the irradiation chamber 7) faces the sample stage 8 is provided between the irradiation chamber (the irradiation chamber 7) and the sample stage 8, and the cover member 9 constitutes an electrical switch mechanism used to detect its contact with the sample. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、蛍光X線分析装置
に関し、特に試料の衝突防止に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fluorescent X-ray analyzer, and more particularly to prevention of collision of a sample.

【0002】[0002]

【従来の技術】試料に対して、X線を照射し、試料から
発生した蛍光X線を検出器で測定することにより、試料
の定性分析や定量分析を行う蛍光X線分析装置が知られ
ている。
2. Description of the Related Art There is known a fluorescent X-ray analyzer for qualitative or quantitative analysis of a sample by irradiating the sample with X-rays and measuring the fluorescent X-rays generated from the sample with a detector. There is.

【0003】このような蛍光X線分析装置の一構成とし
て、X線を試料に照射する照射源、及び試料から発生し
た蛍光X線を検出する検出器等の分析機構を備える照射
室を試料ステージに対向させた構成とし、試料ステージ
上に配置した試料に対してX線を照射し、試料から発生
した蛍光X線を検出している。
As one configuration of such a fluorescent X-ray analyzer, a sample stage is provided with an irradiation source equipped with an irradiation source for irradiating a sample with X-rays and an analysis mechanism such as a detector for detecting fluorescent X-rays generated from the sample. The X-ray is irradiated to the sample placed on the sample stage, and the fluorescent X-ray generated from the sample is detected.

【0004】この構成による蛍光X線分析装置では、試
料を試料ステージ上に配置し、この試料ステージを照射
室に対してX,Y方向に移動させることにより、X線の
照射線の照射位置が試料平面上の所定位置となるように
調整し、また、試料ステージを照射室に対してZ方向
(上下方向)に移動させることにより、照射X線及び検
出器の焦点が試料の所定高さに合うように調整してい
る。
In the fluorescent X-ray analyzer having this configuration, the sample is placed on the sample stage, and the sample stage is moved in the X and Y directions with respect to the irradiation chamber so that the irradiation position of the X-ray irradiation line is changed. The irradiation X-rays and the focus of the detector are adjusted to a predetermined height of the sample by adjusting the sample stage to a predetermined position on the plane and moving the sample stage in the Z direction (vertical direction) with respect to the irradiation chamber. Adjusted to fit.

【0005】[0005]

【発明が解決しようとする課題】前記構成の蛍光X線顕
微鏡では、試料ステージ上に試料を配置した状態で試料
ステージを上下移動させ、照射室と試料との間の距離を
調節することによって照射線の焦点位置を調整してい
る。この焦点位置の調整は、通常、試料ステージ自体の
高さを基準として行っている。そのため、試料ステージ
を照射室側に近づくように上方に移動させたり、横方向
に移動させると、試料の厚みによっては、試料が照射室
の一部に衝突する場合がある。
In the fluorescent X-ray microscope having the above-mentioned structure, the sample stage is moved up and down while the sample is placed on the sample stage, and the distance between the irradiation chamber and the sample is adjusted. Adjusting the focus position of the line. The adjustment of the focus position is usually performed with reference to the height of the sample stage itself. Therefore, when the sample stage is moved upward so as to approach the irradiation chamber side or laterally moved, the sample may collide with a part of the irradiation chamber depending on the thickness of the sample.

【0006】従来の蛍光X線顕微鏡は試料の衝突防止機
構を備えていないため、試料ステージ上に配置した試料
がその上方に配置された分析機構や照射室と衝突し、試
料が破損したり、あるは分析機構や照射室が損傷するお
それがあるという問題がある。
Since the conventional fluorescent X-ray microscope does not have a sample collision prevention mechanism, the sample arranged on the sample stage collides with the analysis mechanism and the irradiation chamber arranged above the sample stage, and the sample is damaged or damaged. There is a problem that the analysis mechanism and the irradiation chamber may be damaged.

【0007】このような問題に対して、試料表面の高さ
を測定し、試料と分析機構や照射室とが衝突しないよう
に試料ステージの移動量を制御することにより、試料と
分析機構や照射室との衝突を防止することも考えられる
が、この試料ステージの制御は、試料表面の凹凸や傾
き、あるいは試料ステージ自体の傾斜などのため必ずし
も容易ではなく、また、表面高さを測定する機構や制御
機構等の複雑な構成を必要であり、コストを高める要因
ともなる。
In order to solve such a problem, the height of the sample surface is measured and the movement amount of the sample stage is controlled so that the sample does not collide with the analysis mechanism or the irradiation chamber. Although it is possible to prevent collision with the chamber, control of the sample stage is not always easy due to unevenness and inclination of the sample surface, or inclination of the sample stage itself, and a mechanism for measuring the surface height. And a complicated structure such as a control mechanism are required, which also causes a cost increase.

【0008】そこで、本発明は前記した従来の問題点を
解決し、蛍光X線分析装置において、照射源や検出器等
の分析機構や照射室と試料との衝突を簡易に防止するこ
とを目的とする。
[0008] Therefore, the present invention solves the above-mentioned conventional problems, and in the fluorescent X-ray analyzer, an analysis mechanism such as an irradiation source and a detector, or an irradiation chamber, can be easily prevented from colliding with the sample. And

【0009】[0009]

【課題を解決するための手段】本発明は、試料が分析機
構に衝突する前に、試料が照射室に接近したことを検出
する接触センサを設けることにより、分析機構や照射室
が試料と衝突するのを防止するものであり、試料から蛍
光X線を発生させる照射源、及びこの蛍光X線を検出す
る検出器を有する照射室と、照射室の下方に間隔をあけ
て対向配置する試料ステージとを有する蛍光X線分析装
置において、照射室と試料ステージとの間に、少なくと
も照射室が試料ステージと対向する面を覆うカバー部材
を備え、このカバー部材は、電気的スイッチ機構を構成
する。
The present invention provides a contact sensor for detecting that a sample approaches the irradiation chamber before the sample collides with the analysis mechanism, so that the analysis mechanism and the irradiation chamber collide with the sample. A sample stage that is arranged to face the irradiation chamber having an irradiation source for generating fluorescent X-rays from the sample and a detector for detecting the fluorescent X-rays, and a space below the irradiation chamber with a space therebetween. In the X-ray fluorescence analyzer having the above, a cover member is provided between the irradiation chamber and the sample stage to cover at least the surface of the irradiation chamber facing the sample stage, and the cover member constitutes an electrical switch mechanism.

【0010】本発明のカバー部材は、照射室と試料ステ
ージとの間に配置することにより、試料上に配置された
試料と照射室とが直接接触することを防ぎ、また、電気
的スイッチ機構を構成することにより、試料が照射室に
接近したことを検出することができる。電気的スイッチ
機構を構成する一方の端点はカバー部材であり、他方の
端点は照射室、あるいは他の独立した接点部材とするこ
とができる。
By disposing the cover member of the present invention between the irradiation chamber and the sample stage, it is possible to prevent the sample arranged on the sample from directly contacting the irradiation chamber, and also to provide an electrical switch mechanism. With the configuration, it is possible to detect that the sample approaches the irradiation chamber. One end point of the electric switch mechanism can be a cover member, and the other end point can be an irradiation chamber or another independent contact member.

【0011】電気的スイッチ機構を構成する端点を、カ
バー部材及び照射室とする場合には、カバー部材を照射
室に対して下方にぶら下げて垂下させることで電気的に
分離して常開スイッチを構成する。電気的スイッチ機構
の閉成は、カバー部材が上昇して照射室と接触すること
により行われる。これによって、試料がカバー部材に接
触したことが検出される。一方、カバー部材が下降して
分析機構から離れるとスイッチは開成し、試料とカバー
部材との接触が解かれたことが検出される。
When the end points constituting the electrical switch mechanism are the cover member and the irradiation chamber, the cover member hangs downward from the irradiation chamber and hangs down to electrically separate the cover member and the normally open switch. Constitute. The electric switch mechanism is closed by raising the cover member and making contact with the irradiation chamber. This detects that the sample has come into contact with the cover member. On the other hand, when the cover member descends and separates from the analysis mechanism, the switch is opened, and it is detected that the contact between the sample and the cover member is released.

【0012】本発明による電気的スイッチ機構は、試料
ステージと照射室との間に、少なくとも照射室が試料ス
テージと対向する面を覆うカバー部材を設けるという簡
易な構成とすることができる。
The electrical switch mechanism according to the present invention can have a simple structure in which a cover member is provided between the sample stage and the irradiation chamber to cover at least the surface of the irradiation chamber facing the sample stage.

【0013】また、試料ステージが上下方向(Z方向)
に移動する他、横方向(X,Y方向)に移動した場合で
あっても、試料がカバー部材に接触しさえすれば検出す
ることができる。また、本発明の蛍光X線分析装置は、
電気的スイッチ機構による検出に基づいて試料ステージ
の移動を停止することができる。
Further, the sample stage is vertically moved (Z direction).
In addition to moving to the horizontal direction (X direction, Y direction), the sample can be detected as long as it contacts the cover member. Further, the X-ray fluorescence analyzer of the present invention is
The movement of the sample stage can be stopped based on the detection by the electrical switch mechanism.

【0014】[0014]

【発明の実施の形態】以下、本発明の実施の形態につい
て、図を参照しながら詳細に説明する。図1は本発明の
蛍光X線分析装置の第1の形態を説明するための概略図
である。第1の形態は、試料との接触を検出する電気的
スイッチ機構を、カバー部材とX線照射室とで構成する
ものである。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a schematic diagram for explaining a first mode of the X-ray fluorescence analyzer of the present invention. In the first form, an electric switch mechanism for detecting contact with a sample is composed of a cover member and an X-ray irradiation chamber.

【0015】蛍光X線分析装置1は、試料S上にX線を
照射する構成として、X線源2と、X線集光用キャピラ
リレンズ3と、このキャピラリレンズを所定位置に保持
するキャピラリ固定用フランジ4を備え、また、試料S
から発生した蛍光X線を検出する構成として、蛍光X線
集光部5と、検出器6を備え、分析機構を構成する。X
線照射室7は、この分析機構を所定位置関係に保持し、
X線照射室7の開口部分には、X線集光用キャピラリレ
ンズ3及び蛍光X線集光部5の各先端部分が突出して設
けられている。
The X-ray fluorescence analyzer 1 is configured to irradiate a sample S with X-rays, an X-ray source 2, an X-ray condensing capillary lens 3, and a capillary fixing that holds this capillary lens at a predetermined position. Equipped with a flange 4 for the sample S
As a configuration for detecting the fluorescent X-rays generated from, the fluorescent X-ray condensing unit 5 and the detector 6 are provided, and an analysis mechanism is configured. X
The radiation irradiation chamber 7 holds this analysis mechanism in a predetermined positional relationship,
At the opening of the X-ray irradiation chamber 7, the respective tip portions of the X-ray focusing capillary lens 3 and the fluorescent X-ray focusing section 5 are provided so as to project.

【0016】X線照射室7の下方位置には、試料ステー
ジ8が設けられる。試料ステージ8は、上部面に試料S
を配置して支持すると共に、X,Y方向及びZ方向に移
動可能としている。なお、X,Y方向の移動は、試料S
を分析機構に対して横方向に移動させ、Z方向の移動
は、試料Sを分析機構に対して上下方向に移動させる。
A sample stage 8 is provided below the X-ray irradiation chamber 7. The sample stage 8 has a sample S on the upper surface.
Are arranged and supported, and are movable in the X, Y and Z directions. It should be noted that the movement in the X and Y directions is performed by the sample S.
Is moved laterally with respect to the analysis mechanism, and the movement in the Z direction moves the sample S vertically with respect to the analysis mechanism.

【0017】本発明の蛍光X線分析装置1は、X線照射
室7と試料ステージ8との間の隙間にカバー部材9を備
える。カバー部材9は、少なくともX線照射室7の下端
部分を覆い、試料SがX線集光用キャピラリレンズ3や
蛍光X線集光部5の先端部分と直接に接触しないように
保護すると共に、X線照射室7と組み合わせることによ
り試料Sの接触を検出する電気的スイッチ機構を構成す
る。
The X-ray fluorescence analyzer 1 of the present invention is equipped with a cover member 9 in the gap between the X-ray irradiation chamber 7 and the sample stage 8. The cover member 9 covers at least the lower end portion of the X-ray irradiation chamber 7 to protect the sample S from directly contacting the tip portion of the X-ray focusing capillary lens 3 or the fluorescent X-ray focusing unit 5, and By combining with the X-ray irradiation chamber 7, an electric switch mechanism for detecting the contact of the sample S is constructed.

【0018】電気的スイッチ機構は、X線照射室7とカ
バー部材9を接点とする回路により構成される。通常状
態においては、X線照射室7とカバー部材9とは非接触
状態にあり、回路は開いた状態にある。一方、X線照射
室7とカバー部材9とが接触すると、回路は閉じた状態
となる。したがって、この回路の開閉により、X線照射
室7とカバー部材9との接触、非接触を検出することが
でき、さらに、試料SがX線照射室7に接近し、衝突す
るおそれがあることを検出することができる。
The electrical switch mechanism is composed of a circuit having the X-ray irradiation chamber 7 and the cover member 9 as contacts. In the normal state, the X-ray irradiation chamber 7 and the cover member 9 are in a non-contact state, and the circuit is in an open state. On the other hand, when the X-ray irradiation chamber 7 and the cover member 9 come into contact with each other, the circuit is closed. Therefore, by opening / closing this circuit, contact or non-contact between the X-ray irradiation chamber 7 and the cover member 9 can be detected, and further, the sample S may approach the X-ray irradiation chamber 7 and collide with it. Can be detected.

【0019】カバー部材9は、X線照射室7に対して保
持部材10によって、電気的に絶縁された状態で上下動
自在に取り付けられる。保持部材10によるカバー部材
9の取り付けは、例えば、絶縁性のねじ部材によってカ
バー部材9を保持部材9からつり下げることで行うこと
ができる。このつり下げにおいて、カバー部材9は、上
下動が自在となるように上下方向に余裕を持たせてお
く。この垂下保持により、試料Sがカバー部材9と接触
していない状態では、カバー部材9は自重により下方位
置に下がった状態で保持される。このとき、カバー部材
9の上面とX線照射室7の下端面との間に隙間が形成さ
れ、X線照射室7とカバー部材9とは電気的に絶縁され
た状態となる。図1(a)はこの状態を示している。
The cover member 9 is attached to the X-ray irradiation chamber 7 by a holding member 10 so as to be vertically movable in an electrically insulated state. The attachment of the cover member 9 by the holding member 10 can be performed, for example, by suspending the cover member 9 from the holding member 9 with an insulating screw member. In this suspension, the cover member 9 is provided with a margin in the vertical direction so that the cover member 9 can freely move up and down. Due to this suspended holding, when the sample S is not in contact with the cover member 9, the cover member 9 is held in a state of being lowered to the lower position by its own weight. At this time, a gap is formed between the upper surface of the cover member 9 and the lower end surface of the X-ray irradiation chamber 7, and the X-ray irradiation chamber 7 and the cover member 9 are electrically insulated. FIG. 1 (a) shows this state.

【0020】試料ステージ上に試料を固定し、試料ステ
ージを用いて分析位置をX線集光用キャピラリレンズの
集光位置へ移動させる。この移動において、試料ステー
ジ8を上方(Z方向)に移動させたとき、試料の凹凸が
大きい場合や、分析位置よりも試料が上方に移動する
と、試料Sがカバー部材9に接触する。これにより、カ
バー部材9は試料Sにより上方(Z方向)押し上げられ
て、カバー部材9の上面とX線照射室7の下端面とが接
触する。カバー部材9の上面とX線照射室7の下端面と
が接触すると、カバー部材9とX線照射室7を接点とす
る回路が閉じた状態となる。この回路が閉じた状態は、
図示しない検出手段で検出することができる。図1
(b)はこの状態を示している。
The sample is fixed on the sample stage, and the analysis position is moved to the focusing position of the X-ray focusing capillary lens using the sample stage. In this movement, when the sample stage 8 is moved upward (Z direction), when the unevenness of the sample is large, or when the sample moves above the analysis position, the sample S comes into contact with the cover member 9. As a result, the cover member 9 is pushed upward (in the Z direction) by the sample S, and the upper surface of the cover member 9 and the lower end surface of the X-ray irradiation chamber 7 come into contact with each other. When the upper surface of the cover member 9 and the lower end surface of the X-ray irradiation chamber 7 come into contact with each other, the circuit having the cover member 9 and the X-ray irradiation chamber 7 as a contact is closed. When this circuit is closed,
It can be detected by a detection means (not shown). Figure 1
(B) shows this state.

【0021】なお、カバー部材9には、X線集光用キャ
ピラリレンズ3及び蛍光X線集光部5の各延長上の部分
に開口部9aが形成され、X線集光用キャピラリレンズ
3で集光されX線を試料Sに照射し、X線照射によって
試料Sから放出された蛍光X線を蛍光X線集光部5内に
導入する。
In the cover member 9, an opening 9a is formed in each extension of the X-ray condensing capillary lens 3 and the fluorescent X-ray condensing unit 5, and the X-ray condensing capillary lens 3 is used. The sample S is irradiated with the condensed X-rays, and the fluorescent X-rays emitted from the sample S by the X-ray irradiation are introduced into the fluorescent X-ray condensing unit 5.

【0022】検出手段は、例えば図2に示すように、回
路中に接続した電源11と検出器12とにより構成する
ことができる。
The detecting means can be composed of a power source 11 and a detector 12 connected in a circuit as shown in FIG. 2, for example.

【0023】図2は、カバー部材とX線照射室との接触
を検出する回路構成を説明するための図である。図2
(a)はカバー部材とX線照射室との非接触状態を示し
ている。この状態では、カバー部材9は自重によって下
方位置に下がっており、X線照射室7との間に隙間が形
成されている。そのため、電源11、カバー部材9、X
線照射室7、及び検出器12で形成される回路は開放状
態にある。この開放状態は、例えば、検出器12で検出
される電圧値や電流値により知ることができる。
FIG. 2 is a diagram for explaining a circuit configuration for detecting contact between the cover member and the X-ray irradiation chamber. Figure 2
(A) shows a non-contact state between the cover member and the X-ray irradiation chamber. In this state, the cover member 9 is lowered to the lower position by its own weight, and a gap is formed between the cover member 9 and the X-ray irradiation chamber 7. Therefore, the power source 11, the cover member 9, X
The circuit formed by the line irradiation chamber 7 and the detector 12 is in an open state. This open state can be known by, for example, the voltage value or current value detected by the detector 12.

【0024】次に、試料ステージ8が上方(Z方向)に
移動し、この移動に伴って試料ステージ上の試料Sが過
度に上昇すると、試料Sの上端はカバー部材9の下面と
接触する。図2(b)は試料Sとカバー部材9とが接触
した状態を示している。この状態においては、カバー部
材9とX線照射室7との間にはまだ隙間があるため閉回
路が形成されず、検出器12に出力は現れない。
Next, when the sample stage 8 moves upward (Z direction) and the sample S on the sample stage rises excessively with this movement, the upper end of the sample S contacts the lower surface of the cover member 9. FIG. 2B shows a state in which the sample S and the cover member 9 are in contact with each other. In this state, since there is still a gap between the cover member 9 and the X-ray irradiation chamber 7, a closed circuit is not formed and no output appears in the detector 12.

【0025】試料ステージ8がさらに上方(Z方向)に
移動し、この移動に伴って試料ステージ上の試料Sがさ
らに上昇すると、カバー部材9は試料Sに押し上げられ
て、その上端面はX線照射室7の下面と接触する。図2
(c)はカバー部材9とX線照射室7が接触した状態を
示している。この状態においては、カバー部材9とX線
照射室7とが接触することにより閉回路が形成され、検
出器12に出力が現れる。これによって、試料SがX線
照射室7に接近したことが検出される。
When the sample stage 8 moves further upward (Z direction) and the sample S on the sample stage further rises with this movement, the cover member 9 is pushed up by the sample S, and the upper end surface of the cover member 9 is X-rayed. It contacts the lower surface of the irradiation chamber 7. Figure 2
(C) shows the state where the cover member 9 and the X-ray irradiation chamber 7 are in contact with each other. In this state, the cover member 9 and the X-ray irradiation chamber 7 are in contact with each other to form a closed circuit, and an output appears on the detector 12. As a result, it is detected that the sample S has approached the X-ray irradiation chamber 7.

【0026】検出器12で検出した信号は、図示しない
制御手段に送られ試料ステージ8を制御する。試料ステ
ージ8の制御の態様としては、例えば、試料ステージの
停止や、試料ステージを下方に移動させる等がある。
The signal detected by the detector 12 is sent to control means (not shown) to control the sample stage 8. Examples of control modes of the sample stage 8 include stopping the sample stage and moving the sample stage downward.

【0027】次に、本発明の本発明の蛍光X線分析装置
の第2の形態を、図3を用いて説明する。第2の形態
は、試料との接触を検出する電気的スイッチ機構を、カ
バー部材とX線照射室と、独立した他の接点部材とで構
成するものであり、試料がカバー部材と接触していない
状態において回路を閉じ、試料がカバー部材と接触した
状態において回路を開く構成とする。なお、図3では、
蛍光X線分析装置の一部のみを示している。
Next, a second embodiment of the X-ray fluorescence analyzer of the present invention will be described with reference to FIG. In the second mode, the electrical switch mechanism for detecting contact with the sample is composed of the cover member, the X-ray irradiation chamber, and another independent contact member, and the sample is in contact with the cover member. The circuit is closed when there is no contact, and the circuit is opened when the sample is in contact with the cover member. In addition, in FIG.
Only part of the X-ray fluorescence analyzer is shown.

【0028】図3において、検出手段を構成する回路
は、一方の端点をカバー部材9とし、他方の端点をX線
照射室7から独立した接点部材13とし、このカバー部
材9と接点部材13との間に電源11と検出器12を接
続している。
In FIG. 3, in the circuit constituting the detecting means, one end point is a cover member 9 and the other end point is a contact member 13 independent of the X-ray irradiation chamber 7, and the cover member 9 and the contact member 13 are connected to each other. The power source 11 and the detector 12 are connected between the two.

【0029】図3(a)はカバー部材とX線照射室との
非接触状態を示している。この状態では、カバー部材9
は自重によって下方位置に下がり、接点部材13と接触
している。そのため、電源11、カバー部材9、接点部
材13、及び検出器12で形成される回路は閉状態にあ
る。この閉状態は、例えば、検出器12で検出される電
圧値や電流値により知ることができる。
FIG. 3A shows a non-contact state between the cover member and the X-ray irradiation chamber. In this state, the cover member 9
Is lowered to its lower position by its own weight and is in contact with the contact member 13. Therefore, the circuit formed by the power source 11, the cover member 9, the contact member 13, and the detector 12 is in a closed state. This closed state can be known by, for example, the voltage value or current value detected by the detector 12.

【0030】次に、試料ステージ8が上方(Z方向)に
移動し、この移動に伴って試料ステージ上の試料Sが過
度に上昇すると、試料Sの上端はカバー部材9の下面と
接触する。図3(b)は試料Sとカバー部材9とが接触
した状態を示している。この状態においては、カバー部
材9と接点部材13とは接触した状態にあるため、閉回
路が形成された状態のままであり、検出器12の出力は
変化しない。
Next, when the sample stage 8 moves upward (Z direction) and the sample S on the sample stage rises excessively with this movement, the upper end of the sample S comes into contact with the lower surface of the cover member 9. FIG. 3B shows a state where the sample S and the cover member 9 are in contact with each other. In this state, since the cover member 9 and the contact member 13 are in contact with each other, the closed circuit is still formed and the output of the detector 12 does not change.

【0031】試料ステージ8がさらに上方(Z方向)に
移動し、この移動に伴って試料ステージ上の試料Sがさ
らに上昇すると、カバー部材9は試料Sに押し上げられ
て、接点部材13から離れる。図3(c)はカバー部材
9が接点部材13から離れた状態を示している。この状
態においては、カバー部材9と接点部材13との接触が
なくなることにより閉回路が形成されず、検出器12の
出力が変化する。これによって、試料SがX線照射室7
に接近したことが検出される。
When the sample stage 8 moves further upward (Z direction) and the sample S on the sample stage further rises with this movement, the cover member 9 is pushed up by the sample S and separated from the contact member 13. FIG. 3C shows a state in which the cover member 9 is separated from the contact member 13. In this state, the closed circuit is not formed because the contact between the cover member 9 and the contact member 13 is lost, and the output of the detector 12 changes. As a result, the sample S is transferred to the X-ray irradiation chamber 7
Is approached.

【0032】次に、試料ステージが横方向(X,Y方
向)に移動した場合の接触検出について、図4を用いて
説明する。この接触検出では、試料の一部分がカバー部
材と接触し、このカバー部材とX線照射室との接触を検
出する。
Next, contact detection when the sample stage moves laterally (X, Y directions) will be described with reference to FIG. In this contact detection, a part of the sample comes into contact with the cover member, and the contact between the cover member and the X-ray irradiation chamber is detected.

【0033】図4(a)はカバー部材とX線照射室との
非接触状態を示している。この状態では、カバー部材9
は自重によって下方位置に下がっており、X線照射室7
との間に隙間が形成され、また、横方向においてもカバ
ー部材9とX線照射室7との間に隙間が形成されてい
る。これにより、電源11、カバー部材9、X線照射室
7、及び検出器12で形成される回路は開放状態にあ
る。この開放状態は、例えば、検出器12で検出される
電圧値や電流値により知ることができる。
FIG. 4A shows a non-contact state between the cover member and the X-ray irradiation chamber. In this state, the cover member 9
Is lowered to the lower position by its own weight, and the X-ray irradiation chamber 7
And a gap is formed between the cover member 9 and the X-ray irradiation chamber 7 also in the lateral direction. As a result, the circuit formed by the power source 11, the cover member 9, the X-ray irradiation chamber 7, and the detector 12 is in an open state. This open state can be known by, for example, the voltage value or current value detected by the detector 12.

【0034】次に、試料ステージ8が横方向(X,Y方
向)に移動し、この移動に伴って試料ステージ上の試料
Sが過度に横ずれすると、試料Sの突起部14はカバー
部材9の側面と接触する。図4(b)は試料Sの突起部
14とカバー部材9の側面とが接触した状態を示してい
る。この状態においては、カバー部材9とX線照射室7
との間にはまだ隙間があるため閉回路が形成されず、検
出器12に出力は現れない。
Next, when the sample stage 8 moves laterally (in the X and Y directions) and the sample S on the sample stage is excessively laterally displaced in accordance with this movement, the protrusion 14 of the sample S causes the protrusion 14 of the cover member 9 to move. Contact the sides. FIG. 4B shows a state in which the protrusion 14 of the sample S and the side surface of the cover member 9 are in contact with each other. In this state, the cover member 9 and the X-ray irradiation chamber 7
Since there is still a gap between and, a closed circuit is not formed and no output appears at the detector 12.

【0035】試料ステージ8がさらに横方向(X,Y方
向)に移動し、この移動に伴って試料ステージ上の試料
Sがさらに横ずれすると、カバー部材9は試料Sに押さ
れて、カバー部材9の側部9aがX線照射室7の側面と
接触する。図4(c)はカバー部材9の側部9aとX線
照射室7の側面が接触した状態を示している。この状態
においては、カバー部材9とX線照射室7とが接触する
ことにより閉回路が形成され、検出器12に出力が現れ
る。これによって、試料SがX線照射室7に接近したこ
とが検出される。
When the sample stage 8 is further moved in the lateral direction (X, Y directions) and the sample S on the sample stage is further laterally displaced due to this movement, the cover member 9 is pushed by the sample S and the cover member 9 is moved. The side portion 9a of the contact part comes into contact with the side surface of the X-ray irradiation chamber 7. FIG. 4C shows a state in which the side portion 9a of the cover member 9 and the side surface of the X-ray irradiation chamber 7 are in contact with each other. In this state, the cover member 9 and the X-ray irradiation chamber 7 are in contact with each other to form a closed circuit, and an output appears on the detector 12. As a result, it is detected that the sample S has approached the X-ray irradiation chamber 7.

【0036】なお、図4に示す例は前記図2に示す構成
について示しているが、図3に示す構成についても接点
部材を適宜配置することで適用することができる。
Although the example shown in FIG. 4 shows the configuration shown in FIG. 2, the configuration shown in FIG. 3 can also be applied by appropriately disposing the contact members.

【発明の効果】以上説明したように、本発明によれば、
蛍光X線分析装置において、照射源や検出器等の分析機
構と試料との衝突を簡易に防止することができる。
As described above, according to the present invention,
In the fluorescent X-ray analyzer, it is possible to easily prevent the collision between the analysis mechanism such as the irradiation source and the detector and the sample.

【0037】[0037]

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の蛍光X線分析装置の第1の形態を説明
するための概略図である。
FIG. 1 is a schematic diagram for explaining a first mode of an X-ray fluorescence analyzer of the present invention.

【図2】本発明のカバー部材とX線照射室との接触を検
出する回路構成を説明するための図である。
FIG. 2 is a diagram for explaining a circuit configuration for detecting contact between the cover member and the X-ray irradiation chamber of the present invention.

【図3】本発明の蛍光X線分析装置の第2の形態を説明
するための概略図である。
FIG. 3 is a schematic diagram for explaining a second mode of the X-ray fluorescence analyzer of the present invention.

【図4】本発明のカバー部材とX線照射室との横方向の
接触を説明するための図である。
FIG. 4 is a diagram for explaining lateral contact between the cover member of the present invention and the X-ray irradiation chamber.

【符号の説明】[Explanation of symbols]

1…蛍光X線分析装置、2…X線源、3…X線集光用キ
ャピラリレンズ、4…キャピラリ固定用フランジ、5…
蛍光X線集光管、6…検出器、7…X線照射室、8…試
料ステージ、9…カバー部材、9a…側部、10…保持
部材、11…電源、12…検出器、13…接点部材、1
4…突起部、S…試料。
1 ... Fluorescent X-ray analyzer, 2 ... X-ray source, 3 ... Capillary lens for collecting X-rays, 4 ... Capillary fixing flange, 5 ...
X-ray fluorescence condensing tube, 6 ... Detector, 7 ... X-ray irradiation chamber, 8 ... Sample stage, 9 ... Cover member, 9a ... Side part, 10 ... Holding member, 11 ... Power supply, 12 ... Detector, 13 ... Contact member, 1
4 ... Projection, S ... Sample.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 試料にX線を照射する照射源、及び試料
から発生するX線を検出する検出器を有する照射室と、
前記照射室の下方に間隔をあけて対向配置する試料ステ
ージとを有する蛍光X線分析装置において、前記照射室
と前記試料ステージとの間に、少なくとも照射室が試料
ステージと対向する面を覆うカバー部材を備え、前記カ
バー部材は、試料との接触を検出する電気的スイッチ機
構の一端を構成することを特徴とする、蛍光X線分析装
置。
1. An irradiation chamber having an irradiation source for irradiating a sample with X-rays and a detector for detecting X-rays generated from the sample,
In a fluorescent X-ray analysis apparatus having a sample stage arranged below the irradiation chamber so as to face each other with a gap, a cover covering at least a surface of the irradiation chamber facing the sample stage between the irradiation chamber and the sample stage. An X-ray fluorescence analyzer, comprising a member, wherein the cover member constitutes one end of an electrical switch mechanism for detecting contact with a sample.
【請求項2】 前記電気的スイッチ機構において、カバ
ー部材と接触する他端は前記照射室であることを特徴と
する、請求項1記載の蛍光X線分析装置。
2. The X-ray fluorescence analyzer according to claim 1, wherein the other end of the electrical switch mechanism that comes into contact with the cover member is the irradiation chamber.
【請求項3】 前記電気的スイッチ機構は、カバー部材
を照射室に対して垂下させることで電気的に分離して常
開スイッチを構成し、カバー部材の上昇による照射室と
の接触により閉成することを特徴とする、請求項2に記
載の蛍光X線分析装置。
3. The electrical switch mechanism forms a normally open switch by electrically separating the cover member by hanging it from the irradiation chamber, and is closed by contact with the irradiation chamber when the cover member rises. The fluorescent X-ray analysis device according to claim 2, wherein
【請求項4】 前記電気的スイッチ機構による検出に基
づいて、試料ステージの移動を停止することを特徴とす
る、請求項1乃至3の何れか一つに記載の蛍光X線分析
装置。
4. The X-ray fluorescence analyzer according to claim 1, wherein movement of the sample stage is stopped based on detection by the electrical switch mechanism.
JP2002155674A 2002-05-29 2002-05-29 Fluorescent x-ray analyzer Pending JP2003344318A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002155674A JP2003344318A (en) 2002-05-29 2002-05-29 Fluorescent x-ray analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002155674A JP2003344318A (en) 2002-05-29 2002-05-29 Fluorescent x-ray analyzer

Publications (1)

Publication Number Publication Date
JP2003344318A true JP2003344318A (en) 2003-12-03

Family

ID=29772144

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2003344318A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006208013A (en) * 2005-01-25 2006-08-10 Jfe Steel Kk Measuring instrument of adhesion amount of surface-treated film on metal strip and measuring method
JP2007033207A (en) * 2005-07-26 2007-02-08 Hamamatsu Photonics Kk Fluorescence x-ray three-dimensional analyzer
JP2007139590A (en) * 2005-11-18 2007-06-07 Shimadzu Corp X-ray fluoroscopic system
WO2008065793A1 (en) * 2006-11-30 2008-06-05 Sumitomo Metal Mining Co., Ltd. Specific element detecting apparatus
JP2008241312A (en) * 2007-03-26 2008-10-09 Shimadzu Corp X-ray generatior
JP2010071969A (en) * 2008-08-22 2010-04-02 Sii Nanotechnology Inc X-ray analyzer and x ray analysis method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006208013A (en) * 2005-01-25 2006-08-10 Jfe Steel Kk Measuring instrument of adhesion amount of surface-treated film on metal strip and measuring method
JP4736440B2 (en) * 2005-01-25 2011-07-27 Jfeスチール株式会社 Apparatus and method for measuring surface treatment film adhesion amount of metal strip
JP2007033207A (en) * 2005-07-26 2007-02-08 Hamamatsu Photonics Kk Fluorescence x-ray three-dimensional analyzer
JP4694296B2 (en) * 2005-07-26 2011-06-08 浜松ホトニクス株式会社 X-ray fluorescence three-dimensional analyzer
JP2007139590A (en) * 2005-11-18 2007-06-07 Shimadzu Corp X-ray fluoroscopic system
JP4662048B2 (en) * 2005-11-18 2011-03-30 株式会社島津製作所 X-ray fluoroscope
WO2008065793A1 (en) * 2006-11-30 2008-06-05 Sumitomo Metal Mining Co., Ltd. Specific element detecting apparatus
JP2008241312A (en) * 2007-03-26 2008-10-09 Shimadzu Corp X-ray generatior
JP2010071969A (en) * 2008-08-22 2010-04-02 Sii Nanotechnology Inc X-ray analyzer and x ray analysis method

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